| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/05/2001 | US6241402 Developing apparatus and method thereof |
| 06/05/2001 | US6240874 Integrated edge exposure and hot/cool plate for a wafer track system |
| 06/05/2001 | US6240846 Recording material comprising a substrate and a ceramic layer applied to a surface of the substrate |
| 06/05/2001 | US6240610 Wafer and transport system |
| 06/05/2001 | CA2199346C Semiconductor device and manufacturing method of the same |
| 05/31/2001 | WO2001039337A1 Deep ultraviolet catadioptric anamorphic telescope |
| 05/31/2001 | WO2001039269A1 Method and apparatus for personalization of semiconductor |
| 05/31/2001 | WO2001039210A1 X-ray zoom lens |
| 05/31/2001 | WO2001038940A2 Method for surface patterning using a focused laser |
| 05/31/2001 | WO2001038939A2 Method for determining misalignment between a reticle and a wafer |
| 05/31/2001 | WO2001038286A1 PROCESS FOR PRODUCING t-BUTYL ESTERS OF BRIDGED-RING POLYCARBOXYLIC ACIDS |
| 05/31/2001 | WO1999028787A9 High optical density ultra thin organic black matrix system |
| 05/31/2001 | US20010002415 An organic pigment, a solvent and a dispersant being a polymerizable oligomer having a nitrogen-containing monomer and a double bond at its ends; stability; low viscosity; image contrast; alkali resistance; coatings; inks; displays |
| 05/31/2001 | US20010002339 Shaping members with curved outer side surface are pivotally connected with the substrate support, gravity biases shaping members downward until angular velocity of support provids a force to bias members upward to establish a circular surface |
| 05/31/2001 | US20010002304 Methods of reducing proximity effects in lithographic processes |
| 05/31/2001 | US20010002303 Driving stage toward target position, measuring position of stage, based upon measured position, correcting for nonlinear dynamics of stage |
| 05/31/2001 | US20010002301 Projection-exposure methods and apparatus exhibiting increased throughput |
| 05/31/2001 | US20010002155 Catoptric reduction projection optical system and exposure apparatus and method using same |
| 05/31/2001 | US20010002074 Method for manufacture of optical element |
| 05/31/2001 | US20010001958 Method of minimizing contaminating deposits using dilute acid rinse |
| 05/31/2001 | US20010001900 Double-sided wafer exposure method and device |
| 05/31/2001 | DE19957398A1 Aligning supporting surfaces of supporting elements for optical elements involves deforming supporting elements and/or bearing part(s) for optical elements using laser beam |
| 05/31/2001 | DE19955969A1 Verwendung von Polyimid für Haftschichten und lithographisches Verfahren zur Herstellung von Mikrobauteilen The use of polyimide for subbing layers, and lithographic process for manufacturing micro-components |
| 05/31/2001 | DE10057079A1 Device for corpuscular beam exposure subjects pattern on specimen to corpuscular beam whilst feeding low pressure ozone into vacuum chamber at pressure below that of the atmosphere |
| 05/31/2001 | DE10054550A1 Novel sulfonium salts with oxoindanyl, tetralonyl or chromanonyl groups are useful as photoacid producers in chemically-amplified positive and negative photoresists processed at far-to-vacuum UV wavelengths |
| 05/31/2001 | CA2392378A1 X-ray zoom lens |
| 05/30/2001 | EP1104018A2 Optimized optical system design for endpoint detection |
| 05/30/2001 | EP1103860A1 Electron-beam lithography system and alignment method |
| 05/30/2001 | EP1103859A1 Developing composition for alkaline-developable lithographic printing plates with different interlayers |
| 05/30/2001 | EP1103857A2 Optical system |
| 05/30/2001 | EP1103856A1 Positive resist composition & process for forming resist pattern using same |
| 05/30/2001 | EP1103855A1 Photosensitive resin composition, porous resin, circuit board, and wireless suspension board |
| 05/30/2001 | EP1103528A2 Silica glass product for an optical element and method for its production |
| 05/30/2001 | EP1103373A2 Pattern-forming methods and lithographic printing plates |
| 05/30/2001 | EP1103018A1 Diffractive element in extreme-uv lithography condenser |
| 05/30/2001 | EP1103017A1 Colour changing composition and colouring polymeric articles made therefrom |
| 05/30/2001 | EP1102662A1 Ticket dispensing modules and method |
| 05/30/2001 | EP0800664B1 Metal ion reduction in novolak resin using an ion exchange resin in a polar solvent and photoresists compositions therefrom |
| 05/30/2001 | EP0616702B1 Aqueous-processable tonable imaging element |
| 05/30/2001 | CN1297542A Radiation-sensitive resin composition |
| 05/30/2001 | CN1297430A Photosensitive compound and photosensitive composition |
| 05/30/2001 | CN1297385A Process and apparatus for treating workpiece such as semiconductor wafer |
| 05/30/2001 | CN1297251A Electronic beam exposure method and used mask, and electronic beam exposure system |
| 05/30/2001 | CN1297169A Positive photoresist layer and use method |
| 05/30/2001 | CN1297168A Light image-forming composition contg. light polymerizable adhesive oligomer |
| 05/30/2001 | CN1297167A Phenol-alicyclic copolymer and photoresist |
| 05/29/2001 | US6240158 X-ray projection exposure apparatus with a position detection optical system |
| 05/29/2001 | US6240117 Fluorine control system with fluorine monitor |
| 05/29/2001 | US6240112 High pulse rate pulse power system with liquid cooling |
