| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/05/2001 | WO2001024245A1 Process for ashing organic materials from substrates |
| 04/05/2001 | WO2001024228A2 Temporary bridge for micro machined structures |
| 04/05/2001 | WO2001023961A1 Method and apparatus for determining phase shifts and trim masks for an integrated circuit |
| 04/05/2001 | WO2001023936A1 Double mirror catadioptric objective lens system with three optical surface multifunction component |
| 04/05/2001 | WO2001023935A1 Projection exposure method and apparatus and projection optical system |
| 04/05/2001 | WO2001023934A1 Projection exposure method and apparatus and projection optical system |
| 04/05/2001 | WO2001023933A1 Projection optical system |
| 04/05/2001 | WO2001023914A1 Optical device with multilayer thin film and aligner with the device |
| 04/05/2001 | WO1996034745B1 Exposure process and device |
| 04/04/2001 | EP1089327A1 Exposure device and method of manufacturing semiconductor device |
| 04/04/2001 | EP1089129A1 Positive type photosensitive resin composition, process for producing pattern and electronic parts |
| 04/04/2001 | EP1088679A2 Lithographic printing plate support and lithographic printing plate precursor using the same |
| 04/04/2001 | EP1088653A2 Infrared laser-imageable lithograhic printing members and methods of preparing and imaging such printing members |
| 04/04/2001 | EP1088328A1 Method and device for correcting proximity effects |
| 04/04/2001 | EP1047552A4 Direct write imaging medium |
| 04/04/2001 | EP1044394A4 Process for preparing a radiation-sensitive composition |
| 04/04/2001 | CN1290402A Stripping agent against resist residues |
| 04/04/2001 | CN1290357A Positively photosensitive resin composition |
| 04/04/2001 | CN1064055C Epoxy acrylates |
| 04/03/2001 | US6212217 Smart laser with automated beam quality control |
| 04/03/2001 | US6212214 Performance control system and method for gas discharge lasers |
| 04/03/2001 | US6211965 Photolithographic position measuring laser interferometer with relitively moving measuring intereometer |
| 04/03/2001 | US6211948 Process and apparatus for photomechanical production of structured surfaces, especially for irradiation of offset press plates |
| 04/03/2001 | US6211947 Illuminance distribution measuring method, exposing method and device manufacturing method |
| 04/03/2001 | US6211946 Stage unit, drive table, and scanning exposure apparatus using the same |
| 04/03/2001 | US6211945 Apparatus and method for exposing substrates |
| 04/03/2001 | US6211944 Projection exposure method and apparatus |
| 04/03/2001 | US6211942 Double-sided exposure system |
| 04/03/2001 | US6211528 Electron beam drawing method in which cell projection manner and variably shaped beam manner are used in combination |
| 04/03/2001 | US6211347 Inks, color filters |
| 04/03/2001 | US6211328 Phenol resin |
| 04/03/2001 | US6211127 Containing alkanolamine, sulfone or sulfoxide and glycol ether |
| 04/03/2001 | US6211126 Formulations including a 1, 3-dicarbonyl compound chelating agent for stripping residues from semiconductor substrates |
| 04/03/2001 | US6210868 Method for forming a pattern on a chemical sensitization photoresist |
| 04/03/2001 | US6210866 Method for forming features using self-trimming by selective etch and device formed thereby |
| 04/03/2001 | US6210865 Collects radiation, here soft x-rays, from a small, incoherent source and couples it to the ringfield of a camera designed for projection lithography. mirrors |
| 04/03/2001 | US6210863 Ortho-substituted on at least two aryl radicals, addition polymerization |
| 04/03/2001 | US6210862 Solder mask having cationically polymerizable non-brominated epoxy resin system, |
| 04/03/2001 | US6210861 Tonable radiation sensitive recording material with balanced adhesive properties and process for using the same |
| 04/03/2001 | US6210859 Sensitivity, resolution, heat-resistance and stability after exposure, ultrafine patterns can be formed irrespective of any substrate, larger scope of exposure can be obtained, a modifiedpolyhydroxystyrene copolymer |
| 04/03/2001 | US6210856 Si-containing polymeric additive, base polymer, photoacid generator, solvent, polymeric material contains acid sensitive protecting groups and are aqueous base soluble after exposure processing, high image resolution, good image profile and high |
| 04/03/2001 | US6210855 Positive resist composition suitable for lift-off technique and pattern forming method |
| 04/03/2001 | US6210854 Aqueous developable flexographic printing plate |
| 04/03/2001 | US6210846 Exposure during rework for enhanced resist removal |
| 04/03/2001 | US6210845 Plate precursor for lithographic printing plate, method for making lithographic printing plate using the same, and method for producing the plate precursor for lithographic printing plate |
| 04/03/2001 | US6210844 Polymer having a melting point tin of at least 50 degree c. and a glass transition temperature of about 0.degree c, especially polycaprolactones, |
| 04/03/2001 | US6210843 Modulation of peripheral critical dimension on photomask with differential electron beam dose |
