| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/27/2001 | US6208407 Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
| 03/27/2001 | US6208406 Environmental control apparatus for exposure apparatus |
| 03/27/2001 | US6208165 Semiconductor integrated circuit |
| 03/27/2001 | US6208045 Electric motors and positioning devices having moving magnet arrays and six degrees of freedom |
| 03/27/2001 | US6207986 Semiconductor integrated circuit device |
| 03/27/2001 | US6207788 Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin |
| 03/27/2001 | US6207787 Antireflective coating for microlithography |
| 03/27/2001 | US6207728 Photo-curable composition and photo-cured product |
| 03/27/2001 | US6207727 Photoinitiator mixtures containing acylphosphinoxides and benzophenone derivatives |
| 03/27/2001 | US6207583 Photoresist ashing process for organic and inorganic polymer dielectric materials |
| 03/27/2001 | US6207573 Differential trench open process |
| 03/27/2001 | US6207565 Integrated process for ashing resist and treating silicon after masked spacer etch |
| 03/27/2001 | US6207529 Semiconductor wafer,wafer alignment patterns and method of forming wafer alignment patterns |
| 03/27/2001 | US6207358 Method of stripping a photoresist from a semiconductor substrate using dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide |
| 03/27/2001 | US6207357 Methods of forming photoresist and apparatus for forming photoresist |
| 03/27/2001 | US6207356 Coating on a substrate a copolyamide from aromatic dicarboxylic acids, disiloxanealkylenediamines and dihydroxy aromatic diamines; prebaking; irradiation with light; dissolving in an alkylbenzenesullfonic acid |
| 03/27/2001 | US6207353 Resist formulation which minimizes blistering during etching |
| 03/27/2001 | US6207352 Resist developing process |
| 03/27/2001 | US6207350 Corrosion inhibitor for NiCu for high performance writers |
| 03/27/2001 | US6207347 Urethane biuret oligomer. |
| 03/27/2001 | US6207346 Waterborne photoresists made from urethane acrylates |
| 03/27/2001 | US6207345 Laminate film and processes for preparing printed wiring board |
| 03/27/2001 | US6207343 Positive photosensitive composition |
| 03/27/2001 | US6207342 Chemically amplified resist material and process for the formation of resist patterns |
| 03/27/2001 | US6207341 Method for producing a chemically adsorbed film |
| 03/27/2001 | US6207340 Positive photoresists alkali-soluble resin; (b) a naphthoquinonediazide group-containing compound; and (c) a solvent for pattern images |
| 03/27/2001 | US6207231 Coating film forming method and coating apparatus |
| 03/27/2001 | US6207117 Suppressing a beam drift caused by the accumulated carbon compounds by using deflector electrodes of the beam column containing a granular or porous precious metal oxidation catalyst; drawing of high accuracy; lithography; wafers |
| 03/27/2001 | US6206966 Pedestal substrate for coated optics |
| 03/27/2001 | US6206528 Surface figure control for coated optics |
| 03/27/2001 | US6206527 Device for oblique light irradiation |
| 03/27/2001 | CA2181598C Packaged strain actuator |
| 03/22/2001 | WO2001020733A1 Light source and wavelength stabilization control method, exposure apparatus and exposure method, method for producing exposure apparatus, and device manufacturing method and device |
| 03/22/2001 | WO2001020691A1 Conductive structure based on poly-3,4-alkenedioxythiophene (pedot) and polystyrenesulfonic acid (pss) |
| 03/22/2001 | WO2001020651A1 Exposure device with laser device |
| 03/22/2001 | WO2001020650A1 Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system |
| 03/22/2001 | WO2001020646A2 Fill strategies in the optical kerf |
| 03/22/2001 | WO2001020402A1 Fabrication of finely featured devices by liquid embossing |
| 03/22/2001 | WO2001020398A1 Exposure device with laser device |
| 03/22/2001 | WO2001020397A1 Laser device and exposure method |
| 03/22/2001 | WO2000079344A8 Photosensitive element, photosensitive element roll, process for producing resist pattern with the same, resist pattern, substrate with overlying resist pattern, process for producing wiring pattern, and wiring pattern |
| 03/22/2001 | WO2000075241A3 Oil soluble radiation curable metal-containing compounds and compositions |
| 03/22/2001 | DE19945690C1 Wafer cascade alignment system uses light chopper with one or more blades inserted between wafer cascade and detector |
| 03/22/2001 | DE19944761A1 Vorrichtung und Verfahren zur wellenlängenabhängigen Lichtauskupplung Apparatus and method for wavelength-dependent Lichtauskupplung |
| 03/22/2001 | DE19944759A1 Verfahren zur Synchronisation von Positionier- und Belichtungsvorgängen Method for synchronization of positioning and exposure operations |
| 03/22/2001 | DE10046652A1 Defocusing calculation method for lithographic process e.g. for semiconductor manufacture, uses evaluation of Gauss function for line width and roughness of patterns obtained by double exposure operations |
| 03/22/2001 | DE10015698C1 Semiconductor device has additional marking detected for increasing overly alignment of photomask employed during exposure step of semiconductor manufacture |
| 03/22/2001 | DE10014083A1 Production of a semiconductor device comprises forming a first resist layer on a semiconductor base layer, forming a resist pattern, forming a second resist layer, forming a crosslinked layer |
| 03/21/2001 | EP1085744A2 External drum imaging system |
| 03/21/2001 | EP1085529A2 Dielectric composition |
| 03/21/2001 | EP1085381A1 Developer for radiation exposed photoimageable materials |
| 03/21/2001 | EP1085380A1 Photosensitive recording material provided with a covering layer |
| 03/21/2001 | EP1085379A1 Radiation-sensitive resin composition |
| 03/21/2001 | EP1085378A1 Radiation-sensitive resin composition |
| 03/21/2001 | EP1085377A1 Resist compositions and patterning process |
| 03/21/2001 | EP1085376A1 Process for obtaining a color image with improved resolution |
| 03/21/2001 | EP1085003A1 High-purity 1,3-propanediol derivative solvent, process for producing the same, and use thereof |
| 03/21/2001 | EP1084830A1 Method for obtaining a heat sensitive element by spray-coating |
| 03/21/2001 | EP1084826A1 Heat-sensitive lithographic printing plate precursor |
| 03/21/2001 | EP1084457A1 Method for producing small and micro-sized ceramic parts |
| 03/21/2001 | EP1084456A1 Heavy metal-free coating formulations |
| 03/21/2001 | EP1084455A1 Lithographic printing plate precursors |
| 03/21/2001 | EP1084454A1 Free-form nanofabrication using multi-photon excitation |
| 03/21/2001 | EP1084452A1 Process for producing purified solutions of blocked polyhydroxystyrene resins |
| 03/21/2001 | EP1084440A1 Multiple parallel source scanning device |
| 03/21/2001 | EP1084415A1 Device for detecting the position of rotating objects |
| 03/21/2001 | EP1084165A1 Water soluble negative-working photoresist composition |
| 03/21/2001 | EP1021856A4 Narrow band excimer laser |
| 03/21/2001 | EP1019994A4 Narrow band excimer laser with gas additive |
| 03/21/2001 | EP0976010A4 Waterborne photoresists made from urethane acrylates |
| 03/21/2001 | EP0929842B1 Bottom antireflective coatings containing an arylhydrazo dye |
| 03/21/2001 | EP0772656B1 Acrylic syrup curable to a crosslinked viscoelastomeric material |
| 03/21/2001 | EP0728327B1 Process for making an array of tapered photopolymerized waveguides |
| 03/21/2001 | CN1288590A Method for forming resist pattern |
| 03/21/2001 | CN1288589A Novel detergent and cleaning method using it |
| 03/21/2001 | CN1288529A Radiation-sensitive resin composition |
| 03/21/2001 | CN1288178A Positive type photo-anticorrosion composite material |
| 03/21/2001 | CN1063552C Method for making quantum line ultra-fine figure |
| 03/20/2001 | US6204969 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same |
| 03/20/2001 | US6204914 Printing apparatus of photosensitive microcapsule type and image processing system using the same |
| 03/20/2001 | US6204912 Exposure method, exposure apparatus, and mask |
| 03/20/2001 | US6204911 Exposure apparatus and device manufacturing method |
| 03/20/2001 | US6204511 Electron beam image picturing method and image picturing device |
| 03/20/2001 | US6204356 Polybenzoxazole resin and precursor thereof |
| 03/20/2001 | US6204306 Alpha-aminoacetophenones functionalized with organic diisocyanates, which can be used as reactive photoinitiators; |
| 03/20/2001 | US6204187 Contact and deep trench patterning |
| 03/20/2001 | US6203966 Stereolithographic resin composition |
| 03/20/2001 | US6203965 Photoresist comprising blends of photoacid generators |
| 03/20/2001 | US6203952 Articles such as radio frequency identification tags; absence of heat distortion, debris, photoresis, undercut image |
| 03/20/2001 | US6203950 Method for manufacturing a color filter |
| 03/20/2001 | US6203849 Process and device for coating disc-shaped data storage media |
| 03/20/2001 | US6203659 Method and apparatus for controlling the quality of a photoresist stripper bath |
| 03/20/2001 | US6203658 Processing system and method for making spherical shaped semiconductor integrated circuits |
| 03/20/2001 | US6203218 Substrate processing apparatus and substrate processing method |
| 03/20/2001 | US6203143 Hydroxyalkylated high performance curable polymers |
| 03/20/2001 | US6202653 Processing solution supplying apparatus, processing apparatus and processing method |
| 03/20/2001 | US6202553 Process for producing a screen printing form and screen printing fabric of a coated screen web |
| 03/20/2001 | US6202492 Anti-vibration apparatus and exposure apparatus |
| 03/15/2001 | WO2001018944A1 Displacement device |
| 03/15/2001 | WO2001018923A1 High power gas discharge laser with line narrowing unit |