| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/27/2001 | EP1110628A1 Imaging method |
| 06/27/2001 | EP1110437A1 Scanner system |
| 06/27/2001 | EP1110124A1 Method of making optical replicas by stamping in photoresist and replicas formed thereby |
| 06/27/2001 | EP1110054A1 Methods and apparatus for measuring the thickness of a film, particularly of a photoresist film on a semiconductor substrate |
| 06/27/2001 | CN1300790A Organic anti-reflecting coating polymer and preparation thereof |
| 06/27/2001 | CA2328017A1 Euv reticle thermal management |
| 06/26/2001 | US6252758 Method for reducing particles from an electrostatic chuck and an equipment for manufacturing a semiconductor |
| 06/26/2001 | US6252725 Semiconductor micro epi-optical components |
| 06/26/2001 | US6252712 Optical system with polarization compensator |
| 06/26/2001 | US6252676 System and method for proofing |
| 06/26/2001 | US6252668 Systems and methods for quantifying nonlinearities in interferometry systems |
| 06/26/2001 | US6252667 Interferometer having a dynamic beam steering assembly |
| 06/26/2001 | US6252665 Lithography using quantum entangled particles |
| 06/26/2001 | US6252662 Projection exposure apparatus and device manufacturing method using the same |
| 06/26/2001 | US6252651 Exposure method and exposure apparatus using it |
| 06/26/2001 | US6252650 Exposure apparatus, output control method for energy source, laser device using the control method, and method of producing microdevice |
| 06/26/2001 | US6252649 Aligner |
| 06/26/2001 | US6252648 Exposure apparatus and method of cleaning optical element of the same |
| 06/26/2001 | US6252647 Projection exposure apparatus |
| 06/26/2001 | US6252370 Electromagnetic alignment and scanning apparatus |
| 06/26/2001 | US6252314 Linear motor and stage system, and scanning exposure apparatus using the same |
| 06/26/2001 | US6252238 Micro-processing method using a probe |
| 06/26/2001 | US6252234 Reaction force isolation system for a planar motor |
| 06/26/2001 | US6252226 Nanometer scale data storage device and associated positioning system |
| 06/26/2001 | US6251963 Orgaophosphorous compound containing ketone group |
| 06/26/2001 | US6251745 Two-dimensional scaling method for determining the overlay error and overlay process window for integrated circuits |
| 06/26/2001 | US6251570 Resist developer saving system using material to reduce surface tension and wet resist surface |
| 06/26/2001 | US6251569 Forming a pattern of a negative photoresist |
| 06/26/2001 | US6251568 Methods and apparatus for stripping photoresist and polymer layers from a semiconductor stack in a non-corrosive environment |
| 06/26/2001 | US6251567 Process for manufacturing microstructured bodies |
| 06/26/2001 | US6251565 Forming photoresist sensitive to x-rays; overcoating witth electroconductive layer; masking; exposur eto ultraviolet radiation |
| 06/26/2001 | US6251564 Method for forming a pattern with both logic-type and memory-type circuit |
| 06/26/2001 | US6251562 Antireflective polymer and method of use |
| 06/26/2001 | US6251560 Photoresist compositions with cyclic olefin polymers having lactone moiety |
| 06/26/2001 | US6251558 Mixture of polymer, active materials, quaternary ammonium compound and solvent |
| 06/26/2001 | US6251557 Photosensitive resin composition for rapid prototyping and a process for the manufacture of 3-dimensional objects |
| 06/26/2001 | US6251551 Adjustment in vertical plane; tilting |
| 06/26/2001 | US6251550 Maskless photolithography system that digitally shifts mask data responsive to alignment data |
| 06/26/2001 | US6251548 Transparent substrate; multicolor pacture elements on balck matrix; transparent electrode |
| 06/26/2001 | US6251544 Positioning a mask; exposure to light; calibration of pattern |
| 06/26/2001 | US6251487 Method for coating a resist film |
| 06/26/2001 | US6250822 Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer |
| 06/26/2001 | US6250221 Imaging system having external drum and method for producing drum |
| 06/26/2001 | US6249932 Apparatus and method for removing fine particles |
| 06/21/2001 | WO2001045145A1 Exposure method and exposure apparatus |
| 06/21/2001 | WO2001044875A2 Micromolds fabricated using mems technology and methods of use therefor |
| 06/21/2001 | WO2001044874A1 Compositions, articles, methods for producing and processing these articles |
| 06/21/2001 | WO2001044873A1 Photoinitiator system with acylphosphine oxide initiators |
| 06/21/2001 | WO2001044430A1 Antimicrobial solutions |
| 06/21/2001 | WO2001044375A1 Squarylium compounds and optical recording media made by using the same |
| 06/21/2001 | WO2001043967A2 One side matte multilayer coversheet |
| 06/21/2001 | US20010004765 Method of checking exposure patterns formed over photo-mask |
| 06/21/2001 | US20010004633 Post chemical-mechanical planarization (CMP) cleaning composition |
| 06/21/2001 | US20010004511 Comprising a binder resin which is a copolymer having carboxyl groups, an organo-solvent and a main pigment dissolved in the solvent |
