| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/17/2001 | US6218077 Exposure a substrate to energy source ; changing depth of focus |
| 04/17/2001 | US6218076 Stabilizer for organic borate salts and photosensitive composition containing the same |
| 04/17/2001 | US6218075 Photosensitive lithographic printing plate |
| 04/17/2001 | US6218074 Flexible, flame-retardant, aqueous-processable photoimageable composition for coating flexible printed circuits |
| 04/17/2001 | US6218073 Heat sensitive composition, original plate using the same for lithographic printing plate, and process for preparing printing plate |
| 04/17/2001 | US6218069 Photosensitive resin composition and making process |
| 04/17/2001 | US6218068 Irradiating light and heat transfer material to fix image |
| 04/17/2001 | US6218060 Electron beam exposure method and electron beam exposure apparatus |
| 04/17/2001 | US6218057 Radiating a patterned mask; development |
| 04/17/2001 | US6218056 Light exposure photoresist for patterning |
| 04/17/2001 | US6217987 A solder resist comprises an acrylate of novolac type epoxy resin and an imidazole curing agent, has a specific viscosity adjusted with glycol ether comprising diethylene glycol dimethyl ether or dimethyl ether of triethylene glycol |
| 04/17/2001 | US6217984 Organometallic monomers and polymers with improved adhesion |
| 04/17/2001 | US6217657 Resist processing system having process solution deaeration mechanism |
| 04/17/2001 | US6217319 Semiconductor manufacturing device and method of processing wafer |
| 04/17/2001 | US6216873 SMIF container including a reticle support structure |
| 04/12/2001 | WO2001026421A1 Disposable hearing aid tip designs |
| 04/12/2001 | WO2001026134A1 Array of multiple charged particle beamlet emitting columns |
| 04/12/2001 | WO2001026101A1 Patterned high density magnetic recording medium and production method therefor |
| 04/12/2001 | WO2001025855A1 Photomask including hardened photoresist and a conductive layer |
| 04/12/2001 | WO2001025854A1 Method for forming pattern |
| 04/12/2001 | WO2001025853A1 Photosensitive composition |
| 04/12/2001 | WO2001025852A1 Trimming mask with semitransparent phase-shifting regions |
| 04/12/2001 | WO2001025341A1 A method for synthesizing polymeric azo dyes |
| 04/12/2001 | WO2001025340A1 Modified pigments having steric and amphiphilic groups |
| 04/12/2001 | WO2001025314A1 Self-dispersible epoxide/surfactant coating compositions |
| 04/12/2001 | WO2001001447A9 Discharge lamp |
| 04/12/2001 | WO2000012123A3 Method and measuring device for determining a plurality of analytes in a sample |
| 04/12/2001 | US20010000240 Shrinking integrated circuit designs using a two mask process: a phase shift mask and a single phase structure mask; prevention of erasure of phase shifting regions and the creation of undesirable artifact regions; minimization |
| 04/12/2001 | DE19945140A1 Verfahren zur Herstellung einer Maskenschicht mit Öffnungen verkleinerter Breite A process for producing a mask layer with a reduced width openings |
| 04/12/2001 | DE10042294A1 Zusammensetzung für die thermische Bildaufzeichnung, Element, das einen sulfonierten IR-Farbstoff enthält sowie Verfahren zur Bildaufzeichnung und zum Drucken von Bildern Composition for thermal imaging, element containing a sulfonated IR dye, and methods for imaging and printing images |
| 04/12/2001 | DE10028426A1 Manufacture of three-dimensional structure using coarse structure with recesses having edges inclined at angle between 0 and 90 degrees |
| 04/11/2001 | EP1091396A2 Plasma processing method |
| 04/11/2001 | EP1091386A2 Illumination system for electron beam lithography tool |
| 04/11/2001 | EP1091385A1 Electron-beam lithography system and alignment method |
| 04/11/2001 | EP1091383A2 Electron beam imaging apparatus |
| 04/11/2001 | EP1091256A1 Alignment method and semiconductor exposure method |
| 04/11/2001 | EP1091254A2 Resist stripping composition |
| 04/11/2001 | EP1091253A2 Plate making process for planographic plate, automatic developing apparatus and recording medium |
| 04/11/2001 | EP1091252A2 Lithographic method and apparatus |
| 04/11/2001 | EP1091251A2 Lithographic printing plate precursor |
| 04/11/2001 | EP1091250A1 Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same |
| 04/11/2001 | EP1091249A1 Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same |
| 04/11/2001 | EP1091248A1 Postive-working resist composition |
| 04/11/2001 | EP1091247A2 Photopolymerizable composition |
| 04/11/2001 | EP1091230A2 Projection optical system that projects an image of a pattern formed on a reticle onto a substrate |
| 04/11/2001 | EP1090332A1 Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders |
| 04/11/2001 | EP1090331A1 193 nm positive-working photoresist composition |
| 04/11/2001 | EP1090330A2 A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| 04/11/2001 | EP1090268A1 Interferometer |
| 04/11/2001 | EP1089884A1 Method and apparatus for manufacturing cylindrical articles |
| 04/11/2001 | EP1089871A1 Directed energy assisted in vacuo micro embossing |
