| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/25/2001 | EP1094350A2 Optical projection lens system |
| 04/25/2001 | EP1094095A1 Surface tension reduction with n,n,n'-trialkyl ureas |
| 04/25/2001 | EP1094040A2 Silica glass optical material for excimer laser and excimer lamp, and method for producing the same |
| 04/25/2001 | EP1093562A1 Machine vision and semiconductor handling |
| 04/25/2001 | EP1093480A1 Polycyclic copolymer compositions |
| 04/25/2001 | EP1093417A1 Processless direct write imaging member containing polymer grafted carbon and methods of imaging and printing |
| 04/25/2001 | EP0753550B1 Conductive coating composition |
| 04/25/2001 | CN1292892A Process for continuous liquid processing of photosensitive compositions having reduced levels of residues |
| 04/25/2001 | CN1292891A Process for producing photoresist composition having reduced tendency to produce particles |
| 04/25/2001 | CN1292890A A process for making photoactive compound and photoresist therefrom |
| 04/25/2001 | CN1292889A Two-sided imaging material |
| 04/25/2001 | CN1292804A Polymeric films having controlled viscosity response to temp. and shear |
| 04/25/2001 | CN1292556A 介电组合物 Dielectric compositions |
| 04/25/2001 | CN1292508A 感光性平版印刷版 Photosensitive lithographic printing plate |
| 04/25/2001 | CA2323324A1 Mercury short-arc lamp |
| 04/24/2001 | US6223139 Kernel-based fast aerial image computation for a large scale design of integrated circuit patterns |
| 04/24/2001 | US6222936 Apparatus and method for reducing defects in a semiconductor lithographic process |
| 04/24/2001 | US6222666 Electro-optic modulator and imaging device |
| 04/24/2001 | US6222615 Exposure control apparatus and method |
| 04/24/2001 | US6222614 Exposure elements with a cable-relaying support |
| 04/24/2001 | US6222610 Exposure apparatus |
| 04/24/2001 | US6222609 Reduction projection aligner free from reaction product tarnishing photo-mask and method for transferring pattern image through the photo-mask |
| 04/24/2001 | US6222577 Multiple-beam, diode-pumped imaging system |
| 04/24/2001 | US6221972 Sulfonium group containing epoxy resin |
| 04/24/2001 | US6221818 Hydroxylamine-gallic compound composition and process |
| 04/24/2001 | US6221787 Apparatus and method of forming resist film |
| 04/24/2001 | US6221772 In situ plasma ashing by injecting oxygen and argon |
| 04/24/2001 | US6221680 Patterned recess formation using acid diffusion |
| 04/24/2001 | US6221568 Using mixture of solvent and nonsolvent having specified boiling points |
| 04/24/2001 | US6221567 Disposing etch mask over polymeric acid layer, exposing polymeric acid layer to etchant solutions and to rinse solutions in alternating manner such that polymeric acid layer undergoes at least two etchant and two rinse exposures |
| 04/24/2001 | US6221566 Optical waveguide photosensitization |
| 04/24/2001 | US6221562 Resist image reversal by means of spun-on-glass |
| 04/24/2001 | US6221561 Diffusion plate and method for manufacturing master die thereof |
| 04/24/2001 | US6221558 Anti-reflection oxynitride film for polysilicon substrates |
| 04/24/2001 | US6221553 Contacting receptor with thermal transfer element having substrate and transfer layer, transfer layer including multicomponent transfer unit, selectively heating transfer element to transfer multicomponent transfer unit to receptor |
| 04/24/2001 | US6221541 Photolithography; preparing masks having segment patterns corresponding to fan-shapes particularly suitable for manufacture of a diffractive optical element for use in an optical system |
| 04/24/2001 | US6221540 Marking; illuminating grid with light source |
| 04/24/2001 | US6221539 Mask pattern correction method and a recording medium which records a mask pattern correction program |
| 04/24/2001 | US6221536 Material exhibiting compensation for polymerization-induced shrinkage and recording medium formed therefrom |
| 04/24/2001 | US6221535 Mixture of a charge transport matrix and electrooptic dye |
| 04/24/2001 | US6221162 Apparatus for forming a resist layer over an electroconductive substrate |
| 04/24/2001 | US6220914 Method of forming gated photocathode for controlled single and multiple electron beam emission |
| 04/24/2001 | US6220771 Wafer backside protection apparatus |
| 04/24/2001 | US6220715 Method and device for removing light |
| 04/24/2001 | CA2253272C Processes for preparing thioxanthone and derivatives thereof |
| 04/24/2001 | CA2055833C Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin and photosensitive composition comprising the same |
| 04/19/2001 | WO2001028048A2 Energy control for an excimer or molecular fluorine laser |
| 04/19/2001 | WO2001027986A1 Method and device for treating surfaces of objects |
| 04/19/2001 | WO2001027979A1 Reference wafer for controlling accuracy and method for producing the same, aligner, and method for fabricating device |
