| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/19/2001 | WO2000074109A3 Laser writing method and apparatus |
| 07/19/2001 | WO2000073856A3 Pattern forming process comprising chemical machining and electrical discharge machining |
| 07/19/2001 | US20010008993 Non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components |
| 07/19/2001 | US20010008878 Comprising boric acid, organic amine, water, optional glycol solvent, chelating agent |
| 07/19/2001 | US20010008809 Forming a resist layer on a target layer and patterning the resist layer to form original openings and a slit in the resist layer, reflowing resist layer patterned under heat to cause deformation of original openings and the slit |
| 07/19/2001 | US20010008803 Plasma surface treatment method and resulting device |
| 07/19/2001 | US20010008748 Compositions and processes for photogeneration of acid |
| 07/19/2001 | US20010008747 Process for filling apertures in a circuit board or chip carrier |
| 07/19/2001 | US20010008745 Mixing benzotriazole with development solution |
| 07/19/2001 | US20010008744 Mixing benzotriazole with development solution |
| 07/19/2001 | US20010008743 Corrosion inhibitor of NiCu for high performance writers |
| 07/19/2001 | US20010008741 Forming photosensitive layer and transmission reducing layerin determination pattern; exposure to radiation; development |
| 07/19/2001 | US20010008740 Multilayer; support, ink receptive layer and water receptive layer |
| 07/19/2001 | US20010008739 Compounds generate an acid upon irradiation with actinic rays |
| 07/19/2001 | US20010008737 Exposure apparatus with a pulsed laser |
| 07/19/2001 | US20010008701 Coversheet |
| 07/19/2001 | US20010008540 Calcium flouride crystal, optical article and exposure apparatus for photo-lithography using the same |
| 07/19/2001 | US20010008440 Optical system |
| 07/19/2001 | US20010008273 Abbe arm calibration system for use in lithographic apparatus |
| 07/19/2001 | US20010008140 Solution for cleaning metallized microelectronic workpieces and methods of using same |
| 07/19/2001 | US20010008104 Method of offset printing with a reusable substrate |
| 07/19/2001 | DE19963587A1 Optische Anordnung Optical arrangement |
| 07/19/2001 | DE19951445C1 Mercury short-arc lamp for exposure system, has specific diameter relation between head and rod of electrode and specific angle between longitudinal axis of electrode and imaginary auxiliary line |
| 07/19/2001 | DE10001277A1 Elektronenoptischer Korrektor zur Beseitigung der Bildfehler dritter Ordnung Electron optical corrector to eliminate the aberrations of the third order |
| 07/19/2001 | CA2397055A1 System and method for writing fiber gratings |
| 07/19/2001 | CA2396259A1 Abbe error correction system and method |
| 07/19/2001 | CA2395960A1 Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulsewidths |
| 07/18/2001 | EP1117126A1 Discharge lamp |
| 07/18/2001 | EP1117009A2 Method of making resist pattern |
| 07/18/2001 | EP1117008A2 UV-assisted chemical modification of photoresist images |
| 07/18/2001 | EP1117007A2 Development processing apparatus and developing method for photosensitive material |
| 07/18/2001 | EP1117006A1 Photoresist having increased photospeed |
| 07/18/2001 | EP1117005A1 Polymer compound, method of producing the same, photosensitive composition, and pattern formation method |
| 07/18/2001 | EP1117004A2 Electron beam or x-ray negative-working resist composition |
| 07/18/2001 | EP1117003A1 Chemical amplification type resist composition |
| 07/18/2001 | EP1117002A1 Negative-working resist composition |
| 07/18/2001 | EP1117001A2 Photolithographic process and mask therefor |
| 07/18/2001 | EP1116421A1 Method for producing etched circuits |
| 07/18/2001 | EP1116074A1 Environment exchange control for material on a wafer surface |
| 07/18/2001 | EP1116073A1 Radiation sensitive coating composition useful for lithographic printing plates and the like |
| 07/18/2001 | EP1116072A1 Low thermal distortion extreme-uv lithography reticle |
| 07/18/2001 | EP1116053A2 Multilayer optical element |
| 07/18/2001 | EP1115751A1 Photopolymerization process and composition employing a charge transfer complex and cationic photoinitiator |
| 07/18/2001 | EP1115545A1 Device and method for transferring microstructures |
| 07/18/2001 | EP1115424A1 Method and measuring device for determining a plurality of analytes in a sample |
| 07/18/2001 | EP0713586B1 Ablation transfer onto intermediate receptors |
| 07/18/2001 | CN1304420A Fractionated novolak resin and photoresist composition therefrom |
| 07/18/2001 | CN1304353A Application of textured or patterned surfaces to prototype |
| 07/18/2001 | CN1304282A Pulse light diagram recorder |
| 07/18/2001 | CN1304167A Method and device for forming film |
| 07/18/2001 | CN1303744A Process for coating board and system of coating board for implementing said process |
| 07/17/2001 | US6263299 Geometric aerial image simulation |
| 07/17/2001 | US6263007 Pulsed discharge gas laser having non-integral supply reservoir |
| 07/17/2001 | US6262845 Apparatus and method for generating partially coherent illumination for photolithography |
| 07/17/2001 | US6262836 High numerical aperture ring field projection system for extreme ultraviolet lithography |
| 07/17/2001 | US6262826 Reflective optical imaging method and circuit |
| 07/17/2001 | US6262825 Apparatus and method for the enhanced imagewise exposure of a photosensitive material |
| 07/17/2001 | US6262797 Stage unit, drive table, and scanning exposure apparatus using the same |
| 07/17/2001 | US6262796 Positioning device having two object holders |
| 07/17/2001 | US6262795 Apparatus and method for the improvement of illumination uniformity in photolithographic systems |
| 07/17/2001 | US6262794 Exposure apparatus and device manufacturing method |
| 07/17/2001 | US6262793 Method of manufacturing and using correction member to correct aberration in projection exposure apparatus |
| 07/17/2001 | US6262792 Optical exposure apparatus of scanning exposure system and its exposing method |
| 07/17/2001 | US6262791 Optical element for imaging a flat mask onto a nonplanar substrate |
| 07/17/2001 | US6262697 Display having viewable and conductive images |
| 07/17/2001 | US6262429 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 07/17/2001 | US6262428 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 07/17/2001 | US6262425 Curvilinear axis set-up for charged particle lithography |
| 07/17/2001 | US6262222 Stability; for microlithography |
| 07/17/2001 | US6262181 As component of photoresists |
| 07/17/2001 | US6261970 Reworking; coating photoresist on substrate to pattern; photoetching; removal by applying thinner mixture of butyl acetate and ethyl acetate |
| 07/17/2001 | US6261938 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 07/17/2001 | US6261776 Nucleic acid arrays |
| 07/17/2001 | US6261751 Low temperature anti-reflective coating for IC lithography |
| 07/17/2001 | US6261748 Recovering method of support and useful ingredient from image forming material |
| 07/17/2001 | US6261745 Comprises salt of hydrofluoric acid with base free from metal, organic solvent, water, and acetylene alcohol/alkylene oxide adduct; used in removing photoresist residues via dry-etched, ashed substrates without damaging spin on glass layer |
| 07/17/2001 | US6261744 Baking apparatus and baking method |
| 07/17/2001 | US6261743 Antireflective coating compositions comprising photoacid generators |
| 07/17/2001 | US6261741 Photosensitive heat-resistant resin composition, method of patterning insulating film made of the same, and patterned insulating film obtained thereby |
| 07/17/2001 | US6261738 Latent curing catalysts for photoresists such as 2,2,2-trifluoro-1-phenyl-ethanone oxime-o-methyl sulfonate |
| 07/17/2001 | US6261736 Pattern forming material and pattern forming method |
| 07/17/2001 | US6261735 Composition and method for removing probing ink and negative photoresist from silicon wafers enclosures |
| 07/17/2001 | US6261734 Peel-developable single sheet color proofing system with laminated adhesive layers |
| 07/17/2001 | US6261733 Silver salt diffusion transfer material sensitized for blue light |
| 07/17/2001 | US6261728 Mask image scanning exposure method |
| 07/17/2001 | US6261727 Projection system having improved depth of focus achieved by using quadrupole mask in pupil plane of illuminator lens and phase-type filter in pupil plane of projection lens allows formation of photoresist wafer in single exposure, etching |
| 07/17/2001 | US6261725 Phase angle modulation of PSM by chemical treatment method |
| 07/17/2001 | US6261724 Method of modifying a microchip layout data set to generate a predicted mask printed data set |
| 07/17/2001 | US6261664 Optical structures for diffusing light |
| 07/17/2001 | US6261635 Applying liquid |
| 07/17/2001 | US6261507 Method of and apparatus for making a three-dimensional object by stereolithography |
| 07/17/2001 | US6261007 Substrate process method and substrate process apparatus |
| 07/17/2001 | US6260949 Resoles, novolaks, polyphenylene ethers; photoreactive epoxy resin |
| 07/17/2001 | US6260285 Precision workpiece positioning device |
| 07/17/2001 | US6260282 Stage control with reduced synchronization error and settling time |
| 07/17/2001 | CA2001490C Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms |
| 07/12/2001 | WO2001050523A2 Method to measure alignment using latent image grating structures |
| 07/12/2001 | WO2001050522A1 Method for determining optimal process targets in microelectronic fabrication |
| 07/12/2001 | WO2001050508A1 Etch and ash photoresist removal process |
| 07/12/2001 | WO2001050506A1 Mask recycle process |