Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2000
11/23/2000EP1050070A3 Holding device for a substrate
11/23/2000DE19921795A1 Projektions-Belichtungsanlage und Belichtungsverfahren der Mikrolithographie Projection exposure apparatus and exposure method in microlithography
11/23/2000DE10007429A1 Photoresistzusammensetzung mit ausgezeichneter Beständigkeit gegenüber der Wirkung von Verzögerung nach dem Belichten The photoresist composition having excellent resistance to the effects of delay after exposure
11/22/2000EP1054490A2 Line narrowed laser with spatial filter
11/22/2000EP1054297A1 Photoresist stripper and method of stripping
11/22/2000EP1054296A2 Fine pattern forming method
11/22/2000EP1054010A1 Chromene compound
11/22/2000EP1053999A2 Positive photosensitive composition
11/22/2000EP1053986A1 Resist materials and compounds therefore
11/22/2000EP1053985A1 Resist compositions and patterning process
11/22/2000EP1053566A1 Method and composition for dry photoresist stripping in semiconductor fabrication
11/22/2000EP1053510A1 Process for producing a photoresist composition having a reduced tendency to produce particles
11/22/2000EP1053509A1 Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures
11/22/2000EP1053508A1 A process for making a photoactive compound and photoresist therefrom
11/22/2000EP1053507A1 Integral thin-film metal resistor with improved tolerance and simplified processing
11/22/2000EP1053287A1 Liquid curable resin composition, coating, and cured coating therefrom
11/22/2000CN1274473A Ligh-life electrode for high pressure discharge lamp
11/22/2000CN1274433A Radiation-sensitive compsn. of chemical amplification type containing onium salt type photosensitive acid generating agent
11/22/2000CN1274432A Photosensitive black matrix compsn. and process of haking it
11/22/2000CN1058806C Method of forming fluorescent screen for color cathode-ray tube and exposure system for forming same
11/21/2000USRE36964 Device manufacture involving lithographic processing
11/21/2000US6151349 Automatic fluorine control system
11/21/2000US6151346 High pulse rate pulse power system with fast rise time and low current
11/21/2000US6151343 Method and apparatus for driving diode pumped solid-state lasers
11/21/2000US6151173 Assembly of optical components optically aligned and method for making this assembly
11/21/2000US6151122 Inspection method and apparatus for projection optical systems
11/21/2000US6151120 Exposure apparatus and method
11/21/2000US6151115 Phase-shifting point diffraction interferometer focus-aid enhanced mask
11/21/2000US6151105 Exposure apparatus having dynamically isolated support structure
11/21/2000US6151103 Method and system for improved optical imaging in microlithography
11/21/2000US6151102 Projection exposure apparatus
11/21/2000US6151101 Charged-particle-beam projection-exposure apparatus and methods exhibiting increased throughtput
11/21/2000US6151100 Positioning system
11/21/2000US6151099 Apparatus for exposure of printing plates using signals to offset image incline distortion
11/21/2000US6151042 Ink jet printhead with layer of cured polymer made from polymer having photosensitive substituent which enables crosslinking or chain extension via actinic radiation, and a second, thermosensitive substituent for further crosslinking
11/21/2000US6150840 Programmable reticle stitching
11/21/2000US6150787 Exposure apparatus having dynamically isolated reaction frame
11/21/2000US6150726 Component carrier with raised bonding sites
11/21/2000US6150653 Lens system for photodetectors
11/21/2000US6150558 Bis-o-amino(thio)phenols, and their preparation
11/21/2000US6150431 Photopolymerization of at least one ethylenically unsaturated double bond in presence of a photoinitiator
11/21/2000US6150231 Overlay measurement technique using moire patterns
11/21/2000US6150076 Process for treating periphery of unexposed photosensitive resin plate
11/21/2000US6150075 Process for making pictorial reproductions
11/21/2000US6150070 Method of creating optimal profile in single layer photoresist
11/21/2000US6150069 Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
11/21/2000US6150068 Photosensitive resin composition for far-ultraviolet exposure
11/21/2000US6150059 Photomask having main holes opposite the positions at which pattern parts are to form, and further has minute auxiliary holes between main holes which pass light to a degree that it is not transferred onto the substrate at the time of exposure
