| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/25/2001 | WO2001037043A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 05/25/2001 | WO2001036901A2 Systems and methods for quantifying nonlinearities in interferometry systems |
| 05/25/2001 | WO2001036578A1 Non-corrosive cleaning composition for removing plasma etching residues |
| 05/25/2001 | WO2001036370A1 Vinylphenylpropionic acid derivatives, processes for production of the derivatives, polymers thereof and radiosensitive resin compositions |
| 05/25/2001 | WO2000041893A8 Thermal transfer element and process for forming organic electroluminescent devices |
| 05/25/2001 | CA2360439A1 Photosensitive composition, and optical waveguide element and process for producing the same |
| 05/24/2001 | US20010001785 A cleaning composition for removing plasma etch residues formed on a substrate which comprises water, atleast one hydroxylammonium inorganic or organic compound, a basic compound and an organic carboxyllic acid |
| 05/24/2001 | US20010001746 High efficiency photoresist coating |
| 05/24/2001 | US20010001703 Method for the formation of resist patterns |
| 05/24/2001 | US20010001702 Method of fabricating an opening with deep ultra-violet photoresist |
| 05/24/2001 | US20010001698 Methods and compositions for imaging acids in chemically amplified photoresists using ph-dependent fluorophores |
| 05/24/2001 | US20010001697 Positioning wafer on surface of hot plate, developing predetermined temperature pattern across wafer responsive to controlling temperature across zones extending over surface of hot plate, measuring, plotting, maximizing image linewidth |
| 05/24/2001 | US20010001583 Diffractive optical element and optical sysetm incorporating the same |
| 05/24/2001 | US20010001577 Exposure apparatus and device manufacturing method including measuring position and/or displacement of each of a base and a stage with respect to a support |
| 05/24/2001 | US20010001571 Method and apparatus for removing residual material from an alignment mark of a semiconductor wafer |
| 05/24/2001 | US20010001463 Heating device, method for evaluating heating device and pattern forming method |
| 05/24/2001 | US20010001407 Removes significant proportion of mutagens and carcinogens; retains smoke flavor, nicotine content, and draw character-istics; inexpensive, safe |
| 05/24/2001 | US20010001383 Producing fluoride crystal via adding scavenger to calcium fluoride raw material and refining, then growing a crystal by using a crucible lowering method; excimer lasers |
| 05/24/2001 | US20010001370 Detection of a gaseous substance emanating from a layer of polymeric composition |
| 05/23/2001 | EP1102368A2 Narrow-band excimer laser apparatus |
| 05/23/2001 | EP1102125A1 Masks for lithographic patterning using off-axis illumination |
| 05/23/2001 | EP1102124A2 Exposure apparatus and device manufacturing method |
| 05/23/2001 | EP1102123A1 Imageable articles |
| 05/23/2001 | EP1102103A2 Optical device, especially objective, with at least one diaphragm |
| 05/23/2001 | EP1102100A2 Catadioptric objective with beamsplitter |
| 05/23/2001 | EP1102058A1 Method and apparatus for inspecting articles |
| 05/23/2001 | EP1101629A2 Method of fabricating a photopolymer type light-sensitive planographic printing plate |
| 05/23/2001 | EP1101607A1 Article having imageable coatings |
| 05/23/2001 | EP1101258A1 High pulse rate pulse power system |
| 05/23/2001 | EP1101145A1 Method and apparatus for providing rectangular shaped array of light beams |
| 05/23/2001 | EP1100630A1 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 05/23/2001 | DE19955984A1 Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende Optical imaging device, in particular lens having at least one aperture system |
| 05/23/2001 | DE19955975A1 Lithographisches Verfahren zur Herstellung von Mikrobauteilen Lithographic method for producing microcomponents |
| 05/23/2001 | CN1296578A Liquid, radiation-curable composition, especially for stereolithography |
| 05/23/2001 | CN1296577A Liquid, radiation-curable composition, especially for producing fiexible cured articles by stereolithography |
| 05/23/2001 | CN1296197A Support for lithographic printing-plate and original plate of lithographic printing using the support |
| 05/23/2001 | CN1296196A Composition of infrared radiation and thermal sense and lithographic printing system coated with same |
| 05/23/2001 | CN1296064A Photoresist cleaning composition |
| 05/23/2001 | CN1296024A Partial esterification products of aromatic hydroxy-carboxylic resin and use thereof |
| 05/23/2001 | CN1066266C Precision photo etching imaging material on metal surface and mfg. method and use thereof |
| 05/23/2001 | CN1066181C Coatings and recording materials stabilized with benzotriazole UV absorbers |
| 05/22/2001 | US6236449 Illumination optical apparatus and exposure apparatus |
| 05/22/2001 | US6236448 Projection exposure system |
| 05/22/2001 | US6236447 Exposure method and apparatus, and semiconductor device manufactured using the method |
| 05/22/2001 | US6236052 Quadrupole device for projection lithography by means of charged particles |
| 05/22/2001 | US6235836 Photoresists prepared from the protected copolymers can enhance the resolution of fine circuit by virtue of low weight loss upon the thermal treatment after exposure. |
