| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 06/19/2001 | US6248860 Before becoming cross-linked, comprised alkylene carbonate units having substituents with terminal moieties selected from the group consisting of terminal alkenyl moieties and trialkoxysilane moieties. |
| 06/19/2001 | US6248847 Acrylated ester |
| 06/19/2001 | US6248704 Compositions for cleaning organic and plasma etched residues for semiconductors devices |
| 06/19/2001 | US6248669 Method for manufacturing a semiconductor device |
| 06/19/2001 | US6248658 Method of forming submicron-dimensioned metal patterns |
| 06/19/2001 | US6248625 Manufacturing method of cylindrical-capacitor lower electrode |
| 06/19/2001 | US6248509 Photosensitive work material, masking, light beams and shutters |
| 06/19/2001 | US6248508 Manufacturing a circuit element |
| 06/19/2001 | US6248506 Aqueous developing solutions for reduced developer residue |
| 06/19/2001 | US6248505 Photoresists patterns on supports with developers for novolaks |
| 06/19/2001 | US6248502 Developer solvent for photopolymer printing plates and method |
| 06/19/2001 | US6248501 Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same |
| 06/19/2001 | US6248500 Acrylic polymers and phenol, naphthol or hydroxyanthracene compounds |
| 06/19/2001 | US6248499 Acrylate ester polymers and copolymers |
| 06/19/2001 | US6248498 Photosensitive modified vinyl alcohol polymer grafted with furanyl quaternary heterocycle for hydrophobic polymer |
| 06/19/2001 | US6248497 Light sensitive and heat sensitive recording images |
| 06/19/2001 | US6248486 Method of detecting aberrations of an optical imaging system |
| 06/19/2001 | US6248485 Forming reticle and image transfer error profile |
| 06/19/2001 | US6248398 Coater having a controllable pressurized process chamber for semiconductor processing |
| 06/19/2001 | US6248175 Nozzle arm movement for resist development |
| 06/19/2001 | US6248171 Yield and line width performance for liquid polymers and other materials |
| 06/19/2001 | US6247856 Developing system of photosensitive resin plates and apparatus used therein |
| 06/19/2001 | US6247599 Electrostatic discharge-free container equipped with metal shield |
| 06/19/2001 | US6247404 Method of making newspaper printing plates |
| 06/15/2001 | CA2328376A1 Oxime ester photoinitiators |
| 06/15/2001 | CA2328342A1 Photosensitive resin composition |
| 06/14/2001 | WO2001042996A2 Design of photomasks for semiconductor device fabrication |
| 06/14/2001 | WO2001042964A2 Method and apparatus for structure prediction based on model curvature |
| 06/14/2001 | WO2001042860A1 Creation of resist structures |
| 06/14/2001 | WO2001042859A1 Production of resist structures |
| 06/14/2001 | WO2001042858A1 Device and method in connection with the production of structures |
| 06/14/2001 | WO2001042857A1 Photosensitive resin print plate material and production method for photosensitive resin print plate |
| 06/14/2001 | WO2001042856A2 A method and a plate for digitally-imaged offset printing |
| 06/14/2001 | WO2001042855A2 Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range |
| 06/14/2001 | WO2001042854A1 Platemaking system and method using an imaging mask made from photochromic film |
| 06/14/2001 | WO2001042853A2 Photoresist composition for deep uv radiation |
| 06/14/2001 | WO2001042313A1 Additive composition for increasing the storage stability of ethylenically unsaturated resins |
| 06/14/2001 | WO2001013175A3 Photosensitive resin composition |
| 06/14/2001 | US20010003772 Polymer bearing cyclic silicon-containing groups such as 1,4,4-trimethyl-4-silacyclohexyl methacrylate; use as chemically amplified positive resist |
| 06/14/2001 | US20010003759 A photocurable resin consists of an acid modified vinyl group containing epoxy resin, an elastomer, a photopolymerization initiator, a diluent and a curing agent, can give high performance cured film |
| 06/14/2001 | US20010003673 Etch bias tuning for enhancement of stepper life |
| 06/14/2001 | US20010003655 Which can correct position of an electron-beam based on an amount of position of the electron beam, while reflecting charge-up of a semiconductor wafer used, obtaining alignment accuracy in superposing |
| 06/14/2001 | US20010003643 Heat-sensitive lithographic printing plate precursor |
| 06/14/2001 | US20010003642 A transfer element comprises a substrate having deposited a light to heat conversion layer, an interlayer and a thermal transfer layer; useful for color proof and color filters |
| 06/14/2001 | US20010003640 Chemically amplified resist compositions and process for the formation of resist patterns |
| 06/14/2001 | US20010003633 Photosensitive compositions and pattern formation method |
| 06/14/2001 | US20010003606 Anti-reflection coating layer covered by silicon oxynitride layer is provided, surface treatment step is performed with oxidizer based plasma on oxynitride layer to form oxide layer, oxidizer-based plasma comprises oxygen, nitrous oxide |
| 06/14/2001 | US20010003481 Process and equipment for recovering developer from photoresist development waste and reusing it |
| 06/14/2001 | US20010003480 Apertures and illuminating apparatus including aperture openings dimensioned to compensate for directional critical dimension differences |
