Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2000
12/06/2000CN1276068A Optical lithography beyond conventional resolution limits
12/06/2000CN1275797A Electronic beam explosure mask and method for making semiconductor device with same
12/06/2000CN1275484A Picture composition method, device, template and method for making same
12/06/2000CN1275483A Screen printing plate and making technology
12/06/2000CN1059278C Process for manufacturing optical shade of zero level of integrated circuit
12/05/2000US6157498 Dual-imaging optical system
12/05/2000US6157497 Exposure apparatus
12/05/2000US6157159 Stage system and exposure apparatus using the same
12/05/2000US6157039 Charged particle beam illumination of blanking aperture array
12/05/2000US6156816 Screen coating composition and method for applying same
12/05/2000US6156815 Urea and melamine resins
12/05/2000US6156668 Sequentially forming etched layer and photosensitive film for silylation on semiconductor substrates; exposing; forming silylation region; etching
12/05/2000US6156661 Post clean treatment
12/05/2000US6156487 Top surface imaging technique for top pole tip width control in magnetoresistive read/write head processing
12/05/2000US6156486 Forming a coating including a photosensitive composition containing a carboxylic acid; and exposing the coating in a pattern to convert a portion of the acid that is irradiated into a lactone structure; forming a negative pattern
12/05/2000US6156481 Positive resist composition
12/05/2000US6156480 Low defect thin resist processing for deep submicron lithography
12/05/2000US6156479 High molecular weight acrylic (co)polymer covalently linked to light absorbing carboxylic acid dye or phenolic dye; an alkylated aminoplast crosslinker; acid catalyst; and solvent; high differential solubility between polymer and photoresist
12/05/2000US6156478 Article comprising substrate and a gel layer of the cured composition which may be photopatterned with high resolution and used to bind biomolecules to the substrate
12/05/2000US6156477 (poly)hydroxy styrene-(meth)acrylic acid or ester copolymer where hydroxyl and/or carboxyl hydrogen atom(s) are replaced by acid labile group, and polymer is crosslinked with alkenyl ether or halogenated alkyl ether to form c-o-c linkage
12/05/2000US6156476 Positive photoresist composition
12/05/2000US6156475 Image forming process using silver halide, reducing agent and polymerizable compound
12/05/2000US6156474 An alkali-soluble novolak resin, a quinonediazide group-containing compound, and to improve adhesion to a substrate, an n,n,n',n'-tetrakis(ethylene oxide-propylene oxide block polymer) ethylene diamine specified compound
12/05/2000US6156464 Scanning-type charged-particle beam exposure methods including scan-velocity error detection and correction
12/05/2000US6156463 One-step determination of minimum amount of the exposure for removing a photoresist film by irradiating light through a photomask having openings with varying transmittance values; determing etching rate; semiconductors; integrated circuits
12/05/2000US6156462 Photosensitive resin compositions, cured films thereof, and circuit substrates
12/05/2000US6156445 A metallized ceramic substrate coated a film of an ablatively photodecomposable acrylate polymer modified by disperse red 1, a photoabsorber; circuit patterns; no phase separation or crystallization, even ablation and high resolution
12/05/2000US6156433 Electrode for plasma display panel and process for producing the same
12/05/2000US6156414 Carrier film and process for producing the same
12/05/2000US6156393 Method of molecular-scale pattern imprinting at surfaces
12/05/2000US6156237 Conductive paste and circuit substrate formed by use of the paste
12/05/2000US6156220 System and method for optically aligning films and substrates used in printed circuit boards
12/05/2000US6156126 Exposing to volatile solvent
12/05/2000US6156125 Adhesion apparatus
12/05/2000US6155542 Vibration damping apparatus and method
12/05/2000CA2022587C Mono- and di-acylphosphine oxides
11/2000
11/30/2000WO2000072375A1 Container for holder exposure apparatus, device manufacturing method, and device manufacturing apparatus
11/30/2000WO2000072365A1 Exposure system and method of manufacturing device
11/30/2000WO2000072364A1 Apparatus for curing resist
11/30/2000WO2000072092A1 Lithographic exposure device and lithographic method
11/30/2000WO2000072091A1 Photosensitive material employing microcapsules
11/30/2000WO2000072090A2 A method for error reduction in lithography
11/30/2000WO2000072080A1 Method and apparatus for providing rectangular shaped array of light beams
11/30/2000WO2000072076A1 Probe tip that is transparent to light and method for producing the same
11/30/2000WO2000071597A1 Photocuring and thermosetting composition
11/30/2000WO2000023840A9 Near field optical scanning system employing microfabricated solid immersion lens
11/30/2000DE19926025A1 Verfahren zum Herstellen von Mikrobauteilen A method of manufacturing micro-components
