| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/07/2001 | CN1062966C Master disks for making dies for pressing in particular optical disks and their method of manufacture |
| 03/06/2001 | US6198982 Method and apparatus for detecting the presence of particles on a wafer holder of semiconductor exposure equipment |
| 03/06/2001 | US6198793 Illumination system particularly for EUV lithography |
| 03/06/2001 | US6198792 Wafer chamber having a gas curtain for extreme-UV lithography |
| 03/06/2001 | US6198579 Process for the correction of non-rotationally-symmetrical image errors |
| 03/06/2001 | US6198576 Projection optical system and exposure apparatus |
| 03/06/2001 | US6198527 Projection exposure apparatus and exposure method |
| 03/06/2001 | US6198109 Aperture apparatus used for photolithography and method of fabricating the same |
| 03/06/2001 | US6197843 Method for preparing ceramic articles |
| 03/06/2001 | US6197733 Photoresist ashing residue cleaning agent |
| 03/06/2001 | US6197679 Semiconductor device and manufacturing method therefor |
| 03/06/2001 | US6197608 Mask for area forming selective grating and selective area growth and method for fabricating semiconductor device by utilizing the same |
| 03/06/2001 | US6197506 Using substrate having over 100 different polynucleotides at density of over 50 different polynucleotides per square centimeter to generate hybridization patterns and distinguish between two nucleic acid samples; heredity; diagnosis |
| 03/06/2001 | US6197481 Oxidizing surface of blank wafer and etching zero layer alignment pattern into wafer at first and second chip sites; depositing photoresist, exposing with circuit pattern; removing exposed photoresit |
| 03/06/2001 | US6197480 Photosensitive paste, a plasma display, and a method for the production thereof |
| 03/06/2001 | US6197479 Image reproducibility and for flexographic printing plates |
| 03/06/2001 | US6197476 Photosensitive composition containing a cyclic dione polymer |
| 03/06/2001 | US6197475 Film property, heat-resistance, adhesivity and image-formability which does not require complex steps for preparation and does not cause contamination with chlorides |
| 03/06/2001 | US6197473 Photosensitive composition and a pattern forming process using the same |
| 03/06/2001 | US6197472 For offset printing; printing plates |
| 03/06/2001 | US6197459 Storage stabiliyt; resilience; tensile strength; elongation; in flexographic printing |
| 03/06/2001 | US6197454 Clean-enclosure window to protect photolithographic mask |
| 03/06/2001 | US6197372 Cassette station and substrate with carriers, coating, heating and mounting |
| 03/06/2001 | US6197225 Chromene compound |
| 03/06/2001 | US6196391 Electrostatic discharge-free container for insulating articles |
| 03/06/2001 | US6196138 Movable table unit |
| 03/01/2001 | WO2001014934A1 Photoresist remover composition |
| 03/01/2001 | WO2001014932A1 Apparatus and method for the enhanced imagewise exposure of a photosensitive material |
| 03/01/2001 | WO2001014931A1 Photopolymerizable composition and photopolymerizable lithographic plate |
| 03/01/2001 | WO2001014930A1 Methods for enhancing images on relief image printing plates |
| 03/01/2001 | WO2001014929A1 Integrated hybrid optoelectronic devices |
| 03/01/2001 | WO2001014510A1 Stripping and cleaning compositions |
| 03/01/2001 | WO2001014460A1 A method for forming polymeric patterns, relief images and colored polymeric bodies using digital light processing technology |
| 03/01/2001 | DE19940921A1 Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial A photopolymerizable mixture and thus produced recording material |
| 03/01/2001 | DE19937995A1 Verfahren zur Strukturierung einer organischen Antireflexionsschicht Method for structuring an organic anti-reflective layer |
| 03/01/2001 | DE10040963A1 Vernetzermonomer, umfassend eine Doppelbindung, und ein dieses enthaltendes Photoresist-Copolymer Crosslinker comprising one double bond, and a photoresist containing this copolymer |
| 03/01/2001 | DE10036217A1 Coordinate table mechanism for semiconductor lithography device has sliding shafts fitted with table surface within vacuum chamber supported by pressurized gas bearings |
| 03/01/2001 | DE10034967A1 Verfahren und Vorrichtung zum genauen Positionieren von Linsenrasteranordnungen mit periodischen Strukturen bezüglich zusammengesetzter Bilder Method and device for accurate positioning of the lenticular arrays with respect periodic structures of composite images |
| 02/28/2001 | EP1079277A1 Hybrid illumination system for use in photolithography |
| 02/28/2001 | EP1079276A1 Photopolymerisable mixture and recording material prepared therewith |
| 02/28/2001 | EP1079275A2 Thermosensitive transfer film and method of using the same |
| 02/28/2001 | EP1079253A1 Projection exposure apparatus and method, and reflection refraction optical system |
| 02/28/2001 | EP1079223A1 Aberration measuring instrument and measuring method, projection exposure apparatus provided with the instrument and device-manufacturing method using the measuring method, and exposure method |
| 02/28/2001 | EP1078945A2 Polymer for use in a photoresist composition |
| 02/28/2001 | EP1078926A1 Pyran derivatives |
| 02/28/2001 | EP1078736A1 Lithographic printing plate precursor |
| 02/28/2001 | EP1078735A2 Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board |
| 02/28/2001 | EP1078734A2 Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board |
| 02/28/2001 | EP1078506A1 Laser pattern generator |
