| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/01/2001 | WO2001007885A2 Phase-shifting point diffraction interferometer focus-aid enhanced mask |
| 02/01/2001 | WO2001007506A2 Microfabricated devices and method of manufacturing the same |
| 02/01/2001 | WO2001007177A1 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 02/01/2001 | WO2000072090A3 A method for error reduction in lithography |
| 02/01/2001 | WO2000055690A3 A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| 02/01/2001 | DE19962160A1 Extreme UV and soft X-ray radiation source e.g. for extreme UV lithography, has auxiliary electrode behind opening in one main gas discharge electrode for increasing energy conversion efficiency |
| 02/01/2001 | DE19935404A1 Beleuchtungssystem mit mehreren Lichtquellen A lighting system comprising a plurality of light sources |
| 02/01/2001 | DE10036183A1 Verfahren und Gerät zum Erhitzen eines Wafers und Verfahren und Gerät zum Ausheizen eines Photoresistfilms auf einem Wafer Method and apparatus for heating a wafer, and method and apparatus for baking a photoresist film on a wafer |
| 02/01/2001 | DE10028327A1 Vorrichtung und Verfahren für bildformende Strahlen aus geladenen Teilchen und Bestrahlungsvorrichtung mit Strahlen aus geladenen Teilchen Apparatus and method for image-forming beams of charged particles and radiation device with beams of charged particles |
| 02/01/2001 | CA2377832A1 Narrow band gas discharge laser with gas additive |
| 01/31/2001 | EP1073097A2 Dot mark reading apparatus and reading method |
| 01/31/2001 | EP1072958A2 Method for mounting multiple printing elements onto a cylindrical element |
| 01/31/2001 | EP1072957A2 Illumination system with multiple light sources |
| 01/31/2001 | EP1072956A2 Stable pigment dispersion and photosensitive recording material prepared therewith |
| 01/31/2001 | EP1072955A2 Image forming material |
| 01/31/2001 | EP1072954A2 Lithographic process for device fabrication |
| 01/31/2001 | EP1072953A1 Flexographic printing plate precursor comprising an ink-jet receiving layer |
| 01/31/2001 | EP1072927A2 Colour filter for a liquid crystal panel and process for producing it |
| 01/31/2001 | EP1072658A1 Process for improving the adhesiveness of acrylate resins |
| 01/31/2001 | EP1072432A2 Image forming material and method for forming thereof |
| 01/31/2001 | EP1072403A2 A photosensitive lithographic printing plate |
| 01/31/2001 | EP1072401A2 Method of manufacturing a planographic printing plate |
| 01/31/2001 | CN2417489Y PVC back sprayed transparent film used for color ink jek printer |
| 01/31/2001 | CN1282295A Direct electrostatic printing method and apparatus |
| 01/31/2001 | CN1282005A Method for heating wafer and baking photoetch-resist film on wafer and its equipment |
| 01/31/2001 | CN1282004A Photoresist composition, its preparation method and method for forming pattern by using it |
| 01/31/2001 | CN1282003A Chip heating device and method for using heated chip |
| 01/30/2001 | USRE37033 Photopolymerizable mixture curable to form pixels of transparent, smooth, uniform films on substrate; displays |
| 01/30/2001 | US6181532 Stabilized MR sensor and flux/heat guide joined by contiguous junction |
| 01/30/2001 | US6181469 Optical member for photolithography, method for evaluating optical member, and photolithography apparatus |
| 01/30/2001 | US6181420 Interferometry system having reduced cyclic errors |
| 01/30/2001 | US6180952 Holder assembly system and method in an emitted energy system for photolithography |
| 01/30/2001 | US6180947 Multi-element deflection aberration correction for electron beam lithography |
| 01/30/2001 | US6180531 Etching amorphous carbon fluoride film using resist as mask;applying negative bias |
| 01/30/2001 | US6180528 Method for forming a minute resist pattern and method for forming a gate electrode |
| 01/30/2001 | US6180498 Alignment targets having enhanced contrast |
| 01/30/2001 | US6180325 Method for masking and exposing photosensitive printing plates |
