| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/11/2013 | EP2635937A1 Projection objective of a microlithographic exposure apparatus |
| 09/11/2013 | EP2635936A2 Arrangement for the production of structured substrates |
| 09/11/2013 | EP2635522A2 Nanoimprint lithography formation of functional nanoparticles using dual release layers |
| 09/11/2013 | EP2442182B1 Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film |
| 09/11/2013 | CN203192777U Silicon wafer bench installation positioning system |
| 09/11/2013 | CN203191681U PCB (printed circuit board) via hole and plug hole film structure |
| 09/11/2013 | CN1580221B Stripping and cleaning compositions for microelectronics |
| 09/11/2013 | CN103299243A Proximity exposure device and proximity exposure method |
| 09/11/2013 | CN103299242A Photocurable resin composition, dry film and cured object obtained therefrom, and printed wiring board obtained using these |
| 09/11/2013 | CN103299234A Method and device scanning a two-dimensional brush through an acousto-optic deflector (AOD) having an extended field in a scanning direction |
| 09/11/2013 | CN103298841A Photosensitive resin composition, and dielectric insulating film and electronic device using the same |
| 09/11/2013 | CN103298782A Oxime ester compound and photoinitiator containing said compound |
| 09/11/2013 | CN103296436A Manufacturing method for metamaterial |
| 09/11/2013 | CN103293884A Off-axis alignment system and method for photolithographic equipment |
| 09/11/2013 | CN103293883A Photoresist stripping fluid composition and application thereof |
| 09/11/2013 | CN103293882A Photoresist cleanout fluid |
| 09/11/2013 | CN103293881A Developing solution component |
| 09/11/2013 | CN103293880A Two-stage type correction device and exposure machine base |
| 09/11/2013 | CN103293879A Objective wave aberration detection system |
| 09/11/2013 | CN103293878A Lithography machine capacity monitoring system |
| 09/11/2013 | CN103293877A Photolithography device and light-transmitting unit adopting quadrupole exposure mode and photolithography method |
| 09/11/2013 | CN103293876A Photolithography device and light-transmitting unit adopting sextupole exposure mode and photolithography method |
| 09/11/2013 | CN103293875A Photolithography device and light-transmitting unit adopting octupole exposure mode and photolithography method |
| 09/11/2013 | CN103293874A Exposure device, exposure method and manufacturing method for display panel substrate |
| 09/11/2013 | CN103293873A Exposure apparatus and device manufacturing method using same |
| 09/11/2013 | CN103293872A Substrate handler, lithographic system and device manufacturing method |
| 09/11/2013 | CN103293871A Non-directional dithering methods |
| 09/11/2013 | CN103293870A Error diffusion and grid shift in lithography |
| 09/11/2013 | CN103293869A System and method for lithography patterning |
| 09/11/2013 | CN103293868A Exposure apparatus, exposure control system, and exposure method |
| 09/11/2013 | CN103293867A Pre-alignment device and method of square substrates |
| 09/11/2013 | CN103293866A High-modal small-mass bearing piece platform of photoetching machine |
| 09/11/2013 | CN103293865A Workpiece platform position error measurement and pre-compensation method |
| 09/11/2013 | CN103293864A Photoetching exposure dose control device and method |
| 09/11/2013 | CN103293863A Lithography illumination system |
| 09/11/2013 | CN103293862A Silicon wafer edge protection device |
| 09/11/2013 | CN103293861A Synchronous control method and synchronous control system for workpiece platform and mask platform |
| 09/11/2013 | CN103293860A Magnet block fixing device and mounting method for magnet blocks in magnetic levitation gravity compensator |
| 09/11/2013 | CN103293859A Method for manufacturing photoresist film |
| 09/11/2013 | CN103293858A Photo-curable resin composition, method for manufacturing cured film, cured film, organic el device and liquid crystal display |
| 09/11/2013 | CN103293857A Polymerizable composition, light-blocking color filter for solid-state imaging device, and the solid-state imaging device |
| 09/11/2013 | CN103293856A Colored photosensitive resin composition, color filter and display device |
| 09/11/2013 | CN103293855A Acrylic ester photocuring composition |
| 09/11/2013 | CN103293854A 感光性树脂组合物 The photosensitive resin composition |
| 09/11/2013 | CN103293853A Photo-sensitive resin composition, cured film and method for manufacturing cured film, liquid crystal display and organic el device |
| 09/11/2013 | CN103293852A Photosensitive resin composition, black matrix, color filter and liquid crystal display element thereof |
| 09/11/2013 | CN103293851A Silk-screen printing water film plate making-sealing process |
| 09/11/2013 | CN103293850A Single-layered positive photoresist photoetching method applied to metal stripping |
| 09/11/2013 | CN103293753A Color liquid crystal display device |
| 09/11/2013 | CN103293677A Dodging device and manufacturing method thereof |
| 09/11/2013 | CN103293665A Facet mirror for use in a projection exposure apparatus for microlithography |
| 09/11/2013 | CN102799065B Pattern roller for release paper and preparation method thereof |
| 09/11/2013 | CN102549499B 干膜光致抗蚀剂 The dry film photoresist |
| 09/11/2013 | CN102483588B Method and apparatus for drying after single-step-processing of lithographic printing plates |
| 09/11/2013 | CN102472972B 柔性版印刷原版 Flexographic printing original |
| 09/11/2013 | CN102466832B Method for manufacturing photon sieve with high height-width ratio |
| 09/11/2013 | CN102445860B Method for matching different photoetching machines in same photoetching technology |
| 09/11/2013 | CN102445855B Double-layer exposure compensation method |
| 09/11/2013 | CN102445852B Positive-type photosensitive resin composition and pattern forming method thereof |
| 09/11/2013 | CN102402124B Method for reducing lithography alignment deviation arising from lens distortion of lithography machine |
| 09/11/2013 | CN102375345B Movable adjusting drive unit for optical elements |
| 09/11/2013 | CN102375344B Method for controlling change of image quality of lens |
| 09/11/2013 | CN102369480B Directly imageable waterless planographic printing plate precursor and method for producing same |
| 09/11/2013 | CN102346291B Coaxial double-telecentric imaging optics system |
| 09/11/2013 | CN102289148B Embedded micro-pinpoint electrode and manufacturing method thereof |
| 09/11/2013 | CN102193317B Method for manufacturing films |
| 09/11/2013 | CN102169291B Film use method |
| 09/11/2013 | CN102163001B Method and apparatus for controlling a lithographic apparatus |
| 09/11/2013 | CN102084299B Source module of an EUV lithographic apparatus, lithographic apparatus, and method for manufacturing a device |
| 09/11/2013 | CN102012639B Method and device for protecting silicon wafer edge |
| 09/11/2013 | CN101923291B A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus |
| 09/11/2013 | CN101866110B Rotation test pattern of windmill-shaped scribing groove |
| 09/11/2013 | CN101743514B Color composition and color filter using the same |
| 09/11/2013 | CN101687794B Oxime ester photoinitiators |
| 09/11/2013 | CN101528653B Radiation-sensitive composition |
| 09/11/2013 | CN101305322B Method of making a lithographic printing plate |
| 09/11/2013 | CN101024624B Oxime derivative, photopolymerisable composition, colour filter and process for producing the same |
| 09/10/2013 | US8533634 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 09/10/2013 | US8531647 Exposure method and exposure apparatus for photosensitive film |
| 09/10/2013 | US8530692 Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound |
| 09/10/2013 | US8530357 Method for manufacturing semiconductor device and apparatus for manufacturing semiconductor device |
| 09/10/2013 | US8530269 Manufacture of a polymer device |
| 09/10/2013 | US8530148 Stable formation of high precision fine patterns utilizing positive resist whose solubility increases in positive developer and decreases in negative developer upon irradiation |
| 09/10/2013 | US8530147 Patterning process |
| 09/10/2013 | US8530146 Method for forming resist pattern |
| 09/10/2013 | US8530145 Method for manufacturing a semiconductor device |
| 09/10/2013 | US8530143 Silicate-free developer compositions |
| 09/10/2013 | US8530142 Flexographic printing plate precursor, imaging assembly, and use |
| 09/10/2013 | US8530141 Lithographic printing plate precursors |
| 09/10/2013 | US8530139 Solvent for printing, pattern composition for printing comprising the solvent, and patterning method using the composition |
| 09/10/2013 | US8530138 Salt and photoresist composition comprising the same |
| 09/10/2013 | US8530137 Photoresist composition |
| 09/10/2013 | US8530136 Fluoroalcohol containing molecular photoresist materials and processes of use |
| 09/10/2013 | US8530135 Photoresist composition |
| 09/10/2013 | US8530134 Process for producing photoresist polymeric compounds |
| 09/10/2013 | US8530133 Preparation of norbornane-based PAC ballasts |
| 09/10/2013 | US8530119 Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same |
| 09/10/2013 | US8530118 Multiphoton curing to provide encapsulated optical elements |
| 09/10/2013 | US8530117 Method of producing a relief image for printing |
| 09/10/2013 | US8530116 Colored curable composition for color filter, color filter and method for producing the same, and solid state imaging device |