| 04/03/2001 | US6210537 Forming solution comprising pyrrole monomer and an electron acceptor; evenly applying film of solution onto substrate; photochemically polymerizing portions of film to form electronically conducting polymer; removing solution |
| 04/03/2001 | US6210481 Apparatus and method of cleaning nozzle and apparatus of processing substrate |
| 04/03/2001 | US6210050 Resist developing method and apparatus with nozzle offset for uniform developer application |
| 04/03/2001 | US6209484 Method and apparatus for depositing an etch stop layer |
| 04/03/2001 | US6209354 Method of preparing silica glass article |
| 04/01/2001 | WO2001081525A1 Detergent composition |
| 03/29/2001 | WO2001022481A1 Method for producing a mask layer having openings with reduced widths |
| 03/29/2001 | WO2001022480A1 Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices |
| 03/29/2001 | WO2001022183A1 Method of improved estimation of critical dimensions in microelectronic fabrication |
| 03/29/2001 | WO2001022170A1 Method for forming resist pattern having improved dry-etching resistance |
| 03/29/2001 | WO2001022169A1 System to reduce heat-induced distortion of photomasks during lithography |
| 03/29/2001 | WO2001022168A1 Device and method for wavelength dependent light outcoupling |
| 03/29/2001 | WO2001022167A1 Method for synchronising positioning and exposure processes |
| 03/29/2001 | WO2001022166A1 Waiting time dependent correction for lithographic mask exposure |
| 03/29/2001 | WO2001022165A1 Photosensitive resin compositions, photosensitive element containing the same, process for producing resist pattern, and process for producing printed circuit board |
| 03/29/2001 | WO2001022164A1 Contact hole production by means of crossing sudden phase shift edges of a single phase mask |
| 03/29/2001 | WO2001022163A2 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof |
| 03/29/2001 | WO2001022162A2 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof |
| 03/29/2001 | WO2001022133A1 Photonic crystal materials |
| 03/29/2001 | WO2001022127A1 Dye compositions and uses |
| 03/29/2001 | WO2001021708A1 Ultraviolet-curable resin composition |
| 03/29/2001 | DE19944446A1 Lamp closure arrangement has flaps that open and close alternately and light outlet mask that is covered or exposed according to program and controlled by corresponding end switches |
| 03/29/2001 | DE19938893A1 Vibration-free device or stepper for mask-exposure during semiconductor fabrication |
| 03/28/2001 | EP1087264A1 Method of adjusting projection optical apparatus |
| 03/28/2001 | EP1087263A2 Photosensitive resin composition, pattering method, and electronic components |
| 03/28/2001 | EP1087262A2 Energy-ray curing resin composition |
| 03/28/2001 | EP1087261A1 Photosensitive resin composition, multilayer printed wiring board and process for production thereof |
| 03/28/2001 | EP1087260A1 Photosensitive resin composition |
| 03/28/2001 | EP1086406A1 Holographic patterning method and tool employing prism coupling |
| 03/28/2001 | EP1086404A1 Crossed grating photonic crystals and multiple exposure processes for making them |
| 03/28/2001 | EP1086403A1 Liquid, radiation-curable composition, especially for stereolithography |
| 03/28/2001 | EP1086156A1 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations |
| 03/28/2001 | EP1086147A1 Process for producing purified solutions of blocked polyhydroxystyrene resin |
| 03/28/2001 | EP1086145A1 Novel photoinitiators and their applications |
| 03/28/2001 | EP1086030A2 Smif pod including independently supported wafer cassette |
| 03/28/2001 | EP1085971A1 Application of textured or patterned surfaces to a prototype |
| 03/28/2001 | EP1046082A4 Developer solvent for photopolymer printing plates and method |
| 03/28/2001 | CN1289452A Process for ashing organic materials from substrates |
| 03/28/2001 | CN1289416A Photoresist stripper and method of stripping |
| 03/28/2001 | CN1289415A Imaging system employing encapsulated radiation sensitive composition |
| 03/28/2001 | CN1289071A Photosensitive plate with very thin photosensitive layer and its preparation and application |
| 03/28/2001 | CN1289070A Positive photo-resist composition |
| 03/28/2001 | CN1289069A Photo-resist composition containing photo-alkali-generator and photo-acid-generator |
| 03/28/2001 | CN1288902A Organic polymer for anti-reflection coating and preparation method thereof |
| 03/28/2001 | CN1288901A Organic polymer for anti-reflection coating and its preparation method thereof |
| 03/28/2001 | CN1063711C Heat-sensitive plate-making paper |
| 03/27/2001 | US6208748 Monitoring focus of a lens imaging system based on astigmatism |
| 03/27/2001 | US6208747 Determination of scanning error in scanner by reticle rotation |
| 03/27/2001 | US6208707 X-ray projection exposure apparatus |
| 03/27/2001 | US6208674 Laser chamber with fully integrated electrode feedthrough main insulator |
| 03/27/2001 | US6208473 Catadioptric projection lens |
| 03/27/2001 | US6208469 Method of adjusting reduction projection exposure device |
| 03/27/2001 | US6208408 Projection exposure apparatus and device manufacturing method |