| 04/11/2001 | EP1089799A1 Apparatus and method for recovering photoresist developers and strippers |
| 04/11/2001 | EP1066123A4 Improvement in aqueous stripping and cleaning compositions |
| 04/11/2001 | EP0948553B1 Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom |
| 04/11/2001 | EP0948552B1 Method for producing a water insoluble, aqueous alkali soluble novolak resin |
| 04/11/2001 | EP0904568B1 Metal ion reduction of aminoaromatic chromophores and their use in the synthesis of low metal bottom anti-reflective coatings for photoresists |
| 04/11/2001 | EP0823073B1 Illumination unit for an optical apparatus |
| 04/11/2001 | CN1291347A Photoresist film removing method and device therefor |
| 04/11/2001 | CN1291302A Photosensitive resin composition |
| 04/11/2001 | CN1291301A Positive active photodielectric composition |
| 04/11/2001 | CN1291289A Color filter and method of manufacture thereof |
| 04/11/2001 | CN1291135A Direct write imaging medium |
| 04/11/2001 | CN1290960A Electronic beam writing method, electronic beam etching equipment and its mask thereof |
| 04/11/2001 | CN1290713A Organic anti-reflection paint polymer and its preparing method |
| 04/10/2001 | US6215896 System for enabling the real-time detection of focus-related defects |
| 04/10/2001 | US6215808 Laser apparatus, exposure apparatus, lithography system, method for producing circuit elements, gas supply system and gas supply method |
| 04/10/2001 | US6215642 Vacuum compatible, deformable electrostatic chuck with high thermal conductivity |
| 04/10/2001 | US6215578 Electronically switchable off-axis illumination blade for stepper illumination system |
| 04/10/2001 | US6215546 Method of optical correction for improving the pattern shrinkage caused by scattering of the light |
| 04/10/2001 | US6215545 Substrate processing apparatus |
| 04/10/2001 | US6215387 Thick film low value high frequency inductor |
| 04/10/2001 | US6215269 Method of exposing a path on a curved, or otherwise irregularly shaped, surface |
| 04/10/2001 | US6215247 Construction of electrode for high pressure discharge lamp and process for producing the same |
| 04/10/2001 | US6215128 Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| 04/10/2001 | US6215127 Method of using critical dimension mapping to qualify a new integrated circuit fabrication tool set |
| 04/10/2001 | US6215099 Multi-Laser Combustion surface treatment |
| 04/10/2001 | US6214721 Method and structure for suppressing light reflections during photolithography exposure steps in processing integrated circuit structures |
| 04/10/2001 | US6214637 Method of forming a photoresist pattern on a semiconductor substrate using an anti-reflective coating deposited using only a hydrocarbon based gas |
| 04/10/2001 | US6214528 Method of forming mother for use in optical disc |
| 04/10/2001 | US6214527 Photosensitive conductor paste |
| 04/10/2001 | US6214526 Semiconductor processing using antireflective layer having high wet etch rate |
| 04/10/2001 | US6214524 Integrated circuit prepared with a step for neutralization of excess acids generated by photoacid generator after photolithography by exposing developed photoresist to amine, aldehyde, amide, or nitrogen; by-product inhibition |
| 04/10/2001 | US6214522 Photopolymerizable polyurethane resin comprising a polyether diol reacted with diisocyanate and having acrylated end groups, an monomer and photoinitiator; flexography |
| 04/10/2001 | US6214521 Laser recordable optical media including a crosslinkable layer comprising an unsaturated monomer, a photoinitiator, a partially or fully hydrolyzed polyvinyl alcohol binder and polymeric filler particles |
| 04/10/2001 | US6214520 Thermal transfer element for forming multilayer devices |
| 04/10/2001 | US6214518 Negative type image recording material and method of plate-making using the same |
| 04/10/2001 | US6214517 Photoresist having an ester moiety and hydrolyzable groups together with an acid generator; ultramicro lithography, integrated circuits |
| 04/10/2001 | US6214516 Photosensitive resin compositions |
| 04/10/2001 | US6214496 Method for reducing corner rounding in mask fabrication utilizing elliptical energy beam |
| 04/10/2001 | US6214495 Phase mask for processing optical fibers and method of manufacturing the same |
| 04/10/2001 | US6214494 Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability |
| 04/10/2001 | US6214441 Use of wee (water edge exposure) to prevent polyimide |
| 04/10/2001 | US6214104 Coating solution for forming silica coating and method of forming silica coating |
| 04/10/2001 | US6213610 Catoptric reduction projection optical system and exposure apparatus and method using same |
| 04/10/2001 | US6213607 Exposure apparatus and field stop thereof |
| 04/10/2001 | US6213443 Anti-vibration apparatus and exposure apparatus using the same |
| 04/10/2001 | US6212789 Semiconductor device manufacturing system |
| 04/10/2001 | CA2126015C Resist materials |
| 04/10/2001 | CA1341214C Stereolithographic beam profiling |
| 04/05/2001 | WO2001024327A1 Very narrow band injection seeded f2 lithography laser |