Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2000
10/24/2000US6136502 Comprising organic solvent, at least two polymers with weight average molecular weights of 1,000-500,000 which have at least one type of acid labile group and are crosslinked within a molecule and/or between molecules, photoacid generator
10/24/2000US6136501 Polymers and photoresist compositions comprising same
10/24/2000US6136500 Radiation sensitive resin composition
10/24/2000US6136499 Radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups
10/24/2000US6136498 Polymer-bound sensitizer
10/24/2000US6136497 Actinic radiation-curable and cationically polymerizable organic substance, a cationic initiator, a radical photoinitiator, cationic reactive modifier containing two reactive groups per molecule or at least one polyether polyol
10/24/2000US6136496 Underlying photosensitive layer is layer comprising at least 10 mg/m2 of a copolymer containing at least 1 mole % of tetraallyloxyethane
10/24/2000US6136495 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer
10/24/2000US6136481 Color filter manufacturing method capable of assuring a high alignment accuracy of color filter and alignment mark therefor
10/24/2000US6136480 Method for fabrication of and apparatus for use as a semiconductor photomask
10/24/2000US6136479 A portion of interconnection and/or contact hole pattern is covered with an absorption layer, exposing interconnection pattern and contact hole pattern to rays of different wavelength, wherein one ray is absorb by the absorption layer
10/24/2000US6136478 Mask pattern correction method and exposure mask to be used for such a method
10/24/2000US6136425 Support for printing material, printing material employing the same and manufacturing method thereof
10/24/2000US6136212 Polymer-based micromachining for microfluidic devices
10/24/2000US6136142 Film applying apparatus
10/24/2000US6134981 Precision scanning apparatus and method with fixed and movable guide members
10/22/2000CA2269729A1 Apparatus for exposure of printing plates using signals to offset image incline distortion
10/19/2000WO2000062586A1 Ultraviolet curable silver composition and related method
10/19/2000WO2000062324A2 System and method to correct for distortion caused by bulk heating in a substrate
10/19/2000WO2000062127A1 System and method for performing lithography on a substrate
10/19/2000CA2334388A1 System and method to correct for distortion caused by bulk heating in a substrate
10/18/2000EP1045495A2 Gas discharge laser with magnetic bearings
10/18/2000EP1045427A2 Target locking system for electron beam lithography
10/18/2000EP1045424A2 Particle beam system with dynamic focusing
10/18/2000EP1045291A2 Method of improving the etch resistance of photoresists
10/18/2000EP1045290A2 Composition for resist underlayer film and method for producing the same
10/18/2000EP1045289A2 A lithographic process having sub-wavelength resolution
10/18/2000EP1045288A2 Mask structure and method of manufacturing the same
10/18/2000EP1044809A1 Method for producing lithographic printing plate
10/18/2000EP1044460A1 Electron sources utilizing patterned negative electron affinity photocathodes
10/18/2000EP1044457A1 X-ray irradiation apparatus including an x-ray source provided with a capillary optical system
10/18/2000EP1044454A1 Collimator for x-ray proximity lithography
10/18/2000EP1044396A1 Method for continuous and maskless patterning of structured substrates
10/18/2000EP1044394A1 Process for preparing a radiation-sensitive composition
10/18/2000EP1044251A1 Ammonium borate containing compositions for stripping residues from semiconductor substrates
10/18/2000EP1044074A1 Photoresist coating process control with solent vapor sensor
10/18/2000EP0909408B1 Process for producing a screen printing form and screen printing fabric of a coated screen web
10/18/2000CN1270494A Method for forming conductive pattern and manufacturing multi-layer ceramic substrates
10/18/2000CN1270329A Optical imaging composition with improved chemical quality and stripping performance
10/17/2000US6134096 Substrate, insulating dielectric layer and electrode between the two; object is attracted onto electrode via insulating dielectric layer, which utilizes a gas-introducing hole to form a gas-diffusing depression for uniform heat conduction
10/17/2000US6134049 Method to adjust multilayer film stress induced deformation of optics
10/17/2000US6134008 Aligner and patterning method using phase shift mask
10/17/2000US6134007 Method for measuring orthogonality having a third interferometer which is not orthogonal
10/17/2000US6133987 Technique for reducing pattern placement error in projection electron-beam lithography
10/17/2000US6133986 Microlens scanner for microlithography and wide-field confocal microscopy
10/17/2000US6133982 Exposure apparatus
10/17/2000US6133981 Processing system
10/17/2000US6133618 Semiconductor device having an anti-reflective layer and a method of manufacture thereof
10/17/2000US6133577 Method and apparatus for producing extreme ultra-violet light for use in photolithography
10/17/2000US6133576 Broad spectrum ultraviolet inspection methods employing catadioptric imaging
10/17/2000US6133465 Improving the adhesion between a semiconductor substrate and a resist pattern as well as preventing an insoluble skin layer from being formed on the surface of a resist pattern in using a chemically amplified resist
10/17/2000US6133412 Acid catalyzed acetalization of a vinyl ether by reacting with both a hydroxy aromatic monomer or polymer and a monoalcohol to form photoresist resin
10/17/2000US6133336 Process for forming a colored three-dimensional article
10/17/2000US6133335 Photopolymerizable epoxy monomer and an initiation system comprising an organo-iron complex salt and accelerator of given formula having 2 adjacent hydroxyl groups on a benzene ring; upon photoactivation, enables a color change
10/17/2000US6133155 Method for preventing corrosion of a metallic layer of a semiconductor chip
10/17/2000US6132940 Method for producing constant profile sidewalls
10/17/2000US6132939 Covering a protective film made of a paraffin before or after exposing the chemically amplified resist film by use of a mask
10/17/2000US6132938 Process for making lithographic printing plate
10/17/2000US6132937 A photographic developer comprising an alkali-soluble macromolecular addition copolymer binder; forming fineness pattern
10/17/2000US6132936 Monomer and polymer for photoresist, and photoresist using the same
10/17/2000US6132931 Photosensitive composition
10/17/2000US6132930 Negative photoresist composition
10/17/2000US6132928 Coating solution for forming antireflective coating film
10/17/2000US6132926 Semiconductors
10/17/2000US6132925 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer
10/17/2000US6132908 Photo mask and exposure method using the same
10/17/2000US6132667 Multilayer element, setting and exposure
10/17/2000US6132498 Emulsion comprising aqueous phase and oil phase which contains a surface protective agent selected from oxyethylene addition products of fatty acids having 12-30 carbon atoms, and oxyethylene addition products of esters of fatty acids
10/17/2000US6132113 Developer cup
10/17/2000CA2126271C A process for forming a photosensitive material and an exposure apparatus used for the process
10/17/2000CA2009518C Spin-on glass processing technique for the fabrication of semiconductor device
10/12/2000WO2000060632A2 Electrostatically focused addressable field emission arraychips (afea's) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy
10/12/2000WO2000060416A1 Radiation-sensitive resin composition
10/12/2000WO2000060415A1 Method for correcting image faults
10/12/2000WO2000060414A1 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
10/12/2000WO2000060412A1 Display screen and method of manufacture therefor
10/12/2000WO2000059987A1 Silicone resin and photosensitive resin composition containing the same
10/12/2000WO2000059966A1 Photoactive polymers
10/12/2000WO2000059717A1 Process for direct digital printing of circuit boards
10/12/2000WO2000028385A3 Method and device for aligning two photo masks with each other and optionally, an unexposed printed circuit board blank, and for subsequent simultaneous exposure in the production of double-sided printed circuit boards
10/12/2000WO2000020925A3 Silicon-containing alcohols and polymers having silicon-containing tertiary ester groups made therefrom
10/12/2000DE19915717A1 Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht Recording material with pigment dyed radiation-sensitive layer
10/12/2000DE10013454A1 Printing form production appliance and method involve sources of radiation, slide piece with holes in, and housing
10/12/2000CA2369042A1 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
10/12/2000CA2369033A1 Display screen and method of manufacture therefor
10/12/2000CA2367870A1 Process for direct digital printing of circuit boards
10/11/2000EP1043761A1 Projection exposure apparatus and exposure method
10/11/2000EP1043760A1 Illumination control method and illumination control device for pulse light source used in aligner
10/11/2000EP1043629A2 Photoresist stripping composition and process for stripping photoresist
10/11/2000EP1043628A1 Method of developing photosensitive resin plate and developing device
10/11/2000EP1043627A1 Recording material having a pigment-colored radiation-sensitive layer
10/11/2000EP1043626A1 A method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof
10/11/2000EP1043625A1 Method and apparatus for manufacturing photomask and method of fabricating device
10/11/2000EP1042798A1 Etching process for organic anti-reflective coating
10/11/2000EP1042791A1 Improved techniques for etching with a photoresist mask
10/11/2000EP1042781A1 Raster scan gaussian beam writing strategy and method for pattern generation
10/11/2000EP1042381A1 Fractionated novolak resin and photoresist composition therefrom
10/11/2000EP1000386A4 Rubber-based aqueous developable photopolymers and photocurable elements comprising same
10/11/2000EP0914260B1 Process for preparing high resolution emissive arrays and corresponding articles
10/11/2000EP0885406B1 Light-absorbing antireflective layers with improved performance due to refractive index optimization
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