| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/23/2001 | US6177218 Lithographic process for device fabrication using electron beam imaging |
| 01/23/2001 | US6177199 Forming a solution of a solvent and the organohydridosiloxane resin, dispensing the solution on a substrate, spinning the substrate, baking the substrate to remove the solvent, and curing the substrate to form the dielectric film |
| 01/23/2001 | US6177133 Method and apparatus for adaptive process control of critical dimensions during spin coating process |
| 01/23/2001 | US6176962 Methods for fabricating enclosed microchannel structures |
| 01/23/2001 | US6176770 Grindstone having a vacuum system in a pin chuck stepper |
| 01/23/2001 | US6176286 Film applying apparatus |
| 01/23/2001 | US6176274 Method and system for measuring fluid volume in a photolithography track |
| 01/23/2001 | US6176252 Apparatus for supplying liquid in semiconductor manufacturing process |
| 01/23/2001 | CA2081961C Photoelectrochemical imaging system |
| 01/18/2001 | WO2001004707A1 Photoresist removal process using forming gas plasma |
| 01/18/2001 | WO2001004706A1 Chemical amplification resist composition |
| 01/18/2001 | WO2001004705A1 Alkali development type photocurable composition and pattern of burned matter obtained from the same |
| 01/18/2001 | WO2001004682A1 Broad band ultraviolet catadioptric imaging system |
| 01/18/2001 | WO2001004638A1 Merged-mask micro-machining process |
| 01/18/2001 | DE19929199A1 Verfahren und Vorrichtung zum Herstellen eines dreidimensionalen Objektes Method and apparatus for producing a three-dimensional object |
| 01/18/2001 | DE10019704A1 Cleaning liquid for semiconductor device manufacturing includes phosphoric acid or orthophosphoric acid which has preset hydrogen ion concentration for removing resist scum adhered to wiring layer |
| 01/18/2001 | CA2714788A1 Merged-mask micro-machining process |
| 01/17/2001 | EP1069600A1 Illuminator, exposing method and apparatus, and device manufacturing method |
| 01/17/2001 | EP1069478A2 Resist processing for integrated circuit manufacture |
| 01/17/2001 | EP1069477A2 Exposure apparatus and device manufacturing method using the same |
| 01/17/2001 | EP1069476A1 Apparatus and method for exposure |
| 01/17/2001 | EP1069453A2 Device for reducing the peak output of a pulse laser light source |
| 01/17/2001 | EP1069448A1 Catadioptric optical system and projection exposure apparatus equipped with the same |
| 01/17/2001 | EP1068641A1 Stepper alignment mark formation with dual field oxide process |
| 01/17/2001 | EP1068559A1 Negative-working, dry planographic printing plate |
| 01/17/2001 | EP1068075A1 Improved photopolymer film and method for producing same |
| 01/17/2001 | EP1068020A1 Fluid nozzle system , energy emission system for photolithography and its method of manufacture |
| 01/17/2001 | EP1068019A1 Energy emission system for photolithography |
| 01/17/2001 | EP1025462A4 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| 01/17/2001 | CN1280384A Method and equipment for reducing non-uniform area influence in semiconductor device production |
| 01/17/2001 | CN1280360A Exposure device and method optic disc driver and recording and/or reproducing method |
| 01/17/2001 | CN1280316A Explosure device for double side printed circuit board |
| 01/17/2001 | CN1280315A Method for forming photoetching offset plate figure |
| 01/17/2001 | CN1280172A Composition for cleaning photoetching glue in integrated circuit production |
| 01/16/2001 | US6175953 Method and apparatus for general systematic application of proximity correction |
| 01/16/2001 | US6175422 Method and apparatus for the computer-controlled manufacture of three-dimensional objects from computer data |
| 01/16/2001 | US6175418 Multiple alignment mechanism in close proximity to a shared processing device |
| 01/16/2001 | US6175405 Projection exposure method and method of manufacturing a projection exposure apparatus |
| 01/16/2001 | US6175404 Exposure apparatus having dynamically isolated reaction frame |
| 01/16/2001 | US6175121 Block mask and charged particle beam exposure method and apparatus using the same |
| 01/16/2001 | US6174801 E-beam direct writing to pattern step profiles of dielectric layers applied to fill poly via with poly line, contact with metal line, and metal via with metal line |
| 01/16/2001 | US6174741 Method for quantifying proximity effect by measuring device performance |
| 01/16/2001 | US6174651 Method for depositing atomized materials onto a substrate utilizing light exposure for heating |
| 01/16/2001 | US6174650 Forming resist film in clean room by conducting surface treatment on semiconductor substrate with silane compound; coating semiconductor substrate with chemically amplified resist; exposing and developing |
| 01/16/2001 | US6174647 Providing circuit layer comprising photoresist and via opening; roughening; adsorbing compound having ligand for palladium on photoresist; applying photoresist; catalyzing; metallized exposed palladium compound to form metal pad |
| 01/16/2001 | US6174645 Biocompatibility; nontoxic; anticoagulants |
| 01/16/2001 | US6174644 Semiconductor integrated circuits |
| 01/16/2001 | US6174643 Process for developing lithographic printing plate |
| 01/16/2001 | US6174642 Imaging system employing encapsulated radiation sensitive composition |