| 06/14/2001 | US20010003382 Semiconductor device comprising layered positional detection marks and manufacturing method therof |
| 06/14/2001 | US20010003299 Liquid processing apparatus and liquid processing method |
| 06/14/2001 | CA2393807A1 A method and a plate for digitally-imaged offset printing |
| 06/13/2001 | EP1107313A2 On-chip test circuit to control the succession of exposure masks |
| 06/13/2001 | EP1107293A1 X-ray exposure apparatus, x-ray exposing method, x-ray mask, x-ray mirror, synchrotron radiator, synchrotron radiating method, and semiconductor device |
| 06/13/2001 | EP1107068A2 Lithographic projection apparatus with system for positioning a reflector |
| 06/13/2001 | EP1107067A2 Positioning system and lithographic apparatus comprising the same |
| 06/13/2001 | EP1107066A2 Lithographic apparatus with mask clamping apparatus |
| 06/13/2001 | EP1107065A2 Lithography apparatus with filter |
| 06/13/2001 | EP1107064A2 Exposure apparatus |
| 06/13/2001 | EP1107063A1 Photobleachable compounds containing photopolymerizable compositions for use in flexographic printing plates |
| 06/13/2001 | EP1107039A2 System for compensating direction and position variations of laser produced illumination |
| 06/13/2001 | EP1107034A2 Device and method for supporting an optical element with reduced deformation |
| 06/13/2001 | EP1106994A2 Inspection apparatus and method |
| 06/13/2001 | EP1106946A2 Supercritical drying method and supercritical drying apparatus |
| 06/13/2001 | EP1106639A1 Photocurable composition containing iodonium salt compound |
| 06/13/2001 | EP1106382A1 Heat sensitive printing plate precursors |
| 06/13/2001 | EP1106349A1 Sensitised heat sensitive printing plate precursors |
| 06/13/2001 | EP1106348A1 Planographic printing plate precursor |
| 06/13/2001 | EP1106347A1 Heat-sensitive lithographic printing plate precursor |
| 06/13/2001 | EP1106332A2 Stereolithographic beam profiling |
| 06/13/2001 | EP1105950A1 Laser repetition rate multiplier |
| 06/13/2001 | EP1105925A1 Method for double-sided patterning of high temperature superconducting circuits |
| 06/13/2001 | EP1105780A1 Reaction force isolation system for a planar motor |
| 06/13/2001 | EP1105778A1 Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| 06/13/2001 | EP1105373A1 Unsaturated oxime derivatives and the use thereof as latent acids |
| 06/13/2001 | EP1105369A1 Unsaturated oligophenol cyanates |
| 06/13/2001 | EP1105368A1 Photoactivatable bases containing nitrogen |
| 06/13/2001 | EP1064313A4 Selected high thermal novolaks and positive-working radiation-sensitive compositions |
| 06/13/2001 | EP0782720B1 Process and apparatus for rejuvenating developer in printing plate development |
| 06/13/2001 | DE19959742A1 System zur Kompensation von Richtungs- und Positionsschwankungen eines von einem Laser erzeugten Lichtes System for compensating for the direction and position fluctuations of a light generated from a laser |
| 06/13/2001 | DE19959741A1 Vorrichtung zur deformationsarmen Lagerung eines optischen Elementes und Verfahren zur deformationsarmen Lagerung des optischen Elementes Device for low-deformation storage of an optical element and method for low-deformation of the optical storage element |
| 06/13/2001 | DE19958967A1 Erzeugung von Resiststrukturen Producing resist structures |
| 06/13/2001 | DE19958966A1 Erzeugung von Resiststrukturen Producing resist structures |
| 06/13/2001 | DE19956354A1 Optical system and method for compensating for non-rotationally symmetrical image defects in an optical system has a slit-shaped image field or non-rotationally symmetrical lighting, a light source, a lens and a mirror. |
| 06/13/2001 | DE10063066A1 Iodoniumsalze als latente Säurespender Iodonium salts as latent acid donors |
| 06/13/2001 | DE10053911A1 Process for removing a metallic impurity from a substrate comprises producing an inert gas atmosphere around the substrate, introducing oxygen into the atmosphere, and introducing a process fluid onto the substrate |
| 06/13/2001 | DE10043678A1 Negative Resistzusammensetzung, Verfahren zur Bildung von Resistmustern und Verfahren zur Herstellung elektronischer Anordnungen Negative resist composition, method of forming resist patterns and methods of making electronic devices |
| 06/13/2001 | CN1299396A Pigment composition, dispersion contg. the same, and color resist for color filter |
| 06/13/2001 | CN1299079A Chemical enlargement type positive photoetching gum compositions |
| 06/12/2001 | US6246706 Laser writing method and apparatus |
| 06/12/2001 | US6246528 Variable focus lens by small changes of the equatorial lens diameter |
| 06/12/2001 | US6246481 Systems and methods for quantifying nonlinearities in interferometry systems |
| 06/12/2001 | US6246477 High resolution scanning microscope |
| 06/12/2001 | US6246204 Electromagnetic alignment and scanning apparatus |
| 06/12/2001 | US6246202 Method of making exposure apparatus with dynamically isolated reaction frame |
| 06/12/2001 | US6246065 Electron beam projection exposure apparatus |
| 06/12/2001 | US6246064 Electron beam drawing apparatus |
| 06/12/2001 | US6245930 Chemical-sensitization resist composition |
| 06/12/2001 | US6245922 Chromophoric photocrosslinking compound |
| 06/12/2001 | US6245849 Molding, curing; ceramic particles in binder |