| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/22/2001 | WO2000054882A8 Individually addressable micro-electromagnetic unit array chips |
| 02/22/2001 | DE19939687A1 Large-area electron beam radiation exposure dose determination for microelectronics layout, involves dividing the total surface area into several disjunctive part-areas with different structural widths |
| 02/22/2001 | DE19938463A1 Composition, curable by visible light, useful for dental inlays and rapid prototypes, comprises a compound having an acrylate, methacrylate, vinyl or oxetan group or polysiloxane resin |
| 02/22/2001 | DE10036001A1 Vorrichtung und Verfahren zur Waferheizung Apparatus and method for wafer heating |
| 02/22/2001 | DE10027091A1 Negativ arbeitende Resistzusammensetzungen des chemischen Verstärkungstyps Negative-working resist compositions of chemical amplification type |
| 02/21/2001 | EP1077476A2 Oxygen free plasma stripping process |
| 02/21/2001 | EP1077393A2 Substrate attracting and holding system for use in exposure apparatus |
| 02/21/2001 | EP1077392A1 Photosensitive lithographic printing plate |
| 02/21/2001 | EP1077391A1 Onium salts, photoacid generators for resist compositions, and patterning process |
| 02/21/2001 | EP1076906A1 Lighting system, especially for extreme ultraviolet lithography |
| 02/21/2001 | EP1076835A1 Broadband diffractive diffuser and associated methods |
| 02/21/2001 | EP1076667A1 Preparation of co-and terpolymers of p-hydroxystyrene and alkyl acrylates |
| 02/21/2001 | EP0863925B1 Metal ion reduction in photoresist compositions by chelating ion exchange resin |
| 02/21/2001 | CN1284982A Liquid curable resin composition, coating, and cured coating therefrom |
| 02/21/2001 | CN1284740A Method for electronic beam exposing and method for maaufacture of semiconductor device |
| 02/21/2001 | CN1284730A Thermal transfer film and its using method |
| 02/20/2001 | US6192510 Method of preparing a partial one-shot electron beam exposure mask and method of direct-writing patterns by use of a partial one-shot electron beam exposure mask |
| 02/20/2001 | US6192290 System and method of manufacturing semicustom integrated circuits using reticle primitives from a library and interconnect reticles |
| 02/20/2001 | US6192100 X-ray mask pellicles and their attachment in semiconductor manufacturing |
| 02/20/2001 | US6192064 Narrow band laser with fine wavelength control |
| 02/20/2001 | US6191880 Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement |
| 02/20/2001 | US6191844 Scanning exposure apparatus in which light exposure is a function of the speed of the mask or substrate stage |
| 02/20/2001 | US6191843 Exposure device, method of making and using same, and objects exposed by the exposure device |
| 02/20/2001 | US6191829 Optical apparatus for optically rotating a portion of a polarization axis of a linearly polarized light |
| 02/20/2001 | US6191429 Projection exposure apparatus and method with workpiece area detection |
| 02/20/2001 | US6191397 Heating device, method for evaluating heating device and pattern forming method |
| 02/20/2001 | US6191186 Insulating paste |
| 02/20/2001 | US6191182 Subjecting p-halophenyl alkyl ketone to aminolysis with cyclic secondary amine to form cyclic amine-substituted phenyl alkyl ketone; halogination and reacting with amine compound; stevens rearrangement under basic condition |
| 02/20/2001 | US6191086 Cleaning composition and method for removing residues |
| 02/20/2001 | US6191053 High efficiency photoresist coating |
| 02/20/2001 | US6191036 Use of photoresist focus exposure matrix array as via etch monitor |
| 02/20/2001 | US6190989 Method for patterning cavities and enhanced cavity shapes for semiconductor devices |
| 02/20/2001 | US6190928 Method for actually measuring misalignment of via |
| 02/20/2001 | US6190841 Pattern forming process and a photosensitive composition |
| 02/20/2001 | US6190840 Resist pattern forming method |
| 02/20/2001 | US6190839 High conformality antireflective coating compositions |
| 02/20/2001 | US6190837 Method for forming photoresist film pattern |
| 02/20/2001 | US6190835 A coaxial shielding fluid is produced around the process fluid plume. a plasma is generated by providing an energy source that impinges on the process fluid plume. |
| 02/20/2001 | US6190834 First resin being an epoxy resin, and a second epoxy resin having an n-substituted carbamic acid ester group and a radical polymeric unsaturated bond in its side chain |
| 02/20/2001 | US6190833 Radiation-sensitive resin composition |
| 02/20/2001 | US6190832 Preparation of photopolymeric gravure printing plates |
| 02/20/2001 | US6190831 Processless direct write printing plate having heat sensitive positively-charged polymers and methods of imaging and printing |
| 02/20/2001 | US6190830 Processless direct write printing plate having heat sensitive crosslinked vinyl polymer with organoonium group and methods of imaging and printing |
| 02/20/2001 | US6190829 Allows for wider exposure dosage windows, therefore increasing the yield or performance and line density. |
| 02/20/2001 | US6190826 For transferring medical diagnostic chemistry to a receptor. |
| 02/20/2001 | US6190825 Polymers containing N-substituted maleimide units and their use in radiation-sensitive mixtures |
