| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/25/2013 | CN101813892B Immersion lithography apparatus and method for manufacturing microdevice using lithography device |
| 09/25/2013 | CN101689027B Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component |
| 09/25/2013 | CN101558356B Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board |
| 09/24/2013 | US8542344 Lithographic apparatus and device manufacturing method |
| 09/24/2013 | US8542343 Lithographic apparatus |
| 09/24/2013 | US8541752 Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask |
| 09/24/2013 | US8541529 Positive resist composition, method of forming resist pattern, and polymeric compound |
| 09/24/2013 | US8541165 Resin film forming method |
| 09/24/2013 | US8541164 Sub-wavelength lithography via Rabi oscillations |
| 09/24/2013 | US8541163 Transporting method, transporting apparatus, exposure method, and exposure apparatus |
| 09/24/2013 | US8541162 High resolution, solvent resistant, thin elastomeric printing plates |
| 09/24/2013 | US8541161 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method |
| 09/24/2013 | US8541160 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same |
| 09/24/2013 | US8541159 Positive resist composition for immersion exposure and pattern forming method |
| 09/24/2013 | US8541158 Positive resist compositions and patterning process |
| 09/24/2013 | US8541157 Resist composition, method of forming resist pattern, compound and acid generator including the same |
| 09/24/2013 | US8541150 Manufacturing method of polymer film with photonic crystal structure |
| 09/24/2013 | US8540824 Substrate processing method |
| 09/24/2013 | CA2714871C Method and apparatus for production of a cast component |
| 09/24/2013 | CA2693228C A double exposure semiconductor process for improved process margin |
| 09/19/2013 | WO2013138066A1 Dual angles of incidence and azimuth angles optical metrology |
| 09/19/2013 | WO2013137345A1 Original plate for lithographic printing plate and lithographic printing plate production method |
| 09/19/2013 | WO2013137226A1 Photosensitive film, method for producing input device of electrostatic capacitance type and input device of electrostatic capacitance type, and image display device equipped with said input device |
| 09/19/2013 | WO2013137157A1 Photoresist composition, method for forming resist pattern, acid diffusion control agent and compound |
| 09/19/2013 | WO2013136959A1 Exposure/drawing device and exposure/drawing method |
| 09/19/2013 | WO2013136882A1 Mask blank, and method for producing mask for transcription use |
| 09/19/2013 | WO2013136881A1 Mask blank, and method for producing mask for transcription use |
| 09/19/2013 | WO2013136834A1 Mask unit, substrate processing device, method for producing mask unit, and substrate processing method |
| 09/19/2013 | WO2013136318A1 Photoresist stripping and cleaning composition, method of its preparation and its use |
| 09/19/2013 | WO2013135532A1 Illumination optical unit for a projection exposure apparatus |
| 09/19/2013 | WO2013135500A1 Method for adjusting an optical system of a microlithographic projection exposure apparatus |
| 09/19/2013 | WO2013135494A2 Lithographic apparatus |
| 09/19/2013 | WO2013048069A9 Positive-type photosensitive resin composition, and insulating film and oled formed using the same |
| 09/19/2013 | US20130244186 Composition And Method For Removing Photoresist And Bottom Anti-Reflective Coating For A Semiconductor Substrate |
| 09/19/2013 | US20130244185 Radiation-sensitive resin composition, method for forming resist pattern, organic acid and acid generating agent |
| 09/19/2013 | US20130244184 Sub-wavelength lithography via rabi oscillations |
| 09/19/2013 | US20130244183 Process for producing ink jet recording head |
| 09/19/2013 | US20130244182 Photosensitive composition comprising an acrylate compound |
| 09/19/2013 | US20130244181 Polymers, methods of use thereof, and methods of decomposition thereof |
| 09/19/2013 | US20130244180 Photoresist overcoat compositions and methods of forming electronic devices |
| 09/19/2013 | US20130244178 Photoresists comprising multi-amide component |
| 09/19/2013 | US20130244177 Photosensitive resin composition, color filter and liquid crystal display device |
| 09/19/2013 | US20130244176 Resist composition and method of forming resist pattern |
| 09/19/2013 | US20130244175 Lithographic printing plate precursors and methods of use |
| 09/19/2013 | US20130244174 Positive-type photoresist composition |
| 09/19/2013 | US20130244146 Method of manufacturing a semiconductor device |
| 09/19/2013 | US20130244145 Method of fabricating a polarized color filter |
| 09/19/2013 | US20130244141 Photomask and pattern forming method |
| 09/19/2013 | US20130244140 Non-Planar Lithography Mask and System and Methods |
| 09/19/2013 | US20130244139 Reflective Lithography Masks and Systems and Methods |
| 09/19/2013 | US20130242527 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| 09/19/2013 | US20130242394 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses |
| 09/19/2013 | US20130242305 Imaging Overlay Metrology Target and Complimentary Overlay Metrology Measurement System |
| 09/19/2013 | US20130242281 Exposure apparatus |
| 09/19/2013 | US20130242280 Illumination optical apparatus and projection exposure apparatus |
| 09/19/2013 | US20130242278 Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objective |
| 09/19/2013 | US20130242277 Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus |
| 09/19/2013 | US20130241358 Quartz crystal device and method for fabricating the same |
| 09/19/2013 | US20130239832 Positive-working lithographic printing plate precursors |
| 09/19/2013 | DE10297658B4 Verfahren und System zum Reparieren defekter Photomasken Method and system for repairing defective photomasks |
| 09/19/2013 | DE102012204273A1 Beleuchtungsoptik für die EUV-Projektionslithografie Illumination optics for EUV projection lithography |
| 09/19/2013 | DE102012203959A1 Optical system for use in illuminating device of microlithographic projection exposure system for manufacturing LCDs, has facets trapping light from other respective facets during operating exposure system in switching positions |
| 09/19/2013 | DE102012203950A1 Beleuchtungsoptik für eine Projektionsbelichtungsanlage Illumination optics for a projection exposure apparatus |
| 09/19/2013 | DE102012107105A1 Method for cleaning optical component of extreme-UV (EUV) projection exposure system, involves operating projection exposure system in presence of gas with work light so that work light ions are produced to clean optical component |
| 09/19/2013 | DE102011076435B4 Verfahren sowie Vorrichtung zur Einstellung einer Beleuchtungsoptik Method and apparatus for adjusting illumination optics |
| 09/18/2013 | EP2639640A1 Machine for exposing panels provided with a panel turner |
| 09/18/2013 | EP2639639A2 Method of manufacturing a semiconductor device |
| 09/18/2013 | EP2639638A1 Positive photosensitive resin composition, and semiconductor device and display therewith |
| 09/18/2013 | EP2639637A1 Positive-type photoresist composition |
| 09/18/2013 | EP2639636A1 Positive-type photoresist composition |
| 09/18/2013 | EP2638432A2 Nanoscale photolithography |
| 09/18/2013 | EP2638089A1 Photopolymer formulation for producing holographic media |
| 09/18/2013 | CN203204301U 显影机 Developers |
| 09/18/2013 | CN203204300U Circuit graph positioning exposure system of circuit board |
| 09/18/2013 | CN203204296U A LED light source exposure apparatus |
| 09/18/2013 | CN103314328A Film exposure method |
| 09/18/2013 | CN103311097A Method for manufacturing micro-nano graph on sapphire substrate |
| 09/18/2013 | CN103309178A Double-face alignment exposure device for semiconductor wafer |
| 09/18/2013 | CN103309177A Workpiece platform system of photoetching machine |
| 09/18/2013 | CN103309176A Six-freedom-degree micropositioner with lifting vacuum claw |
| 09/18/2013 | CN103309175A Alignment device and method for cascade micro-lens array of lithography machine illumination system |
| 09/18/2013 | CN103309174A Lithographic equipment, light-transmission unit and lithographic method employing dipolar exposure method |
| 09/18/2013 | CN103309173A Photoetching device and light-transmission unit including annular light-transmission aperture as well as photoetching method |
| 09/18/2013 | CN103309172A Exposure device and exposure method |
| 09/18/2013 | CN103309171A Generation method and information processing apparatus |
| 09/18/2013 | CN103309170A Auxiliary exposure apparatus |
| 09/18/2013 | CN103309169A Detection apparatus, exposure apparatus, and method of manufacturing device |
| 09/18/2013 | CN103309168A Reflective lithography masks and systems and methods |
| 09/18/2013 | CN103309167A Measuring system and measuring method for positional accuracy of motion platform |
| 09/18/2013 | CN103309166A Movable lens adjustment device and adjustable optical system using same |
| 09/18/2013 | CN103309165A Formation method for semiconductor structure |
| 09/18/2013 | CN103309164A Formation method for semiconductor structure |
| 09/18/2013 | CN103309163A External reference interference silicon chip aligning system |
| 09/18/2013 | CN103309162A Photocurable composition, and encapsulated apparatus including a barrier layer including the same |
| 09/18/2013 | CN103309161A Photosensitive resin composition and uses thereof |
| 09/18/2013 | CN103309160A Novel negative chemical amplified photoresist and imaging method thereof |
| 09/18/2013 | CN103309159A Cationic photopolymerization type planographic printing plate material based on vinyl pyrrolidone copolymer resin |
| 09/18/2013 | CN103309158A Colored resin composition for color filter, color filter, liquid crystal display device and organic EL display device |
| 09/18/2013 | CN103309157A Polyvinylpyrrolidone copolymer resin-based composition capable of photoinitiated cationic polymerization imaging |
| 09/18/2013 | CN103309156A Ultraviolet curable ink receptive layer for color filter, and method of producing color filter |