| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/08/2001 | CA2334291A1 Organometallic monoacylarylphosphines |
| 08/07/2001 | USRE37309 Scanning exposure apparatus |
| 08/07/2001 | US6272392 Methodology for extracting effective lens aberrations using a neural network |
| 08/07/2001 | US6272236 Inspection technique of photomask |
| 08/07/2001 | US6272202 Exposure method and X-ray mask structure for use with the same |
| 08/07/2001 | US6271957 Methods involving direct write optical lithography |
| 08/07/2001 | US6271923 Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
| 08/07/2001 | US6271911 Apparatus for enhancing image contrast using intensity filtration |
| 08/07/2001 | US6271910 Projection exposure apparatus and method |
| 08/07/2001 | US6271909 Exposure apparatus and device manufacturing method including changing a photo-intensity distribution of a light source and adjusting an illuminance distribution on a substrate in accordance with the change |
| 08/07/2001 | US6271852 boundary processing of oblique overlapping graphics to achieve dimensionally accurate electron beam irradiation |
| 08/07/2001 | US6271640 Exposure apparatus having reaction frame |
| 08/07/2001 | US6271606 Driving motors attached to a stage that are magnetically coupled through a chamber |
| 08/07/2001 | US6271589 Thick-film conductor circuit and production method therefor |
| 08/07/2001 | US6271531 Charged beam drawing apparatus and method thereof |
| 08/07/2001 | US6271514 Multi-beam scanner including a dove prism array |
| 08/07/2001 | US6271412 Obtained from the reaction of acryloyl chloride and tricycloalcohol or its derivatives. |
| 08/07/2001 | US6271154 Methods for treating a deep-UV resist mask prior to gate formation etch to improve gate profile |
| 08/07/2001 | US6270949 Single component developer for copolymer resists |
| 08/07/2001 | US6270948 Method of forming pattern |
| 08/07/2001 | US6270947 Printing a pattern |
| 08/07/2001 | US6270946 Forming reaction product; washing to remove residues |
| 08/07/2001 | US6270945 Photosensitive compositions and elements comprising dyed photosensitive polyesters |
| 08/07/2001 | US6270944 Thermal transfer element for forming multilayers devices |
| 08/07/2001 | US6270942 Photosensitve polymer containing norbornene units, maleic anhydride units and unsaturated ester |
| 08/07/2001 | US6270941 Positive silicone-containing photosensitive composition |
| 08/07/2001 | US6270939 Radiation-sensitive resin composition |
| 08/07/2001 | US6270938 Acetal copolymers and use thereof in photosensitive compositions |
| 08/07/2001 | US6270934 Laser addressable thermal transfer imaging element with an interlayer |
| 08/07/2001 | US6270904 For high-frequency circuits |
| 08/07/2001 | US6270666 Magnetic treatment apparatus for fluids and method for using same |
| 08/07/2001 | US6270579 Nozzle arm movement for resist development |
| 08/07/2001 | US6270576 Used for blue and green optoelectronic devices |
| 08/07/2001 | US6270570 Fluoride crystal, optical article, and production method |
| 08/07/2001 | US6270267 Method of developing photosensitive resin plate and developing device |
| 08/02/2001 | WO2001056122A1 Electric discharge laser with acoustic chirp correction |
| 08/02/2001 | WO2001056074A1 Wafer chuck, exposure system, and method of manufacturing semiconductor device |
| 08/02/2001 | WO2001055791A1 Self-alignment hybridization process and component |
| 08/02/2001 | WO2001055790A1 Photocurable resin compositions |
| 08/02/2001 | WO2001055789A2 Chemically amplified short wavelength resist |
| 08/02/2001 | WO2001055767A2 Microlithographic reduction projection catadioptric objective |
| 08/02/2001 | US20010011199 Method for patterning and fabricating wordlines |
| 08/02/2001 | US20010011198 Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool |
| 08/02/2001 | US20010010950 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
| 08/02/2001 | US20010010894 By which capacitance generated between multi-layered metal wirings in a semiconductor device can be minimized. |
| 08/02/2001 | US20010010893 Containing aromatic sulfonamide compound |
| 08/02/2001 | US20010010891 Treating anodized substrate with acidic aquesous solution; aluminum hydroxide by-product inhibition during rinsing |
| 08/02/2001 | US20010010890 Fluoroacrylate polymers; transparency; preventing negative working; low absorption of fluorine excimer laser light; high transmittance to vacuum ultraviolet radition |
| 08/02/2001 | US20010010886 High accuracy circuit pattern transferring |
| 08/02/2001 | US20010010885 Resist pattern and method of forming same, method of forming thin-film pattern, and method of manufacturing micro device |
| 08/02/2001 | US20010010843 Digital optical chemistry micromirror imager |
| 08/02/2001 | US20010010668 Nanometer scale data storage device and associated positioning system |
| 08/02/2001 | US20010010580 Exposure control apparatus and method |
| 08/02/2001 | US20010010579 Apparatus and method for projection exposure |
| 08/02/2001 | US20010010578 Scanning exposure photo-mask and method of scanning exposure and scanning exposure system |
| 08/02/2001 | US20010010536 Pulse light pattern writer |
| 08/02/2001 | US20010010362 Methods and devices for achieving alignment of a beam-propagation axis with a center of an aperture in a charged-particle-beam optical system |
| 08/02/2001 | US20010010229 Stripping the patterned resist from the semiconductor structure; contacting carbon containing resist debris remaining on the semiconductor structure with ozone to reduc the amount of carbon debris thereon. |
| 08/02/2001 | US20010010192 Rotor balancing structure, sheet material processing device, and image forming device |
| 08/02/2001 | DE10046925A1 Halbleitervorrichtung mit einer Testmarkierung A semiconductor device with a test marker |
| 08/02/2001 | CA2395635A1 Self-alignment hybridization process and component |
| 08/01/2001 | EP1120690A2 EUV reticle thermal management |
| 08/01/2001 | EP1120689A2 Photosensitive copolymers of alkyl vinyl ether and resist compositions containing the same |
| 08/01/2001 | EP1120688A1 Laminate structure and method of manufacturing the same |
| 08/01/2001 | EP1120684A1 Laser marking system |
| 08/01/2001 | EP1120672A1 Self-alignment hybridization process and component |
| 08/01/2001 | EP1120246A2 Planographic printing original plate and method of plate-making a planographic printing plate |
| 08/01/2001 | EP1120245A2 Infrared-sensitive image forming material |
| 08/01/2001 | EP1119784A1 Diffraction grating and fabrication technique for same |
| 08/01/2001 | EP1119590A1 Substituted phthalocyanine |
| 08/01/2001 | EP0739536B1 Charged particle projector system |
| 08/01/2001 | CN1306692A Planar resist structure esp encapsulation for electric components and thermomechanical method for prodn thereof |
| 08/01/2001 | CN1306673A Discharge lamp source appts and method |
| 08/01/2001 | CN1306293A Color filter for panel display |
| 08/01/2001 | CN1306226A Exposure device |
| 08/01/2001 | CN1306225A Method for checking exposure figure formed on optical mask |
| 08/01/2001 | CN1306224A Iodonium salt used as potential acid provider |
| 08/01/2001 | CN1069136C Integral X-ray lens and mfg. method thereof and equipment using same |
| 07/31/2001 | US6269472 Optical proximity correction method and apparatus |
| 07/31/2001 | US6269208 Wavelength tuning of photo-induced gratings |
| 07/31/2001 | US6268908 Micro adjustable illumination aperture |
| 07/31/2001 | US6268907 Elimination of standing waves in photoresist |
| 07/31/2001 | US6268906 Exposure apparatus and exposure method |
| 07/31/2001 | US6268904 Optical exposure apparatus and photo-cleaning method |
| 07/31/2001 | US6268903 Method of adjusting projection optical apparatus |
| 07/31/2001 | US6268902 Exposure apparatus, and manufacturing method for devices using same |
| 07/31/2001 | US6268900 Accommodating apparatus and substrate processing system |
| 07/31/2001 | US6268606 Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-up |
| 07/31/2001 | US6268457 Spin-on glass anti-reflective coatings for photolithography |
| 07/31/2001 | US6268436 Approach to formulating irradiation sensitive positive resists |
| 07/31/2001 | US6268323 Mixture of solvent, alkanolamine and corrosion resistance |
| 07/31/2001 | US6268282 Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks |
| 07/31/2001 | US6268228 Electrical mask identification of memory modules |
| 07/31/2001 | US6268227 Method for controlling photoresist removal processes |
| 07/31/2001 | US6268115 Surfactants, wetting agents |
| 07/31/2001 | US6268113 Multilayer; substrate, metal absorbing alyer and antireflecting layer |
| 07/31/2001 | US6268112 Photosensitive resin composition |
| 07/31/2001 | US6268111 Photoimageable composition having photopolymerizeable binder oligomer |
| 07/31/2001 | US6268110 Lithography printing plate |
| 07/31/2001 | US6268109 Multilayer; photosensitive compound and overcoating |