| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/31/2001 | US6268108 Composition for forming antireflective coating film and method for forming resist pattern using same |
| 07/31/2001 | US6268106 Low molecular weight polymer |
| 07/31/2001 | US6268094 Photosensitive media cartridge having an ambient condition sensor |
| 07/31/2001 | US6268093 Optical exposure system |
| 07/31/2001 | US6268091 Primary pattern; diffraction grating |
| 07/31/2001 | US6268089 Photorecording medium and process for forming medium |
| 07/31/2001 | US6267516 Developing apparatus and developing nozzle |
| 07/26/2001 | WO2001054184A1 Method for removing residues with reduced etching of oxide |
| 07/26/2001 | WO2001054046A1 Geometric aerial image simulation |
| 07/26/2001 | WO2001053891A1 Method for ionic lithography, high contrast coating, equipment and reticle therefor |
| 07/26/2001 | WO2001053890A1 Photosensitive resin composition |
| 07/26/2001 | WO2001053889A1 A mold for nano imprinting |
| 07/26/2001 | WO2001053420A1 Curable composition containing reactive melamine derivative, cured product, and laminate |
| 07/26/2001 | WO2001053375A1 Polynuclear epoxy compound, resin obtained therefrom curable with actinic energy ray, and photocurable/thermosetting resin composition containing the same |
| 07/26/2001 | WO2001053065A1 Manufacturing method for multilayer fluorescent information carriers |
| 07/26/2001 | US20010010014 Low pressure stent |
| 07/26/2001 | US20010009751 Lithographic process |
| 07/26/2001 | US20010009750 Laminate film and processes for preparing printed wiring board |
| 07/26/2001 | US20010009749 Comprising polyhydroxystyrene protected by 1-ethoxyethanol, photosensitive acid generator, solvent and polystyrene filler; dimensional and shape control of semiconductors; responsive to design rule of <0.15mu m; miniaturization |
| 07/26/2001 | US20010009746 Adding a dissolution inhibitor to a polymer soluble in an aqueous alkaline developer and a quinonediazide photosensitizer to increase the solubility difference between the exposed and unexposed parts; fineness; resolution; films |
| 07/26/2001 | US20010009597 Self-alignment hybridization process and component |
| 07/26/2001 | US20010009560 Narrow band excimer or molecular fluorine laser with adjustable bandwidth |
| 07/26/2001 | US20010009559 Narrow beam ArF excimer laser device |
| 07/26/2001 | US20010009455 Exposure apparatus |
| 07/26/2001 | US20010009452 Developing method and developing unit |
| 07/26/2001 | US20010009135 Film forming method and film forming apparatus |
| 07/26/2001 | US20010009129 Planographic printing plate |
| 07/26/2001 | DE19963588A1 Optische Anordnung Optical arrangement |
| 07/26/2001 | DE10048646A1 Mask component used in electron beam lithography system, has electroconductive antioxidation layer which is formed on surface of base material with area irradiated by charged particle beam |
| 07/26/2001 | DE10002626A1 Projection lens e.g. for photolithography during semiconductor manufacture, has double aspherical lens spaced from image plane by more than maximum lens diameter |
| 07/26/2001 | DE10001914A1 Photosensitive material exposure method, has individually controlled light sources each used for exposure of given number of raster points or pixels |
| 07/26/2001 | DE10001163A1 Method for coating base plate with PCBs with liquid coating material, involves transporting plate vertically along on coating roller in contact with roller to be coated by coating device |
| 07/26/2001 | DE10000193A1 Optisches System Optical system |
| 07/26/2001 | DE10000191A1 Optical arrangement has optical element, projection light source and compensation light feed device coupled to optical element via peripheral surface of optical element |
| 07/25/2001 | EP1119083A2 Narrow beam ArF excimer laser device |
| 07/25/2001 | EP1119028A1 Apparatus for curing resist |
| 07/25/2001 | EP1118910A2 A microlithography projection apparatus |
| 07/25/2001 | EP1118909A1 Imaging method for manufacture of microdevices |
| 07/25/2001 | EP1118905A2 Projector and display using optical element for diffraction and scattering |
| 07/25/2001 | EP1118474A1 Method for making micro-emulsions |
| 07/25/2001 | EP1118472A1 Method of lithographic printing with a reusable printing plate substrate |
| 07/25/2001 | EP1118471A1 Method of lithographic printing with a reusable substrate |
| 07/25/2001 | EP1118470A1 Method of lithographic printing with a reusable substrate |
| 07/25/2001 | EP1118390A2 Coating method and coating apparatus |
| 07/25/2001 | EP1118144A1 Line narrowing apparatus with high transparency prism beam expander |
| 07/25/2001 | EP1118109A1 Silicon carbide deposition method and use as a barrier layer and passivation layer |
| 07/25/2001 | EP1118107A1 In situ deposition of low k si carbide barrier layer, etch stop, and anti-reflective coating for damascene applications |
| 07/25/2001 | EP1118041A2 Silicon-containing alcohols and polymers having silicon-containing tertiary ester groups made therefrom |
