| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 06/12/2001 | US6245828 Dental adhesive |
| 06/12/2001 | US6245827 Ultraviolet curable resin compositions having enhanced shadow cure properties |
| 06/12/2001 | US6245630 Spherical shaped semiconductor integrated circuit |
| 06/12/2001 | US6245585 Method of providing levelling and focusing adjustments on a semiconductor wafer |
| 06/12/2001 | US6245493 Method for reducing surface reflectivity by increasing surface roughness |
| 06/12/2001 | US6245492 Photoresist system and process for aerial image enhancement |
| 06/12/2001 | US6245491 Photo-assisted post exposure bake for chemically amplified photoresist process |
| 06/12/2001 | US6245489 Fluorinated hard mask for micropatterning of polymers |
| 06/12/2001 | US6245488 Method for forming features using frequency doubling hybrid resist and device formed thereby |
| 06/12/2001 | US6245487 Methods for enhancing images on relief image printing plates |
| 06/12/2001 | US6245485 Mixture of acid generator and a crosslinked addition polymer comprising units having a polycyclic alicyclic moiety and a carboxyl moiety; small absorption of the far ultraviolet light wavelengths and improved dry etch resistance |
| 06/12/2001 | US6245484 Polyimide comprising units of a diaminopolysiloxane, carboxyl group-containing diamine, a carbocyclic diamine, and a tetracarboxylic acid unit derived from a dianhydride having a 2,5-dioxotetrahydrofuryl moiety; negative patterns |
| 06/12/2001 | US6245483 Photosensitive resin composition |
| 06/12/2001 | US6245482 Polymer and chemically amplified resist composition including silicon containing protecting group |
| 06/12/2001 | US6245479 Thermal imaging medium |
| 06/12/2001 | US6245478 Resist composition |
| 06/12/2001 | US6245470 Exposure, masking, transparent substrates, micro patterns and focusing |
| 06/12/2001 | US6245468 Optical proximity correction methods, and methods of forming radiation-patterning tools |
| 06/12/2001 | US6245432 Circuit substrate, circuit-formed suspension substrate, and production methods therefor |
| 06/12/2001 | US6245188 Process for the removal of resist material |
| 06/12/2001 | US6245155 Method for removing photoresist and plasma etch residues |
| 06/12/2001 | US6244717 Reduction objective for extreme ultraviolet lithography |
| 06/12/2001 | US6244121 Sensor device for non-intrusive diagnosis of a semiconductor processing system |
| 06/07/2001 | WO2001041268A1 High power gas discharge laser with helium purged line narrowing unit |
| 06/07/2001 | WO2001041262A2 Method and apparatus for optically examining miniature patterns |
| 06/07/2001 | WO2001041155A1 Optical element such as multilayer film reflection mirror, production method therefor and device using it |
| 06/07/2001 | WO2001040875A1 Dual-stage lithography apparatus and method |
| 06/07/2001 | WO2001040874A1 Use of a composition in stereolithography |
| 06/07/2001 | WO2001040873A1 Positive type photosensitive polyimide resin composition |
| 06/07/2001 | WO2001040872A1 Polymeric nanocomposite materials with a functional matrix and a method of reading and writing thereto |
| 06/07/2001 | WO2001040870A1 Removable pellicle for lithographic mask protection and handling |
| 06/07/2001 | WO2001040869A2 Mask design and method for controlled profile fabrication |
| 06/07/2001 | WO2001040865A1 Non-aromatic chromophores for use in polymer anti-reflective coatings |
| 06/07/2001 | WO2001040864A1 Photoresist dispense method by compensation for substrate reflectivity |
| 06/07/2001 | WO2001040425A2 Post chemical-mechanical planarization (cmp) cleaning composition |
| 06/07/2001 | WO2001040087A1 Wafer transport system |
| 06/07/2001 | WO2001039985A2 Heat-sensitive imaging element for providing lithographic printing plates |
| 06/07/2001 | WO2001009682A3 Positive acting photoresist composition and imageable element |
| 06/07/2001 | US20010003036 Applying a positive type photosensitive resin onto a substrate to form a photosensitive film, exposing the film to form desired pattern, developing to form resist pattern; all of there steps are carried under irradation of safelight |
| 06/07/2001 | US20010003035 Diffraction grating and fabrication technique for same |
| 06/07/2001 | US20010003033 Method and apparatus for reducing non-uniformity area effects in the manufacture of semiconductor devices |
| 06/07/2001 | US20010003032 Plate-making method, plate-making apparatus used in such plate-making method, and image recording material |
| 06/07/2001 | US20010003031 Photocurable resin composition |
| 06/07/2001 | US20010003030 Over-coating composition comprising an over-coating resin, a solvent, and a basic compound |
| 06/07/2001 | US20010003028 Scanning Exposure Method |
| 06/07/2001 | US20010003027 Exposure method |
| 06/07/2001 | US20010003016 Placing the replica in a vacuum chamber, depressurizing, depositing overcoat of aluminum and an overcoat of a dielectric material; layers are deposited at thicknesses to increase normal reflectivity of reflective faces |
| 06/07/2001 | US20010003013 Substrate heating apparatus, substrate heating method, semiconductor integrated circuit device, photomask and liquid crystal device |
