| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/13/2001 | US6188150 Light weight high-stiffness stage platen |
| 02/13/2001 | US6188147 Wedge and transverse magnet arrays |
| 02/13/2001 | US6188076 Discharge lamp sources apparatus and methods |
| 02/13/2001 | US6188071 Feedback method for increasing stability of electron beams |
| 02/13/2001 | US6187877 Process for producing a polyamide based on a dicarboxylic acid and a diamine |
| 02/13/2001 | US6187833 Photopolymerization; debtal prosthetics |
| 02/13/2001 | US6187730 Hydroxylamine-gallic compound composition and process |
| 02/13/2001 | US6187688 Pattern formation method |
| 02/13/2001 | US6187519 Process and equipment for recovering developer from photoresist development waste and reusing it |
| 02/13/2001 | US6187513 Process for forming mask pattern and process for producing thin film magnetic head |
| 02/13/2001 | US6187512 Process for halomethylation of high performance polymers |
| 02/13/2001 | US6187511 Water-less lithographic plates |
| 02/13/2001 | US6187510 Subtrate coated with a photosensitive layer and a photographic layer which comprises a silver halide emulsion, a sensitizing dye, and an adhesion promoting blend of a vinyl phenol copolymer and a polymeric keying agent |
| 02/13/2001 | US6187509 Heat resistance, high resolution for fine patterns |
| 02/13/2001 | US6187507 Grained and anodized aluminum lithographic printing plate having a silver halide emulsion layer on the front side and an inert protective coating on the back surface; scratch resistance |
| 02/13/2001 | US6187506 Antireflective coating for photoresist compositions |
| 02/13/2001 | US6187505 Mixture comprising polysilsesquioxane having phenolic groups crosslinkable with acid catalyzable curing agent, acid generator, photosensitizer, a base and surfactant; pattern resolution with high aspect ratio |
| 02/13/2001 | US6187504 Photosensitive blend containing a naphthalene sulfonium sulfonate derivative photoacid generator, resin having alkali insoluble groups cleavable by acid, an alkali soluble resin and a solubility control agent; positives, resolution |
| 02/13/2001 | US6187503 Grained and anodized aluminum support coated with a nucleation layer including a water soluble anionic polymeric material and overcoated with a silver halide emulsion layer; diffusion transfer |
| 02/13/2001 | US6187500 Positive photoresist compositions and multilayer resist materials using same |
| 02/13/2001 | US6187488 Pattern estimating method and pattern forming method |
| 02/13/2001 | US6187486 Providing wafer having photoresist alinged; performing exposure and shifts; developing |
| 02/13/2001 | US6187485 Method of forming concave-convex pattern and use of the method in the production of color filters for liquid crystal displays |
| 02/13/2001 | US6187482 For microcmachining; photolithography; semiconductors |
| 02/13/2001 | US6187211 Method for fabrication of multi-step structures using embedded etch stop layers |
| 02/13/2001 | US6186632 Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography |
| 02/13/2001 | US6186067 Infrared laser-imageable lithographic printing members and methods of preparing and imaging such printing members |
| 02/13/2001 | US6185830 Semiconductor wafer fixture for alignment in a grating exposure process |
| 02/13/2001 | CA2168107C Light source destructuring and shaping device |
| 02/13/2001 | CA2017932C Oxygen-containing titanocenes, and the use thereof |
| 02/08/2001 | WO2001009926A1 Improved ladder boat for supporting wafers |
| 02/08/2001 | WO2001009921A1 Minimization of electron fogging in electron beam lithography |
| 02/08/2001 | WO2001009920A1 Electron beam column using high numerical aperture illumination of the photocathode |
| 02/08/2001 | WO2001009884A1 Optical data storage system and method |
| 02/08/2001 | WO2001009684A1 Control of the distribution of lighting in the exit pupil of an euv lighting system |
| 02/08/2001 | WO2001009683A1 Reduction of resist poisoning |
| 02/08/2001 | WO2001009682A2 Positive acting photoresist composition and imageable element |
| 02/08/2001 | WO2001009681A2 Multi mirror system for an illumination system |
| 02/08/2001 | WO2001009648A1 A method for creating a color filter layer |
| 02/08/2001 | WO2001009630A1 System for aligning rectangular wafers |
| 02/08/2001 | WO2001009075A1 Photocurable composition containing iodonium salt compound |
| 02/08/2001 | DE19932488A1 Photographic illumination apparatus for biological matter has a perforated mask between the light source and the DNA chip with micro shutters operated by electronic control |
| 02/08/2001 | DE19932487A1 Photolithography illumination of biological matter uses an elastic mirror surface with controlled distortion to give structured diffracted light for illuminated and unlit zones at the target surface |
| 02/08/2001 | DE10024634A1 Electron beam patterning apparatus for use in manufacture of semiconductor device, sets up adjusting value of shaping lens such that detected position slippage of electron beam is minimum |
| 02/07/2001 | EP1075061A2 Automatic fluorine concentration control system for excimer laser |
| 02/07/2001 | EP1075060A2 Automatic fluorine concentration control system for excimer laser |
| 02/07/2001 | EP1075017A1 Optical device and exposure system equipped with optical device |
| 02/07/2001 | EP1074985A2 Manufacturing method for optical recording medium and manufacturing device thereof |
| 02/07/2001 | EP1074889A2 Thermal treatment of imagable coatings |
| 02/07/2001 | EP1074888A1 Aqueous photosolder resist composition |
| 02/07/2001 | EP1074887A1 Radiation-sensitive compositions for printing plates for improving their chemical and developer resistance and printing plates comprising said compositions |