| 06/21/2001 | US20010004510 Refractory bilayer resist materials for lithography using highly attenuated radiation |
| 06/21/2001 | US20010004508 Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane |
| 06/21/2001 | US20010004472 Reducing coating defects caused by strikethrough when simultaneously slide coating at least a first fluid layer, a second fluid layer, and a third fluid layer; imaging, data storage media |
| 06/21/2001 | US20010004467 Deposition method, deposition apparatus, and pressure-reduction drying apparatus |
| 06/21/2001 | US20010004293 Multi-beam optical system |
| 06/21/2001 | US20010004185 Charged-particle beam exposure apparatus, exposure system, control method therefor, and device manufacturing method |
| 06/21/2001 | US20010004105 Crash prevention in positioning apparatus for use in lithographic projection apparatus |
| 06/21/2001 | US20010004104 Radiation source for use in lithographic projection apparatus |
| 06/21/2001 | US20010004066 Making surface of resist layer hydrophilic and removing resist layer using processing liquid; etching a semiconductor wfer and then removing a resist layer and a polymer layer on the substrate, for example |
| 06/21/2001 | US20010003965 Coating processing apparatus |
| 06/21/2001 | US20010003964 Coating film forming apparatus and coating unit |
| 06/21/2001 | DE19961347A1 Photoinitiatorsystem mit Acylphosphinoxid-Initiatoren Photoinitiator system with acyl phosphine oxide initiators |
| 06/21/2001 | DE19958201A1 Lithographic process for structuring layers during the manufacture of integrated circuits comprises guiding radiation emitted by a radiation source and lying in the extreme UV range onto photosensitive layers via a mask |
| 06/21/2001 | DE19957034A1 Treating the surfaces of substrates, e.g. semiconductor substrates comprises producing reactive fragments, especially radicals or ions, using UV radiation from a UV radiator as discharge lamp |
| 06/21/2001 | DE10062579A1 Optical integrator of wave front subdividing type used for photolithographic illuminating device comprises micro-optical elements arranged two-dimensionally to form light sources by subdividing wave front of falling light beam |
| 06/21/2001 | DE10061948A1 Lichtempfindliche Harzzusammensetzung A photosensitive resin composition |
| 06/21/2001 | DE10061947A1 Oximester-Photostarter Oxime ester photoinitiator |
| 06/21/2001 | DE10050068A1 Method of analyzing factors responsible for errors in wafer patterns during the manufacture of semiconductor device, involves placing first and second masks in etching chamber to form an overlapping zone between the two masks |
| 06/21/2001 | CA2392771A1 Photoinitiator system with acylphosphine oxide initiators |
| 06/21/2001 | CA2362640A1 Squarylium compounds and optical recording media made by using the same |
| 06/20/2001 | EP1109427A2 Radiation source for use in lithographic projection apparatus |
| 06/20/2001 | EP1109314A1 Pulse power system for a gas discharge laser |
| 06/20/2001 | EP1109067A2 Illuminator |
| 06/20/2001 | EP1109066A1 Chemical amplification type negative-working resist composition for electron beams or x-rays |
| 06/20/2001 | EP1109059A2 Oxonol infrared radiation sensitive compounds |
| 06/20/2001 | EP1108723A1 Organosilyl radical generators and their applications |
| 06/20/2001 | EP1108275A1 Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| 06/20/2001 | EP1108237A1 Polymers having silicon-containing acetal or ketal functional groups |
| 06/20/2001 | EP1107859A1 Method for making optical masters using incoherent light |
| 06/20/2001 | EP0858472B1 Photosensitive resin composition |
| 06/20/2001 | CN1300384A Retaining device for photo blanks |
| 06/20/2001 | CN1300383A Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders |
| 06/20/2001 | CN1300097A Electronic-beam exposing method |
| 06/20/2001 | CN1299989A Flat printed element capable of infrared laser imaging and making method for said printed element and imaging method thereof |
| 06/20/2001 | CN1299812A Oximate light initiator |
| 06/19/2001 | US6249904 Method and apparatus for submicron IC design using edge fragment tagging to correct edge placement distortion |
| 06/19/2001 | US6249597 Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same |
| 06/19/2001 | US6249452 Semiconductor device having offset twisted bit lines |
| 06/19/2001 | US6249385 Laser irradiation apparatus |
| 06/19/2001 | US6249382 Illumination optical system and projection exposure apparatus using same |
| 06/19/2001 | US6249336 Projection exposure system |
| 06/19/2001 | US6249335 Photo-mask and method of exposing and projection-exposing apparatus |
| 06/19/2001 | US6249331 Methods for forming an orientation layer on LCD panels |
| 06/19/2001 | US6249306 Multi-beam drawing method using partially damaged light emitting devices and including spiral correction |
| 06/19/2001 | US6249036 Stepper alignment mark formation with dual field oxide process |
| 06/19/2001 | US6248920 Reacting an aldehyde or ketone compound and an acid halide compound in a one pot reaction in the presence of an organometallic compound to directly form the esters without forming an intermediate alcohol |