| 02/20/2001 | US6190824 Photosensitive composition |
| 02/20/2001 | US6190810 Mark focusing system for steppers |
| 02/20/2001 | US6190808 X-ray mask and method of manufacturing the same |
| 02/20/2001 | US6190807 Used in a semiconductor fabrication process, and more particularly, to a mask that is compatible with steppers of different manufacturers. |
| 02/20/2001 | US6190748 Optical discs |
| 02/20/2001 | US6190063 Developing method and apparatus |
| 02/20/2001 | US6189875 Positioning device with H-drive having spring coupling between beams |
| 02/20/2001 | US6189339 Method for producing silica glass used for photolithography |
| 02/20/2001 | CA2224312C High resolution positive acting dry film photoresist |
| 02/20/2001 | CA2007295C Photocurable compositions |
| 02/20/2001 | CA2005283C Radiation-sensitive, ethylenically unsaturated, copolymerizable compounds and their preparation |
| 02/15/2001 | WO2001011737A1 High electric field, high pressure light source |
| 02/15/2001 | WO2001011733A1 High pulse rate pulse power system with fast rise time and low leakage current |
| 02/15/2001 | WO2001011732A1 High pulse rate pulse power system with liquid cooling |
| 02/15/2001 | WO2001011679A1 Method and apparatus for performing run-to-run control in a batch manufacturing environment |
| 02/15/2001 | WO2001011678A1 Method and apparatus for run-to-run controlling of overlay registration |
| 02/15/2001 | WO2001011666A2 Method of etching a wafer layer using multiple layers of the same photoresistant material and structure formed thereby |
| 02/15/2001 | WO2001011665A1 Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method and device for evaluating filter |
| 02/15/2001 | WO2001011657A1 Correction for systematic, low spatial frequency critical dimension variations in lithography |
| 02/15/2001 | WO2001011430A1 Transfer of a pattern with a high structural density by multiple exposure of less dense sub-patterns |
| 02/15/2001 | WO2001011429A1 Antireflective coating for photoresist compositions |
| 02/15/2001 | WO2001011426A1 Method of forming a masking pattern on a surface |
| 02/15/2001 | WO2001011408A1 Device for focussing light onto an object |
| 02/15/2001 | WO2001010964A1 Composition for polyimide electrodeposition and method of forming patterned polyimide film with the same |
| 02/15/2001 | WO2001010916A1 Polymer for photoresists and resin compositions for photoresists |
| 02/15/2001 | WO2001010872A1 Organo-silicon compounds and their use as photoinitiators |
| 02/15/2001 | WO2001010635A2 Filmable material with characteristics selectively modifiable by administration of particular types of energy |
| 02/15/2001 | WO2000062324A3 System and method to correct for distortion caused by bulk heating in a substrate |
| 02/15/2001 | WO2000057235A3 Multi-beam scanner including a dove prism array |
| 02/15/2001 | WO2000033140A8 Composition and method for removing probing ink and negative photoresist from silicon wafers |
| 02/15/2001 | DE19936331A1 Copolymer useful in the production of radiation sensitive compositions comprises units of specified formulae |
| 02/15/2001 | DE19935568A1 Illumination system for specified wavelengths used especially in EUV lithography includes raster-optical elements selected in number and form to predetermine uniformity of field illumination |
| 02/15/2001 | DE10037173A1 Negativ arbeitende Resistzusammensetzung des chemischen Verstärkungstyps The negative-working resist composition of chemical amplification type |
| 02/15/2001 | CA2375365A1 Method of forming a masking pattern on a surface |
| 02/14/2001 | EP1076263A2 Method for forming a cylindrical photosensitive element |
| 02/14/2001 | EP1076262A1 Photosensitive resin |
| 02/14/2001 | EP1076261A1 Negative resist composition |
| 02/14/2001 | EP1076071A2 Photosensitive ceramic compositions containing polycarbonate polymers |
| 02/14/2001 | EP1076070A2 Highly stable resin, hardenable resin composition, production method therefor, color filter and liquid crystal panel |
| 02/14/2001 | EP1076013A1 A method for stabilizing heat sensitive elements, developable by an aqueous solution |
| 02/14/2001 | EP1075672A1 Protection of lithographic components from particle contamination |
| 02/14/2001 | EP1075642A1 Device for measuring structures on a transparent substrate |
| 02/14/2001 | EP0864119B1 Photosensitive composition |
| 02/14/2001 | EP0723736B1 Bonding inner layers in printed circuit board manufacture |
| 02/14/2001 | CN1062079C FM and AM netting method |
| 02/13/2001 | US6189136 Design level optical proximity correction methods |
| 02/13/2001 | US6188783 Method and system for providing a probe array chip design database |
| 02/13/2001 | US6188710 Narrow band gas discharge laser with gas additive |
| 02/13/2001 | US6188709 Aerodynamic electrode support bar |
| 02/13/2001 | US6188519 Bigrating light valve |
| 02/13/2001 | US6188513 High numerical aperture ring field projection system for extreme ultraviolet lithography |
| 02/13/2001 | US6188467 Method and apparatus for fabricating semiconductor devices |
| 02/13/2001 | US6188464 Exposure apparatus |
| 02/13/2001 | US6188195 Exposure method, and method of making exposure apparatus having dynamically isolated support structure |