| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/16/2001 | CN1295021A System for conveying and supporting sheets |
| 05/16/2001 | CN1065971C Organic base catalytic non-developing gas-phase photoresist |
| 05/15/2001 | USRE37179 Radiation sensitive resin composition |
| 05/15/2001 | US6233494 Method of measuring overlay offset |
| 05/15/2001 | US6233306 X-ray irradiation apparatus including an x-ray source provided with a capillary optical system |
| 05/15/2001 | US6233056 Interferometric at-wavelength flare characterization of EUV optical systems |
| 05/15/2001 | US6233044 Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns |
| 05/15/2001 | US6233042 Projection exposure apparatus and device manufacturing method using the same |
| 05/15/2001 | US6233041 Exposure method utilizing diffracted light having different orders of diffraction |
| 05/15/2001 | US6233040 Exposure apparatus with setting of stage driving in accordance with type of motion of stage and device manufacturing method |
| 05/15/2001 | US6233039 Optical illumination system and associated exposure apparatus |
| 05/15/2001 | US6232992 Thermal imaging apparatus and method for material dispensing and applicating |
| 05/15/2001 | US6232639 Method and structure to reduce latch-up using edge implants |
| 05/15/2001 | US6232615 Lithographic projection apparatus with improved substrate holder |
| 05/15/2001 | US6232613 Debris blocker/collector and emission enhancer for discharge sources |
| 05/15/2001 | US6232612 Variable shaped electron beam exposure system and method of writing a pattern by a variable shaped electron beam |
| 05/15/2001 | US6232597 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 05/15/2001 | US6232417 Using coordination catalyst |
| 05/15/2001 | US6232361 Derived by combining cycloaliphatic epoxy compound with water compatible epoxides or oxetanes, and water; useful in ink jet, gravure and flexographic printing |
| 05/15/2001 | US6232247 Substrate coating apparatus and semiconductor processing method of improving uniformity of liquid deposition |
| 05/15/2001 | US6232237 Method for fabricating semiconductor device |
| 05/15/2001 | US6232051 Patterning step which is capable of repressing the occurrence of particles and also improves the throughput and the yield during the treatment of exposure to light. |
| 05/15/2001 | US6232048 Ionic bombardment with ionized particles in a direction normal to the planar surface of a resistant substrate. the ionic bombardment causes formation of a hardened ?chemically less reactive? skin on the exposed op surface of the photoresist. |
| 05/15/2001 | US6232046 Irradiating dry photoresist with variable intensity radiation; development |
| 05/15/2001 | US6232042 Microelectronics; resistor on substrate |
| 05/15/2001 | US6232041 Scanning image; forming multicolor computer image |
| 05/15/2001 | US6232040 Method of electron beam exposure utilizing emitter with conductive mesh grid |
| 05/15/2001 | US6232039 Photosensitive composition |
| 05/15/2001 | US6232038 Photosensitive composition, image-forming material and image-forming method employing it |
| 05/15/2001 | US6232034 Lithographic printing plate precursor and method for the preparation of lithographic printing plate employing the same |
| 05/15/2001 | US6232032 Mixture of polybenzoxazole and polyamide |
| 05/15/2001 | US6232031 Mixture of phenolic resin and insoluble o-diazonaphthoquinonecompound |
| 05/15/2001 | US6232023 Contact exposure process and device |
| 05/15/2001 | US6231917 Method of forming liquid film |
| 05/15/2001 | US6231775 Process for ashing organic materials from substrates |
| 05/15/2001 | US6231677 Using mixture of oxalic acid and solvent |
| 05/15/2001 | CA2198952C Catadioptric one-to-one telecentric image combining system |
| 05/10/2001 | WO2001033649A1 Method of producing vertical interconnects between thin film microelectronic devices and products comprising such vertical interconnects |
| 05/10/2001 | WO2001033615A2 Method and apparatus for supercritical processing of multiple workpieces |
| 05/10/2001 | WO2001033613A2 Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| 05/10/2001 | WO2001033558A1 Magnetic pole fabrication process and device |
| 05/10/2001 | WO2001033300A2 High precision orientation alignment and gap control stages for imprint lithography processes |
| 05/10/2001 | WO2001033232A2 Precision stage |
| 05/10/2001 | US20010001056 Mask pattern is transferred onto a wafer by exposure with a mask stage and a wafer stage being moved synchronously |
| 05/10/2001 | US20010000975 Apparatus for enhancing image contrast using intensity filtration |
| 05/10/2001 | US20010000974 Scanning exposure method with reduced time between scans |
| 05/10/2001 | DE19847616C2 Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen Polyvinyl acetals with imido groups and the use thereof in photosensitive compositions |
