Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2000
10/11/2000EP0845115B1 Water-less lithographic plates
10/11/2000EP0464224B1 Method of and material for forming thick filmy pattern
10/11/2000CN1269810A Photoeresist composition comprising polycyclic polymers with acid labile pendant groups
10/11/2000CN1269752A Thermal waterless lithographic printing plate
10/11/2000CN1269600A Improved alignment mark pattern and overlapping accracy measuring pattern and their formation method
10/11/2000CN1269532A Reflection-resisting coating for improving creatial size control
10/11/2000CN1269531A Fuel composition, blank sheet and multilayer substrate materials
10/11/2000CN1269530A Photoresist composition containing cycloolefine polymer and hydrophobic-non-stero superfatted cyclic additive
10/11/2000CN1269529A System and method for lightening corner of mask to become round in production of said mask
10/11/2000CN1269386A Photosensitive conductive paste
10/11/2000CN1057292C Dicyclic compound, medicinal composition containing same and use thereof
10/10/2000US6130751 Positioning method and apparatus
10/10/2000US6130750 Optical metrology tool and method of using same
10/10/2000US6130747 Method of measuring aberrations of lens
10/10/2000US6130742 Exposure apparatus for a ball shaped substrate
10/10/2000US6130517 Magnetic actuator producing large acceleration on fine stage and low RMS power gain
10/10/2000US6130432 Particle beam system with dynamic focusing
10/10/2000US6130169 Uses cf4, o2, and h2o as etchant gases in a downstream chamber at a low pressure, which are ionized by radio waves
10/10/2000US6130166 Alternative plasma chemistry for enhanced photoresist removal
10/10/2000US6130027 Process for producing lead frames
10/10/2000US6130026 Waterless lithographic plates
10/10/2000US6130025 Stereolithographic resin composition and stereolithographic method
10/10/2000US6130023 Method for making lithographic printing plates according to the silver salt diffusion transfer process
10/10/2000US6130016 Determining optimum numerical aperture and partial coherence values for the stepper
10/10/2000US6130013 Birefringent interlayer for attenuating standing wave photoexposure of a photoresist layer formed over a reflective layer
10/05/2000WO2000059013A1 Exposure apparatus, semiconductor device, and photomask
10/05/2000WO2000059012A1 Exposure method and apparatus
10/05/2000WO2000058788A1 Photopolymerizable layered product with high resolution and semiconductor device made with the same
10/05/2000WO2000058761A1 Multilayer antireflection film, optical component, and reduction projection exposure system
10/05/2000WO2000058275A1 Photosensitive compound and photosensitive composition
10/05/2000WO2000058252A1 High-purity 1,3-propanediol derivative solvent, process for producing the same, and use thereof
10/05/2000WO2000029906A3 Antireflective composition for a deep ultraviolet photoresist
10/05/2000WO2000025178A3 Photoresists and processes for microlithography
10/05/2000DE19914583A1 Lithography device for production of semiconductor or micro- mechanical structures generates a mash for illuminating a photosensitive circuit by creation of a bitmap using software, which bitmap can then be illuminated with UV light
10/05/2000DE19908884C1 Verfahren und Vorrichtung zum elektrochemischen Aufrauhen eines Trägers für lichtempfindliche Schichten Method and apparatus for electrochemically roughening a substrate for photosensitive layers
10/05/2000DE19907858C1 Vorrichtung zur elektrostatischen Ablenkung eines Korpuskularstrahles Apparatus for electrostatic deflection of a particle beam
10/05/2000DE10015742A1 Photoresist composition used for processing semiconductors contains mixture of benzophenone and poly(phenylene-alkylene) naphthoquinone-diazide-sulfonates, resin and solvent
10/05/2000DE10015255A1 New and known oxime derivatives used as photosensitive acid donors in chemically amplified photoresist compositions comprising a compound which is acid curable or which increases in solubility in acid
10/04/2000EP1041630A2 Method of accurately performing alignment of patterning in the manufaturing of a semiconductor device, and mask for exposure
10/04/2000EP1041607A1 Projection exposure apparatus
10/04/2000EP1041606A1 Exposure apparatus
10/04/2000EP1041605A1 Temperature adjusting method and aligner to which this method is applied
10/04/2000EP1041445A2 Method of improving the etch resistance of photoresists
10/04/2000EP1041444A2 Apparatus and method for manufacturing a semiconductor device
10/04/2000EP1041443A2 Lithographic process for device fabrication using dark-field illumination and apparatus therefor
10/04/2000EP1041442A1 Chemical amplification type positive resist
10/04/2000EP1041441A2 Device manufacturing method
10/04/2000EP1041440A2 System and method for reducing corner rounding in mask fabrication
10/04/2000EP1041357A1 Stage device and exposure apparatus
10/04/2000EP1041011A1 Water-developable plate package
10/04/2000EP1040912A2 Photosensitive resin laminate and production method thereof
10/04/2000EP1040539A1 High pulse rate pulse power system
10/04/2000EP1040511A2 Integrated material management module
