Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2000
11/14/2000US6147177 Polycyclic resist compositions with increased etch resistance
11/14/2000US6147010 Solvent having a low vapor pressure, wherein the vapor pressure of the solvent is equal to or is lower than the vapor pressure of diacetone alcohol; wherein said solvent comprises diacetone alcohol
11/14/2000US6146908 Method of manufacturing a test circuit on a silicon wafer
11/14/2000US6146819 Silver halide photographic light-sensitive material
11/14/2000US6146816 Developer liquid for negative working radiation sensitive compositions which includes an alkyl ester of a hydroxy carboxylic acid.
11/14/2000US6146815 Developer for photosensitive polyimide precursor, and method of using it for patterning
11/14/2000US6146812 Imaging member containing switchable polymers and method for use
11/14/2000US6146811 Photoresist using dioxaspiro ring-substituted acryl derivatives
11/14/2000US6146810 Resist polymer and chemical amplified resist composition containing the same
11/14/2000US6146808 Method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process
11/14/2000US6146807 Method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process
11/14/2000US6146806 Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same
11/14/2000US6146798 Methods that rapidly write and rewrite a lithographic printing plate using a process that does not require a chemical solvent.
11/14/2000US6146797 Focused ion beam lithography method with sample inspection through oblique angle tilt
11/14/2000US6146796 Liquid crystal display and a manufacturing method thereof
11/14/2000US6146795 Manufacturing nonvolatile semiconductor devices with high quality tunnel oxides and sub-micron features.
11/14/2000US6146794 Electron beam antistatic method using conductive pins for charge disipation
11/14/2000US6146793 Radiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systems
11/14/2000US6146792 Method of making a color filter with high speed and durable image-transfer characteristics for laser-induced thermal transfer
11/14/2000US6145438 Method and apparatus for direct writing of semiconductor die using microcolumn array
11/14/2000CA2017931C Process for the preparation of titanocenes containing o,o'-difluoroaryl ligands
11/09/2000WO2000067536A1 A method for making flexible circuits
11/09/2000WO2000067303A1 Exposure method and apparatus
11/09/2000WO2000067302A1 Exposure method, exposure device, exposure system, mask and device manufacturing method
11/09/2000WO2000067291A2 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
11/09/2000WO2000067076A1 Improved method and apparatus for submicron ic design using edge fragment tagging to correct edge placement distortion
11/09/2000WO2000067075A1 Improved method and apparatus for submicron ic design using edge fragment tagging
11/09/2000WO2000067074A1 Streamlined ic mask layout optical and process correction through correction reuse
11/09/2000WO2000067073A1 Photopolymerisable composition for holographic recording and variants
11/09/2000WO2000067072A1 Fluorinated polymers, photoresists and processes for microlithography
11/09/2000WO2000066969A2 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance
11/09/2000WO2000066697A1 Compositions for cleaning organic and plasma etched residues for semiconductor devices
11/09/2000DE19921089A1 Producing uniform overall raster structure on workpiece, involves using displacement between adjacent sectional structures corresponding to width of sub-field or its integral multiple
11/09/2000CA2369658A1 A method for making flexible circuits
11/09/2000CA2336557A1 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
11/08/2000EP1050900A1 Exposure system, exposure apparatus, and coating developing exposure apparatus
11/08/2000EP1050875A2 Manufacture of a pressing die for Compact Discs
11/08/2000EP1050754A2 Method for measuring transmittance of optical members for ultraviolet use, synthetic silica glass, and photolithography apparatus using the same
11/08/2000EP1050070A2 Holding device for a substrate
11/08/2000EP1049960A1 Method of detecting aberrations of an optical imaging system
11/08/2000EP1049953A1 Microlens structure having two anamorphic surfaces on opposing ends of a single high index substrate and method of fabricating the same
11/08/2000EP1049586A1 Processless direct write printing plate having heat sensitive polymer
11/08/2000EP0920654B1 Production of color proofs and printing plates
11/08/2000EP0882072B1 Anionic photocatalyst
11/08/2000EP0666184B1 Printing plate material and process for producing the same
11/08/2000CN2405247Y Desk type device for exposure and drying
11/08/2000CN1272864A Composition for reflection reducing coating
11/08/2000CN1272637A Photoresist composite containing cycloolefine polymer and hydrophobic non-steroidal alicyclic additive
11/08/2000CN1272621A Method for measuring position movement and/or distortion resulted from quadrantal deviation and its device
11/07/2000US6144760 Exposure data correction method, exposing method, photomask, semiconductor device, exposure data correction apparatus, exposure apparatus, and manufacturing apparatus of semiconductor device
11/07/2000US6144719 Exposure method, exposure device and device producing method
11/07/2000US6144686 Tangential fan with cutoff assembly and vibration control for electric discharge laser
11/07/2000US6144504 Projection and exposure apparatus including an optical member and a holding member
11/07/2000US6144495 Projection light source
11/07/2000US6144442 Pneumatic support device with a controlled gas supply, and lithographic device provided with such a support device
11/07/2000US6144119 Planar electric motor with dual coil and magnet arrays
11/07/2000US6144028 Scanning probe microscope assembly and method for making confocal, spectrophotometric, Near-Field, and Scanning probe measurements and associated images
11/07/2000US6143803 Curable composition for back-protecting material in making shadow mask
11/07/2000US6143671 Semiconductor device manufacturing method
11/07/2000US6143479 Nonfouling aqueous mixture comprising an alkylene phosphonic acid or amino(alkylenephosphonic acid)derivative, a polyglycol derivative, an alkylene glycol; development of both positive and negative photoresists
11/07/2000US6143478 Solution-coating with photoresist a circuit pattern having uneven topography, heating substrate from below while cooling from above to form a uniformly thick conformal layer of heat-modified photoresist, dissolving away nonmodified layer
11/07/2000US6143477 Degrading/stripping organic residues from wafer surface using oxygen radicals generated by exposing oxygen gas flow to xenon excimer light source to produce ozone which is subsequently treated with light of krypton halide lamp
11/07/2000US6143475 Polyimide precursor, polyimide and their use
11/07/2000US6143473 Film patterning method utilizing post-development residue remover
11/07/2000US6143472 Resist composition and a method for formation of a pattern using the composition
11/07/2000US6143467 Photosensitive polybenzoxazole precursor compositions
11/07/2000US6143466 Chemically amplified photoresist composition
11/07/2000US6143465 Photosensitive polymer having cyclic backbone and resist composition comprising same
11/07/2000US6143464 Onium/quinone diazide-free blend comprising a substance which generates heat upon absorbing light, a discontinuous phase of an alkali soluble resin having phenolic hydroxyls, and a continuous phase of a second copolymer; solvent resistance
11/07/2000US6143463 Method and photoresist using a photoresist copolymer
11/07/2000US6143461 Imagewise exposing to actinic radiation an element having color photosensitive layers on a cover sheet, laminating latent negative image layer to a receiver sheet to transfer image areas to receiver sheet when sheets are peeled apart
11/07/2000US6143460 Photoacid generator providing improved photoresist resolution
11/07/2000US6143451 Improved processes which operate effectively at high speeds and which afford high image densities and good durability of images present on receiver elements upon thermal imaging
11/07/2000US6143233 Polymers containing 2,3-dihydrofuran groups
11/07/2000US6142722 Automated opening and closing of ultra clean storage containers
11/07/2000US6142660 Semiconductor manufacturing apparatus and command setting method
11/07/2000US6142641 Four-mirror extreme ultraviolet (EUV) lithography projection system
11/03/2000CA2270807A1 Closed chamber method and apparatus for the coating of liquid films
11/02/2000WO2000065645A1 Stage device and exposure device
11/02/2000WO2000065639A1 Anti-reflective coatings and methods regarding same
11/02/2000WO2000065408A1 Method for forming a micro-pattern on a substrate
11/02/2000WO2000065318A1 Dual-domain point diffraction interferometer
11/02/2000WO2000065303A1 Gas insensitive interferometric apparatus and methods
11/02/2000WO2000065302A1 Interferometric apparatus and method that compensate refractive index fluctuations
11/02/2000WO2000065301A1 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry
11/02/2000WO2000064826A1 Quartz glass member, production method therefor, and projection aligner using it
11/02/2000WO2000064685A1 Coated transfer sheet comprising a thermosetting or uv curable material
11/02/2000WO2000064572A2 Epoxy-functional polymeric microbeads
11/02/2000EP1049142A1 Method and device for removing photoresist film
11/02/2000EP1049141A1 Novel detergent and cleaning method using it
11/02/2000EP1048986A1 Compositions for stripping photoresists in the manufacture of integrated circuits
11/02/2000EP1048984A2 Method and apparatus for reducing non-uniformities in the manufacture of semiconductive devices
11/02/2000EP1048983A1 Radiation sensitive resin composition
11/02/2000EP1048982A1 Photopolymerizable composition for short wavelenght semiconductor laser exposure, photosensitive composition and method for polymerizing photosensitive composition
11/02/2000EP1048981A1 Negative type image recording material
11/02/2000EP1048980A1 Bottom resist
11/02/2000EP1048457A2 Lithographic printing plate precursor
11/02/2000EP1048070A1 System for receiving and retaining a substrate
11/02/2000EP1047552A1 Direct write imaging medium
11/02/2000DE19953143A1 Material removal during manufacture of a flexographic printing plate involves directing a radiation beam of specific wave length at an absorbing ablative layer and leaving a stabilizing layer intact
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