| 02/07/2001 | EP1074882A1 Method of forming an anti-reflection layer on a rear projection screen |
| 02/07/2001 | EP1074566A1 Copolymer, process for producing the same, and resist composition |
| 02/07/2001 | EP1074043A1 Process for ashing organic materials from substrates |
| 02/07/2001 | EP1073876A1 Measuring a diffracting structure, broadband, polarized, ellipsometric, and an underlying structure |
| 02/07/2001 | EP0975731A4 Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process |
| 02/07/2001 | EP0562025B1 Compounds and their use in a binary synthesis strategy |
| 02/07/2001 | CN1283182A Process for controlling particle size of naphthoquinone diazide esters |
| 02/07/2001 | CN1282956A Exposure equipment and exposure method |
| 02/07/2001 | CN1282954A Method and device for manufacturing optical recording medium |
| 02/07/2001 | CN1282889A Composition used for forming inorganic envelope and method to form inorganic envelope |
| 02/06/2001 | US6185474 Exposure unit, exposure system and device manufacturing method |
| 02/06/2001 | US6185473 Optical pattern transfer tool |
| 02/06/2001 | US6185019 Holographic patterning method and tool employing prism coupling |
| 02/06/2001 | US6184972 Substrate transport apparatus, substrate holding apparatus and substrate processing apparatus |
| 02/06/2001 | US6184970 Master plate transporting system |
| 02/06/2001 | US6184596 Stage construction incorporating magnetically levitated movable stage |
| 02/06/2001 | US6184520 Internal drum imaging system |
| 02/06/2001 | US6184476 Thin multi-layer circuit board having a remodeling pad layer and a metallic barrier layer with an exclusion zone |
| 02/06/2001 | US6184305 For antireflective coating being useful upon manufacturing integrated circuit elements by photo-lithography; photoresists; resolution |
| 02/06/2001 | US6184263 Blends containing photosensitive high performance aromatic ether curable polymers |
| 02/06/2001 | US6184156 Process and system for flattening secondary edgebeads on resist coated wafers |
| 02/06/2001 | US6184148 Forming on semiconductor substrate having insulation layer, layer of aluminum copper alloy; forming resist pattern on aluminum alloy layer; etching exposed layer; downstream ashing resist pattern; removing residual chlorine component |
| 02/06/2001 | US6184041 Fused hybrid resist shapes as a means of modulating hybrid resist space width |
| 02/06/2001 | US6183942 Can be used in washing and removing the unnecessary spin-on-glass (sog) of an sog layer at edges and backside on semiconductor substrates |
| 02/06/2001 | US6183940 Method of retaining the integrity of a photoresist pattern |
| 02/06/2001 | US6183939 Method for producing a pattern on a transparent substrate |
| 02/06/2001 | US6183938 Conformal organic coatings for sidewall patterning of sublithographic structures |
| 02/06/2001 | US6183937 Forming blanket photoresist layer on substrate; photoexposing and developing to form patterned photoresist layer having first linewidth; irradiating with isotropic radiation source to partially decompose patterned photoresist layer |
| 02/06/2001 | US6183936 Providing lithographic printing plate precursor comprising grained and anodised aluminium substrate having metallic silver coating; imagewise exposing byhigh intensity laser beam; chemical and mechanical treatment to remove stains |
| 02/06/2001 | US6183935 For forming minute inorganic pattern; resolution, sensitivity, aspect ratio, |
| 02/06/2001 | US6183934 Negative photosensitive resin composition, method of forming a pattern and electronic parts |
| 02/06/2001 | US6183920 Detecting diffusion layer corresponding concave shape; correcting by indenting inner bottom surface of diffusion layer to ensure projection of gate from inside of layer corresponding concave shape for preventing corner rounding |
| 02/06/2001 | US6183919 Darkfield imaging for enhancing optical detection of edges and minimum features |
| 02/06/2001 | US6183917 Used in color televisions, personal computers, navigation systems for automobile; contrast |
| 02/06/2001 | US6183669 Paste composition, circuit board using the same, ceramic green sheet, ceramic substrate, and method for manufacturing ceramic multilayer substrate |
| 02/06/2001 | US6183223 Chemical supply system with a pair of bellows connected in series for pumping a fluid |
| 02/06/2001 | US6183095 High numerical aperture ring field projection system for extreme ultraviolet lithography |
| 02/06/2001 | US6182571 Making printing member by forming a hydrophilic layer on a support by contacting with solution of specified alkali metal silicate and particulate, modifying hydrophilic layer with aluminum sulfate, adding image layer with indicator |
| 02/06/2001 | US6182570 Printing plate includes a primer layer underlying the ablative-absorbing layer with an adhesion-promoting zirconium compound; suitable for directly imaging and utilizing with a wet lithographic printing press |
| 02/06/2001 | US6182369 Pattern forming apparatus |
| 02/01/2001 | WO2001008444A2 Hearing aid |
| 02/01/2001 | WO2001008278A1 Narrow band gas discharge laser with gas additive |
| 02/01/2001 | WO2001008205A1 Exposure method, exposure system, light source, and method of device manufacture |
| 02/01/2001 | WO2001008204A1 Exposing method and apparatus |
| 02/01/2001 | WO2001008163A1 Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements |
| 02/01/2001 | WO2001008162A1 High efficiency replicated x-ray optics and fabrication method |
| 02/01/2001 | WO2001007967A1 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 02/01/2001 | WO2001007940A1 High collection angle short wavelength radiation collimator and focusing optic |
| 02/01/2001 | WO2001007939A1 Collimator and focusing optic |