| 01/30/2001 | US6180323 Photopolymerizable compositions having improved sidewall geometry and development latitude |
| 01/30/2001 | US6180322 Developing thin film, made from radiation sensitive composition comprising alkali-soluble resin and radiation sensitive compound and having latent image pattern, with alkaline developing solution to form thin film pattern wherein |
| 01/30/2001 | US6180321 Preparing semiconductor substrate with thin film layer, intermediate layer and photoresist layer; exposing partial depth of photoresist layer to light beam; removing portion of photoresist layer exposed to light; patterning |
| 01/30/2001 | US6180320 Resist pattern is formed on semiconductor substrate through use of acid catalyst chemically-amplified photoresist and forming organic film which includes acid or which produces acid on exposure to light; heat treating film to diffuse acid |
| 01/30/2001 | US6180319 Applying aqueous-developable photoresist comprising photoinitiator to surface of substrate; imagewise exposing to actinic radiation to produce exposed and non-exposed areas in photoresist; treating with sample of alkaline solution |
| 01/30/2001 | US6180316 Suitable for use as chemically amplified resist used in manufacturing of integrated circuits |
| 01/30/2001 | US6180315 Compositions for making structured color images and application thereof |
| 01/30/2001 | US6180313 Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same |
| 01/30/2001 | US6180294 Color filter having substrate and ink absorptive resin layer |
| 01/30/2001 | US6180289 Projection-microlithography mask with separate mask substrates |
| 01/30/2001 | US6180288 Gel sensors and method of use thereof |
| 01/30/2001 | US6180239 Microcontact printing on surfaces and derivative articles |
| 01/30/2001 | US6180226 Method of forming a monolayer of particles, and products formed thereby |
| 01/30/2001 | US6180213 Heat sensitive planographic printing plate, its manufacturing method and image forming method employing the same |
| 01/30/2001 | US6180186 Rapid prototyping technology capable of producing fully dense and functional parts directly from a computer-aided-design (cad) model, stereolithography, |
| 01/30/2001 | US6180009 For reuse; ultrafiltration, reverse osmosis, pervaporization,distillation |
| 01/30/2001 | US6179978 Mandrel for forming a nozzle plate having a non-wetting surface of uniform thickness and an orifice wall of tapered contour, and method of making the mandrel |
| 01/30/2001 | US6179922 Chemical vapor deposition directly to a semiconductor substrate surface by heating a monomer in a gas chamber to vaporize and polymerize; passing polymer vapor to a connected processing chamber and depositing a thin uniform film |
| 01/30/2001 | US6179915 On track coater unit cup set |
| 01/30/2001 | US6179448 Automated light tuner |
| 01/30/2001 | CA2314520A1 Composition sensitive to ir radiation and to heat and lithographic plate coated therewith |
| 01/25/2001 | WO2001006548A1 Exposure method and system |
| 01/25/2001 | WO2001006319A1 Holographic photopolymer data recording media and method of holographically reading, recording and storing data |
| 01/25/2001 | WO2000074112A3 Exposure system and method using quasi-continuous wave laser |
| 01/25/2001 | WO2000069216A3 Disposable modular hearing aid |
| 01/25/2001 | WO2000060632A3 Electrostatically focused addressable field emission arraychips (afea's) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy |
| 01/25/2001 | DE19933741A1 Verfahren zur Haftungsverbesserung von Acrylatharzen A method for improving adhesion of acrylic resins |
| 01/25/2001 | DE19933139A1 Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial Stable pigment dispersion and thus produced radiation-sensitive recording material |
| 01/25/2001 | DE19906564C2 Verfahren zur Herstellung von dreidimensionalen Gegenständen mittels Stereolithographie A process for producing three-dimensional objects by means of stereolithography |