| 02/28/2001 | EP1078454A1 Planar resist structure, especially an encapsulation for electric components and a thermomechanical method for the production thereof |
| 02/28/2001 | EP1078301A1 Retaining device for photo blanks |
| 02/28/2001 | EP1078288A1 Method for forming bragg gratings, apparatus for implementing said method and devices with bragg gratings obtained with said method |
| 02/28/2001 | EP1078287A1 Structure for micro-machine optical tooling and method for making and using |
| 02/28/2001 | EP0909311A4 Post clean treatment |
| 02/28/2001 | EP0789721B1 Visible-light curable epoxy system with enhanced depth of cure |
| 02/28/2001 | CN2421670Y Optical pre-alighment apparatus for submicron photoetching device |
| 02/28/2001 | CN1285947A Magnetic recording/reproducing device |
| 02/28/2001 | CN1285932A Method of molecular-scale pattern imprinting at surface |
| 02/28/2001 | CN1285612A Electronic Beam exposure mask, Exposure method and equipment and method for making semiconductor device |
| 02/28/2001 | CN1285529A Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same |
| 02/27/2001 | US6195621 Non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components |
| 02/27/2001 | US6195619 System for aligning rectangular wafers |
| 02/27/2001 | US6195213 Projection exposure apparatus and method |
| 02/27/2001 | US6195201 Reflective fly's eye condenser for EUV lithography |
| 02/27/2001 | US6195156 Image forming device, image forming process, and pattern forming process, and photosensitive material used therein |
| 02/27/2001 | US6195155 Scanning type exposure method |
| 02/27/2001 | US6195154 Projection exposure apparatus for transferring mask pattern onto photosensitive substrate |
| 02/27/2001 | US6195153 Scanning type exposure device having individually adjustable optical modules and method of manufacturing same |
| 02/27/2001 | US6194833 Microdischarge lamp and array |
| 02/27/2001 | US6194733 Method and apparatus for adjustably supporting a light source for use in photolithography |
| 02/27/2001 | US6194732 Charged-particle-beam exposure methods with beam parallelism detection and correction |
| 02/27/2001 | US6194482 Casting resin of epoxy resin, isocyanurate siloxane, fillers, photo initiators and thermal initiators |
| 02/27/2001 | US6194480 Pigment composition and colored photosensitive composition |
| 02/27/2001 | US6194366 Post chemical-mechanical planarization (CMP) cleaning composition |
| 02/27/2001 | US6194268 Printing sublithographic images using a shadow mandrel and off-axis exposure |
| 02/27/2001 | US6194231 Method for monitoring polishing pad used in chemical-mechanical planarization process |
| 02/27/2001 | US6194127 Resistive sheet patterning process and product thereof |
| 02/27/2001 | US6194126 Pattern-forming process using photosensitive resin composition |
| 02/27/2001 | US6194125 Preparation of photopolymeric letterpress printing plates |
| 02/27/2001 | US6194124 Photosensitive ceramic compositions containing polycarbonate polymers |
| 02/27/2001 | US6194119 Thermal transfer donor element with light to heat conversion layer, interlayer, and thermal transfer layer including release layer, cathode layer, light emitting polymer layer, small molecule hole transport layer and anode layer |
| 02/27/2001 | US6194111 Comprising at least one poly(arylene ether alcohol), polyisocyanate crosslinking agent(s) and at least one charge transport material dispersed in a solvent; photoconductor with the crosslinked layer has excellent wear resistance |
| 02/27/2001 | US6194105 Forming a reticle having first size from a graphics file defining a reticle having a size larger than the first size, which includes steps of identifying windows in the graphics file, converting file into reticle files of second format |
| 02/27/2001 | US6194104 Optical proximity correction (OPC) method for improving lithography process window |
| 02/27/2001 | US6194103 E-beam double exposure method for manufacturing ASPM mask with chrome border |
| 02/27/2001 | US6194101 Photomask, and process and apparatus for determining condition of photomask |
| 02/27/2001 | US6193899 System and method for optically aligning films and substrates used in printed circuit boards |
| 02/27/2001 | US6193783 Pumping a solution, degassing, opening a passage then discharging |
| 02/22/2001 | WO2001013465A1 Aperture coupled slot array antenna |
| 02/22/2001 | WO2001013413A1 Exposure during rework for enhanced resist removal |
| 02/22/2001 | WO2001013412A1 Method for structuring an organic anti-reflection coating |
| 02/22/2001 | WO2001013181A1 Method and apparatus for recording a hologram from a mask pattern by the use of total internal reflection holography and hologram manufactured by the method |
| 02/22/2001 | WO2001013180A1 Antireflective coating material for photoresists |
| 02/22/2001 | WO2001013179A1 Water-processable photoresist compositions |
| 02/22/2001 | WO2001013177A1 Photomask, method for manufacturing the same, projection aligner using the photomask, and projection exposing method |
| 02/22/2001 | WO2001013176A1 Methods of determining alignment in the forming of phase shift regions in the fabrication of a phase shift mask |
| 02/22/2001 | WO2001013175A2 Photosensitive resin composition |
| 02/22/2001 | WO2001012720A1 Onium gallates cationic initiators |
| 02/22/2001 | WO2001012711A1 Screen coating composition and method for applying same |
| 02/22/2001 | WO2001012679A1 Composition that hardens with visible light and use thereof |