Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2000
12/27/2000CN1278336A Fractionated novolak resin copolymer and photoresist composition therefrom
12/27/2000CN1278076A Agent for lowering dependence of substrate
12/27/2000CN1059967C Method of forming coating film and apparatus therefor
12/27/2000CN1059899C Novel 2-(2-hydroxy-3-alpha-cumyl-5-alkylphenyl)-2H-benzotriazoles
12/26/2000US6167111 Exposure apparatus for synchrotron radiation lithography
12/26/2000US6166865 Projection optical system and exposure apparatus
12/26/2000US6166820 Laser interferometric lithographic system providing automatic change of fringe spacing
12/26/2000US6166812 Stage apparatus
12/26/2000US6166808 Optical height meter, surface-inspection device provided with such a height meter, and lithographic apparatus provided with the inspection device
12/26/2000US6166801 Monitoring apparatus and method particularly useful in photolithographically processing substrates
12/26/2000US6166392 Exposure for performing synchronized off-axis alignment
12/26/2000US6166245 Meth(acrylate) functionality is separated from the half-ester linkage by at least two alkoxylate groups and at least one ring opened lactone or lactam group
12/26/2000US6166233 Onium gallates cationic initiators
12/26/2000US6166101 Ultraviolet-curing coating composition for cans
12/26/2000US6165855 Antireflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies
12/26/2000US6165697 Antihalation compositions
12/26/2000US6165692 Method for manufacturing a semiconductor device and an exposure mask used therefor
12/26/2000US6165690 Aluminum substrates and infrared lasers for development
12/26/2000US6165689 Method for making positive working printing plates from a light sensitive imaging element
12/26/2000US6165688 Construction of passivation layers on substrates in patterns
12/26/2000US6165686 Photocurable composition and color reversion preventing method
12/26/2000US6165685 Thermally recordable material insensitive to white light
12/26/2000US6165684 Photoresist polymer antireflective coating
12/26/2000US6165682 Radiation sensitive copolymers, photoresist compositions thereof and deep UV bilayer systems thereof
12/26/2000US6165681 Black-pigmented structured high molecular weight material
12/26/2000US6165680 Photosensitivity polymers
12/26/2000US6165678 Radiation sensitive acid generators and copolymers
12/26/2000US6165677 Photoresist composition
12/26/2000US6165675 Photoresists of photosensitive component and novolak resin in solvent
12/26/2000US6165674 Polymers and photoresist compositions for short wavelength imaging
12/26/2000US6165673 Iodonium sulfonate radiation sensitive acid generator and vinyl polymer
12/26/2000US6165672 Reaction of potassium carbonate, tetramethylammonium hydroxide or sodium hydroxide with acetate of maleimidealkyl acetate to produce maleimide based monomers
12/26/2000US6165671 Laser donor element
12/26/2000US6165658 Nonlinear image distortion correction in printed circuit board manufacturing
12/26/2000US6165656 Overlay error determination mark considering influence of aberration
12/26/2000US6165654 Color thermal images or receivers
12/26/2000US6165652 Photomasking a gate pattern in multilayer semiconductors, controlling and development
12/26/2000US6165648 Holographic recording
12/26/2000US6165552 Positioning process liquid supply nozzle above rectangular substrate and supplying process liquid to portion at rotation center portion of rectangular substrate to form film, rotating rectangular substrate in cup to adjust film thickness
12/26/2000US6164204 Drawing apparatus having fixing member for clamping material on drum and method of mounting material
12/25/2000CA2311014A1 In situ projection optic metrology method and apparatus
12/24/2000CA2311053A1 Method and apparatus for characterization of optical systems
12/21/2000WO2000077577A1 Modification of 193 nm sensitive photoresist materials by electron beam exposure
12/21/2000WO2000077576A1 Method for producing a digitally imaged screen for use in a screen printing process
12/21/2000WO2000077575A1 Spin-on-glass anti-reflective coatings for photolithography
12/21/2000DE10027587A1 Photoresist-Oberflächenschichtzusammensetzung und Verfahren zur Bildung eines feinen Musters und Verwendung derselben Photoresist surface layer composition and method for forming a fine pattern and using the same
12/21/2000CA2376514A1 Method for producing a digitally imaged screen for use in a screen printing process
12/21/2000CA2374944A1 Spin-on-glass anti-reflective coatings for photolithography
12/20/2000EP1061562A1 Method for forming resist pattern
12/20/2000EP1061561A1 Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
12/20/2000EP1061560A2 Antireflective hard mask compositions
12/20/2000EP1061418A2 Photosensitive material automatic-processing apparatus
12/20/2000EP1061417A2 Method and apparatus for overlay measurement
12/20/2000EP1061396A2 Projection optical system and projection exposure apparatus using the same
12/20/2000EP1061383A1 Color filter and method of manufacture thereof
12/20/2000EP1061019A2 Plate feeding apparatus and method
12/20/2000EP1060543A1 RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KrF EXCIMER LASER
12/20/2000EP1060500A1 An apparatus and method for controlling a beam shape
12/20/2000EP1060499A1 Device and method for forming lithographic patterns using an interferometer
12/20/2000EP1060498A1 A method and apparatus that determines charged particle beam shape codes
12/20/2000EP1060443A1 Improved modulator design for pattern generator
12/20/2000EP1060442A1 Pattern generator with improved address resolution
12/20/2000EP1060441A1 Improved pattern generator
12/20/2000EP1060440A1 Pattern generator using euv
12/20/2000EP1060439A1 Improved pattern generator for avoiding stitching errors
12/20/2000EP1060206A1 Modified polycyclic polymers
12/20/2000EP1030784A4 Lithographic printing plates for use with laser imaging apparatus
12/20/2000EP0858392B1 Processes for preparing and using moulds
12/20/2000CN1277682A Composition and method for removing resist and etching residues using hydroxylammonium carboxylates
12/20/2000CN1277681A Composite relief image printing plates
12/20/2000CN1277578A Lithographic printing plate for laser-imageable printing members
12/19/2000US6163559 Beam expander for ultraviolet lasers
12/19/2000US6163376 Alignment apparatus, aberration measuring method and aberration measuring mark
12/19/2000US6163368 Method and apparatus for performing a double shift print on a substrate
12/19/2000US6163367 Apparatus and method for in-situ adjustment of light transmission in a photolithography process
12/19/2000US6163366 Exposure method and apparatus
12/19/2000US6163365 Exposure apparatus and device manufacturing method using the same
12/19/2000US6163111 Mercury lamp of the short arc type
12/19/2000US6162881 Initiators for cationic polymerization
12/19/2000US6162841 Betaketosulphones derivatives suitable to the use as polymerization photoinitiators and photopolymerizable systems containing the same
12/19/2000US6162745 Film forming method
12/19/2000US6162736 Process for fabricating a semiconductor integrated circuit utilizing an exposure method
12/19/2000US6162593 Diisopropylbenzene containing solvent and method of developing flexographic printing plates
12/19/2000US6162592 Methods for decreasing surface roughness in novolak-based resists
12/19/2000US6162591 Photolithography process with gas-phase pretreatment
12/19/2000US6162590 Cutting glass substrate into separate heads; masking, etching
12/19/2000US6162588 Resist pattern forming method using anti-reflective layer and method of etching using resist pattern
12/19/2000US6162586 Forming titanium nitride layer over oxide and aluminum metallization film
12/19/2000US6162584 Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors and capacitor plates in an integrated circuit
12/19/2000US6162581 Shaping aperture image can be vibrated
12/19/2000US6162580 Photosensitive polyimide precursor compositions processable by exposure to short wavelength light
12/19/2000US6162579 Nitrone compounds as photopolymer polymerization inhibitors and contrast enhancing additives
12/19/2000US6162577 Photoresist composition for extreme ultraviolet radiation lithography selected from a group consisting of boron carbides, vanadium oxide, molybdenum oxide, and organotitanites
12/19/2000US6162576 Resin composition for stereolithography
12/19/2000US6162575 Subjecting a lithographic printing material having physical development nuclei between an anodized aluminum support and a silver halide emulsion layer to exposure and processing with alkaline earth metal developing solution
12/19/2000US6162574 Comprises a diazonium salt, an infrared ray absorbing agent, a cross-linking agent which is cross-linked in the presence of an acid, and a binder
12/19/2000US6162566 Includes a thin-film portion having an aperture pattern forming region and a supporting frame portion; for use in electron-beam exposure, ion-beam exposure, x-ray exposure
12/19/2000US6162565 Dilute acid rinse after develop for chrome etch
12/19/2000US6162564 Comprising circular optically transparent substrate, light shielding film, resist
12/19/2000US6162507 Spin coating dispense arm assembly
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