| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/12/2000 | US6118515 Scanning exposure method |
| 09/12/2000 | US6118514 Image forming apparatus |
| 09/12/2000 | US6118185 Segmented box-in-box for improving back end overlay measurement |
| 09/12/2000 | US6117967 Arylene ether alcohol polymers |
| 09/12/2000 | US6117623 Remover solvent for partial removal of photoresist layer |
| 09/12/2000 | US6117622 Controlled shrinkage of photoresist |
| 09/12/2000 | US6117621 Patterning method |
| 09/12/2000 | US6117619 Low temperature anti-reflective coating for IC lithography |
| 09/12/2000 | US6117618 Carbonized antireflective coating produced by spin-on polymer material |
| 09/12/2000 | US6117617 Using a methanofullerene containing an oxygen-containing group and aryl and heterocyclic rings as the electron beam resist material; graphitization; high pattern resolution; semiconductors; highly resistant against dry etching |
| 09/12/2000 | US6117616 Circuit-forming substrate and circuit substrate |
| 09/12/2000 | US6117615 Capturing the leading edge of the first photosensitive printing element in the nip by contacting the coversheet to the roller; removing the coversheet while rotating the cylinder; forming a gap when mounting the second element |
| 09/12/2000 | US6117612 Stereolithography resin for rapid prototyping of ceramics and metals |
| 09/12/2000 | US6117610 A mixture or a reaction product of a phenolic resin and an o-diazonaphthoquinone, a non-basic infrared absorber and a dissolution inhibitor insensitive to actinic radiation; positive and negative lithographic printing plates |
| 09/12/2000 | US6117609 Photosensitive recording material using microcapsules |
| 09/12/2000 | US6117600 Charged-particle-beam transfer methods utilizing high and low resolution sub-patterns |
| 09/12/2000 | US6117599 Alignment and exposure process utilizing split beam for exposure and alignment |
| 09/12/2000 | US6117598 Scanning exposure method with alignment during synchronous movement |
| 09/12/2000 | US6117597 Utilizing three of the four (111) families of crystallographic planes of single crystal silicon as etch barrier for anisotropic etchants, etching to form planar surface |
| 09/12/2000 | US6117486 Multilayer photoresists and nozzles for spraying |
| 09/12/2000 | US6117481 Applying resins on substrates, slits, dropping and scanning |
| 09/12/2000 | US6117344 Method for manufacturing low work function surfaces |
| 09/12/2000 | US6117294 Contacting the faceplate of a field emission display with an electrophoresis solution, comprising a black matrix material selected from boron carbide, silicon carbide, titanium carbide, vanadium carbide to deposit carbide on the faceplate |
| 09/12/2000 | US6117240 Liquid applying apparatus and an image forming substance removing apparatus |
| 09/11/2000 | CA2299856A1 Ester-containing iodonium salts and their use for the radiation curing of cationically-curing materials |
| 09/08/2000 | WO2000052757A1 Semiconductor device |
| 09/08/2000 | WO2000052744A1 Stage device and production method thereof, position control method, exposure system and production method thereof, and device and production method thereof |
| 09/08/2000 | WO2000052531A1 Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor |
| 09/08/2000 | WO2000052530A1 Oxime derivatives and the use thereof as photoinitiators |
| 09/08/2000 | WO2000052529A1 Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board |
| 09/08/2000 | WO2000052528A2 Monograin membrane mask |
| 09/08/2000 | WO2000052103A1 Pigment composition, dispersion containing the same, and color resist for color filter |
| 09/08/2000 | WO2000051761A1 Method and apparatus for production of a cast component |
| 09/08/2000 | WO2000020900A3 Silicon carbide for use as a low dielectric constant anti-reflective coating and its deposition method |
| 09/08/2000 | WO2000016163A3 Method and apparatus for developing photoresist patterns |
| 09/08/2000 | CA2714871A1 Method and apparatus for production of a cast component |
| 09/08/2000 | CA2663076A1 Method and apparatus for production of a cast component |
| 09/07/2000 | DE4138731C2 Belichtungsvorrichtung Exposure apparatus |
| 09/07/2000 | DE19960506A1 Vernetzende Monomere für ein Photoresist und Verfahren zur Herstellung von Photoresist-Polymeren unter Verwendung derselben Crosslinking monomers for photoresist and a method for the production of photoresist polymers using the same |
| 09/07/2000 | DE19909520A1 Verfahren und Vorrichtung zum Wiederverwerten einer Siebdruckschablone Method and device for recycling a screen printing stencil |
| 09/07/2000 | DE10010871A1 Semiconductor wafer processing system, generating downwards directed pure air laminar stream at front side of drier units |
| 09/06/2000 | EP1033744A2 Improved dry photolithography process for deep ultraviolet exposure |
| 09/06/2000 | EP1033741A2 Charged-particle beam lithography system |
| 09/06/2000 | EP1033738A1 Device for the electrostatic deflection of a particle beam |
| 09/06/2000 | EP1033627A2 Process and device for recovering a printing screen |
| 09/06/2000 | EP1033626A1 Radiation sensitive composition |
| 09/06/2000 | EP1033625A1 Radiation sensitive composition |
| 09/06/2000 | EP1033624A1 Radiation-sensitive composition of chemical amplification type |
| 09/06/2000 | EP1033623A2 Photorecording medium, process for fabricating medium, and process for holography using medium |
| 09/06/2000 | EP1033622A2 Photopolymerizable recording element and process for the preparation of flexographic printing forms |
| 09/06/2000 | EP1033420A1 Process and apparatus for electrochemically graining a support for light-sensitive layers |
| 09/06/2000 | EP1033350A1 Synthetic quartz glass member for use in ArF excimer laser lithography |
| 09/06/2000 | EP1032866A1 Solid-capped liquid photopolymer printing elements |
| 09/06/2000 | EP0711146B1 Osmotic device having a vapor-permeable coating |
| 09/06/2000 | EP0704145B1 Method of manufacturing a device, by irradiating some parts of the surface of the device directly through a mask, and other parts indirectly through the mask and via a reflecting surface, thereby producing a pattern |
| 09/06/2000 | CN2395301Y Screen plate making machine |
| 09/05/2000 | US6115175 UV image forming optical system |
| 09/05/2000 | US6115110 Pressure-developing device and recording device |
| 09/05/2000 | US6115108 Illumination modification scheme synthesis using lens characterization data |
| 09/05/2000 | US6115107 Exposure apparatus |
| 09/05/2000 | US6114781 Cooling system for a linear or planar motor |
| 09/05/2000 | US6114709 Electron-beam transfer-exposure apparatus and method |
| 09/05/2000 | US6114708 Electron-beam exposure apparatus and exposure method |
| 09/05/2000 | US6114497 Polybenzoxazole resin and precursor thereof |
| 09/05/2000 | US6114462 Crosslinking a polyvinylphenol derivative with unsaturated ether derivatives |
| 09/05/2000 | US6114422 A chemically amplified copolymer of p-hydroxystyrene and a (meth)acrylate of an hydroxyalkylmalonate along with a photoacid generator; fineness of resolution for semiconductor chips; thermal properties |
| 09/05/2000 | US6114255 For use in active area lithography and gate area lithography steps in the formation of a semiconductor integrated circuit |
| 09/05/2000 | US6114099 Patterned molecular self-assembly |
| 09/05/2000 | US6114097 Improves the 3-d patterning capability of laser pantography (computer controlled laser direct-write patterning); process for interconnecting ic chips to a substrate via sidewall patterning |
| 09/05/2000 | US6114096 Method for fabricating an electronic component which component had an asymmetric resist pattern formed on the component during the manufacturing process; manufacture of electronic components such as integrated circuit wafers using |
| 09/05/2000 | US6114094 Process for making lithographic printing plate |
| 09/05/2000 | US6114093 Desired pattern is written by exposing the resist film with a charged particle electron beam |
| 09/05/2000 | US6114092 Photosensitive resin compositions for photoresist |
| 09/05/2000 | US6114091 Photopolymerizable composition containing an N-heterocyclic photoinitiator |
| 09/05/2000 | US6114089 Positive working photosensitive lithographic printing plate |
| 09/05/2000 | US6114088 Thermal transfer element for forming multilayer devices |
| 09/05/2000 | US6114086 Comprising alkali-soluble resin, dissolution controlling agents, photoacid generator, solvent; used for the manufacture of semiconductor devices or integrated circuits |
| 09/05/2000 | US6114085 Antireflective composition for a deep ultraviolet photoresist |
| 09/05/2000 | US6114084 Chemically amplified resist composition |
| 09/05/2000 | US6114082 Preparing a film forming photoresist composition used in manufacture of integrated circuit chips |
| 09/05/2000 | US6114072 Reticle which can prevent degradation in registration accuracy caused by shot rotation error or shot magnification error without increasing area of the dicing region |
| 09/05/2000 | US6113836 Method of forming thick film pattern and material for forming thick film pattern |
| 09/05/2000 | US6113697 Method of and apparatus for coating a wafer with a minimal layer of photoresist |
| 09/05/2000 | US6113694 Substrate treatment apparatus |
| 09/05/2000 | US6113346 Method for loading and unloading a supply of plates in an automated plate handler |
| 09/05/2000 | US6112664 Plate making apparatus with a cutter and punch mechanism formed in one piece |
| 08/31/2000 | WO2000051190A1 Packaged strain actuator |
| 08/31/2000 | WO2000051172A1 Exposure system, lithography system and conveying method, and device production method and device |
| 08/31/2000 | WO2000050958A1 Photosensitive pastes and substrates for plasma display panel using the same |
| 08/31/2000 | DE19908529A1 Pigmentiertes und rückseitenbeschichtetes Aufzeichnungsmaterial zur Herstellung von Offsetdruckplatten Pigmented and back-coated recording material for the production of offset printing plates |
| 08/31/2000 | DE19908528A1 Strahlungsempfindliches Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten A radiation-sensitive recording material for the production of waterless offset printing plates |
| 08/31/2000 | DE19908526A1 Beleuchtungssystem mit Feldspiegeln zur Erzielung einer gleichförmigen Scanenergie Illumination system with field mirrors to achieve a uniform scanning energy |
| 08/31/2000 | DE19906564A1 Verfahren zur Herstellung von dreidimensionalen Gegenständen mittels Stereolithographie A process for producing three-dimensional objects by means of stereolithography |
| 08/31/2000 | DE19906421A1 Illuminator with laser and light-path objective inserts perforated shutter in light path ahead of objective with aperture diameter smaller than beam shaft waist section. |
| 08/31/2000 | DE19906398A1 Verfahren und Vorrichtung zum Behandeln von Substraten Method and apparatus for treating substrates |
| 08/31/2000 | DE19655045C2 Water-soluble photocurable resin compsn. useful in black matrix punch |
| 08/31/2000 | DE10003011A1 Negative-type light-sensitive resin composition for manufacture of circuit boards, semiconductor chip carriers and semiconductor devices, contains cis-diene substituted polyamic acid or polyimide and oxygen sensitizer |
| 08/31/2000 | CA2363949A1 Packaged strain actuator |
| 08/30/2000 | EP1032098A2 Laser oscillating apparatus |
| 08/30/2000 | EP1032097A2 Laser oscillating apparatus |