| 05/10/2001 | DE10054996A1 Resistzusammensetzung des chemischen Verstärkungstyps The resist composition of chemical amplification type |
| 05/10/2001 | DE10046891A1 Photoresist composition for forming semiconductor element, comprises photoresist resin, photoacid generator, photobase generator and organic solvent |
| 05/10/2001 | DE10042626A1 Electron beam photolithography device for IC manufacture uses block mask provided with matrix of rectangular aperture patterns and setting aperture pattern used for setting beam deflector |
| 05/10/2001 | CA2387341A1 Method and apparatus for supercritical processing of multiple workpieces |
| 05/10/2001 | CA2387334A1 Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| 05/09/2001 | EP1098559A1 Transport and holding device for panels |
| 05/09/2001 | EP1098557A1 Laser exposure device for plates |
| 05/09/2001 | EP1098556A1 Device for measuring a positioning error |
| 05/09/2001 | EP1098403A1 Device for processing a plurality of laser beams |
| 05/09/2001 | EP1098359A1 Scanning aligner, method of manufacture thereof, and method of manufacturing device |
| 05/09/2001 | EP1098226A2 Lithographic apparatus with gas flushing system |
| 05/09/2001 | EP1098225A2 Lithographic projection apparatus with purge gas system and method using the same |
| 05/09/2001 | EP1098224A1 Photosensitive printing plate and method of producing the same |
| 05/09/2001 | EP1098223A1 Dry film photopolymerizable compositions |
| 05/09/2001 | EP1098215A1 Catadioptric objective comprising two intermediate images |
| 05/09/2001 | EP1098189A2 Method for detecting an end point for an oxygen free plasma process |
| 05/09/2001 | EP1097811A1 A method for making a lithographic printing plate by a negative working non-ablative process |
| 05/09/2001 | EP1097405A1 Composition for stripping photoresist and organic materials from substrate surfaces |
| 05/09/2001 | EP1097404A1 Projection lens for microlithography |
| 05/09/2001 | EP0975437A4 Black matrix with conductive coating |
| 05/09/2001 | CN1294703A Photosensitive resin compsn. |
| 05/09/2001 | CN1294319A Method for coorecting optical approach effect |
| 05/09/2001 | CN1294318A Optical imaging compsns, contg. flexible low polymer |
| 05/08/2001 | US6229911 Method and apparatus for providing a bioinformatics database |
| 05/08/2001 | US6229871 Projection lithography with distortion compensation using reticle chuck contouring |
| 05/08/2001 | US6229657 Assembly of optical element and mount |
| 05/08/2001 | US6229652 Beryllium carbide interfaces; extreme ultraviolet radiation lithography; optics |
| 05/08/2001 | US6229647 Reflection and refraction optical system and projection exposure apparatus using the same |
| 05/08/2001 | US6229639 Multiplexer for laser lithography |
| 05/08/2001 | US6229618 Method of improving registration accuracy and method of forming patterns on a substrate using the same |
| 05/08/2001 | US6229595 Lithography system and method with mask image enlargement |
| 05/08/2001 | US6229558 Printer, printing system, and printing method using print paper with photosensitive microcapsules applied thereto |
| 05/08/2001 | US6229138 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 05/08/2001 | US6229116 Heat treatment apparatus |
| 05/08/2001 | US6228919 Solvent dispersible interpenetrating polymer networks |
| 05/08/2001 | US6228776 Ashing process by adjusting etching endpoint and orderly stepped positioning silicon wafer |
| 05/08/2001 | US6228740 Method of making an antireflective structure |
| 05/08/2001 | US6228661 Method to determine the dark-to-clear exposure dose for the swing curve |
| 05/08/2001 | US6228564 Method of patterning photoresist using precision and non-precision techniques |
| 05/08/2001 | US6228563 Exposure to plasma activated gas; separation; penetration to vapor phase solvent |
| 05/08/2001 | US6228562 Method for manufacturing recording original disc for optical information recording media |
| 05/08/2001 | US6228561 Film forming method and film forming apparatus |
| 05/08/2001 | US6228560 Photosensitive resin composition and photosensitive element using the same |
| 05/08/2001 | US6228559 Negative working waterless lithographic printing plate precursor |
| 05/08/2001 | US6228558 Blend of polymer and photoacid generator |
| 05/08/2001 | US6228557 Aluminum support; image receiver layer; silver halide emulsion; holding tanks, drive rollers |
| 05/08/2001 | US6228554 Blend of alkali soluble resin and a 1,2-quinonediazide compound |
| 05/08/2001 | US6228552 Alkali soluble resin |
| 05/08/2001 | US6228544 Exposure to radiation flux |
| 05/08/2001 | US6228543 Coupling binder and palsticizer |
| 05/08/2001 | US6228540 Method of forming a photomask of high dimensional accuracy utilizing heat treatment equipment |
| 05/08/2001 | US6228539 Masking; calibration; shrinkage of integrated circuits |
| 05/08/2001 | US6228538 Using photosensitive material |