| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/20/2000 | CN2397520Y Thermal ferrotype solidification separating cutting device |
| 09/20/2000 | CN1267089A Single-point strobed micro electromagnetic units array chip or electromagnetic biologic chip and application thereof |
| 09/20/2000 | CN1267082A Graticule having new identifying pattern |
| 09/20/2000 | CN1267053A Method for forming very tip in reader head of data converter, and reader/writer head |
| 09/20/2000 | CN1267001A Photoetching resin composition contg cyclic olefin polymer and saturated steroid additive |
| 09/20/2000 | CN1267000A Cyclic olefin polymer and additive photoetching resin composition |
| 09/20/2000 | CN1266843A Organic antireflecting coating and its preparation |
| 09/19/2000 | US6122114 Optical-element supporting device and optical apparatus |
| 09/19/2000 | US6122107 Angular integrator |
| 09/19/2000 | US6122059 Scanning exposure apparatus and device fabrication method in which multiple laser interferometers use a respective laser head |
| 09/19/2000 | US6122037 Reflective phaseshift lithography system |
| 09/19/2000 | US6122036 Projection exposure apparatus and method |
| 09/19/2000 | US6122035 Lithographic system and method for exposing a target utilizing unequal stepping distances |
| 09/19/2000 | US6121996 Laser recording method |
| 09/19/2000 | US6121975 Pattern forming method and system providing compensated repeat |
| 09/19/2000 | US6121626 Method and system of exposure with a universal dynamic mask and charge coupled device image feedback control |
| 09/19/2000 | US6121625 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 09/19/2000 | US6121412 Condensing formaldehyde with phenolic compounds, producing a novolak resin, adding photoresist solvent and water-soluble organic polar solvent, centrifuging, removing polar solvent leaving novolak dissolved in photoresist solvent |
| 09/19/2000 | US6121340 Photodefinable dielectric compositions comprising polycyclic polymers |
| 09/19/2000 | US6121217 Removal of process residue from substrate of titanium (metal, alloy, or compound) with aqueous solution of alkanolamine, gallic acid or catechol chelating agent, hydroxylamine |
| 09/19/2000 | US6121158 Method for hardening a photoresist material formed on a substrate |
| 09/19/2000 | US6121154 Etching multilayer nitride photoresists |
| 09/19/2000 | US6121133 Isolation using an antireflective coating |
| 09/19/2000 | US6121123 Gate pattern formation using a BARC as a hardmask |
| 09/19/2000 | US6121027 For coating biomaterial surfaces and forming a crosslinked biomaterial |
| 09/19/2000 | US6120978 Surfactants and photoresists developers |
| 09/19/2000 | US6120977 Photoresist with bleaching effect |
| 09/19/2000 | US6120974 Pattern forming material and pattern forming method |
| 09/19/2000 | US6120973 Radiation sensitive composition for color filters |
| 09/19/2000 | US6120972 Copolymer of acrylic ester and carbonate with photoacid generator for photosensitive elements |
| 09/19/2000 | US6120971 Aluminum printing plates and silver halide emulsions |
| 09/19/2000 | US6120970 Polybenzoxazole and polybenzothiazole precursors |
| 09/19/2000 | US6120969 Phenolic resins for photoresists |
| 09/19/2000 | US6120968 Light sensitive recording media and reflectance |
| 09/19/2000 | US6120953 Reducing a critical dimension of the main pattern by adding a serif/hammerhead onto the main pattern and an assist feature is added onto the main pattern for further reduction; photolithography process |
| 09/19/2000 | US6120952 Achieving a desired transferred main feature dimension |
| 09/19/2000 | US6120950 Optical element manufacturing method |
| 09/19/2000 | US6120945 Method of developing a photoresist pattern and a developing apparatus |
| 09/19/2000 | US6120944 An optical color filter comprising extremely fine organic pigment particles in multi-thin layers |
| 09/19/2000 | US6120943 Fabricating method of liquid crystal display apparatus |
| 09/19/2000 | US6120902 Luminescent article with protective coating and manufacture |
| 09/19/2000 | US6120834 Applying wet film to surface of substrate while substrate is held in place by support member; forming vacuum chamber around substrate while substrate is held in place by support member and while film is still wet; drying using vacuum |
| 09/19/2000 | US6120693 Method of manufacturing an interlayer via and a laminate precursor useful for same |
| 09/19/2000 | CA2227493C Writing gratings |
| 09/19/2000 | CA2132768C Photoresist strippers containing reducing agents to reduce metal corrosion |
| 09/19/2000 | CA2057725C Photosensitive composition containing water as solvent or dispersant |
| 09/14/2000 | WO2000054112A1 Holographic recording material |
