| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/19/2000 | US6162495 Protective overcoat for replicated diffraction gratings |
| 12/19/2000 | US6162295 Spin coating spindle and chuck assembly |
| 12/19/2000 | US6161969 Apparatus for processing a substrate |
| 12/19/2000 | CA2171771C Flexographic element having an infrared ablatable layer and process for making a flexographic printing plate |
| 12/14/2000 | WO2000076002A1 Microlens for surface mount products |
| 12/14/2000 | WO2000075730A1 Lithography using quantum entangled particles |
| 12/14/2000 | WO2000075729A1 Exposure device capable of aligning while moving mask |
| 12/14/2000 | WO2000075728A1 Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition |
| 12/14/2000 | WO2000075697A1 Fluoride lens crystal for optical microlithography systems |
| 12/14/2000 | WO2000075241A2 Oil soluble radiation curable metal-containing compounds and compositions |
| 12/14/2000 | WO2000075235A1 Photosensitive resin composition of aqueous emulsion type |
| 12/14/2000 | DE19926479A1 Internal drum exposure system for reprographic machines, has beam comb of separate beams to expose sensitive material |
| 12/14/2000 | DE19925831A1 Process for measuring the positioning errors of structured patterns used in semiconductor production comprises forming test grating structures, and measuring the light bent at the structures |
| 12/13/2000 | EP1059566A2 Lithographic projection apparatus |
| 12/13/2000 | EP1059565A2 Lithographic projection method |
| 12/13/2000 | EP1059564A1 Photosensitive resin composition |
| 12/13/2000 | EP1059563A1 Agent for reducing substrate dependence of resist |
| 12/13/2000 | EP1059550A1 Reflection refraction image-forming optical system and projection exposure apparatus comprising the optical system |
| 12/13/2000 | EP1059314A1 A resist composition |
| 12/13/2000 | EP1058864A1 Imaging system employing encapsulated radiation sensitive composition |
| 12/13/2000 | EP1058699A1 Polycyclic resist compositions with increased etch resistance |
| 12/13/2000 | EP1058697A1 Polymeric films having controlled viscosity response to temperature and shear |
| 12/13/2000 | CN1276884A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 12/13/2000 | CN1276883A Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| 12/13/2000 | CN1276541A Topcoating composition and method for forming fine pattern using said composition |
| 12/13/2000 | CN1276540A Positive photoresist composition |
| 12/12/2000 | US6160865 X-ray exposure apparatus with synchrotron radiation intensity measurement |
| 12/12/2000 | US6160628 Interferometer system and method for lens column alignment |
| 12/12/2000 | US6160624 Method for verifying silver-based lithographic printing plates |
| 12/12/2000 | US6160623 Method for measuring an aberration of a projection optical system |
| 12/12/2000 | US6160622 Alignment device and lithographic apparatus comprising such a device |
| 12/12/2000 | US6160619 Projection exposure apparatus having compact substrate stage |
| 12/12/2000 | US6160612 Scanning type exposure apparatus, position control apparatus, and method therefor |
| 12/12/2000 | US6160611 Exposing apparatus and method |
| 12/12/2000 | US6160338 Transport apparatus |
| 12/12/2000 | US6160081 Used as a surface-protecting film or layer insulation film for a semiconductor device |
| 12/12/2000 | US6160077 Halogen-free epoxy resin |
| 12/12/2000 | US6160068 Monomer and a polymer obtained therefrom |
| 12/12/2000 | US6160062 Dissolving acrylamide and dimethylacrylamide in pure water, deoxygenating with nitrogen, heating, adding catalyst to polymerize, adding vinyl silane compound during polymerization |
| 12/12/2000 | US6159681 Light-mediated method and apparatus for the regional analysis of biologic material |
| 12/12/2000 | US6159666 Environmentally friendly removal of photoresists used in wet etchable polyimide processes |
| 12/12/2000 | US6159665 Processes using photosensitive materials including a nitro benzyl ester photoacid generator |
| 12/12/2000 | US6159664 Coating a photoresist film, selectively exposing, developing the film, heating, etching, molding optical disc storage media on the matrix to form complementary pits and lands in the optical disc storage media, representing stored data |
| 12/12/2000 | US6159663 Ion vapor depositing an aluminum containing mixture on the member, covering with a photoresist layer, photolithographic process, coating a metal corrosion inhibiting layer, electroless plating |
| 12/12/2000 | US6159662 Photoresist development method with reduced cycle time and improved performance |
| 12/12/2000 | US6159660 Opposite focus control to avoid keyholes inside a passivation layer |
| 12/12/2000 | US6159659 Method for processless flexographic printing and flexographic printing plate |
| 12/12/2000 | US6159658 A photoresist resin blends comprising an anionic polymer, a cationic polymer and a photo-polymerization initiator; aqueous-developable, flexographic printing plate materials with increased impact resilience, resistance to aqueous ink |
| 12/12/2000 | US6159657 Thermal imaging composition and member containing sulfonated ir dye and methods of imaging and printing |
| 12/12/2000 | US6159656 Positive photosensitive resin |
