| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/09/2001 | US6171755 Chemically amplified resist |
| 01/09/2001 | US6171754 Chemically amplified resist compositions |
| 01/09/2001 | US6171750 Coating novolak resin composition on substrate to form a coating film, prebaking the thus formed coating film to form a photoresist film, optionally post-baking the photoresist film, and exposing photoresist to radiation |
| 01/09/2001 | US6171749 Comprising alkali-soluble resin, radiation-sensitive acid generating agent and cross-linking agent; characteristically, the acid generating agent is a combination of a halogenoacid generating compound and a bis(alkylsulfonyl) diazomethane |
| 01/09/2001 | US6171739 Method of determining focus and coma of a lens at various locations in an imaging field |
| 01/09/2001 | US6171737 For detecting defects in photolithography processes in a submicron integrated circuit manufacturing environment; combines use of a reusable test wafer with in-line processing to monitor defects using a pattern comparator system |
| 01/09/2001 | US6171736 Projection-microlithography alignment method utilizing mask with separate mask substrates |
| 01/09/2001 | US6171735 Negative-acting no-process printing plates |
| 01/09/2001 | US6171733 Material for forming black matrix for color liquid crystal display and method for forming black matrix |
| 01/09/2001 | US6171732 Method of manufacturing and application of dual alignment photomask |
| 01/09/2001 | US6171731 Simulation of an aerial image produced by a mask to be used in patterning an integrated circuit chip during semiconductor wafer fabrication |
| 01/09/2001 | US6171730 Transferring a pattern to substrate using an elastic mask pressed to substrate and irradiating with evanescent light; fine pattern resolution |
| 01/09/2001 | US6171401 Process liquid dispense apparatus |
| 01/09/2001 | US6170622 Anti-vibration apparatus and anti-vibration method thereof |
| 01/09/2001 | US6170494 Spraying photoresist cleaning solvent upwardly through opening of solvent dispensing needle directly onto the tip of nozzle to dissolve the dried photoresist particles, collecting in catch pan, draining |
| 01/09/2001 | CA2209852C Embossed substrate and photoreceptor device incorporating the same and method |
| 01/09/2001 | CA2016529C Method of forming a pattern on a surface |
| 01/04/2001 | WO2001001736A1 Device for producing an extreme ultraviolet and soft x radiation from a gaseous discharge |
| 01/04/2001 | WO2001001532A1 Device for on-line control of output power of vacuum-uv laser |
| 01/04/2001 | WO2001001474A1 Acid blend for removing etch residue on semiconductor substrates |
| 01/04/2001 | WO2001001447A1 Discharge lamp |
| 01/04/2001 | WO2001001440A1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 01/04/2001 | WO2001001199A1 Methods and materials for selective modification of photopatterned polymer films |
| 01/04/2001 | WO2001001182A1 Birefringence minimizing fluoride crystal optical vuv microlithography lens elements and optical blanks therefor |
| 01/04/2001 | WO2001001025A2 Microfabricated elastomeric valve and pump systems |
| 01/04/2001 | WO2001000759A1 Stripper composition for negative chemically amplified resist |
| 01/04/2001 | WO2001000735A1 Water-soluble resin composition |
| 01/04/2001 | WO2001000710A1 Photosensitive low-permittivity polyimide and method of forming positive polyimide film pattern from the same |
| 01/04/2001 | WO2001000701A1 Radiation curable coating containing polyfluorooxetane |
| 01/04/2001 | WO2001000390A1 Method and device for producing an object by means of stereolithography |
| 01/04/2001 | WO2000057236A3 Optical synthetic aperture array |
| 01/04/2001 | CA2369142A1 Radiation curable coating containing polyfluorooxetane |
| 01/03/2001 | EP1065568A2 EUV-Lithographic projection apparatus comprising an optical element with a capping layer |
| 01/03/2001 | EP1065567A2 Integrated critical dimension control |
| 01/03/2001 | EP1065533A2 Color filter and process for producing the same |
| 01/03/2001 | EP1065532A2 Multilayer extreme-ultraviolet mirror with enhanced reflectivity and lithographic projection apparatus comprising the mirror |
| 01/03/2001 | EP1065378A2 Microfabricated elastomeric valve and pump systems |
| 01/03/2001 | EP1065071A1 Aluminum alloy strip used for making lithographic plate and method of production |
| 01/03/2001 | EP1065053A1 Processless printing plate with low ratio of anorganic pigment over hardener |
| 01/03/2001 | EP1065052A1 Processless printing plate with high ratio of anorganic pigment over hardener |
| 01/03/2001 | EP1065051A1 Processless printing plate with cover layer containing compounds with cationic groups |
| 01/03/2001 | EP1065050A1 Processless printing plate with thin oleophilic layer |
| 01/03/2001 | EP1064713A2 Exposure device having a planar motor |
| 01/03/2001 | EP1064587A1 Two-sided imaging material |
| 01/03/2001 | EP1064313A1 Selected high thermal novolaks and positive-working radiation-sensitive compositions |
| 01/03/2001 | EP1023129A4 Improvement in aqueous stripping and cleaning compositions |
| 01/03/2001 | CN1278612A Low temperature metalization process of preparing thick film photoetching glue |
| 01/03/2001 | CN1278529A Organic anti-reflection polymer and preparation method thereof |
| 01/02/2001 | US6169652 Electrostatically screened, voltage-controlled electrostatic chuck |
| 01/02/2001 | US6169627 Catadioptric microlithographic reduction objective |
| 01/02/2001 | US6169605 Method and apparatus for the computer-controlled manufacture of three-dimensional objects from computer data |
| 01/02/2001 | US6169603 Compact reticle inspection system capable of inspecting a reticle with high accuracy and method of inspecting the same |
| 01/02/2001 | US6169602 Inspection method and apparatus for projection optical systems |