11/30/2000DE19923444A1 Lichttransparente Sondenspitze sowie Verfahren zur Herstellung einer solchen Transparent light probe tip and method of making such a
11/30/2000DE19922941A1 Vorrichtung und Verfahren zur photolithographischen Belichtung von biologischen Stoffen Apparatus and method for photolithographic exposure of biological agents
11/30/2000CA2336370A1 Method and apparatus for providing rectangular shaped array of light beams
11/29/2000EP1055969A1 Positively photosensitive resin composition
11/29/2000EP1055251A1 Large area silent discharge excitation radiator
11/29/2000EP1055155A1 Euv illumination system
11/29/2000EP1055154A1 Photomask provided with an esd-precluding envelope
11/29/2000EP1054726A2 Method and apparatus for chemical and biochemical reactions using photo-generated reagents
11/29/2000EP1054715A1 Method of purifying photoacid generators for use in photoresist compositions
11/29/2000EP1012672A4 A negatively acting photoresist composition based on polyimide precursors
11/29/2000CN1274870A Electronic beam exposure method
11/29/2000CN1274857A Making process of great-angle Y-branch silicon luminous-power distributor
11/29/2000CN1274723A Dicyclic compound, medicine composition containing the same and use thereof
11/28/2000US6154711 Disposition tool for factory process control
11/28/2000US6154563 Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same
11/28/2000US6154270 Scanning exposure method and apparatus
11/28/2000US6154269 Method of evaluating performance of a scan-type exposure apparatus
11/28/2000US6153941 Semiconductor registration measurement mark
11/28/2000US6153885 Toroidal charged particle deflector with high mechanical stability and accuracy
11/28/2000US6153877 Projection exposure apparatus
11/28/2000US6153743 Lithographic mask design and synthesis of diverse probes on a substrate
11/28/2000US6153733 A radiation-sensitive acid-generating agent in a chemical-amplification positive-working photoresist composition; photolithographic patterning in the manufacture of semiconductor devices, liquid crystal display panels
11/28/2000US6153662 Aromatic maleimides and methods of using the same
11/28/2000US6153661 Onium borates/borates of organometallic complexes and cationic initiation of polymerization therewith
11/28/2000US6153660 Very high sensitivity to beams in the visible region, particularly to visible rays at 400 nm or more such as rays at 488 nm or 532 nm corresponding to the output of ar+ laser or yag-shg laser
11/28/2000US6153361 Method of removing photoresist at the edge of wafers
11/28/2000US6153360 Using deionized water, acetone and pyrrolidone
11/28/2000US6153357 Exposure, forming pattern, phase shifting cycles
11/28/2000US6153356 Mixture of unsaturated compound, cyanine dye and photoinitiator
11/28/2000US6153354 Electron beam negative working resist composition
11/28/2000US6153350 Polybenzoxazole and polybenzothiazole precursors
11/28/2000US6153349 Comprising polyvinylphenol derivative resin
11/28/2000US6153340 Charged-particle-beam microlithography methods and reticles for same exhibiting reduced space-charge and proximity effects
11/28/2000US6153299 Fiber comprising polymer matrix in which particle scattering colorant particles are dispersed, particles comprising metallic conductor selected from gold, platinum, copper, aluminum, lead, palladium, silver, rhodium, osmium, iridium
11/28/2000US6153107 Process for treating development waste liquor
11/28/2000US6153044 Protection of lithographic components from particle contamination
11/28/2000US6153018 Metal rinsing process with controlled metal microcorrosion reduction
11/28/2000US6152618 Apparatus and a method for processing photographic material
11/28/2000CA2195728C Lithographic printing members with deformable cushioning layers
11/28/2000CA2152167C Dry lithographic forme
11/23/2000WO2000070720A1 Tangential fan with cutoff assembly and vibration control for electric discharge laser
11/23/2000WO2000070718A1 Gas discharge laser with gas temperature control
11/23/2000WO2000070669A1 Differential trench open process
11/23/2000WO2000070660A1 Exposure method, illuminating device, and exposure system
11/23/2000WO2000070407A1 Projection lens for microlithography
11/23/2000WO2000070406A1 Methods for patterning polymer films, and use of the methods
11/23/2000WO2000069761A1 Cassette buffering within a minienvironment
11/23/2000WO2000069649A1 Thermal transfer of a black matrix containing carbon black
11/23/2000WO2000069553A1 Device and method for photolithographically irradiating biological substances
11/23/2000WO2000049464A3 Photolithography method and apparatus configuration for performing photolithography
11/23/2000WO2000038281A9 Line narrowed f2 laser with etalon based output coupler
11/23/2000WO2000031774A3 Holding device for a substrate
11/23/2000WO2000030172A3 System for receiving and retaining a substrate
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