| 12/12/2000 | US6159655 Positive photoresist composition for exposure to far ultraviolet light |
| 12/12/2000 | US6159654 Comprising a photosensitive heat cure accelerator; forming a polyimide film pattern |
| 12/12/2000 | US6159653 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations |
| 12/12/2000 | US6159652 Comprising a blends of polyhydroxystyrene resin whose solubility in an alkaline aqueous solution is increased by the action of acids, and a compound which generates an acid when exposed to radiations |
| 12/12/2000 | US6159650 Photoactivated printing through a stacked paper which can be penetrate by radiation and a precursor of coloring matter can develop a color, change or fade a color because of light |
| 12/12/2000 | US6159646 Removing the defect photoresist coatings on the semiconductor substrate by applying a thinner, then removing the dissolved photoresist and the thinner by rotating the vacuum chuck |
| 12/12/2000 | US6159645 Black matrix in color picture tubes and a process for producing said black matrix |
| 12/12/2000 | US6159644 Method of fabricating semiconductor circuit devices utilizing multiple exposures |
| 12/12/2000 | US6159541 Spin coating process |
| 12/12/2000 | US6159413 Micro structure and its manufacture method |
| 12/12/2000 | US6159294 Apparatus for coating board-shaped articles, especially printed circuit boards |
| 12/12/2000 | US6158298 Stage apparatus and exposure apparatus provided with the stage apparatus |
| 12/07/2000 | WO2000074121A1 Method to produce high density memory cells and small spaces by using nitride spacer |
| 12/07/2000 | WO2000074120A1 Exposure method and apparatus |
| 12/07/2000 | WO2000074119A1 X-ray exposure apparatus, x-ray exposing method, x-ray mask, x-ray mirror, synchrotron radiator, synchrotron radiating method, and semiconductor device |
| 12/07/2000 | WO2000074118A1 Exposure system, method of manufacturing device, and method of environmental control of exposure system |
| 12/07/2000 | WO2000074112A2 Exposure system and method using quasi-continuous wave laser |
| 12/07/2000 | WO2000074109A2 Laser writing method and apparatus |
| 12/07/2000 | WO2000073856A2 Pattern forming process comprising chemical machining and electrical discharge machining |
| 12/07/2000 | WO2000073855A1 Production device for printed board, production method for printed board and printed board |
| 12/07/2000 | WO2000073854A1 Production of an integrated optical device |
| 12/07/2000 | WO2000073853A1 Method for forming polyimide pattern using photosensitive polyimide and composition for use therein |
| 12/07/2000 | WO2000073852A1 Positive-type photosensitive polyimide precursor composition |
| 12/07/2000 | WO2000073823A1 MoRu/Be MULTILAYERS |
| 12/07/2000 | WO2000073753A1 in situ ALIGNMENT SYSTEM FOR PHASE-SHIFTING POINT DIFFRACTION INTERFEROMETRY |
| 12/07/2000 | WO2000073241A1 Fabrication of ceramic microstructures from polymer compositions containing ceramic nanoparticles |
| 12/07/2000 | WO2000073203A1 Patterned carbon nanotube films |
| 12/07/2000 | WO2000073056A1 Method for producing microcomponents |
| 12/07/2000 | WO2000073035A1 Device and method for transferring microstructures |
| 12/07/2000 | WO2000072985A1 Jet coating system for semiconductor processing |
| 12/07/2000 | DE19925133A1 Water soluble or dispersible polyvinyl alcohol derivative, prepared from by reacting with a plasticizer and a compound with an epoxy and olefinic groups in a nitrogen-containing base |
| 12/07/2000 | DE10022786A1 Printing plate comprises a support, a UV-sensitive layer and a protective layer, contains a polymer binder(s) and a light absorbing component(s) giving a specific absorption |
| 12/07/2000 | CA2372938A1 Method of manufacturing micro-components |
| 12/07/2000 | CA2338346A1 Hybrid surface modification process and article |
| 12/06/2000 | EP1058172A2 Semiconductor processing techniques |
| 12/06/2000 | EP1058156A2 Integrating waveguide for use in lithographic projection apparatus |
| 12/06/2000 | EP1058155A2 Method of forming fine pattern |
| 12/06/2000 | EP1058154A1 Composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition |
| 12/06/2000 | EP1058153A1 Positive working photoresist compositions |
| 12/06/2000 | EP1058152A1 Recovering method of support and useful ingredient from image forming material |
| 12/06/2000 | EP1057859A2 Radiation sensitive resin composition and use of the same in an interlaminar insulating film |
| 12/06/2000 | EP1057623A1 A method for preparing a lithographic printing plate by laser ablation of a heat-sensitive imaging element |
| 12/06/2000 | EP1057202A1 Method and device for exposing a substrate to light |
| 12/06/2000 | EP1057080A1 Resist stripping process |
| 12/06/2000 | EP1057079A1 Filter for extreme ultraviolet lithography |
| 12/06/2000 | EP1057078A1 Method of imaging a mask pattern on a substrate by means of euv radiation, and apparatus and mask for performing the method |
| 12/06/2000 | EP1057077A1 Method to adjust multilayer film stress induced deformation of optics |
| 12/06/2000 | EP1056757A1 Substituted benzoylferrocene anionic photoinitiators |
| 12/06/2000 | EP1012671A4 Photosensitive black matrix composition and process of making it |
| 12/06/2000 | EP0882086A4 Composition exhibiting improved fluorescent response |