| 06/07/2001 | US20010003011 Where the surface of the rollers just before and just after the coating step do not contain antioxidant and/or aging retardant, which prevents their transfer to a photosensitive layer of the substrate, resulting in high sensitivity |
| 06/07/2001 | US20010002871 Method for reducing particles from an electrostatic chuck and an equipment for manufacturing a semiconductor |
| 06/07/2001 | DE10059909A1 Chemisch verstärkte positiv arbeitende Resistzusammensetzung A chemically amplified positive resist composition |
| 06/07/2001 | DE10056561A1 Device for focusing light onto a photosensitive object, preferably having laminar region, e.g. for microscopy, lithography, optical or magneto-optical data storage such as CD and DVD |
| 06/07/2001 | CA2390418A1 Polymeric nanocomposite materials with a functional matrix and a method of reading and writing thereto |
| 06/07/2001 | CA2390123A1 High power gas discharge laser with helium purged line narrowing unit |
| 06/06/2001 | EP0930974B1 Inverted stamping process |
| 06/06/2001 | EP0815481B1 Magnification correction for small field scanning |
| 06/06/2001 | CN2433649Y Automatic PS plate drying machine |
| 06/06/2001 | CN1298496A Resist stripping process |
| 06/06/2001 | CN1298201A Manufacturing method and equipment for semiconductor device |
| 06/06/2001 | CN1297954A Polycarboxylic acid resin containing unsaturated double bond and its preparation and use |
| 06/06/2001 | CN1297799A Laser corrosion method and its apparatus |
| 06/06/2001 | CN1066829C 形成图形的方法 The method of forming a pattern |
| 06/06/2001 | CN1066746C Aromatic hydroxycarboxylic acid resins and their use |
| 06/06/2001 | CN1066644C Method and equipment for removing surface pollutant |
| 06/05/2001 | US6243855 Mask data design method |
| 06/05/2001 | US6243487 Pattern exposure method using electron beam |
| 06/05/2001 | US6243406 Gas performance control system for gas discharge lasers |
| 06/05/2001 | US6243405 Very stable excimer or molecular fluorine laser |
| 06/05/2001 | US6243348 Very-high-density memory device utilizing a scintillating data-storage medium |
| 06/05/2001 | US6243209 Method and apparatus for providing rectangular shape array of light beams |
| 06/05/2001 | US6243206 Illuminating system for vacuum ultraviolet microlithography |
| 06/05/2001 | US6243203 Optical system with anti-reflection coating |
| 06/05/2001 | US6243160 Exposure device for a strip-like workpiece |
| 06/05/2001 | US6243159 Projection aligner and exposure method using the same |
| 06/05/2001 | US6242879 Touch calibration system for wafer transfer robot |
| 06/05/2001 | US6242734 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 06/05/2001 | US6242533 Polyvinylphenol; good pattern shape, heat resistance, resolution, and sensitivity in resists for lithography |
| 06/05/2001 | US6242513 Method of applying a die attach adhesive |
| 06/05/2001 | US6242504 Crosslinking of radiation-crosslinkable pressure-sensitive adhesive films |
| 06/05/2001 | US6242400 Method of stripping resists from substrates using hydroxylamine and alkanolamine |
| 06/05/2001 | US6242361 Plasma treatment to improve DUV photoresist process |
| 06/05/2001 | US6242277 Method of fabricating a complementary metal-oxide semiconductor sensor device |
| 06/05/2001 | US6242165 Supercritical compositions for removal of organic material and methods of using same |
| 06/05/2001 | US6242164 Multilayer element with conductive thin films and etching target layer, photoresists and exposure, diffusion a photo acid and forming patterns |
| 06/05/2001 | US6242162 Forming optical disk and silicon dioxide on substrate, coating a photoresists layer, exposure and patterns, etching |
| 06/05/2001 | US6242161 Acrylic copolymer and reflection-preventing film-forming composition containing the same |
| 06/05/2001 | US6242160 Patterning method of chemical amplification type resist film for far ultraviolet radiation |
| 06/05/2001 | US6242159 Support, coating of diazo salt of diazonium salt and abhesive counter ion, heat mode images, pressing and printing inks to remove abhesive compound |
| 06/05/2001 | US6242158 Photosensitive resin composition and photosensitive element using the resin composition |
| 06/05/2001 | US6242156 Lithographic plate having a conformal radiation-sensitive layer on a rough substrate |
| 06/05/2001 | US6242154 Generation of acid |
| 06/05/2001 | US6242153 Positive photoresist composition for far ultraviolet ray exposure |
| 06/05/2001 | US6242152 Thermal transfer of crosslinked materials from a donor to a receptor |
| 06/05/2001 | US6242151 Novolak resins for photoresists |
| 06/05/2001 | US6242149 Light sensitive elements cured with radiation, radical polymerization, photopolymerization, encapsulation |
| 06/05/2001 | US6242137 Optical masking system; diffraction light grating, mask, lens, filter |
| 06/05/2001 | US6242136 Photomask substrate |
| 06/05/2001 | US6242057 Photoreactor composition and applications therefor |
| 06/05/2001 | US6242044 Uniform coating; calibrating viscosity; network of cooling coils |
| 06/05/2001 | US6241403 Developing method and developing apparatus |