| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/12/2001 | WO2001050198A2 Method for production of three-dimensionally arranged conducting and connecting structures for volumetric and energy flows |
| 07/12/2001 | WO2001050171A1 Projection lens comprising adjacent aspheric lens surfaces |
| 07/12/2001 | WO2001050161A1 CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME |
| 07/12/2001 | WO2001049510A1 Compressible plate for flexopgraphic printing and method for obtaining same |
| 07/12/2001 | WO2001049509A1 Printing plate in the form of a roller and method for obtaining same |
| 07/12/2001 | WO2000038286A8 ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE |
| 07/12/2001 | US20010007796 Polishing polymer surfaces on non-porous CMP pads |
| 07/12/2001 | US20010007786 Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns |
| 07/12/2001 | US20010007736 Photosensitive composition, image-forming material and image -forming method employing it |
| 07/12/2001 | US20010007735 Apparatus and method for exposing substrates |
| 07/12/2001 | US20010007734 Position detecting method, position detecting unit, exposure method, exposure apparatus, a computer readable recording medium, and device manufacturing method |
| 07/12/2001 | US20010007732 Forming plurality of exposure openings; overcoating with photoresist; patterning |
| 07/12/2001 | US20010007495 Projection exposure apparatus and device manufacturing method including an aperture member having a circular light transmitting portion and a light blocking member |
| 07/12/2001 | US20010007347 Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe |
| 07/12/2001 | DE10050581A1 Reflective optical component for projection exposure device, has internal surface with reflecting sections that reflect light with wavelength shorter than 157 nanometers |
| 07/11/2001 | EP1115035A1 Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
| 07/11/2001 | EP1115034A1 Use of N,N-dialkyl ureas in photoresist developers |
| 07/11/2001 | EP1115033A1 Use of alkylated polyamines in photoresist developers |
| 07/11/2001 | EP1115032A2 Scanning exposure apparatus, exposure method using the same, and device manufacturing method |
| 07/11/2001 | EP1115031A2 Pulse light pattern writer |
| 07/11/2001 | EP1115030A2 Optical system |
| 07/11/2001 | EP1115019A2 Projection exposure lens with aspheric elements |
| 07/11/2001 | EP1114802A1 Quartz glass member, production method therefor, and projection aligner using it |
| 07/11/2001 | EP1114355A2 Method and apparatus for developing photoresist patterns |
| 07/11/2001 | EP1114067A1 Polymerisation and/or crosslinking method under electron beam and/or gamma radiation |
| 07/11/2001 | EP1113832A1 Surface micromachined microneedles |
| 07/11/2001 | EP1091230A9 Projection optical system that projects an image of a pattern formed on a reticle onto a substrate |
| 07/11/2001 | EP1083777A9 Laser-excited plasma light source, exposure apparatus and its manufacturing method, and device manufacturing method |
| 07/11/2001 | EP0943119B1 Reticle that compensates for lens error in a photolithographic system |
| 07/11/2001 | EP0832448B1 Method of manufacturing passive elements using conductive polypyrrole formulations |
| 07/11/2001 | CN1303401A Water soluble negative-working photoresist composition |
| 07/11/2001 | CN1303074A Antiforge microelectronic chip method and device for commodities |
| 07/11/2001 | CN1303029A Combined nitrogen gas fumigating box for diazo copy machine |
| 07/11/2001 | CN1302799A 锍盐化合物 Sulfonium salt compound |
| 07/11/2001 | CN1302736A Original edition used for lithographic printing plate |
| 07/11/2001 | CN1068442C Method for forming pattern by silylation |
| 07/10/2001 | US6259567 Microlens structure having two anamorphic surfaces on opposing ends of a single high index substances and method of fabricating the same |
| 07/10/2001 | US6259525 Semiconductor wafer alignment tools |
| 07/10/2001 | US6259521 Method and apparatus for controlling photolithography parameters based on photoresist images |
| 07/10/2001 | US6259513 Illumination system with spatially controllable partial coherence |
| 07/10/2001 | US6259512 Illumination system and exposure apparatus having the same |
| 07/10/2001 | US6259511 Scanning type exposure apparatus |
| 07/10/2001 | US6259510 Exposure method and apparatus |
| 07/10/2001 | US6259509 Exposure apparatus and device manufacturing method |
| 07/10/2001 | US6259508 Projection optical system and exposure apparatus and method |
| 07/10/2001 | US6259174 Positioning apparatus, drive unit and exposure apparatus incorporating the positioning apparatus |
| 07/10/2001 | US6259106 Apparatus and method for controlling a beam shape |
| 07/10/2001 | US6259104 Superresolution in optical microscopy and microlithography |
| 07/10/2001 | US6259072 Zone controlled radiant heating system utilizing focused reflector |
| 07/10/2001 | US6258972 Pattern formation method and surface treating agent |
| 07/10/2001 | US6258734 Method for patterning semiconductor devices on a silicon substrate using oxynitride film |
| 07/10/2001 | US6258725 Method for forming metal line of semiconductor device by (TiA1)N anti-reflective coating layer |
| 07/10/2001 | US6258611 Method for determining translation portion of misalignment error in a stepper |
| 07/10/2001 | US6258514 Top surface imaging technique using a topcoat delivery system |
| 07/10/2001 | US6258513 Phase shifting |
| 07/10/2001 | US6258512 Method for preparation of lithographic printing plate and lithographic printing plate prepared thereby |
| 07/10/2001 | US6258511 Dividing pattern to be transferred; forming stripes; masking; exposuring zones; transferring light source |
| 07/10/2001 | US6258510 Photosensitive polymer on aluminum substrate |
| 07/10/2001 | US6258508 Photoresists |
| 07/10/2001 | US6258507 Photoresist compositions |
| 07/10/2001 | US6258506 Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom |
| 07/10/2001 | US6258493 Phase shifting circuit manufacture method and apparatus |
| 07/10/2001 | US6258492 X-ray mask structure and method of making the same |
| 07/10/2001 | US6258410 Metallic substrate with hydrophilic surface; cutting; prevention stresses |
| 07/10/2001 | US6257778 Method for developing front surface of substrate with improved developing function of developing solution and apparatus thereof |
| 07/10/2001 | US6257564 Vacuum chuck having vacuum-nipples wafer support |
| 07/05/2001 | WO2001049087A1 Method of generating euv radiation, method of manufacturing a device by means of said radiation, euv radiation source unit, and lithographic projection apparatus provided with such a radiation source unit |
| 07/05/2001 | WO2001049086A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 07/05/2001 | WO2001049085A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 07/05/2001 | WO2001048881A1 Wavemeter for gas discharge laser |
| 07/05/2001 | WO2001048812A2 Method and system for efficiently computing a number of integrated circuit dies |
| 07/05/2001 | WO2001048811A2 A method for efficiently computing a number of integrated circuit dies |
| 07/05/2001 | WO2001048804A1 In situ post-etch photoresist and polymer stripping and dielectric etch chamber cleaning |
| 07/05/2001 | WO2001048555A1 Thinner for rinsing photoresist and method of treating photoresist layer |
| 07/05/2001 | WO2001048554A1 Enhancement of photoresist plasma etch resistance via electron beam surface cure |
| 07/05/2001 | WO2001048553A1 A method for maximizing integrated circuit die production |
| 07/05/2001 | WO2001047852A1 Onium salt compound, energy-ray-curable composition containing the same, and cured article thereof |
| 07/05/2001 | WO2001047627A1 Method and device for the mask-free production of biopolymers by means of a light diode array |
| 07/05/2001 | WO2001040864A8 Photoresist dispense method by compensation for substrate reflectivity |
| 07/05/2001 | WO2000067291A3 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
| 07/05/2001 | US20010006936 Removing photoresist residue; does not corrode or attack titanium or other metallurgy, oxide or nitride layers on the substrate |
| 07/05/2001 | US20010006766 Method for patterning thin films |
| 07/05/2001 | US20010006764 Using masking pattern |
| 07/05/2001 | US20010006763 Plurality electrodes arranged along baseplate; transportation means; controllers |
| 07/05/2001 | US20010006762 Balanced positioning system for use in lithographic apparatus |
| 07/05/2001 | US20010006761 Method and apparatus for resist planarization |
| 07/05/2001 | US20010006760 Photosensitive resin and photosensitive resin composition containing the same |
| 07/05/2001 | US20010006759 Radiation sensitive compositions |
| 07/05/2001 | US20010006758 Fine photoresist patterns |
| 07/05/2001 | US20010006752 Adamantane or derivatives as additive and a negative-type chloromethylstyrene/chlorostyrene copolymer as the resist |
| 07/05/2001 | US20010006414 High resolution optical stepper |
| 07/05/2001 | US20010006412 Optical arrangement |
| 07/05/2001 | US20010006320 Method for fabricating screen in color CRT |
| 07/05/2001 | US20010006217 Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit |
| 07/05/2001 | US20010006216 Misalignment inspection method, charge beam exposure method, and substrate for pattern observation |
| 07/05/2001 | US20010006181 Counter-top ticket display, writing stand and method |
| 07/05/2001 | US20010006166 Supplying a mixture of etching gas and an acid neutralizing gas into a vacuum chamber in which a water soluble material of sidewall polymer rails left behind on aluminum/copper line from reactive ion etching, removing it with deionized water |
| 07/05/2001 | US20010006072 Ultrasonic processing device and electronic parts fabrication method using the same |
| 07/05/2001 | DE19962803A1 Verfahren und Vorrichtung zur maskenfreien Herstellung von Biopolymeren Method and apparatus for maskless production of biopolymers |
| 07/05/2001 | DE10056845A1 Development of light-sensitive material, e.g. silver halide emulsion, non-silver salt layer or lithographic printing plate, by immersion or coating system includes peel with peeling agent having fast liquid absorption rate |