| 01/16/2001 | US6174633 Method for correcting photocontiguous effect during manufacture of semiconductor device |
| 01/16/2001 | US6174632 Coating wafer with resist, the wafer having first and second sections; exposing first section which provides area to attract developmenr residue, developing all of the resist in the first and second sections; inspecting wafer for defects |
| 01/16/2001 | US6174630 Method of proximity correction with relative segmentation |
| 01/16/2001 | US6174590 Isolation using an antireflective coating |
| 01/16/2001 | US6174155 Apparatus for producing ultraviolet blocking lenses |
| 01/16/2001 | CA2150689C Waterless lithographic plate |
| 01/11/2001 | WO2001003173A1 Method for patterning a layer of a low dielectric constant material |
| 01/11/2001 | WO2001003170A1 Exposure method and device |
| 01/11/2001 | WO2001002909A1 Photosensitive resin composition and method for improving dry etching resistance of photosensitive resin composition |
| 01/11/2001 | WO2001002908A1 Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 01/11/2001 | WO2001002907A1 Apparatus and method of image enhancement through spatial filtering |
| 01/11/2001 | WO2000052528A3 Monograin membrane mask |
| 01/11/2001 | DE19931848A1 Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen Astigmatic components to reduce the honeycomb aspect ratio in EUV illumination systems |
| 01/11/2001 | DE19931751A1 Vorrichtung zur Reduzierung der Peakleistung einer Pulslaser-Lichtquelle Apparatus for reducing the peak power of a pulse laser light source |
| 01/11/2001 | DE19929448A1 Transparent film coating of stereo or similar images, especially 3D computer animations, by drawing film and image carrier into press chamber and sucking onto upper and position correcting plates |
| 01/11/2001 | DE19919036C1 Production of an etching mask made of a polymeric material comprises initially applying the polymer mask material to a structured layer and then graphitizing the surface of the mask material |
| 01/11/2001 | DE10030428A1 Positiv arbeitende Resistzusammensetzung The positive resist composition |
| 01/10/2001 | EP1067536A2 Exposure apparatus and method, optical disc drive, and recording and/or reproducing method |
| 01/10/2001 | EP1067438A1 Exposure device for double-sided printed circuit boards |
| 01/10/2001 | EP1067437A2 Anamorphic components for reducing an aspect ratio in illumination systems |
| 01/10/2001 | EP1067436A1 Image forming composition, image recording material comprising the same, and process of image formation |
| 01/10/2001 | EP1067435A1 Positively photosensitive resin composition |
| 01/10/2001 | EP1067112A2 Carboxylic acid derivatives and their synthesis method |
| 01/10/2001 | EP1067096A2 Quartz glass members for excimer laser, and their method of manufacture |
| 01/10/2001 | EP1066904A1 Planographic printing plate cutting device and method |
| 01/10/2001 | EP1066506A1 Method and apparatus for synthesis of arrays of dna probes |
| 01/10/2001 | EP1066365A1 Acidic composition containing fluoride for removal of photoresists and etch residues |
| 01/10/2001 | EP1066252A1 A process of controlling particle size of naphthoquinone diazide esters |
| 01/10/2001 | EP1066123A1 Improvement in aqueous stripping and cleaning compositions |
| 01/10/2001 | CN1279777A Photoresist composition containing condensation polymer |
| 01/10/2001 | CN1279776A Smart photolithography |
| 01/10/2001 | CN1060570C Sculpture technology for composite containing polyurethane |
| 01/09/2001 | US6172825 Catoptric reduction projection optical system and projection exposure apparatus and method using same |
| 01/09/2001 | US6172740 Projection exposure apparatus and device manufacturing method |
| 01/09/2001 | US6172739 Exposure apparatus and method |
| 01/09/2001 | US6172738 Scanning exposure apparatus and device manufacturing method using the same |
| 01/09/2001 | US6172409 Buffer grated structure for metrology mark and method for making the same |
| 01/09/2001 | US6172373 Stage apparatus with improved positioning capability |
| 01/09/2001 | US6172364 Charged particle beam irradiation apparatus |
| 01/09/2001 | US6172325 Laser processing power output stabilization apparatus and method employing processing position feedback |
| 01/09/2001 | US6171973 Process for etching the gate in MOS technology using a SiON-based hard mask |
| 01/09/2001 | US6171766 Laser absorbable photobleachable compositions |
| 01/09/2001 | US6171765 Patterning of organic light emitting diodes for use in matrix-addressed displays |
| 01/09/2001 | US6171764 Method for reducing intensity of reflected rays encountered during process of photolithography |
| 01/09/2001 | US6171763 Ultra-thin resist and oxide/nitride hard mask for metal etch |
| 01/09/2001 | US6171761 Resist pattern forming method utilizing multiple baking and partial development steps |
| 01/09/2001 | US6171760 Lithography method and system in which a photoresist film is irradiated with light while the charged particle beam is applied |
| 01/09/2001 | US6171759 Photocurable composition |
| 01/09/2001 | US6171758 Dimensionally stable flexographic printing plates |
| 01/09/2001 | US6171757 Organometallic polymers and use thereof |
| 01/09/2001 | US6171756 Photoactive materials applicable to imaging systems |