| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/08/2001 | US6228512 Amorphous layer of molybdenum, ruthenium and crystalline beryllium; multilayer mirrors |
| 05/08/2001 | US6227926 Construction of electrode for high pressure discharge lamp and process for producing the same |
| 05/05/2001 | CA2324850A1 A machine for exposing a panel to laser radiation |
| 05/03/2001 | WO2001031678A1 Method and radiation generating system using microtargets |
| 05/03/2001 | WO2001031404A1 Using block copolymers as supercritical fluid developable photoresists |
| 05/03/2001 | WO2001031403A1 Ionic lithography method, implementing equipment and reticle for such equipment |
| 05/03/2001 | WO2001031402A1 Method for the production of nanometer range surface decorated substrates |
| 05/03/2001 | WO2001031401A1 Self-processing of diffractive optical components in hybrid sol-gel glasses |
| 05/03/2001 | WO2001030725A2 Diisopropylbenzene solvent for developing flexographic printing plates |
| 05/03/2001 | US20010000744 Thermal transfer element and process for forming organic electroluminescent devices |
| 05/03/2001 | DE10036867A1 Method for processing substrate, e.g. semiconductor wafer comprises arranging substrate in processing vessel, forming layer of solvent over surface of substrate, and dissolving an operating gas in layer of solvent |
| 05/03/2001 | CA2324913A1 A device for measuring relative position error |
| 05/03/2001 | CA2324893A1 A device for transferring and supporting panels |
| 05/02/2001 | EP1096551A2 Method for making integrated circuits having features with reduced critical dimensions |
| 05/02/2001 | EP1096321A1 Light exposure method |
| 05/02/2001 | EP1096320A2 Contact exposure device provided with a mask and workpiece interval setting means |
| 05/02/2001 | EP1096319A1 Positive-working photoresist composition |
| 05/02/2001 | EP1096318A1 Resist composition and patterning process |
| 05/02/2001 | EP1096317A1 Resist composition and patterning process |
| 05/02/2001 | EP1096316A1 Positive resist composition |
| 05/02/2001 | EP1096315A1 Negative-type image recording material and precursor for negative-type lithographic printing plate |
| 05/02/2001 | EP1096314A1 Lithographic printing plate precursor |
| 05/02/2001 | EP1096313A1 Active particle, photosensitive resin composition, and process for forming pattern |
| 05/02/2001 | EP1095393A2 System and method to correct for distortion caused by bulk heating in a substrate |
| 05/02/2001 | EP1095346A1 Two-dimensional to three-dimensional vlsi design |
| 05/02/2001 | EP1095315A1 Method for decontaminating microlithography projection lighting devices |
| 05/02/2001 | EP1095314A1 Method and apparatus for coating a solution onto a substrate |
| 05/02/2001 | EP1095313A1 Photopolymerizable thermosetting resin compositions |
| 05/02/2001 | EP1095310A1 A reflection system for imaging on a nonplanar substrate |
| 05/02/2001 | EP1095304A1 Multiplexer for laser lithography |
| 05/02/2001 | EP1078926A9 Pyran derivatives |
| 05/02/2001 | EP0968458A4 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars |
| 05/02/2001 | EP0804753B1 Method of developing positive photoresist and developing compositions therefor |
| 05/02/2001 | CN1293822A Projection optical system, method for producing the same, and projection exposure apparatus using the same |
| 05/02/2001 | CN1293772A Positively photosensitive resin composition |
| 05/02/2001 | CN1293534A Transmission belt type vacuum applicator and coating method of printing circuit board anti-corrosion drying film |
| 05/02/2001 | CN1293451A Charged particle beam photoetching device and photoetching process of charged particle beam |
| 05/02/2001 | CN1293450A Electron beam exposure method and mask used and electron beam exposure system |
| 05/02/2001 | CN1293383A Water-dispersible negative photosensitive composition |
| 05/02/2001 | CN1293221A Using N,N,N'-trialkylurea to reduce surface tension |
| 05/02/2001 | CN1293218A Epoxy resin composition, adhesive film and preimpregnatel blank and multilayer printing circuit board |
| 05/02/2001 | CN1065178C Process for producing three-dimensional object |
| 05/02/2001 | CA2324910A1 "a device for generating a plurality of laser beams" |
| 05/01/2001 | US6226781 Modifying a design layer of an integrated circuit using overlying and underlying design layers |
| 05/01/2001 | US6226354 Short-wavelength electromagnetic-radiation generator |
| 05/01/2001 | US6226346 Reflective optical imaging systems with balanced distortion |
| 05/01/2001 | US6226133 Optical apparatus and a method of transporting the same |
| 05/01/2001 | US6226131 Apparatus and method for fabricating a lenticular plate |
| 05/01/2001 | US6226128 Light-transmitting optical member, manufacturing method thereof, evaluation method therefor, and optical lithography apparatus using the optical member |
| 05/01/2001 | US6226110 Method and apparatus for holographically recording an essentially periodic pattern |
| 05/01/2001 | US6226087 Method for measuring the positions of structures on a mask surface |
| 05/01/2001 | US6226075 Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporting devices |
| 05/01/2001 | US6226074 Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devices |
| 05/01/2001 | US6226073 Stage system with driving mechanism, and exposure apparatus having the same |