10/04/2000EP1040006A2 Direct electrostatic printing method and apparatus
10/04/2000EP1040003A1 Engraving system and method comprising different engraving devices
10/04/2000EP1038593B1 Device for applying two or several fluids from nozzles
10/04/2000EP0904569B1 Method of producing printing or embossing cylinders having a patterned surface
10/04/2000EP0705454B1 Method and product for particle mounting
10/04/2000CN1268681A Improved critical dimension control
10/04/2000CN1268680A Chemical enhancement type positive photoetching gum composition
10/04/2000CN1268679A Chemical enhancement type photoetching gum
10/04/2000CN1268678A Method for improving etching-resistance ability of photoetching gum
10/03/2000US6128552 Anti-vibration apparatus and method
10/03/2000US6128323 Reliable modular production quality narrow-band high REP rate excimer laser
10/03/2000US6128089 Combined segmented and nonsegmented bar-in-bar targets
10/03/2000US6128070 Monitor method and apparatus for overlay alignment of a stepper
10/03/2000US6128069 Stage mechanism for exposure apparatus
10/03/2000US6128068 Projection exposure apparatus including an illumination optical system that forms a secondary light source with a particular intensity distribution
10/03/2000US6128067 Correcting method and correcting system for mask pattern
10/03/2000US6128030 Semiconductor exposure device
10/03/2000US6127790 Method and apparatus for passively trimming sawyer motors to correct for yaw errors
10/03/2000US6127749 Two-dimensional electric motor
10/03/2000US6127738 Detecting registration marks with low energy electron beam
10/03/2000US6127686 Thin resist process by sub-threshold exposure
10/03/2000US6127683 Electron beam drawing apparatus
10/03/2000US6127447 Radiation curable coating composition includes an effective amount of cationic photoinitiator in combination with a charge transfer complex
10/03/2000US6127445 Substituted benzoylferrocene anionic photoinitiators
10/03/2000US6127262 Vapor deposition of protective nitride or oxynitride antireflectivity/antirefractive coating onto first layer coated onto substrate, then coating with photosensitive layer, patterning and etching uppermost layer
10/03/2000US6127255 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
10/03/2000US6127101 Alkylated aminoalkylpiperazine surfactants and their use in photoresist developers
10/03/2000US6127100 Method of manufacturing a stamper for use in optical information recording medium
10/03/2000US6127098 Reacting phenol-containing composition in resist film with acyl halide or sulfonyl halide to expand volume of resist film and reduce size of opening previously formed by exposure and development
10/03/2000US6127097 Photoresist develop and strip solvent compositions and method for their use
10/03/2000US6127096 Method for reducing photolithographic steps in a semiconductor interconnect process
10/03/2000US6127095 Device comprising light source for supplying light, condenser optical system which includes decentering unit for collecting light and guiding onto object, secondary light source between light source and optical system which varies shape or size
10/03/2000US6127094 Composition comprising crosslinked acrylate copolymer, washout aid, unsaturated monomer, photopolymerization initiator, thermoplastic elastomer, plasticizer, emulsifier
10/03/2000US6127092 Curable reaction resin mixture comprising cationically curable monomer and/or oligomer, initiator having sulfonium group
10/03/2000US6127091 Photopolymerizable composition and photopolymerizable recording material prepared using this composition
10/03/2000US6127090 Forming liquid photosensitive resin into layer by applying to substrate with bucket, wherein forming speed variation point is set at specified position and forming speed is successively reduced
10/03/2000US6127089 Interconnect structure with low k dielectric materials and method of making the same with single and dual damascene techniques
10/03/2000US6127087 Positive photoresist compositions and multilayer resist materials using same
10/03/2000US6127086 Photosensitive resin compositions
10/03/2000US6127085 Photo-curable resin composition
10/03/2000US6127084 Material incorporating hygroscopic polymer into internal phase of microcapsules in imaging system to prevent or reduce tendency of image to darken
10/03/2000US6127075 Method for checking accuracy of a measuring instrument for overlay registration
10/03/2000US6127074 Phosphor slurry comprising photosensitizer, hydroxyethyl acrylate polymer, phosphor
10/03/2000US6127071 Designing photolithographic mask for conducting illumination from a light source onto a semiconductor surface during a microlithographic manufacturing process
10/03/2000US6127050 Compact disc made of a metal such as aluminum which is mechanically grained with particulate material for preparing a tamper-proof archival medium
10/03/2000US6126884 Stereolithographic method and apparatus with enhanced control of prescribed stimulation production and application
10/03/2000US6126772 Method for resist removal, and adhesive or adhesive sheet for use in the same
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