| 07/25/2001 | EP1118025A2 Silicon carbide for use as a low dielectric constant anti-reflective coating and its deposition method |
| 07/25/2001 | EP1117996A2 Method and device for producing and/or analyzing biochemical reaction supporting materials |
| 07/25/2001 | EP1117714A1 Water soluble positive-working photoresist composition |
| 07/25/2001 | EP1117478A2 Support for a method for determining an analyte and a method for producing the support |
| 07/25/2001 | EP0829036B9 Lithographic scanning exposure projection apparatus |
| 07/25/2001 | EP0824722B1 Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
| 07/25/2001 | EP0755803B1 Lithographic form plate |
| 07/25/2001 | CN1305608A 193 NM wavelength positive-working photoresist composition |
| 07/25/2001 | CN1305124A Photo sensitive resin composition |
| 07/25/2001 | CN1304945A Energy ray solidification type resin composition |
| 07/24/2001 | US6266389 Method for manufacturing a device, an exposure apparatus, and a method for manufacturing an exposure apparatus |
| 07/24/2001 | US6266192 Projection exposure apparatus and device manufacturing method |
| 07/24/2001 | US6266144 Stepper and scanner new exposure sequence with intra-field correction |
| 07/24/2001 | US6266134 System for exposing photopolymer with light from compact movable light source |
| 07/24/2001 | US6266133 Stage device, an exposure apparatus and a device manufacturing method using the same |
| 07/24/2001 | US6266132 Stepper with exposure time monitor |
| 07/24/2001 | US6266131 Exposure apparatus |
| 07/24/2001 | US6266130 Position detecting method and position detecting system |
| 07/24/2001 | US6266125 Resist processing method and apparatus |
| 07/24/2001 | US6265793 Linear motor coil for exposure apparatus |
| 07/24/2001 | US6265711 Scanning probe microscope assembly and method for making spectrophotometric near-field optical and scanning measurements |
| 07/24/2001 | US6265696 Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface |
| 07/24/2001 | US6265459 Coordination catalyst |
| 07/24/2001 | US6265323 Substrate processing method and apparatus |
| 07/24/2001 | US6265138 Process and apparatus for oblique beam revolution, for the effective laser stripping of sidewalls |
| 07/24/2001 | US6265137 Exposure method and device producing method using the same |
| 07/24/2001 | US6265136 Lithographic plate precursor |
| 07/24/2001 | US6265135 Positive-working electron beam or X-ray resist composition |
| 07/24/2001 | US6265134 Improved contrast (solubility differential), shrinkage and processing kinetics on radiation exposure |
| 07/24/2001 | US6265132 Photoimageable composition containing flexible oligomer |
| 07/24/2001 | US6265131 Alicyclic dissolution inhibitors and positive potoresist composition containing the same |
| 07/24/2001 | US6265130 Copolymers of bicycloalkenecarbonylmalonates |
| 07/24/2001 | US6265129 Form a resist pattern that had a micro-groove in each element and which yet was satisfactory in feature profile and resolution. |
| 07/24/2001 | US6265128 Imaging transfer system and process for transferring image and non-image areas thereof to a receptor element |
| 07/24/2001 | US6265121 Method of optical proximity correction |
| 07/24/2001 | US6265119 Method for producing semiconductor devices |
| 07/24/2001 | US6265116 Process for producing color filter |
| 07/24/2001 | US6265115 Projection lithography photomask blanks, preforms and methods of making |
| 07/24/2001 | US6264873 Forming successive layers of solidifiabel medium applied to previously formed layers of medium, and selectively exposing layers to prescribed stimulation in patterns to construct the three-dimensional object cross-section by cross-section |
| 07/24/2001 | US6264773 Apparatus and method for temporary and permanent attachment of pellicle frame to photomask substrate |
| 07/19/2001 | WO2001052311A2 Method of preparing a semiconductor substrate for subsequent silicide formation |
| 07/19/2001 | WO2001052301A1 Electron-optical corrector for eliminating third-order aberrations |
| 07/19/2001 | WO2001052004A1 Abbe error correction system and method |
| 07/19/2001 | WO2001051993A1 System, method and photomask for compensating aberrations in a photolithography patterning system |
| 07/19/2001 | WO2001051992A1 Method for producing article coated with patterned film and photosensitive composition |
| 07/19/2001 | WO2001051991A1 Resin composition, cured object obtained therefrom, and article thereof |
| 07/19/2001 | WO2001051990A1 Solventless, resistless direct dielectric patterning |
| 07/19/2001 | WO2001051979A2 Microlithographic reduction projection catadioptric objective |
| 07/19/2001 | WO2001051971A1 System and method for writing fiber gratings |
| 07/19/2001 | WO2001051679A2 Anti-reflective coating process and apparatus |
| 07/19/2001 | WO2001051243A2 Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulsewidths |
| 07/19/2001 | WO2001001025A3 Microfabricated elastomeric valve and pump systems |