| 04/19/2001 | WO2001027978A1 Substrate, stage device, method of driving stage, exposure system and exposure method |
| 04/19/2001 | WO2001027697A1 Composite relief image printing elements |
| 04/19/2001 | WO2001027696A1 Uv-absorbing support layers and flexographic printing elements comprising same |
| 04/19/2001 | WO2001027695A2 Removable cover for protecting a reticle, system including and method of using the same |
| 04/19/2001 | WO2001027182A1 High photo-sensitivity curable resin, photo-curable resin composition, production method thereof, color filter and liquid crystal display panel |
| 04/19/2001 | WO2001026886A1 Electromagnetic radiation absorbant crystals of lithium niobate and lithium tantalate and methods of preparing the same |
| 04/19/2001 | WO2000033121A9 Microlens structure having two anamorphic surfaces on opposing ends of a single high index substrate and method of fabricating the same |
| 04/19/2001 | DE19945425A1 Structuring a metal layer during semiconductor finishing comprises applying a lacquer layer to a semiconductor substrate, structuring and producing an etching mask and structuring the metal layer using the mask |
| 04/19/2001 | DE19945144A1 Wartezeitabhängige Korrektur für lithographische Maskenbelichtung Waiting time dependent correction for lithographic mask exposure |
| 04/19/2001 | DE10050636A1 Process for surface treating silicon wafers comprises preparing a treatment device, producing a foam by blowing a gas into a liquid containing a surfactant |
| 04/18/2001 | EP1093024A1 An aqueous developer for lithographic printing plates |
| 04/18/2001 | EP1093023A1 Photoresist developer compositions containing alkylated aminoalkylpiperazine surfactants |
| 04/18/2001 | EP1093022A2 Lithographic projection apparatus |
| 04/18/2001 | EP1093021A2 Projection optical system as well as equipment and methods making use of said system |
| 04/18/2001 | EP1093020A2 Composite photosensitive element |
| 04/18/2001 | EP1093019A1 Process for forming a colored image having a dominant attribute |
| 04/18/2001 | EP1093018A2 Analog and digital proofing image |
| 04/18/2001 | EP1093017A2 Method and apparatus for reticle inspection using aerial imaging |
| 04/18/2001 | EP1092740A1 Ultraviolet curable resin compositions having enhanced shadow cure properties |
| 04/18/2001 | EP1092739A1 Epoxy resin composition and uses thereof |
| 04/18/2001 | EP1092175A1 Lighting system for microlithography, comprising a depolarizer |
| 04/18/2001 | EP1092174A1 Photocurable elastomeric compositions |
| 04/18/2001 | EP1091998A1 Photo-curable polymer composition and flexographic printing plates containing the same |
| 04/18/2001 | EP0968250B1 Soluble chromophores having improved solubilising groups |
| 04/18/2001 | EP0942937B1 Photoinitiator mixtures containing acylphosphinoxides and benzophenone derivatives |
| 04/18/2001 | EP0929841A4 Method for forming photoresist features having reentrant profiles using a basic agent |
| 04/18/2001 | EP0807280B1 Pressure developer apparatus |
| 04/18/2001 | CN1292103A Improved pattern generator |
| 04/18/2001 | CN1292102A Pattern generator with EUV |
| 04/18/2001 | CN1292002A Polycyclic resist composition with increased etch resistance |
| 04/17/2001 | US6219400 X-ray optical system and X-ray exposure apparatus |
| 04/17/2001 | US6219368 Beam delivery system for molecular fluorine (F2) laser |
| 04/17/2001 | US6219367 Method for determining life of laser light source |
| 04/17/2001 | US6219171 Apparatus and method for stepper exposure control in photography |
| 04/17/2001 | US6219154 Exposure control technique for imagesetting applications |
| 04/17/2001 | US6219081 Image forming apparatus |
| 04/17/2001 | US6218704 ESD protection structure and method |
| 04/17/2001 | US6218674 Electron beam projection exposure apparatus |
| 04/17/2001 | US6218671 On-line dynamic corrections adjustment method |
| 04/17/2001 | US6218482 Epoxy resin, process for preparing the resin and photo-curable resin composition and resin composition for powder coatings containing the epoxy resin |
| 04/17/2001 | US6218313 Process for producing semiconductor device, apparatus for optimizing film thickness, and process for optimizing film thickness |
| 04/17/2001 | US6218200 Multi-layer registration control for photolithography processes |
| 04/17/2001 | US6218090 Imagewise exposure; etching; exposure to electron beam radiation; development |
| 04/17/2001 | US6218089 Photolithographic method |
| 04/17/2001 | US6218087 Using mixture |
| 04/17/2001 | US6218086 In thin film, using tip; process control |
| 04/17/2001 | US6218085 Stripping using hydrogen and oxygen |
| 04/17/2001 | US6218084 Etching; overcoating with polymer; covering with photoresist; plasma etching |
| 04/17/2001 | US6218083 Patternwise exposure to radiation |
| 04/17/2001 | US6218082 Method for patterning a photoresist |
| 04/17/2001 | US6218079 Forming metal wiring |