| 05/22/2001 | US6235820 Alkylated aminoalkylpiperazine surfactants |
| 05/22/2001 | US6235808 Radiation-curable cycloaliphatic epoxy compounds, uses thereof, and compositions containing them |
| 05/22/2001 | US6235807 Curing process for cationically photocurable formulations |
| 05/22/2001 | US6235456 Multilayer; semiconductor substrate, antireflective film |
| 05/22/2001 | US6235453 Low-k photoresist removal process |
| 05/22/2001 | US6235452 Detection of a gaseous substance emanating from a layer of polymeric composition |
| 05/22/2001 | US6235450 Overlapping pattern |
| 05/22/2001 | US6235449 Non-stick photoresist laminate |
| 05/22/2001 | US6235448 Photoresist monomers, polymers thereof, and photoresist compositions containing the same |
| 05/22/2001 | US6235447 Forming pattern; semiconductor |
| 05/22/2001 | US6235446 Radiation sensitive resin composition |
| 05/22/2001 | US6235440 Method to control gate CD |
| 05/22/2001 | US6235439 Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers |
| 05/22/2001 | US6235438 Projection exposure method and apparatus |
| 05/22/2001 | US6235436 Semiconductor device using positive photosensitive resin composition and process for preparation thereof |
| 05/22/2001 | US6235358 Coating layers of epoxy resins and photocationic curing cataltst with cationic sulfur esters, sensitizers of thioxanthones and titanium dioxide pigments |
| 05/22/2001 | US6235177 Method for the construction of an aperture plate for dispensing liquid droplets |
| 05/22/2001 | US6235144 Resist removing apparatus and method |
| 05/22/2001 | US6234692 Semiconductor device fabricating apparatus with a cover over the wafer surface |
| 05/22/2001 | US6233857 Porcelain coated substrate and process for making same |
| 05/17/2001 | WO2001035451A1 Illuminator, aligner, and method for fabricating device |
| 05/17/2001 | WO2001035440A1 Method and apparatus for electron beam column assembly with precise alignment using displaced semi-transparent membranes |
| 05/17/2001 | WO2001035168A1 Interference lithography utilizing phase-locked scanning beams |
| 05/17/2001 | WO2001035167A1 Composition for antireflection coating |
| 05/17/2001 | WO2001035125A1 Antireflection base for ultraviolet and vacuum ultraviolet regions |
| 05/17/2001 | WO2001034679A1 Imide-benzoxazole polycondensate and process for producing the same |
| 05/17/2001 | WO2001034671A1 Ultraviolet-curable resin composition and ink-jet recording material having film based on the composition |
| 05/17/2001 | WO2000057236A9 Optical synthetic aperture array |
| 05/17/2001 | US20010001248 Stage system with driving mechanism, and exposure apparatus having the same |
| 05/17/2001 | US20010001247 Lithography apparatus |
| 05/17/2001 | DE19954365A1 Imagewise thermoresists exposure for manufacture of integrated circuits, involves performing two dimensional scanning of image of light valve across surface of resist with optical system set at different focus settings |
| 05/17/2001 | DE19954363A1 Production of photo polymer printing plate, comprises casting layer of polymerizable liquid on plate, air pressure beneath plate being increased to keep plate level while layer is irradiated to cure polymer |
| 05/17/2001 | DE19951974A1 Kinematic suspension for adjusting mask used in photo lithographic process has lever fastened at three points with degree of freedom supple at mask to be adjusted at base |
| 05/17/2001 | DE10020592A1 Katadioptrisches Objektiv mit physikalischem Strahlteiler A catadioptric lens with a physical beam splitter |
| 05/16/2001 | EP1100167A2 F2 laser with visible red and IR control |
| 05/16/2001 | EP1100114A2 Zone controlled radiant heating system utilizing focused reflector |
| 05/16/2001 | EP1099984A1 Method for producing printing plate |
| 05/16/2001 | EP1099983A1 Chemically amplified positive resist composition and patterning method |
| 05/16/2001 | EP1099982A1 Stable photosensitive resin composition |
| 05/16/2001 | EP1099691A1 N-Sulfonyloxyimide compound and radiation-sensitive resin composition using the same |
| 05/16/2001 | EP1099547A2 Thin-film imaging recording constructions incorporating metallic inorganic layers and optical interference structures |
| 05/16/2001 | EP1099546A2 Printing stamp and method therefor |
| 05/16/2001 | EP1099243A1 Method for patterning cavities and enhanced cavity shapes for semiconductor devices |
| 05/16/2001 | EP1099140A1 Maskless photolithography system |
| 05/16/2001 | EP1099139A1 Lithographic exposure device and lithographic method |
| 05/16/2001 | EP1099138A1 Stereolithographic compositions for preparing polyethylene-like articles |
| 05/16/2001 | EP1098859A1 Alkaline water-based solution for cleaning metallized microelectronic workpieces and methods of using same |
| 05/16/2001 | CN1295729A Reliable, Modular, production quality narrow-band KrF excimer laser |
| 05/16/2001 | CN1295680A Photopolymerization compositions including maleimides and processes for using the same |
| 05/16/2001 | CN1295587A Modified polycyclic polymers |
| 05/16/2001 | CN1295503A Apparatus and method for providing pulsed fluids |
| 05/16/2001 | CN1295305A Machine for exposing plate to laser radiation |
| 05/16/2001 | CN1295268A Device for measuring relative position error |
| 05/16/2001 | CN1295262A Device for generating several laser beams |