Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2000
11/02/2000DE19919764A1 Herstellung eienr Preßform für Compact Discs Also one mold for manufacturing compact discs
11/02/2000DE10021299A1 Polymere mit O-substituierter Vinylphenoleinheit und sie enthaltende Resistzusammensetzungen Polymers with O-substituted vinylphenol unit and they resist compositions containing
11/02/2000DE10021298A1 Negativ arbeitende Resistzusammensetzung The negative-working resist composition
11/02/2000DE10020526A1 Photomask material, used to produce printed circuit boards, liquid crystal displays or large scale integrated circuits, has glass substrate with physical development center layer covered by silver halide emulsion
11/02/2000DE10011666A1 Charged particle beam exposure apparatus for integrated circuit manufacture shortens settling time to point at which beam has bean deflected to defined position
11/02/2000CA2371258A1 Coated transfer sheet comprising a thermosetting or uv curable material
11/01/2000CN1271767A Cleaning liquid and manufacturing method of semi-conductor device using said cleaning liquid
11/01/2000CN1271720A Organic anti reflection paint and its preparation
10/2000
10/31/2000US6141148 Birefringent plate arrangement with stress birefringence
10/31/2000US6141108 Position control method in exposure apparatus
10/31/2000US6141083 Exposure system and method of forming fluorescent surface using same
10/31/2000US6141081 Stepper or scanner having two energy monitors for a laser
10/31/2000US6140660 Optical synthetic aperture array
10/31/2000US6140654 Charged beam lithography apparatus and method thereof
10/31/2000US6140571 Heat-generating element cooling device
10/31/2000US6140385 Photoactive compounds for use with narrow wavelength band ultraviolet (UV) curing systems
10/31/2000US6140384 Photopolymerizable composition containing a sensitizing dye with cyano or substituted carbonyl groups
10/31/2000US6140287 Cleaning compositions for removing etching residue and method of using
10/31/2000US6140027 Photoresist remover composition
10/31/2000US6140026 Positive pattern images on substrates, coating a binder resin with photosensitive compound of o-quinonediazidesulfonic acid of phenol
10/31/2000US6140025 Photoresists pattern films, curing in laser light and photosensitive films, development
10/31/2000US6140023 Method for transferring patterns created by lithography
10/31/2000US6140021 Charged particle beam transfer method
10/31/2000US6140020 Method for manufacturing a semiconductor wafer using a mask that has several regions with different scattering ability
10/31/2000US6140019 Photosensitive quinacridone pigment, binders, developers and photopolymerization initiators
10/31/2000US6140018 Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
10/31/2000US6140017 Light sensitive polymers from aliphatic conjugated dienes with unsaturated monomer and block copolymers with sulfonate groups particulate copolymer (1) has at least one functional group selected from the group consisting of carboxyl
10/31/2000US6140016 Light sensitive elements and color filters
10/31/2000US6140015 Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
10/31/2000US6140014 Multilayer element, photosensitive composition with grains on surfaces
10/31/2000US6140013 Photoresist layer supporting film and photoresist film laminate
10/31/2000US6140010 Polymer with crosslinker, photoacid generator which generates acid in response to light with acrylic ester with terminal acid group
10/31/2000US6140009 Heat exchangers for electroluminescent device formed by positioning the transfer layer on receptor substrate and heat exchanging
10/31/2000US6140008 Infrared laser imageable, peel developable, single sheet color proofing system having a crosslinked thermal transfer layer
10/31/2000US6140007 Photosensitive compositions and pattern formation method
10/31/2000US6140006 Light sensitive laminates with films and photosensitive layers
10/31/2000US6139996 Pigment, anionic surfactant, citric acid salt dispersant, solvent of glycol and pyrrolidone with nonionic surfactant
10/31/2000US6139994 Photomasking attenuator and substrate for images with patterns
10/31/2000US6139920 Photoresist compositions
10/31/2000US6139634 Apparatus for manufacturing electronic devices
10/31/2000US6139384 Microdischarge lamp formation process
10/31/2000US6138567 Method of preparing a planographic printing member with a radiation sensitive member
10/26/2000WO2000063946A1 Black defect correction method and black defect correction device for photomask
10/26/2000WO2000063747A1 Stabilization of chemically amplified resist coating
10/26/2000WO2000063729A1 Method and apparatus for reference distribution aerial image formation
10/26/2000WO2000063272A1 Resin composition for photofabrication of three dimensional objects
10/26/2000WO2000063025A1 Processless direct write imaging member containing polymer grafted carbon and methods of imaging and printing
10/26/2000WO2000033137A3 Preparation of fractionated novolak resins by a novel extraction technique
10/26/2000WO2000013018B1 Support for a method for determining analytes and a method for producing the support
10/26/2000DE19962784A1 Organisches, nicht reflektierendes Beschichtungsmaterial und dessen Herstellung Organic, non-reflective coating material and its preparation
10/26/2000DE19909187C1 Monokornmembranmaske Mono-particle membrane mask
10/26/2000DE10019282A1 Production of fine structure in semiconductor substrates involves coating a target layer with a resist containing a crosslinker, forming a photoresist by lithography and then heating to crosslink and form narrower holes
10/26/2000CA2306673A1 Mixture for the removal of light-sensitive resin in the manufacture of integrated circuits
10/25/2000EP1047288A2 Plasma focus high energy photon source
10/25/2000EP1047260A1 Apparatus for exposure of printing plates using signals to offset image incline distortion
10/25/2000EP1047111A2 Short-arc discharge lamp
10/25/2000EP1046959A2 Coating device, particularly for coating silicon wafers
10/25/2000EP1046958A1 Composition for bottom reflection preventive film and novel polymeric dye for use in the same
10/25/2000EP1046957A1 Photosensitive resin composition
10/25/2000EP1046956A1 Radiation-sensitive resin composition
10/25/2000EP1046955A1 Radiation-sensitive resin composition
10/25/2000EP1046954A1 Method for forming micropattern of resist
10/25/2000EP1046421A2 Methods and reagents for very large scale immobilized polymer synthesis
10/25/2000EP1046192A1 Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with an alignment grating and an at least partially recessed oxide pattern
10/25/2000EP1046185A1 Projection lithography device utilizing charged particles
10/25/2000EP1046184A1 Quadrupole device for projection lithography by means of charged particles
10/25/2000EP1046082A1 Developer solvent for photopolymer printing plates and method
10/25/2000EP0991697A4 Functionalized poly(alkylene carbonate), and use thereof
10/25/2000EP0861457B1 Method of monitoring a photolithographic process
10/25/2000CN1271429A Volume phase hologram and method for producing the same
10/25/2000CN1271176A Electronic beam photetching process and its device
10/25/2000CN1271113A Diluent composition for removing unnecessary sensitive resin
10/25/2000CN1057848C Optical device with unit for driving lens system
10/25/2000CN1057734C Method of facsimiling and etching figure on marble
10/25/2000CN1057731C Ablative imaging on work piece by using high power source
10/24/2000US6138058 Method for electronically tracking containers to avoid misprocessing of contents
10/24/2000US6137821 Durable etalon based output coupler
10/24/2000US6137631 Illumination system and method for spatial modulators
10/24/2000US6137578 Segmented bar-in-bar target
10/24/2000US6137574 Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry
10/24/2000US6137562 Substrate adjuster, substrate holder and substrate holding method
10/24/2000US6137561 Exposure apparatus for aligning photosensitive substrate with image plane of a projection optical system
10/24/2000US6137186 Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns
10/24/2000US6137113 Electron beam exposure method and apparatus
10/24/2000US6137105 Multiple parallel source scanning device
10/24/2000US6137088 Baking of photoresist on wafers
10/24/2000US6137002 Glycoprotein IIb/IIIa antagonists
10/24/2000US6136694 Method for forming via hole
10/24/2000US6136661 Method to fabricate capacitor structures with very narrow features using silyated photoresist
10/24/2000US6136517 Forming very large scale integrated circuit devices employing reticle having plural discrete image fields which may be respectively blocked off and exposed to form patterns on integrated circuit wafer substrate
10/24/2000US6136515 Forming metal layer on semiconductor substrate, forming photoresist layer on which a pattern is already defined on the metal layer, performing etching process to transfer pattern of photoresist layer onto metal layer, performing heat treatment
10/24/2000US6136514 Method of processing semiconductor structure including a positive photoresist thereon comprising exposing semiconductor structure to actinic radiation, contacting with solution comprising deionized water and surfactant, developing
10/24/2000US6136511 Forming first etch mask layer on substrate, depositing second etch mask layer over first etch mask layer at low temperature, forming and patterning resist layer over second etch mask layer, etching through second and first etch mask layers
10/24/2000US6136510 Accuracy of photolithographic processing, particularly in forming small diameter through holes and/or trenches in a dielectric layer, is improved by double-sided scrubbing the wafer prior to photolithography
10/24/2000US6136509 Method of exposing thermoresist
10/24/2000US6136508 Sol-gel layer contains crosslinked colloids derived from certain metal oxides or hydroxides; plates produced from the elements are long-running plates that require no post-imaging processing
10/24/2000US6136507 Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
10/24/2000US6136505 Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film
10/24/2000US6136504 Comprising a copolymer, a compound which generates an acid when irradiated with actinic rays or radiation, and a solvent
10/24/2000US6136503 Printing cylinder composed of a hydrophilic imaging layer formed from a heat-sensitive composition by spray coating, having a hydrophilic heat-sensitive polymer containing heat-activatable thiosulfate groups
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