| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/15/2001 | WO2001018922A1 Narrow band laser with fine wavelength control |
| 03/15/2001 | WO2001018860A2 Improved apparatus and methods for integrated circuit planarization |
| 03/15/2001 | WO2001018854A1 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification |
| 03/15/2001 | WO2001018607A1 Method and apparatus for determining post exposure bake endpoint using residual gas analysis |
| 03/15/2001 | WO2001018606A1 Data path for high performance pattern generator |
| 03/15/2001 | WO2001018605A1 Photosensitive resin printing plate and method for producing photosensitive printing plate having projection |
| 03/15/2001 | WO2001018604A2 Method and apparatus for thermal processing a photosensitive element |
| 03/15/2001 | WO2001018603A2 Polymer for chemically amplified resist and a resist composition using the same |
| 03/15/2001 | WO2001018280A1 Improved aperture plate and methods for its construction and use |
| 03/15/2001 | WO2001017797A1 Microfabrication methods and devices |
| 03/15/2001 | WO2001017793A1 Thermal transfer element with a plasticizer-containing transfer layer and thermal transfer process |
| 03/15/2001 | WO2001010635A3 Filmable material with characteristics selectively modifiable by administration of particular types of energy |
| 03/15/2001 | WO2000057247A8 Improved thermosetting anti-reflective coatings |
| 03/15/2001 | DE19944073A1 Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht A radiation-sensitive recording material with top coat |
| 03/15/2001 | DE19937742A1 Übertragung eines Musters hoher Strukturdichte durch multiple Belichtung weniger dichter Teilmuster Transferring a pattern of high structural density by multiple exposure less dense partial pattern |
| 03/15/2001 | DE19936333A1 A radiation-sensitive composition, used to produce printing plates, printed circuit boards for integrated circuits and photomasks |
| 03/15/2001 | DE19936332A1 A radiation-sensitive composition, used to produce printing plates, printed circuit boards for integrated circuits and photomasks |
| 03/15/2001 | DE10018852A1 Silicium enthaltendes Polymer, Verfahren zu seiner Herstellung, dieses verwendende Resistzusammensetzung, Musterbildungsverfahren und Verfahren zur Herstellung einer elektronischen Anordnung Silicon-containing polymer, method for its manufacture, use of this resist composition, and pattern-forming method A method for manufacturing an electronic device |
| 03/15/2001 | CA2384463A1 Improved apparatus and methods for integrated circuit planarization |
| 03/15/2001 | CA2384070A1 Improved aperture plate and methods for its construction and use |
| 03/14/2001 | EP1083777A1 Laser-excited plasma light source, exposure apparatus and its manufacturing method, and device manufacturing method |
| 03/14/2001 | EP1083463A2 Patterning method and semiconductor device |
| 03/14/2001 | EP1083462A1 Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device |
| 03/14/2001 | EP1083444A1 An optical element, a method for manufacturing the same, and an optical apparatus using the same |
| 03/14/2001 | EP1082641A1 Photosensitive paste, substrate for plasma display panel using the same, and method of production of the substrate |
| 03/14/2001 | EP1082470A1 Microchamber |
| 03/14/2001 | EP1082224A1 Printing mould and method for modifying its wetting characteristics |
| 03/14/2001 | EP1082182A1 Apparatus and method for providing pulsed fluids |
| 03/14/2001 | EP0888389A4 Photoactivatable chain transfer agents |
| 03/14/2001 | EP0646845B1 Color filter, material thereof and resin |
| 03/14/2001 | CN1287631A Solid-capped liquid photopolymer printing elements |
| 03/14/2001 | CN1287630A Positive radiation-sensitive composition |
| 03/14/2001 | CN1287629A Radiation-sensitive resin composition |
| 03/14/2001 | CN1287380A Production of device by electron beam illumination method |
| 03/14/2001 | CN1063269C Single-group spectral imaging liquid soldering inhibitor and its producing process |
| 03/14/2001 | CN1063135C Method for producing screen printing stencil |
| 03/13/2001 | US6201999 Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool |
| 03/13/2001 | US6201634 Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element |
| 03/13/2001 | US6201609 Interferometers utilizing polarization preserving optical systems |
| 03/13/2001 | US6201598 Charged-particle-beam microlithographic exposure apparatus and reticles for use with same |
| 03/13/2001 | US6201597 Apparatus for projection patterning of large substrates using limited-travel precision x-y stage |
| 03/13/2001 | US6201251 Compensation of space charge in a particle beam system |
| 03/13/2001 | US6201226 Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe |
| 03/13/2001 | US6201215 Method of making a thick film low value high frequency inductor |
| 03/13/2001 | US6200903 Method of manufacturing semiconductor devices |
| 03/13/2001 | US6200901 Polishing polymer surfaces on non-porous CMP pads |
| 03/13/2001 | US6200737 Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure |
| 03/13/2001 | US6200736 Photoresist developer and method |
| 03/13/2001 | US6200734 Method for fabricating semiconductor devices |
| 03/13/2001 | US6200733 Photosensitive composition for sandblasting and photosensitive film comprising the same |
| 03/13/2001 | US6200732 Photocurable resin composition |
| 03/13/2001 | US6200731 A di(5-norbornene-2-carboxylic acid-3-carboxylate) compound for preparing a photoresist copolymer and improving the polymerization yield, reduce the production cost |
| 03/13/2001 | US6200729 Positive photosensitive composition |
| 03/13/2001 | US6200728 A resin blends comprising a first photoacid generator onium compound and a second photoacid generator onium compound, to produce photoacids that differ in acid strength and/or size; useful as deep u.v. photoresists, forming a relief image |
| 03/13/2001 | US6200726 Selecting a desired space width, selecting at least one photoacid generator (pag), which will generate two photoacids upon exposure to actinic energy to produce a desired space width in hybrid photoresist, forming hybrid photoresist |
| 03/13/2001 | US6200725 Chemically amplified resist compositions and process for the formation of resist patterns |
| 03/13/2001 | US6200724 Chemical amplification resist compositions and process for the formation of resist patterns |
| 03/13/2001 | US6200713 Passing first beam of light by first light source through the array, forming a light line, rotating the array to rotate light line across a first detector, producing a signal, determining when maximum signal is produced, rotating array |
| 03/13/2001 | US6200710 Methods for producing segmented reticles |
| 03/13/2001 | US6200709 Photolithographic mask and apparatus and method of use thereof |
| 03/13/2001 | US6200708 Method for automatically determining adjustments for stepping photolithography exposures |
| 03/13/2001 | US6200646 Method for forming polymeric patterns, relief images and colored polymeric bodies using digital light processing technology |
| 03/13/2001 | US6200641 Variations in density; reducing surface defects |
| 03/13/2001 | US6200633 Coating apparatus and coating method |
| 03/13/2001 | US6200502 Process for the production of optical components with coupled optical waveguides and optical components produced by said method |
| 03/13/2001 | US6200480 Method of purifying photoacid generators for use in photoresist compositions |
| 03/13/2001 | US6200479 Contacting polymer with strong acid cation exchange resin scavenges base from polymer solution while introducing liberated strong acid, contacting polymer solution with base anion exchange resin scavenges liberated acid from solution |
| 03/13/2001 | US6200408 Method for cementing a component to a surface |
| 03/13/2001 | US6200100 Method and system for preventing incontinent liquid drip |
| 03/13/2001 | US6199991 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 03/13/2001 | US6199562 Method and apparatus for cleaning a dispense line |
| 03/08/2001 | WO2001017075A1 Laser chamber with fully integrated electrode feedthrough main insulator |
| 03/08/2001 | WO2001016998A2 Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition |
| 03/08/2001 | WO2001016556A1 Interferometers utilizing polarization preserving optical systems |
| 03/08/2001 | WO2001015818A1 Method and apparatus for controlling air over a spinning microelectronic substrate |
| 03/08/2001 | WO2000033432A8 Durable etalon based output coupler |
| 03/08/2001 | DE19923679C1 Substrate exposure device for photolithographic printing plate manufacture, has exposure head supported by ring element for rotation and axial displacement relative to carrier cylinder for exposed substrate |
| 03/08/2001 | DE10042293A1 Thermal imaging composition, used for making lithographic printing plate or drum, contains infrared-sensitive aromatic dye in addition to hydrophilic water-sensitive ionomer, water or water-miscible organic solvent |
| 03/07/2001 | EP1081554A1 Developing system for alkaline-developable lithographic printing plates |
| 03/07/2001 | EP1081553A2 Exposure method and scanning exposure apparatus |
| 03/07/2001 | EP1081552A1 Lithographic printing plate precursor |
| 03/07/2001 | EP1081551A2 Two-dimensional phase element and method of manufacturing the same |
| 03/07/2001 | EP1081521A2 Kinematic lens mounting |
| 03/07/2001 | EP1081489A2 Method and system for reticle inspection by photolithography simulation |
| 03/07/2001 | EP1081483A2 Stepper lens aberration measurement pattern and stepper lens aberration characteristics evaluating method |
| 03/07/2001 | EP1081106A1 Synthetic quartz glass optical member for ultraviolet light and reduction projection exposure system using the same |
| 03/07/2001 | EP1080932A2 Infrared laser imageable, peel developable, single sheet color proofing system |
| 03/07/2001 | EP1080884A1 Processless thermal printing plate with well defined nanostructure |
| 03/07/2001 | EP1080791A2 Process for coating a solution onto a substrate |
| 03/07/2001 | EP1080522A1 Reliable modular production quality narrow-band high rep rate f 2? laser |
| 03/07/2001 | EP1080394A1 Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays |
| 03/07/2001 | EP1080393A1 Method for measuring the position of structures on a surface of a mask |
| 03/07/2001 | EP1080392A1 Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
| 03/07/2001 | EP1080170A1 Cleaning composition and method for removing residues |
| 03/07/2001 | EP1080118A1 Novel photoinitiators and applications therefor |
| 03/07/2001 | EP1079973A1 Waterless lithographic plate |
| 03/07/2001 | EP1079972A1 Ir-sensitive composition and use thereof for the preparation of printing plate precursors |
| 03/07/2001 | CN1286818A Ultraviolet laser apparatus, and exposure apparatus and mehtod comprising ultraviolet laser apparatus |
| 03/07/2001 | CN1286764A Method for forming micropattern of resist |
| 03/07/2001 | CN1286415A Calibration method for photoetching |