| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/05/2001 | DE10029938A1 Optical system for projection exposure device, includes optical element which consists of magnesium fluoride, as main constituent |
| 07/05/2001 | CA2396721A1 Method and device for the mask-free production of biopolymers by means of a light diode array |
| 07/04/2001 | EP1113337A2 Optical arrangement |
| 07/04/2001 | EP1113336A2 Optical arrangement |
| 07/04/2001 | EP1113335A1 Photopolymerizable compositions |
| 07/04/2001 | EP1113334A1 Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition |
| 07/04/2001 | EP1113005A1 Sulfonium salt compounds |
| 07/04/2001 | EP1112995A1 Alicyclic compounds and curable resin composition |
| 07/04/2001 | EP1112859A2 Donor element for laser-induced thermal transfer |
| 07/04/2001 | EP1112843A2 Waterless planographic printing plate precursor and production method thereof |
| 07/04/2001 | EP1112842A2 Inner drum type image recording device |
| 07/04/2001 | EP1112590A1 Method for patterning a layer of a low dielectric constant material |
| 07/04/2001 | EP1112578A1 Apparatus for generating focused electromagnetic radiation |
| 07/04/2001 | EP1112530A1 Method for producing micro-openings |
| 07/04/2001 | EP1112307A1 Screen coating composition and method for applying same |
| 07/04/2001 | EP1112288A1 Thermal- and photoinitiated radical polymerization in the presence of an addition fragmentation agent |
| 07/04/2001 | EP1112140A1 Laser radiation source |
| 07/04/2001 | EP1100630A4 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 07/04/2001 | CN2437900Y Board driving device for PC board vertical etching machine |
| 07/04/2001 | CN1302452A Organic removal process |
| 07/04/2001 | CN1302391A Improved thermosetting anti-reflective coatings at deep ultraviolet |
| 07/04/2001 | CN1302327A Acidic composition containing fluoride for removal of photoresists and etch residues |
| 07/04/2001 | CN1302081A Electronic beam mask and method for producing mask and exposing method |
| 07/04/2001 | CN1301995A Composition of developing liquid |
| 07/04/2001 | CN1301994A Conveyer belt type vacuum applicator and method for applying anti-corrosion film on printed circuit |
| 07/04/2001 | CN1301993A 感光性树脂组成物 The photosensitive resin composition |
| 07/04/2001 | CN1301797A Organic polymer with anti-reflective coating layer and its preparing method |
| 07/04/2001 | CN1301778A Organic anti-reflective paint polymer and its preparing method |
| 07/04/2001 | CN1068123C Polyester precoated photosensitive plate and mfg. method thereof |
| 07/03/2001 | USRE37257 Transfer imaging system |
| 07/03/2001 | US6256441 Optical waveguide and manufacturing thereof |
| 07/03/2001 | US6256371 X-ray illumination device, x-ray illumination method, and an x-ray exposing device and device manufacturing method using the same |
| 07/03/2001 | US6256087 Light intensity measurement system |
| 07/03/2001 | US6256086 Projection exposure apparatus, and device manufacturing method |
| 07/03/2001 | US6256085 Exposure apparatus |
| 07/03/2001 | US6255796 Electromagnetic alignment and scanning apparatus |
| 07/03/2001 | US6255795 Electromagnetic alignment and scanning apparatus |
| 07/03/2001 | US6255663 Charged particle beam exposure apparatus and semiconductor device manufacturing method |
| 07/03/2001 | US6255661 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 07/03/2001 | US6255405 Radiation absorbing copolymer comprising recurring unit containing organic chromophore |
| 07/03/2001 | US6255225 Method of forming a resist pattern, a method of manufacturing semiconductor device by the same method, and a device and a hot plate for forming a resist pattern |
| 07/03/2001 | US6255189 Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with an alignment grating and an at least partly recessed oxide pattern |
| 07/03/2001 | US6255178 Method for forming transistors with raised source and drains and device formed thereby |
| 07/03/2001 | US6255042 Developing system for alkaline-developable lithographic printing plates with different interlayers |
| 07/03/2001 | US6255041 Method for formation of patterned resist layer |
| 07/03/2001 | US6255038 Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist |
| 07/03/2001 | US6255036 Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed |
| 07/03/2001 | US6255035 Method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devices |
| 07/03/2001 | US6255034 Radiation sensitive composition |
| 07/03/2001 | US6255033 Positive acting photoresist compositions and imageable element |
| 07/03/2001 | US6255032 Transparent acrylic copolymer containing 1-15 mol % of carboxyl groups, 1-15 mol % of hydroxyl groups, 30-50 mol % tertiary butyl ester groups, and 5-20 mol % phenyl groups; an organic pigment; and a photo acid generator |
| 07/03/2001 | US6255022 Having a reduced critical dimension bias between isolated and dense lines and reduced edge roughness. |
| 07/03/2001 | US6254936 Environment exchange control for material on a wafer surface |