| 01/25/2001 | DE10032539A1 Diffraction grating finishing comprises forming photosensitive resist layer on base material, emitting near field light onto resist layer, forming diffraction grating pattern in the resist layer, and etching base material |
| 01/25/2001 | DE10028345A1 Organisches,nicht-reflektierendes Polymer und Verfahren zu dessen Herstellung Organic, non-reflective polymer and process for its preparation |
| 01/25/2001 | DE10028344A1 Organisches,nicht reflektierendes Überzugspolymer und dessen Herstellungsverfahren Organic, non-reflective coating polymer and its production method |
| 01/24/2001 | EP1071122A1 Process for correcting the topography of microelectronic substrates |
| 01/24/2001 | EP1071097A1 Stage positioning device |
| 01/24/2001 | EP1070991A1 Alkaline aqueous solution and method for forming pattern of photosensitive resin composition using the same |
| 01/24/2001 | EP1070990A1 Photosensitive composition and method of making lithographic printing plate |
| 01/24/2001 | EP1070989A1 Flexographic printing plate precursor comprising a (photo)thermographic recording layer |
| 01/24/2001 | EP1070984A1 Projector and display both comprising optical element for diffraction and scattering |
| 01/24/2001 | EP1070345A1 Organic removal process |
| 01/24/2001 | EP1070335A1 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 01/24/2001 | EP1070157A1 Method for removing photoresist and plasma etch residues |
| 01/24/2001 | CN1281554A Amplitude mask, and apparatus and method for manufacturing long period grating filter using same |
| 01/24/2001 | CN1281165A 曝光方法及其装置 Exposure method and device |
| 01/23/2001 | US6178360 Methods and apparatus for determining optimum exposure threshold for a given photolithographic model |
| 01/23/2001 | US6178256 Removal of reticle effect on critical dimension by reticle rotation |
| 01/23/2001 | US6178221 Lithography reflective mask |
| 01/23/2001 | US6178035 Optical device and method of manufacturing the same |
| 01/23/2001 | US6178028 Multibeam scanning exposure device |
| 01/23/2001 | US6178000 Monolithic symmetric interferometer for generation of variable-periodicity patterns for lithography |
| 01/23/2001 | US6177980 High-throughput, maskless lithography system |
| 01/23/2001 | US6177978 Stage device and exposure apparatus using the same |
| 01/23/2001 | US6177578 Processless diacetylenic salt films capable of developing a black image |
| 01/23/2001 | US6177357 Laminating a resist on a polymeric film, exposing a pattern into the resist, developing resist with a aqueous solution to form an image, etching portions of polymer film not covered by crosslinked resist with a base, then stripping the resist |
| 01/23/2001 | US6177330 Method for correcting alignment, method for manufacturing a semiconductor device and a semiconductor device |
| 01/23/2001 | US6177234 Applying radiation-sensitive recording layer, optionally containing a colorant or dye, to an image carrier wherein the image carrier has an image-side surface with a maximum average roughness of 0.25 to 0.37 mu.m, exposing, developing |
| 01/23/2001 | US6177233 Method of forming resist pattern |
| 01/23/2001 | US6177232 Irradiating layer of radiation-curable composition imagewise, which composition comprises a mixture of at least one radiation polymerizable compound, one filler material, one photoinitiator for polymerization, and silica |
| 01/23/2001 | US6177231 Resist material and fabrication method thereof |
| 01/23/2001 | US6177230 Compound having two or more sulfonic acid ester groups each capable of releasing sulfonic acid by the action of heat; recording material |
| 01/23/2001 | US6177229 Photosensitive composition |
| 01/23/2001 | US6177228 Photoresist composition and process for its use |
| 01/23/2001 | US6177226 Positive photoresist composition and process for forming contact hole |
| 01/23/2001 | US6177225 Comprising a capped polybenzoxazole precursor polymer, a photosensitive agent, and a solvent |