Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2013
09/18/2013CN103309155A Colored curable resin composition
09/18/2013CN103309154A Photosensitive resin composition, color filter, display device, photo-polymerization initiator and compound
09/18/2013CN103309153A Optical waveguide forming epoxy resin composition, curable film formed from the epoxy resin composition for formation of optical waveguide, and light transmission flexible printed board
09/18/2013CN103309152A Resist pattern formation method, pattern formation method, solar cell and positive resist composition
09/18/2013CN103309017A Fourier transformation objective lens
09/18/2013CN103308977A Bandwidth-controllable fiber grating inscription method and device
09/18/2013CN103307986A Two-DOF (degree of freedom) heterodyne grating interferometer displacement measurement system
09/18/2013CN103307983A Wafer edge exposure process detecting method
09/18/2013CN103304812A Cured resin, red photoresist and color filter, as well as preparation methods and color display devices thereof
09/18/2013CN103304811A Cured resin, blue photoresist and color filter, as well as preparation methods and color display devices thereof
09/18/2013CN103304810A Cured resin, green photoresist and color filter, as well as preparation methods and color display devices thereof
09/18/2013CN103304521A Molecular glass photoresist of taking tetraphenyl furan, tetraphenyl pyrrole, tetraphenylthiophene and quinary phenylpyridine as cores
09/18/2013CN103304385A Molecular glass photoresist containing bisphenol A skeleton structure as well as preparation method and application thereof
09/18/2013CN103303020A Konjak gulcomannan printing thin film and preparation method thereof
09/18/2013CN103302939A Self-cleaning structure and manufacturing method thereof
09/18/2013CN102629073B Nano grating mask preparation method for surface plasma photoetching
09/18/2013CN102621826B Synchronous control system of step scanning photoetching machine based on VME (Virtual Mobile Engine) bus and synchronous control method thereof
09/18/2013CN102566258B Double imprint method
09/18/2013CN102566011B Projection optical system
09/18/2013CN102565904B Method for preparing large-size grating by utilizing grating imaging scan lithography
09/18/2013CN102540386B Elastic supporting device for moving mirror
09/18/2013CN102520587B Two-workpiece-platform rotary exchange method and device based on cable-box anti-rotation mechanisms
09/18/2013CN102508414B Rotary exchanging method and rotary exchanging device for double workpiece platforms based on synchronous steering of turntable gear
09/18/2013CN102495529B Lintel type dual-guide rail dual-drive stepping scanning double silicon wafer stage exchanging device and method thereof
09/18/2013CN102495527B Double work-piece stage exchanging device based on single/double drive stepping scanning, and method thereof
09/18/2013CN102402133B Double-workpiece-platform same-phase rotation exchange method based on parallel connection mechanisms, and device thereof
09/18/2013CN102402122B Mask aligner light leakage detection method and system
09/18/2013CN102393608B Double workpiece table revolution exchanging method and device based on self rotating direction adjustment of measurement positions
09/18/2013CN102298272B Automatic axial positioning locking device for chip gripper in lithography machine during chip feeding
09/18/2013CN102225389B Capacitance type ultrasonic transducer and manufacturing method thereof
09/18/2013CN102208335B Method and apparatus for template surface treatment, and pattern forming method
09/18/2013CN102193326B Proximity exposure device, carrying stage temperature control method and manufacturing method for panel substrate
09/18/2013CN102193308B Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks
09/18/2013CN102096329B Lithographic apparatus and surface cleaning method
09/18/2013CN102026967B 锍盐引发剂 Sulfonium salt initiator
09/18/2013CN101910951B Scanning EUV interference imaging for extremely high resolution
09/18/2013CN101884014B Imageable elements with components having 1h-tetrazole groups
09/18/2013CN101620380B Resin convex mould for relief printing and method for producing organic EL elements using the same
09/18/2013CN101620376B Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device
09/18/2013CN101504931B Manufacturing method of semiconductor device
09/18/2013CN101080674B Composition for forming antireflection film, layered product, and method of forming resist pattern
09/17/2013US8539395 Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
09/17/2013US8537460 Reflective optical element and EUV lithography appliance
09/17/2013US8537331 Exposure apparatus and method for manufacturing device
09/17/2013US8537185 Laser induced thermal imaging apparatus and fabricating method of organic light emitting diode using the same
09/17/2013US8536242 Photocurable composition
09/17/2013US8535874 Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same
09/17/2013US8535872 Thermally cured underlayer for lithographic application
09/17/2013US8535871 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer
09/17/2013US8535870 Organic pigments for colour filters
09/17/2013US8535869 Sulfonium salt, resist composition, and patterning process
09/17/2013US8535868 Positive resist composition and method of forming resist pattern
09/17/2013US8535857 Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor
09/17/2013US8535856 Lithographic mask and manufacturing method thereof
09/17/2013US8535853 Holographic sensor
09/12/2013WO2013134395A1 Method of developing a lithographic printing plate including dual post treatment
09/12/2013WO2013134104A2 Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
09/12/2013WO2013133700A1 Method for removing a high definition nanostructure, a partly freestanding layer, a sensor comprising said layer and a method using said sensor
09/12/2013WO2013133668A1 Electrode substrate, input device and display device comprising same, and production method therefor
09/12/2013WO2013133396A1 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition
09/12/2013WO2013133392A1 Positive photosensitive resin composition, partition wall and optical element
09/12/2013WO2013133389A1 Colored composition, colored photosensitive composition, color filter and liquid crystal display device equipped with same, organic el display device, and solid-state image sensor
09/12/2013WO2013133321A1 Mask, mask unit, exposure device, substrate treatment apparatus and method for manufacturing device
09/12/2013WO2013133250A1 Copolymer for lithography and method for manufacturing same, resist composition, and method for manufacturing substrate
09/12/2013WO2013133230A1 Photoresist composition, method for forming resist pattern, polymer and compound
09/12/2013WO2013133088A1 Composition for forming highly adhesive resist underlayer film
09/12/2013WO2013131834A1 Illumination optics for euv projection lithography and optical system having such an illumination optics
09/12/2013WO2013131706A1 Radiation source and lithographic apparatus
09/12/2013WO2013131525A1 A method for manufacturing a tool part for an injection molding process, a hot embossing process, a nano-imprint process, or an extrusion process
09/12/2013WO2013131479A1 Poly(p-hydroxy styrene) derivate containing sulfonium salt photo-acid generator group, synthesis process and use thereof
09/12/2013US20130236838 Substrate processing apparatus, substrate processing method, and storage medium
09/12/2013US20130236837 Method for forming a resist pattern and a method for processing a substrate utilizing the method for forming a resist pattern
09/12/2013US20130236836 Multiple patterning process for forming trenches or holes using stitched assist features
09/12/2013US20130236835 Single field zero mask for increased alignment accuracy in field stitching
09/12/2013US20130236834 Carbon nanotube slurry, method for making the same, and method for making cathod emitter using the same
09/12/2013US20130236833 Coating compositions
09/12/2013US20130236832 Acid generator, chemically amplified resist composition, and patterning process
09/12/2013US20130236817 Fabrication of high efficiency, high quality, large area diffractive waveplates and arrays
09/12/2013US20130236149 Optical waveguide forming epoxy resin composition, curable film formed from the epoxy resin composition for formation of optical waveguide, and light transmission flexible printed board
09/12/2013US20130235363 Device-specific markings
09/12/2013US20130235362 Exposure apparatus
09/12/2013US20130235361 Lithographic Method and Apparatus
09/12/2013US20130235360 Lithographic Method to Apply a Pattern to a Substrate and Lithographic Apparatus
09/12/2013US20130235359 Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
09/12/2013US20130235358 Lithographic apparatus and device manufacturing method
09/12/2013US20130235357 System and Method for Particle Control Near A Reticle
09/12/2013US20130235316 Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer
09/12/2013US20130235119 Photosensitive negative resin composition
09/12/2013US20130234302 Semiconductor structure and fabrication method
09/12/2013US20130233826 Composition for forming resist underlayer film, and pattern-forming method
09/12/2013US20130233825 Composition for forming resist underlayer film and pattern-forming method
09/12/2013DE102012216532A1 Optical system for microlithographic projection exposure system for manufacturing e.g. LCD, has lenses arranged such that angle of incidences of light beam with respect to optical axis at respective locations of lenses have opposite signs
09/12/2013DE102012206150B3 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage An optical system, in particular of a microlithographic projection exposure apparatus
09/12/2013DE102012203716A1 Illumination optics for extreme UV projection lithography to guide illuminating light to lighting field, has channel guiding light sub beams, where difference between run times of sub beams is greater than coherence duration of light
09/12/2013DE102012203633A1 Spiegel für den EUV-Wellenlängenbereich, Herstellungsverfahren für einen solchen Spiegel und Projektionsbelichtungsanlage mit einem solchen Spiegel Mirror for the EUV wavelength range, manufacturing process for such a mirror and projection exposure system with such a mirror
09/12/2013DE102011075465B4 Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage Projection objective of a microlithography projection exposure apparatus
09/11/2013EP2637063A2 Pattern forming method
09/11/2013EP2637062A2 Pattern forming method
09/11/2013EP2637061A1 Exposure apparatus, exposure method and method for producing a device
09/11/2013EP2636526A1 Printing device using endless belt-shaped printing plate, printing method thereof, and method for attaching belt-shaped printing plate
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