| 09/14/2000 | WO2000054107A1 Step and flash imprint lithography |
| 09/14/2000 | WO2000054105A1 Hydroxy-amino thermally cured undercoat for 193 nm lithography |
| 09/14/2000 | WO2000054096A1 Imaging device and method for eliminating edge effects in spatial modulators |
| 09/14/2000 | WO2000054091A1 Illumination system and method for spatial modulators |
| 09/14/2000 | WO2000053658A1 Polycyclic polymers containing pendant cyclic anhydride groups |
| 09/14/2000 | WO2000053645A1 Hydroxy-epoxide thermally cured undercoat for 193 nm lithography |
| 09/14/2000 | WO2000053598A1 Pyran derivatives |
| 09/14/2000 | WO2000053422A1 Pixel intensity control in electro-optic modulators |
| 09/14/2000 | WO2000053398A1 Application of textured or patterned surfaces to a prototype |
| 09/14/2000 | WO2000020926A9 Ionization radiation imageable photopolymer compositions |
| 09/14/2000 | WO2000019568A8 Line narrowing apparatus with high transparency prism beam expander |
| 09/14/2000 | WO2000019270A9 Method for forming a critical dimension test structure and its use |
| 09/14/2000 | WO2000013018A3 Support for a method for determining analytes and a method for producing the support |
| 09/14/2000 | DE19910724A1 Mikrolithographie-Projektionsobjektiveinrichtung sowie Projektionsbelichtungsanlage Microlithography projection lens apparatus and projection exposure apparatus |
| 09/14/2000 | DE19906823A1 IR-Empfindliche Zusammensetzung und deren Verwendung zur Herstellung von Druckplatten IR-sensitive composition and its use for the production of printing plates |
| 09/14/2000 | DE19856575A1 Projektions-Mikrolithographiegerät Projection microlithography device |
| 09/14/2000 | CA2366846A1 Holographic recording material |
| 09/14/2000 | CA2338041A1 Application of textured or patterned surfaces to a prototype |
| 09/14/2000 | CA2329912A1 Pixel intensity control in electro-optic modulators |
| 09/14/2000 | CA2328954A1 Illumination system and method for spatial modulators |
| 09/14/2000 | CA2328870A1 Imaging device and method for eliminating edge effects in spatial modulators |
| 09/13/2000 | EP1035446A2 Resist stripping composition and process for stripping resist |
| 09/13/2000 | EP1035445A2 Microlithographic reduction objective and projection exposure apparatus |
| 09/13/2000 | EP1035444A2 Cover film for dry film resist |
| 09/13/2000 | EP1035443A1 An imaging element for making lithographic printing plates with a decreased slippage in the press |
| 09/13/2000 | EP1035442A2 Planarizing antireflective coating compositions |
| 09/13/2000 | EP1035441A1 Pattern formation method |
| 09/13/2000 | EP1035440A1 Photosensitive resin and photosensitive resin composition |
| 09/13/2000 | EP1035439A2 Photosensitive resin composition, color filter, and copolymer resin useful for them |
| 09/13/2000 | EP1035438A2 Phenolic resins and photoresist compositions comprising same |
| 09/13/2000 | EP1035437A2 A radiation-sensitive resist material and a process for device fabrication using the same |
| 09/13/2000 | EP1035436A1 Resist pattern formation method |
| 09/13/2000 | EP1035435A2 Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative |
| 09/13/2000 | EP1035147A1 Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom |
| 09/13/2000 | EP1035124A1 Borate compound, and photopolymerizable composition and recording material which contain the same |
| 09/13/2000 | EP1035105A1 Iodonium salts containing ester groups as well as their use for radiation hardening of cationic hardable masses |
| 09/13/2000 | EP1034456A1 Uv optical system with reduced ageing |
| 09/13/2000 | EP0897420A4 Photoresist stripping compositions |
| 09/13/2000 | EP0885410B1 Thermal treatment process of positive photoresist composition |
| 09/13/2000 | EP0829036B1 Lithographic scanning exposure projection apparatus |
| 09/13/2000 | EP0799439B1 Positioning device with a force actuator system for compensating centre-of-gravity displacements |
| 09/13/2000 | CN2396416Y Exposure device for making stamping face of stamp |
| 09/13/2000 | CN1266506A Dry image forming material and dry image forming method |
| 09/13/2000 | CN1056466C Electrodeless lamp and method for lighting |
| 09/13/2000 | CN1056341C Printing plate |
| 09/13/2000 | CN1056338C Print stamp making device |
| 09/12/2000 | US6118596 Catadioptric reduction projection optical system and method |
| 09/12/2000 | US6118577 Diffractive element in extreme-UV lithography condenser |
| 09/12/2000 | US6118574 Exposure apparatus |
| 09/12/2000 | US6118559 Broadband diffractive diffuser and associated methods |
| 09/12/2000 | US6118535 In Situ alignment system for phase-shifting point-diffraction interferometry |
| 09/12/2000 | US6118517 Mask pattern for alignment |
| 09/12/2000 | US6118516 Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns |