| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 08/23/2001 | US20010015799 Stage apparatus, exposure apparatus, and device production method |
| 08/23/2001 | US20010015798 Exposure apparatus |
| 08/23/2001 | US20010015797 Imaging method for manufacture of microdevices |
| 08/23/2001 | US20010015796 Photolithographic apparatus |
| 08/23/2001 | US20010015795 Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device |
| 08/23/2001 | US20010015413 Electron beam drawing process and electron beam drawing apparatus |
| 08/23/2001 | US20010015410 Inspection apparatus and method |
| 08/23/2001 | US20010015318 Black matrix material and methods related thereto |
| 08/23/2001 | US20010015259 Process for the removal of resist material |
| 08/23/2001 | US20010015008 Process for fabricating a thin multi-layer circuit board |
| 08/23/2001 | DE19952018C1 Verfahren zur Herstellung von im Nanometerbereich oberflächendekorierten Substraten A process for the production of surface-decorated substrates in the nanometer range |
| 08/23/2001 | DE10049350A1 Abdeckungs-Ablösesystem und Steuerungsverfahren für eine Abdeckungs-Ablöse-Lösung Cover-release system and control method for a cover-release solution |
| 08/23/2001 | DE10006527A1 Halbautomat zum halbautomatischen Abziehen von UV- Folie Semi-automatic machine for semi-automatic extraction of UV film |
| 08/23/2001 | DE10006081A1 Method for producing three-dimensional micro-structures in a photo-lacquer, deposited on a substrate, using a focussed laser beam the wavelength of which lies above that corresponding to the lacquer's spectral sensitivity |
| 08/23/2001 | DE10005192A1 Drive system for a scanning or recording device for a reproduction appliance with rotational speed determined by dividing the master clock signal |
| 08/23/2001 | CA2400201A1 Process monitoring system for lithography lasers |
| 08/22/2001 | EP1126510A1 Method of adjusting optical projection system |
| 08/22/2001 | EP1126323A2 Exposure method and exposure apparatus |
| 08/22/2001 | EP1126322A2 Fluorine-containing polymers, resist compositions and patterning process |
| 08/22/2001 | EP1126321A1 Positive photoresists containing crosslinked polymers |
| 08/22/2001 | EP1126320A2 Chemically amplified resist composition containing low molecular weight additives |
| 08/22/2001 | EP1126319A1 Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition |
| 08/22/2001 | EP1125168A1 Stripping compositions for semiconductor substrates |
| 08/22/2001 | EP1125167A1 Methods of reducing proximity effects in lithographic processes |
| 08/22/2001 | EP1125166A1 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 08/22/2001 | EP1124832A1 Oxime derivatives and the use thereof as latent acids |
| 08/22/2001 | EP0885407B1 Bottom antireflective coatings through refractive index modification by anomalous dispersion |
| 08/22/2001 | CN1309785A Silicate-contg. alkaline compositions for cleaning microelectronic substrates |
| 08/22/2001 | CN1309784A Surfaces with release agent |
| 08/22/2001 | CN1309416A Micropicture forming material and method for mfg. semiconductor device using said material |
| 08/22/2001 | CN1309332A Exposure method and device, and method for mfg. device |
| 08/22/2001 | CN1309331A Method for mfg. photosensitive lithographic plate |
| 08/22/2001 | CN1309330A Heat-sensitive lithographic plate |
| 08/22/2001 | CN1309329A Photosensitive compound and photoresist |
| 08/22/2001 | CN1309319A Color light filter substrate and its mfg. method, liquid crystal device and mfg method thereof and electronic machine |
| 08/22/2001 | CN1309116A Cyclic amine substd. phenylalkanone and preparing method thereof |
| 08/21/2001 | US6278764 High efficiency replicated x-ray optics and fabrication method |
| 08/21/2001 | US6278550 Beam homogenizer |
| 08/21/2001 | US6278516 Projection exposure apparatus and method of producing a device using a projection exposure apparatus |
| 08/21/2001 | US6278515 Method and apparatus for adjusting a tilt of a lithography tool |
| 08/21/2001 | US6278514 Exposure apparatus |
| 08/21/2001 | US6278511 Method and apparatus for stacking and drying cut imaged media |
| 08/21/2001 | US6278203 Cooling structure for a linear motor |
| 08/21/2001 | US6278123 Reducing the critical dimension difference of features printed on a substrate |
| 08/21/2001 | US6278116 Method of monitoring deep ultraviolet exposure system |
| 08/21/2001 | US6277986 Photoactivatable nitrogen-containing bases based on α-amino ketones |
| 08/21/2001 | US6277898 Curable sealant composition |
| 08/21/2001 | US6277897 Photoinitiators and applications therefor |
| 08/21/2001 | US6277750 Composition for bottom reflection preventive film and novel polymeric dye for use in the same |
| 08/21/2001 | US6277546 Coating substrate with polymer; heating; imagewise exposure;development |
| 08/21/2001 | US6277545 Forming photoresist, iradiating with laser |
| 08/21/2001 | US6277544 Reverse lithographic process for semiconductor spaces |
| 08/21/2001 | US6277543 Method for forming features using frequency doubling hybrid resist and device formed thereby |
| 08/21/2001 | US6277542 Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density |
| 08/21/2001 | US6277541 Multilayer; aluminum, alumina and alkali-soluble polymer |
| 08/21/2001 | US6277540 Heat sensitive plate precursors |
| 08/21/2001 | US6277539 Working surface for photoresist |
| 08/21/2001 | US6277538 Photosensitive polymer having cyclic backbone and resist composition comprising the same |
| 08/21/2001 | US6277533 Projecting image of a pattern onto a mask |
| 08/21/2001 | US6277532 Charged-particle-beam microlithographic methods for correction of reticle distortions |
| 08/21/2001 | US6277531 Charged-particle-beam microlithography apparatus and methods including focal-point correction |
| 08/21/2001 | US6277530 Method for making partial full-wafer pattern for charged particle beam lithography |
| 08/21/2001 | US6277528 Overcoating a transparent substrate; applying aqueous solution of ammonium hydroxide and hydrogen peroxide |
| 08/21/2001 | US6277442 Suplying liquid; evacuating excess |
| 08/21/2001 | US6277441 Method of forming coating film on a substrate |
| 08/21/2001 | US6276981 Method for obtaining self-aligned openings, in particular for microtip flat display focusing electrode |
| 08/21/2001 | US6276803 Optical path converting optical element, optical path converter, and optical projector and image display apparatus using said optical element |
| 08/21/2001 | US6276372 Process using hydroxylamine-gallic acid composition |
| 08/21/2001 | CA2254234C Apparatus for exposure of printing plates using image modification |
| 08/16/2001 | WO2001059894A1 Electric discharge laser with active wavelength chirp correction |
| 08/16/2001 | WO2001059893A1 Fast wavelength correction technique for a laser |
| 08/16/2001 | WO2001059891A2 Energy stabilized gas discharge laser |
| 08/16/2001 | WO2001059889A1 Bandwidth control technique for a laser |
| 08/16/2001 | WO2001059825A1 Method for removing photoresist and residues from semiconductor device surfaces |
| 08/16/2001 | WO2001059525A1 Method and apparatus for controlling photoresist baking processes |
| 08/16/2001 | WO2001059524A1 Liquid, radiation-curable composition, especially for stereolithography |
| 08/16/2001 | WO2001059523A1 Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate |
| 08/16/2001 | WO2001059522A1 Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 08/16/2001 | WO2001059521A2 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum |
| 08/16/2001 | WO2001059502A1 Reflection/refraction optical system |
| 08/16/2001 | WO2001059031A2 Near infrared sensitive photopolymerizable composition |
| 08/16/2001 | WO2001059022A1 Infrared sensitive coating liquid |
| 08/16/2001 | WO2001058979A1 Photocurable composition, process for producing photocurable composition, photocurable pressure-sensitive adhesive sheet, process for producing photocurable pressure-sensitive adhesive sheet, and method of bonding |
| 08/16/2001 | WO2001058977A1 Photocurable/thermosetting composition for forming matte film |
| 08/16/2001 | WO2001011666A3 Method of etching a wafer layer using multiple layers of the same photoresistant material and structure formed thereby |
| 08/16/2001 | WO2001007885A3 Phase-shifting point diffraction interferometer focus-aid enhanced mask |
| 08/16/2001 | US20010014536 Substrate processing method and apparatus |
| 08/16/2001 | US20010014534 Contains urea or a urea derivative and hydroxy aromatic compound as essential components; corrosion resistance |
| 08/16/2001 | US20010014431 Method for decreasing surface defects of patterned resist layer |
| 08/16/2001 | US20010014429 Potassium, boron and silicon oxide |
| 08/16/2001 | US20010014428 Containing dihydroxy-1-adamantyl (meth)acrylate |
| 08/16/2001 | US20010014427 Sulfonium compound as photoacid generator |
| 08/16/2001 | US20010014426 Lithography; screen printing, curing |
| 08/16/2001 | US20010014424 Photomask substrates; photolithography |
| 08/16/2001 | US20010014399 Solvent-free |
| 08/16/2001 | US20010014224 Film forming method and film forming apparatus |
| 08/16/2001 | US20010014170 Object positioning method for a lithographic projection apparatus |
| 08/16/2001 | US20010014110 Line narrowed laser with bidirection beam expansion |
| 08/16/2001 | US20010013928 Exposure apparatus for printing plates |
| 08/16/2001 | US20010013927 Stage apparatus, exposure apparatus using the same, and a device manufacturing method |