| 07/03/2001 | US6254689 Used to remove photoresist contamination, flowing oxygen into the chamber, exposing it to ultraviolet radiation (uv), a reactive agent ozone is produced and reacts with the heated photoresist to produce volatile products such as co2 |
| 07/03/2001 | US6254682 Cassette invertor apparatus |
| 07/03/2001 | US6253464 Method for protection of lithographic components from particle contamination |
| 07/03/2001 | CA2215750C Magnification correction for small field scanning |
| 07/03/2001 | CA2049362C Near infrared laser absorbing coating and method for using same in color imaging and proofing |
| 07/03/2001 | CA2036471C Presensitized plate for use in making lithographic printing plate |
| 06/28/2001 | WO2001047074A1 Line narrowed laser with bidirection beam expansion |
| 06/28/2001 | WO2001047003A2 Methods and apparatus for forming submicron patterns on films |
| 06/28/2001 | WO2001047001A1 Exposure method and apparatus |
| 06/28/2001 | WO2001046999A2 Method and apparatus for supercritical processing of a workpiece |
| 06/28/2001 | WO2001046680A2 Reticle for use in photolithography and methods for making same and inspecting |
| 06/28/2001 | WO2001046318A1 Lithographic printing plate having high chemical resistance |
| 06/28/2001 | WO2001046288A1 Resin composition curable with actinic energy ray |
| 06/28/2001 | WO2001045958A2 Thermally imageable element and lithographic printing plate |
| 06/28/2001 | US20010005639 Method for coating a resist film and resist coater |
| 06/28/2001 | US20010005638 Method for removing photoresist layer |
| 06/28/2001 | US20010005635 Performing ashing by the use of a plasma of a mixed gas of oxygen and nitrogen |
| 06/28/2001 | US20010005619 Method of forming photomask and method of manufacturing semiconductor device |
| 06/28/2001 | US20010005595 Holding a semiconductor wafer during microlithography, especially in a vacuum environment, by an electrostatic force generated by an electrode; a channel configured for heat exchanging gas flow after controller confirms adhesion |
| 06/28/2001 | US20010005571 Single component developer for use with ghost exposure |
| 06/28/2001 | US20010005569 Photosensitive resin composition |
| 06/28/2001 | US20010005566 Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium |
| 06/28/2001 | US20010005565 Exposing the photoresist layer to a first pattern-defining light using a first mask; and exposing the photoresist layer to a second pattern defining light using a second mask; forming two dimensional random pattern |
| 06/28/2001 | US20010005532 Method for coating a plurality of fluid layers onto a substrate |
| 06/28/2001 | US20010004878 For photolithography process for use in manufacturing semiconductors |
| 06/28/2001 | US20010004864 Apparatus for producing printing plates |
| 06/28/2001 | DE19961867A1 Einrichtung zur Herstellung von Druckformen Means for the production of printing plates |
| 06/28/2001 | DE19957928A1 Local hydrophobization of hydrophilic substrate, e.g. biochip for immobilizing hydrophobic and hydrophilic polypeptide, involves drying, coating with hexamethylenedisilazan, masking with photoresist and oxygen plasma treatment |
| 06/28/2001 | DE10063263A1 Organisches nicht reflektierendes Beschichtungspolymer und dessen Herstellungsverfahren Organic non-reflective coating polymer and its production method |
| 06/28/2001 | DE10063239A1 Optical projection system to form a circuit design on a wafer substrate has a lamp with vacuum ultra violet light to illuminate a lined plate with a diffraction unit of quartz glass in the optical projection assembly |
| 06/28/2001 | DE10063064A1 Positive resist composition, useful for the processing of semiconductors, contains a resin derived from (meth)acrylic acid dihydroxy-1-adamantyl ester and (meth)acrylic acid-alkyl-2-adamantyl ester |
| 06/28/2001 | DE10051584A1 Photolithographic mask for manufacture of semiconductor circuits has pattern edges distributed on corresponding monitoring markings |
| 06/28/2001 | CA2395760A1 Methods and apparatus for forming submicron patterns on films |
| 06/28/2001 | CA2387373A1 Method and apparatus for supercritical processing of a workpiece |
| 06/27/2001 | EP1111489A1 Two-dimensional positioning apparatus and method for measuring laser light from the apparatus |
| 06/27/2001 | EP1111472A2 Position detection system for a lithographic apparatus |
| 06/27/2001 | EP1111471A2 Lithographic projection apparatus with collision preventing positioning device |
| 06/27/2001 | EP1111470A2 Lithographic apparatus with a balanced positioning system |
| 06/27/2001 | EP1111469A2 Lithographic apparatus with a balanced positioning system |
| 06/27/2001 | EP1111468A2 Stage assembly for exposure apparatus |
| 06/27/2001 | EP1111467A1 Chemical resistant underlayer for positive-working printing plates |
| 06/27/2001 | EP1111466A1 The chemical amplified resist composition containing norbornane type low molecular additive |
| 06/27/2001 | EP1111465A1 Negative radiation-sensitive resin composition |
| 06/27/2001 | EP1111464A1 Coating apparatus |
| 06/27/2001 | EP1111425A2 Optical projection system |
| 06/27/2001 | EP1110747A1 Laser image forming method |
| 06/27/2001 | EP1110719A2 Heat-sensitive lithographic printing plate precursor |