| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/16/2001 | US20010013925 Lithographic projection apparatus having a temperature controlled heat shield |
| 08/16/2001 | US20010013580 Cooling of voice coil motors in lithographic projection apparatus |
| 08/16/2001 | US20010013554 Aperture plate and methods for its construction and use |
| 08/16/2001 | US20010013502 For removing remaining resist layer film after etching without swelling the insulation film (acrylic or polyimide resin); semiconductors; liquid crystal displays |
| 08/16/2001 | US20010013294 Stamp device for printing a pattern on a surface of a substrate |
| 08/16/2001 | EP1124310A2 Two-dimensional electric motor, exposure apparatus and semiconductor fabrication method |
| 08/16/2001 | EP1124162A2 Method of positioning an object in a lithographic projection apparatus |
| 08/16/2001 | EP1124161A2 Lithographic projection apparatus having a temperature controlled heat shield |
| 08/16/2001 | EP1124160A2 Cooling of oscillating linear motors in lithographic projection apparatus |
| 08/16/2001 | EP1124159A1 Photocurable composition |
| 08/16/2001 | EP1124158A1 Pattern forming material and pattern forming method |
| 08/16/2001 | EP1124078A2 Active anti-vibration apparatus and exposure apparatus |
| 08/16/2001 | EP1123954A1 Composition for polyimide electrodeposition and method of forming patterned polyimide film with the same |
| 08/16/2001 | EP1123520A1 Wavelength tuning of photo-induced gratings |
| 08/16/2001 | EP1123215A1 Three-dimensional microstructure |
| 08/16/2001 | EP1123212A1 Method for manufacture of electronic parts |
| 08/16/2001 | EP1123166A1 Method of removing organic materials from substrates |
| 08/16/2001 | EP0953166B1 Pattern-forming methods |
| 08/16/2001 | EP0654306B1 Method of and apparatus for application of liquid |
| 08/16/2001 | DE10046911A1 Photo mask for manufacturing semiconductors has monitoring marking with coarse, high density and cross patterns on substrate for assuring dimensions of actual pattern and coincidence |
| 08/16/2001 | DE10004391A1 Verfahren zur Durchführung eines Plasmaätzprozesses A method for performing a plasma etching process |
| 08/16/2001 | CA2398160A1 Liquid, radiation-curable composition, especially for stereolithography |
| 08/15/2001 | CN1308837A Scanner system |
| 08/15/2001 | CN1308737A Composition for stripping photoresist and organic material from substrate surfaces |
| 08/15/2001 | CN1308256A Anticorrosive additive stripper, anticorrosive additive stripping liquid controlling method and semiconductor equipment |
| 08/15/2001 | CN1308255A Direct platemaking printing equipment and printing plate |
| 08/15/2001 | CN1308254A Copolymer with nitrile and alcyl group and photoresist composite containing the copolymer |
| 08/15/2001 | CN1308094A Polymer mixture and its preparation, photosensitive composite and pattern preparing method |
| 08/15/2001 | CN1308089A Organic polymer for antireflective coating and its preparation |
| 08/15/2001 | CN1308081A Organometallic acyl-aryl phosphine |
| 08/14/2001 | US6275514 Laser repetition rate multiplier |
| 08/14/2001 | US6274877 Electron beam exposure apparatus |
| 08/14/2001 | US6274537 Mixture with attack inhibitor |
| 08/14/2001 | US6274296 Stripper pretreatment |
| 08/14/2001 | US6274295 Light-absorbing antireflective layers with improved performance due to refractive index optimization |
| 08/14/2001 | US6274294 Cylindrical photolithography exposure process and apparatus |
| 08/14/2001 | US6274292 Forming antireflective later containing silicon, oxygen and nitrogen, annealing, forming photoresist, exposing layer of photoresist to radiation waves, some of which are attenuated by antireflective material |
| 08/14/2001 | US6274290 Raster scan gaussian beam writing strategy and method for pattern generation |
| 08/14/2001 | US6274289 Chemical resist thickness reduction process |
| 08/14/2001 | US6274288 Self-trapping and self-focusing of optical beams in photopolymers |
| 08/14/2001 | US6274287 Positive resist compositions comprising a hydroxyphenyl ketone |
| 08/14/2001 | US6274286 Resist compositions |
| 08/14/2001 | US6274285 Radiation-sensitive recording material for the production of driographic offset printing plates |
| 08/14/2001 | US6273985 Adhesion promoter is employed in microelectrical mechanical systems such as thermal ink jet printheads. particularly suitable for use with polyarylene photoresists. |
| 08/14/2001 | US6273543 Aqueous developable high performance curable polymers |
| 08/14/2001 | US6273104 Processing fluid is supplied to a surface of the substrate while supplying inert gas into a space between the substrate and a blocking plate; no turbulence is created at the surface of substrate preventing pollutant adherence |
| 08/14/2001 | US6272763 Staging apparatus and method, and method for manufacturing the staging apparatus, and exposing apparatus using the staging apparatus |
| 08/14/2001 | CA2298345A1 Near infrared sensitive photopolymer and holographic photopolymer dispersed liquid crystal materials made therewith |
| 08/14/2001 | CA2254797C Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizers |
| 08/09/2001 | WO2001057911A1 Method for carrying out a plasma etching process |
| 08/09/2001 | WO2001057598A1 Reticle stocking and sorting management system |
| 08/09/2001 | WO2001057597A1 Polymeric compound for photoresist and resin composition for photoresist |
| 08/09/2001 | WO2001057596A1 Active reticle, method for making and controlling same, ion projecting lithography using same and equipment therefor |
| 08/09/2001 | WO2001057409A1 Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for the hydrostatic gas bearing device |
| 08/09/2001 | WO2001056788A2 Device for exposing thermosensitive media |
| 08/09/2001 | US20010012869 Attaching catalytic metal nuclei to the polysilane modified by a carbon-functional silane, immersing the substrate in an electroless plating bath to deposit a metal film on the patterned coating |
| 08/09/2001 | US20010012696 Processing device and method of processing material with ultraviolet light or light of shorter wavelength than ultraviolet light |
| 08/09/2001 | US20010012601 Surface treatment agent for resist pattern, and patterning process |
| 08/09/2001 | US20010012599 Dimensionally stable solid, partly hollow or hollow cylinder and a photopolymerizable crosslinkable cylinder layer applied in part-layers by means of coaxial coating apparatus; uniform layers |
| 08/09/2001 | US20010012598 High conformality antireflective coating compositions |
| 08/09/2001 | US20010012597 Contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound |
| 08/09/2001 | US20010012596 Oxime ester photoinitiators |
| 08/09/2001 | US20010012593 Wafer alignment marks protected by photoresist |
| 08/09/2001 | US20010012592 The plasma polymerized organosilicon film having an upper stratum overlying a lower stratum wherein the upper stratum is more photosensitive to ultraviolet radiation than is the lower stratum |
| 08/09/2001 | US20010012457 Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer |
| 08/09/2001 | US20010012456 Developing method and developing apparatus |
| 08/09/2001 | US20010012311 Method for determining life of laser light source |
| 08/09/2001 | US20010012309 Laser gas replenishment method |
| 08/09/2001 | US20010012154 Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement |
| 08/09/2001 | US20010012139 Pattern reading apparatus |
| 08/09/2001 | US20010012131 Drive system for a scanning or recording device for a reproduction appliance |
| 08/09/2001 | US20010012101 Microlithography projection apparatus |
| 08/09/2001 | US20010012100 Exposure apparatus and device manufacturing method |
| 08/09/2001 | US20010012099 Projection exposure apparatus and method for manufacturing devices using the same |
| 08/09/2001 | US20010012098 Scan type projection exposure apparatus and device manufacturing method using the same |
| 08/09/2001 | US20010012079 Color liquid crystal display panel |
| 08/09/2001 | US20010011712 Position detection system for use in lithographic apparatus |
| 08/09/2001 | US20010011706 Inspection method, apparatus and system for circuit pattern |
| 08/09/2001 | US20010011697 Active anti-vibration apparatus and exposure apparatus |
| 08/09/2001 | DE19956353C1 Optische Anordnung Optical arrangement |
| 08/09/2001 | DE10105046A1 Metallorganische Monoacyl-Aryl-Phosphine Organometallic monoacyl aryl phosphines |
| 08/09/2001 | DE10035670A1 Semiconducting manufacturing system computes optimal exposure value from size of detected pattern produced by photolithography and detected exposure value |
| 08/09/2001 | DE10005189A1 Projection exposure system has light source, illumination system, reflective reticle, beam divider cube in reduction objective that superimposes illumination and imaging beam paths |
| 08/08/2001 | EP1122612A2 Position detection |
| 08/08/2001 | EP1122611A2 Method of reducing surface defects of a patterned resist layer |
| 08/08/2001 | EP1122610A2 Automatic developing apparatus and method for replenishing replenisher for developer for said apparatuses |
| 08/08/2001 | EP1122609A2 Exposure method and apparatus and method for producing exposure apparatus |
| 08/08/2001 | EP1122608A2 Projection exposure system with reflective reticle |
| 08/08/2001 | EP1122607A1 High resolution photoresist compositions |
| 08/08/2001 | EP1122606A2 Chemically amplified positive resist composition |
| 08/08/2001 | EP1122605A2 Radiation-sensitive resin composition |
| 08/08/2001 | EP1122604A2 Chemically amplified positive resist composition |
| 08/08/2001 | EP1121715A1 METHOD FOR FORMING AN ANTIREFLECTING SiON FILM, NON-POLLUTING FOR LIGHT-SENSITIVE RESINS FOR FAR-ULTRAVIOLET RADIATION |
| 08/08/2001 | EP1121623A1 Ionization radiation imageable photopolymer compositions |
| 08/08/2001 | EP0985021A4 Non-corrosive stripping and cleaning composition |
| 08/08/2001 | EP0892941B1 Photo-curable resin composition |
| 08/08/2001 | CN1307694A Photocurable elastomeric compositions |
| 08/08/2001 | CN1307693A Photopolymerizable thermosetting resin compositions |
| 08/08/2001 | CN1307614A Photo-curable polymer composition and flexographic printing plates containing the same |
| 08/08/2001 | CN1307603A Polycyclic copolymer compositions |