11/21/2000US6150058 Forming mask using exposure of a resist using more than one exposure dose so that only one layer of resist is required to form the two regions of the mask one using attenuating phase shifting material and one using a binary pattern
11/21/2000US6150019 Colored articles and compositions and methods for their fabrication
11/21/2000US6149727 Substrate processing apparatus
11/21/2000US6149320 Photosensitive material processing apparatus and sealing structure for processing section of the apparatus
11/21/2000US6148626 Chiller apparatus
11/16/2000WO2000069229A1 System and method for providing a lithographic light source for a semiconductor manufacturing process
11/16/2000WO2000069216A2 Disposable modular hearing aid
11/16/2000WO2000068980A1 Method and apparatus for exposure
11/16/2000WO2000068740A1 Solder resist ink composition
11/16/2000WO2000068739A1 Photosensitive composition
11/16/2000WO2000068738A1 Aligner, microdevice, photomask, exposure method, and method of manufacturing device
11/16/2000WO2000068625A1 End-effector with integrated cooling mechanism
11/16/2000WO2000068218A1 Novel photoinitiators and their applications
11/16/2000WO2000067981A1 Method of post-treatment of photofabricated object and mold
11/16/2000DE19942281A1 Projection lens has system filter screen, constrictions and bulges, negative lens, and positive lenses
11/16/2000CA2369025A1 Photosensitive composition
11/15/2000EP1052683A1 Exposure method and device
11/15/2000EP1052678A2 Electron guns for lithography tools
11/15/2000EP1052677A2 Electron emitters for lithography tools
11/15/2000EP1052553A2 Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatus
11/15/2000EP1052552A2 Gas bearings for use with vacuum chambers and their application in lithographic projection apparatus
11/15/2000EP1052551A2 Motion feed-through into a vacuum chamber and its application in lithographic projection apparatus
11/15/2000EP1052550A2 Multi-stage drive arrangements and their application in lithographic projection apparatus
11/15/2000EP1052549A2 Moveable support in a vacuum chamber and its application in lithographic projection apparatus
11/15/2000EP1052548A2 Lithographic projection apparatus
11/15/2000EP1052547A2 Mask-handling apparatus for lithographic projection apparatus
11/15/2000EP1052546A2 Substrate handler for use in lithographic projection apparatus
11/15/2000EP1052545A2 Projection exposure apparatus and exposure method for microlithography
11/15/2000EP1052544A1 A silver salt diffusion transfer material sensitized for blue light
11/15/2000EP1052261A1 Pyran derivatives and use thereof
11/15/2000EP1051727A1 Discharge lamp sources apparatus and methods
11/15/2000EP1051666A1 Solution of tetramethyl ammonium hydroxide in water and process for preparing the solution
11/15/2000EP1051665A1 Photopolymerization compositions including maleimides and processes for using the same
11/15/2000EP1051664A1 Method for forming a critical dimension test structure and its use
11/15/2000EP1051263A1 Disc master drying cover assembly
11/15/2000EP0948551B1 Fractionated novolak resin and photoresist composition therefrom
11/15/2000EP0919015B1 Process and device for applying a photoresist lacquer on uneven base body surfaces
11/15/2000EP0898499A4 Insulator cure process for giant magnetoresistive heads
11/15/2000EP0699961B1 Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate
11/15/2000CN1273646A Composition for bottom reflection preventive film and novel polymeric dye for use in the same
11/15/2000CN1273590A Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom
11/15/2000CN1273435A Method for manufacturing cylindrical condensor bottom electrode
11/15/2000CN1273251A Novel phenol kind resin and photoresist composite containing the resin
11/14/2000US6147818 Projection optics box
11/14/2000US6147745 Exposure apparatus
11/14/2000US6147730 Color filters formed sequentially with intervening protective films for flat panel displays
11/14/2000US6147421 Platform positionable in at least three degrees of freedom by interaction with coils
11/14/2000US6147394 Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
11/14/2000US6147355 Pattern forming method
11/14/2000US6147329 Resist processing system and resist processing method
11/14/2000US6147249 Ester compound capable of forming acid-decomposable polymer which can be blended as base resin to formulate resist composition having higher sensitivity, resolution and etching resistance than conventional resist compositions
11/14/2000US6147184 Onium borates/borates of organometallic complexes and cationic initiation of polymerization therewith
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