| 05/01/2001 | US6226072 Stage system and exposure apparatus with the same |
| 05/01/2001 | US6225625 Signal detection methods and apparatus |
| 05/01/2001 | US6225476 Acrylic ester compound having alkoxycarbonyl group or group derived from molecule of lactone compound by removing hydrogen atom bonded to carbon atom; monomer of film-forming resin |
| 05/01/2001 | US6225389 Includes an epoxy oligomer and/or urethane oligomer having at least two ethylenically unsaturated moieties, at least one alkoxylated polyol monomer capable of being copolymerized with the oligomer, sugar surfactant; water washable |
| 05/01/2001 | US6225219 Method of stabilizing anti-reflection coating layer |
| 05/01/2001 | US6225215 Method for enhancing anti-reflective coatings used in photolithography of electronic devices |
| 05/01/2001 | US6225134 Method of controlling linewidth in photolithography suitable for use in fabricating integrated circuits |
| 05/01/2001 | US6225034 Photoresist stripping liquid compositions and a method of stripping photoresists using the same |
| 05/01/2001 | US6225033 In which slits having a rectangular cross section can be formed and the exposure dose and the focusing margin can be sufficiently large. |
| 05/01/2001 | US6225031 That avoids introducing dimensional changes and does not adversely impact the dimensional stability |
| 05/01/2001 | US6225030 Post-ashing treating method for substrates |
| 05/01/2001 | US6225027 Ondenser collects radiation, here soft x-rays, and couples it to the ringfield of a camera designed for projection lithography. |
| 05/01/2001 | US6225026 Printing stencil and a method for preparation thereof |
| 05/01/2001 | US6225025 Fabrication process of a semiconductor device by electron-beam lithography |
| 05/01/2001 | US6225020 Such as used in 4 g or 16 g dram semiconductor devices using a light source such as arf, an e-beam, euv, or an ion beam, photoresist for the top surface image (tsi) process using silylation, maleimide andnorbonene carboxylate comonomers, |
| 05/01/2001 | US6225019 Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method |
| 05/01/2001 | US6225013 Stitching design rules for forming interconnect layers |
| 05/01/2001 | US6225012 Method for positioning substrate |
| 05/01/2001 | US6225011 Method for manufacturing semiconductor devices utilizing plurality of exposure systems |
| 05/01/2001 | US6224785 Aqueous ammonium fluoride and amine containing compositions for cleaning inorganic residues on semiconductor substrates |
| 05/01/2001 | US6224735 Process for recording image |
| 05/01/2001 | US6224730 Field emission display having black matrix material |
| 05/01/2001 | US6224274 Semiconductor processing apparatus |
| 05/01/2001 | US6224273 Process and device for the continuous separation of the constituents of an engraving bath |
| 05/01/2001 | US6224248 Light-source device and exposure apparatus |
| 05/01/2001 | CA2016547C Photocurable pigmented secondary optical fiber coatings |
| 04/26/2001 | WO2001030122A1 Production of a dense mist of micrometric droplets in particular for extreme uv lithography |
| 04/26/2001 | WO2001029942A1 Energy stabilized gas discharge laser |
| 04/26/2001 | WO2001029939A1 Single chamber gas discharge laser with line narrowed seed beam |
| 04/26/2001 | WO2001029879A2 Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing |
| 04/26/2001 | WO2001029845A1 Integral lens for high energy particle flow, method for producing such lenses and use thereof in analysis devices and devices for radiation therapy and lithography |
| 04/26/2001 | WO2001029620A1 Apparatus and methods for development of resist patterns |
| 04/26/2001 | WO2001029619A1 Reticle, wafer and method for determining an alignment error in a stepper |
| 04/26/2001 | WO2001029618A1 Method for determining rotational error portion of total misali gnment error in a stepper |
| 04/26/2001 | WO2001029617A1 Reticle, wafer, measuring stepper and methods for preventative maintenance |
| 04/26/2001 | WO2001029616A1 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon |
| 04/26/2001 | WO2001029615A1 Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form |
| 04/26/2001 | WO2001029284A1 Novel composition for selective etching of oxides over metals |
| 04/26/2001 | WO2001029093A1 Photoinitiator formulations |
| 04/26/2001 | WO2001028950A1 A method and apparatus for treating a substrate with an ozone-solvent solution |
| 04/26/2001 | US20010000515 Forming planarization film on substrate that does not smoke or fume on heating by applying polymeric solution including novolac resin, a surfactant selected from nonfluorinated hydrocarbon, fluorinated hydrocarbon and combinations, heating |
| 04/26/2001 | DE10045014A1 Verfahren zur Herstellung eines diffusions-resistenten Linsen-Elementes A process for the preparation of a diffusion-resistant lens element |
| 04/26/2001 | DE10028019A1 Photo mask for semiconductor device manufacture, has comparison-on mask and test-on mask patterns of same shape, arranged adjacently on mask top photoengraving process test mask area of photo mask substrate |
| 04/25/2001 | EP1094366A1 Method for optical proximity correction |
| 04/25/2001 | EP1094365A1 Photoimageable composition containing flexible oligomer |
| 04/25/2001 | EP1094364A1 Photoimageable composition having photopolymerizeable binder oligomer |