| 05/29/2001 | US6240110 Line narrowed F2 laser with etalon based output coupler |
| 05/29/2001 | US6239955 Stabilized MR sensor and heat guide joined by contiguous junction |
| 05/29/2001 | US6239924 Kinematic lens mounting with distributed support and radial flexure |
| 05/29/2001 | US6239878 Fourier-transform and global contrast interferometer alignment methods |
| 05/29/2001 | US6239863 Removable cover for protecting a reticle, system including and method of using the same |
| 05/29/2001 | US6239862 Photolithographic apparatus |
| 05/29/2001 | US6239861 Exposure method and scanning type exposure apparatus |
| 05/29/2001 | US6239859 Photolithographic apparatus composed of coater/developer and a plurality of steppers in parallel connected thereto |
| 05/29/2001 | US6239858 Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatus |
| 05/29/2001 | US6239273 Printing molecular library arrays |
| 05/29/2001 | US6239231 Has the polymerization unit of 2-alkyl-2-adamantyl (meth)acrylate and one or both of the polymerization unit of 3-hydroxy-1-adamantyl (meth)acrylate or (meth)acrylonitrile; acid generator; semiconductors |
| 05/29/2001 | US6239068 Process for obtaining a diffusion resistant lenticular element |
| 05/29/2001 | US6238936 Method of using critical dimension mapping to qualify a new integrated circuit fabrication etch process |
| 05/29/2001 | US6238852 Maskless lithography system and method with doubled throughput |
| 05/29/2001 | US6238851 Exposure method |
| 05/29/2001 | US6238850 Method of forming sharp corners in a photoresist layer |
| 05/29/2001 | US6238849 Cyclic ureas in photoresist developers |
| 05/29/2001 | US6238848 Developing method and developing apparatus |
| 05/29/2001 | US6238846 Method of manufacturing a stamper suitable for producing optical discs |
| 05/29/2001 | US6238845 Method of forming lead frames with preformation support |
| 05/29/2001 | US6238844 Process for depositing a plasma polymerized organosilicon photoresist film |
| 05/29/2001 | US6238842 Positive photosensitive composition |
| 05/29/2001 | US6238841 Resin obtained by introducing a styrylpyridinium, styrylquinolinium or methylolamide group into a polyvinyl alcohol polymer; prepolymer having carboxyl group and at least two ethylenically unsaturated groups in molecule; epoxide |
| 05/29/2001 | US6238840 Curable solder resist comprising a photosensitive resin having one or more carboxyl groups, a phenolic diglycidyl ether epoxy curing agent, and a photoinitiator; adhesion, heat resistance, resolution |
| 05/29/2001 | US6238839 Dimensionally stable metal support coated with a heat-insulating layer, a hydrophilic layer and a thermosensitive lipophilic layer; image quality, multicolor prints |
| 05/29/2001 | US6238838 Radiation-sensitive mixture comprising IR-absorbing, anionic cyanine dyes and recording material prepared therewith |
| 05/29/2001 | US6238837 Photosensitive printing plate element comprising a support coated with an actinic radiation-photopolymerizable binder/monomer mixture overcoated with a tack-free, radiopaque masking layer patterned by infrared ablation |
| 05/29/2001 | US6238831 Coating solution for the preparation of a printing plate comprising photosensitive material and a thermoplastic resin insoluble at alkaline ph both homogenously dissolved in solvent |
| 05/29/2001 | US6238830 Active control of temperature in scanning probe lithography and maskless lithograpy |
| 05/29/2001 | US6238828 Printing method |
| 05/29/2001 | US6238826 Apparatus for transferring structures |
| 05/29/2001 | US6238824 Method for designing and making photolithographic reticle, reticle, and photolithographic process |
| 05/29/2001 | US6238747 Using nozzle |
| 05/29/2001 | US6238735 Using an enclosed substrate; controlled vapor deposition |
| 05/29/2001 | US6238576 Chemical liquid supply method and apparatus thereof |
| 05/29/2001 | US6238511 Method and apparatus for processing substrate |
| 05/29/2001 | US6238063 Illumination optical apparatus and projection exposure apparatus |
| 05/29/2001 | US6237393 Wafer center alignment device and method of wafer alignment |
| 05/25/2001 | WO2001037618A1 Method for obtaining an extreme ultraviolet radiation source, radiation source and use in lithography |
| 05/25/2001 | WO2001037457A1 Virtual laser operator |
| 05/25/2001 | WO2001037309A1 Plasma focus light source with improved pulse power system |
| 05/25/2001 | WO2001037053A1 Imaging method using phase boundary masking with modified illumination |
| 05/25/2001 | WO2001037052A1 Photolithography method, photolithography mask blanks, and method of making |
| 05/25/2001 | WO2001037051A1 Beam positioning in microlithographic writing |
| 05/25/2001 | WO2001037050A1 Use of polyimide for adhesive layers, lithographic method for producing microcomponents and method for producing composite material |
| 05/25/2001 | WO2001037049A1 Photosensitive composition, and optical waveguide element and process for producing the same |
| 05/25/2001 | WO2001037048A1 Photosensitive composition and products of curing thereof |
| 05/25/2001 | WO2001037047A2 Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography |
| 05/25/2001 | WO2001037046A1 Method for forming a relief on the surface of a functional layer |
| 05/25/2001 | WO2001037045A1 Flat coil and lithographic method for producing microcomponents |
| 05/25/2001 | WO2001037044A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |