| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/03/2000 | US6126725 Deaerating apparatus and treatment apparatus with gas permeable films |
| 10/03/2000 | US6126338 Resist coating-developing system |
| 10/03/2000 | US6126336 Apparatus for the complete, continuous separation of a mixture of photopolymers and water with a membrane and filter, for the making of flexible plates useful in printing |
| 10/03/2000 | US6125644 Container of coolant |
| 10/03/2000 | CA2172002C Printing process for multicolor image |
| 10/03/2000 | CA2118753C Method of forming a micro structure and an x-ray mask |
| 09/30/2000 | CA2303019A1 Semiconductor device manufacturing method of accurately performing alignment of patterning, and mask for exposure |
| 09/30/2000 | CA2302875A1 Oxime derivatives and the use thereof as latent acids |
| 09/28/2000 | WO2000057629A1 Laser pattern generator |
| 09/28/2000 | WO2000057459A1 Exposure method and apparatus |
| 09/28/2000 | WO2000057249A1 Resist developer and method for forming resist pattern using the same |
| 09/28/2000 | WO2000057248A1 Photosensitive resin composition for roll coating and method of roll coating |
| 09/28/2000 | WO2000057247A1 Improved thermosetting anti-reflective coatings |
| 09/28/2000 | WO2000057236A2 Optical synthetic aperture array |
| 09/28/2000 | WO2000057235A2 Multi-beam scanner including a dove prism array |
| 09/28/2000 | WO2000057158A1 Method and apparatus for measuring internal transmittance |
| 09/28/2000 | WO2000056822A1 Utilization of phenylglyoxilic acid esters as photoinitiators |
| 09/28/2000 | WO2000056798A1 Urethane oligomer, resin compositions thereof, and cured article thereof |
| 09/28/2000 | WO2000056633A1 Smif container including a reticle support structure |
| 09/28/2000 | WO2000041740A3 Particles for oral delivery of peptides and proteins |
| 09/28/2000 | DE19913353A1 Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren Use of phenylglyoxalic esters as photoinitiators |
| 09/28/2000 | DE19910247A1 Neues holographisches Aufzeichnungsmaterial New holographic recording material |
| 09/28/2000 | DE10009183A1 Photoresist composition comprises a cyclic olefin polymer, a photosensitive acid generator and a hydrophobic additive selected from non-steroidal (multi)-alicyclic components and a saturated steroid component |
| 09/28/2000 | CA2366739A1 Method and apparatus for measuring internal transmittance |
| 09/28/2000 | CA2365144A1 Urethane oligomer, resin compositions thereof, and cured article thereof |
| 09/28/2000 | CA2330122A1 Laser pattern generator |
| 09/27/2000 | EP1039595A2 Gas laser oscillator |
| 09/27/2000 | EP1039511A1 Projection exposure method and projection aligner |
| 09/27/2000 | EP1039510A1 Exposure apparatus and method of manufacturing the same, and exposure method |
| 09/27/2000 | EP1039509A1 Aligner, exposure method using the aligner, and method of manufacture of circuit device |
| 09/27/2000 | EP1039348A2 Digital lithographic printing plate and method of making thereof |
| 09/27/2000 | EP1039347A1 Antireflective coating for improving cd control |
| 09/27/2000 | EP1039346A1 Resist compositions and pattering process |
| 09/27/2000 | EP1038670A1 Process for making a photopolymer relief printing belt |
| 09/27/2000 | EP1038668A2 Photosensitive composition and planographic printing plate precursor using same |
| 09/27/2000 | EP1038666A2 Lithographic printing plate precursor |
| 09/27/2000 | EP1038593A1 Device for applying two or several fluids from nozzles |
| 09/27/2000 | EP1038340A1 Narrow band laser with etalon based output coupler |
| 09/27/2000 | EP1038196A1 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same |
| 09/27/2000 | EP0979525A4 Use of sacrificial masking layer and backside exposure in forming openings that typically receive light-emissive material, and associated light-emitting structure |
| 09/27/2000 | EP0897558B1 Photosensitive resin composition for rapid prototyping and a process for the manufacture of 3-dimensional objects |
| 09/27/2000 | CN1267688A Ultraviolet curing resin composition therewith and photoprotection welding ink |
| 09/27/2000 | CN1056937C Method of manufacturing a matrix for producing optical disc without master as medium |
| 09/26/2000 | US6124934 High-accuracy high-stability method and apparatus for measuring distance from surface to reference plane |
| 09/26/2000 | US6124933 Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus |
| 09/26/2000 | US6124924 Focus error correction method and apparatus |
| 09/26/2000 | US6124923 Stage unit, drive table, and scanning exposure apparatus using the same |
| 09/26/2000 | US6124922 Exposure device and method for producing a mask for use in the device |
| 09/26/2000 | US6124718 Charged-particle-beam projection-exposure apparatus with integrated reticle and substrate inspection |
| 09/26/2000 | US6124601 Position sensor having a reflective projecting system and device fabrication method using the sensor |
| 09/26/2000 | US6124599 Electron beam exposure system and method of manufacturing devices using the same |
| 09/26/2000 | US6124598 Pattern exposure method and system |
| 09/26/2000 | US6124405 Polymers for photoresist compositions |
| 09/26/2000 | US6124372 Improved photoresist compositions and improved thermal ink jet printheads |
| 09/26/2000 | US6124371 Anionic photocatalyst |
| 09/26/2000 | US6124213 Forming a semiconductor structure having a layer formed of a material to be damaged by an oxygen plasma, forming a photoresist mask, selectively etching the semiconductor structure to modify it, removing the mask with hydrazine |
| 09/26/2000 | US6124102 Methods for determining receptor-ligand binding using probe arrays |
| 09/26/2000 | US6124083 An electrically-conductive layer comprising a sulfonated polyurethane film-forming binder and an electroconductive polymer comprising substituted or unsubstituted polypyrroles, polythiophenes and polyanilines |
| 09/26/2000 | US6124081 Prebaking the negative resist to chemical change a substance causing negative resist become slightly soluble or insoluble to the developer |
| 09/26/2000 | US6124077 Visible light-sensitive compositions and pattern formation process |
| 09/26/2000 | US6124076 An expansion agent having a cleaving moiety capable of being detached from the agent by an acid catalysis, an acid-generating photoinitiator and an photopolymerizable monomer; shinkage inhibition; holographic recording; low temperature |
| 09/26/2000 | US6124074 A cyclic olefin polymer having polar functional moieties, and cyclic olefin units having acid labile moieties, a photo-sensitive acid generator, and hnmp's which react with acid to cleave to compounds which promote alkaline solubility |
| 09/26/2000 | US6124064 Light exposure controlling method |
| 09/26/2000 | US6123803 Laser processing chamber with cassette cell |
| 09/26/2000 | US6123502 Substrate holder having vacuum holding and gravity holding |
| 09/26/2000 | CA2097668C Movement actuator/sensor systems |
| 09/26/2000 | CA2023112C Light- and heat-sensitive recording material |
| 09/21/2000 | WO2000055891A1 Exposure device, exposure method, and device manufacturing method |
| 09/21/2000 | WO2000055890A1 Exposure system and aberration measurement method for its projection optical system, and production method for device |
| 09/21/2000 | WO2000055691A1 Method for producing a pattern suitable for forming sub-micron width metal lines |
| 09/21/2000 | WO2000055690A2 A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| 09/21/2000 | WO2000055689A1 Projection lithography photomask blanks, preforms and method of making |
| 09/21/2000 | WO2000055686A1 Passive shaped chuck for correcting field curvature |
| 09/21/2000 | WO2000055675A1 A projection imaging system with a non-circular aperture and a method thereof |
| 09/21/2000 | WO2000055674A1 Mofification of a projection imaging system with a non-circular aperture and a method thereof |
| 09/21/2000 | WO2000055573A1 Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry |
| 09/21/2000 | WO2000055272A1 Radiation curable coating composition comprising a secondary curing agent |
| 09/21/2000 | WO2000054882A1 Individually addressable micro-electromagnetic unit array chips |
| 09/21/2000 | WO2000023840A8 Near field optical scanning system employing microfabricated solid immersion lens |
| 09/21/2000 | DE19962663A1 Organisches, nicht reflektierendes Beschichtungsmaterial und dessen Herstellung Organic, non-reflective coating material and its preparation |
| 09/21/2000 | DE19909152A1 Photopolymerisierbares Aufzeichnungselement und Verfahren zur Herstellung von flexographischen Druckformen A photopolymerizable recording element and process for preparing flexographic printing forms |
| 09/21/2000 | DE10012312A1 Procedure and equipment for testing an excitation or molecular fluorescence laser optical system for spectral line narrowing or bandwidth selection uses a test module for determination of test parameters |
| 09/21/2000 | CA2329539A1 A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| 09/20/2000 | EP1037510A2 Plasma focus high energy photon source with blast shield |
| 09/20/2000 | EP1037339A2 Very stable excimer or molecular fluorine laser |
| 09/20/2000 | EP1037267A1 Projection exposure device, projection exposure method, and method of manufacturing projection exposure device |
| 09/20/2000 | EP1037266A1 Projection exposure method and apparatus |
| 09/20/2000 | EP1037116A2 Method for developing lithographic printing plate precursor, and development processing apparatus |
| 09/20/2000 | EP1037115A2 Microlithographic projection objective and projection exposure apparatus |
| 09/20/2000 | EP1037114A2 Stage control method, exposure method, exposure apparatus and device manufacturing method |
| 09/20/2000 | EP1037113A2 Illumination system for extreme ultraviolet radiation and its application in lithographic apparatus |
| 09/20/2000 | EP1037112A1 Positive photosensitive resin precursor composition and process for producing the same |
| 09/20/2000 | EP1037111A1 Ultraviolet curable resin composition and photo solder resist ink using the same |
| 09/20/2000 | EP1037110A1 Photopolymer plate for letterpress printing |
| 09/20/2000 | EP1037109A2 Reticle having discriminative pattern narrower in pitch than the minimum pattern width but wider than minimum width in the pattern recognition |
| 09/20/2000 | EP1036789A1 Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process |
| 09/20/2000 | EP1036488A1 Method and device for producing extreme ultraviolet and soft x-rays from a gaseous discharge |
| 09/20/2000 | EP1024965A4 Process for removing residues from a semiconductor substrate |
| 09/20/2000 | EP0946894B1 Beam homogenizer |
| 09/20/2000 | EP0920655B1 Baths for producing microstructures |