| 01/02/2001 | US6169592 Photosensitive resin plate with polyimide pattern edge portion having greater hardness than polyimide pattern portion |
| 01/02/2001 | US6169324 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
| 01/02/2001 | US6169282 Defect inspection method and apparatus therefor |
| 01/02/2001 | US6169029 Method of solving metal stringer problem which is induced by the product of tin and organic ARC reaction |
| 01/02/2001 | US6168911 A polyesterionomer containing a repeating units of the condensation residues of a first dicarboxylic acid, a second dicarboxylic acid containing an arylamine electron donating group and a diol with arylamine group |
| 01/02/2001 | US6168909 Material and method for forming pattern |
| 01/02/2001 | US6168908 Coating an alkali-soluble thermosetting resin on a substrate, and baking it, coating a radiation sensitive resin on the coated film, and baking, exposing the radiation sensitive film to a radiation through a mask and baking, developing |
| 01/02/2001 | US6168907 Method for etching semiconductor device |
| 01/02/2001 | US6168906 Micromachined membrane with locally compliant and stiff regions and method of making same |
| 01/02/2001 | US6168905 A photomask is used to prepare a etching mask on a semiconductor substrate for a multi-level terraced structure, such photomask has a pattern with variablity of regions, width of masked areas of pattern permits controlled etching |
| 01/02/2001 | US6168904 Integrated circuit fabrication |
| 01/02/2001 | US6168903 Lithographic imaging with reduced power requirements |
| 01/02/2001 | US6168900 Mixture of tert-butoxycarbonyl protected polyhydroxystyrene polymers having different molecular weight are used as a basic polymer of chemically amplified resist together with photoacid generator; excellent in resolution and focusing |
| 01/02/2001 | US6168899 A pigmented element, for toning a photopolymerizable layer comprising at least one plasticizing component, consisting of polycaprolactone or polytetrahydrofuran or mixture, compatible with plasticizer of photopolymerizable layer |
| 01/02/2001 | US6168898 Positive acting photodielectric composition |
| 01/02/2001 | US6168897 Patternwise-exposing the laminated layer comprising light sensitive layer and fluorescent light-generating layer to electromagnetic radiation and an electron beam to generate a fluorescent light causing photochemical reaction, developing |
| 01/02/2001 | US6168891 Correcting mask patterns for semiconductor integrated circuits comprising a sorting step of sorting patterns units composing a mask pattern based on their respective shape/and or positional relationship and a correction step |
| 01/02/2001 | US6168850 Electric charge transferring capability and that can be used without a separate electric charge generating material |
| 01/02/2001 | US6168660 Spin coating bowl |
| 01/02/2001 | CA2128734C Process for preparing photohardenable elastomeric element having increased exposure latitude |
| 01/02/2001 | CA2088605C Formation of microstructures by multiple level deep x-ray lithography with sacrificial metal layers |
| 01/02/2001 | CA2017934C Nitrogen-containing titanocenes, and the use thereof |
| 12/28/2000 | WO2000079574A1 Stage device and exposure system |
| 12/28/2000 | WO2000079345A1 Acousto-optic light projector |
| 12/28/2000 | WO2000079344A1 Photosensitive element, photosensitive element roll, process for producing resist pattern with the same, resist pattern, substrate with overlying resist pattern, process for producing wiring pattern, and wiring pattern |
| 12/28/2000 | WO2000078819A1 Optical devices made from radiation curable fluorinated compositions |
| 12/28/2000 | DE19929403A1 Objektiv, insbesondere Objektiv für eine Halbleiter-Lithographie-Projektionsbelichtungsanlage und Herstellungverfahren Lens, lens especially for semiconductor lithography projection exposure apparatus and manufacturing method |
| 12/28/2000 | CA2374374A1 Optical devices made from radiation curable fluorinated compositions |
| 12/27/2000 | EP1063756A1 Method of manufacturing linear motor, linear motor, stage provided with the linear motor, and exposure system |
| 12/27/2000 | EP1063742A1 Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus |
| 12/27/2000 | EP1063689A1 Stripping agent against resist residues |
| 12/27/2000 | EP1063685A1 Photoresist film removing method and device therefor |
| 12/27/2000 | EP1063684A1 Projection optical system, method for producing the same, and projection exposure apparatus using the same |
| 12/27/2000 | EP1063669A2 Cathode with improved work function and method for making the same |
| 12/27/2000 | EP1063571A1 Antimicrobial solutions |
| 12/27/2000 | EP1063570A2 In situ projection optic metrology method and apparatus |
| 12/27/2000 | EP1063569A2 Method and apparatus for characterization of optical systems |
| 12/27/2000 | EP1063568A1 Method of forming a fine pattern, and method of manufacturing a semiconductor device, and a semiconductor device having a fine pattern |
| 12/27/2000 | EP1063567A1 Pattern formation method and pattern formation material |
| 12/27/2000 | EP1063551A1 Objective especially suited for semiconductor lithography projection imaging device and its production method |
| 12/27/2000 | EP1063503A1 Wavelength monitoring apparatus for laser light for semiconductor exposure |
| 12/27/2000 | EP1063247A1 Curable resin composition, modified copolymer and resin composition, and alkali development type photocurable glass paste |
| 12/27/2000 | EP1063203A1 Silica glass member |
| 12/27/2000 | EP1063186A1 Substrate transferring device and method |
| 12/27/2000 | EP1063086A1 Imaging element for different imaging systems |
| 12/27/2000 | EP1062546A1 Process for the continuous liquid processing of photosensitive compositions having reduced levels of residues |
| 12/27/2000 | EP1062545A1 Positive acting photodielectric composition |