| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/30/2001 | US20010017692 Illumination optical apparatus and exposure apparatus |
| 08/30/2001 | US20010017691 Exposure apparatus |
| 08/30/2001 | US20010017690 Method and device for exposing both sides of a sheet |
| 08/30/2001 | US20010017648 Inner drum type image recording device |
| 08/30/2001 | US20010017191 Apparatus for removing a coating film |
| 08/30/2001 | US20010017184 Holographic grating and method of forming the same |
| 08/30/2001 | DE10053721A1 Wärme-empfindliche Zusammensetzung, Bildaufzeichnungs-Element mit einem infrarote Strahlung absorbierenden Oxonol-Farbstoff sowie Bildaufzeichnungs-und Druck-Verfahren Heat-sensitive composition imaging element containing an infrared absorbing oxonol dye, and imaging and printing method |
| 08/30/2001 | DE10049831A1 Photoresist-Strippermittel und Verfahren zum Strippen von Photoresistaufträgen unter Verwendung des Mittels Photoresist stripper means and methods for stripping photoresist orders using the agent |
| 08/30/2001 | DE10006952A1 Mask set comprises a first chrome-less phase mask for producing exposed and non-exposed regions on a photolaquer, and a second mask for dividing the non-exposed regions |
| 08/30/2001 | DE10005850A1 Verfahren zur Herstellung von Mikrostrukturen A process for the fabrication of microstructures |
| 08/30/2001 | CA2400157A1 Organic polymeric antireflective coatings deposited by chemical vapor deposition |
| 08/29/2001 | EP1128222A2 Photoresist stripping composition |
| 08/29/2001 | EP1128221A2 Plasma Etching residue removal |
| 08/29/2001 | EP1128220A2 Developing process, process for forming pattern and process for preparing semiconductor device using same |
| 08/29/2001 | EP1128219A2 Exposure method and apparatus |
| 08/29/2001 | EP1128218A2 Projection exposure apparatus |
| 08/29/2001 | EP1128217A2 Method of measuring aberration in an optical imaging system |
| 08/29/2001 | EP1128216A2 Precision stage device |
| 08/29/2001 | EP1128215A2 Alignment mark set and method of measuring alignment accuracy |
| 08/29/2001 | EP1128214A1 Photosensitive compound and photosensitive resin |
| 08/29/2001 | EP1128213A2 Photoresist compositions comprising novel copolymers |
| 08/29/2001 | EP1128212A2 Chemically amplified positive resist composition |
| 08/29/2001 | EP1128211A1 Lithographic printing method using a low surface energy layer |
| 08/29/2001 | EP1127900A1 Polymer and photoresist compositions |
| 08/29/2001 | EP1127899A1 Polymer and photoresist compositions |
| 08/29/2001 | EP1127870A1 Novel monomers, polymers, methods of synthesis thereof and photoresist compositions |
| 08/29/2001 | EP1127370A4 Post etch cleaning composition and process for dual damascene system |
| 08/29/2001 | EP1127370A1 Post etch cleaning composition and process for dual damascene system |
| 08/29/2001 | EP1127294A1 Wafer chamber having a gas curtain for extreme-uv lithography |
| 08/29/2001 | EP1127293A1 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers |
| 08/29/2001 | EP1090332A4 Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders |
| 08/29/2001 | EP0892822B1 Liquid curable resin composition |
| 08/29/2001 | CN1310871A Laser repetition rate multiplier |
| 08/29/2001 | CN1310809A Positive-type photosensitive polyimide precursor composition |
| 08/29/2001 | CN1310731A Water soluble positive-working photoresist composition |
| 08/29/2001 | CN1310642A Trace metal ion reduction by ion exchange pack |
| 08/29/2001 | CN1310360A Originals for lithographic printing plate |
| 08/29/2001 | CN1310359A Producing method for lithographic printing plate originals |
| 08/29/2001 | CN1310346A 全息光栅 Holographic grating |
| 08/29/2001 | CN1070211C Photopolymerisable composition |
| 08/28/2001 | US6282696 Performing optical proximity correction with the aid of design rule checkers |
| 08/28/2001 | US6281967 Illumination apparatus, exposure apparatus and exposure method |
| 08/28/2001 | US6281966 Exposure apparatus and device manufacturing method |
| 08/28/2001 | US6281965 Exposure method and exposure system using the exposure method |
| 08/28/2001 | US6281964 Projection exposure apparatus and device manufacturing method |
| 08/28/2001 | US6281962 Processing apparatus for coating substrate with resist and developing exposed resist including inspection equipment for inspecting substrate and processing method thereof |
| 08/28/2001 | US6281655 High performance stage assembly |
| 08/28/2001 | US6281654 Method for making apparatus with dynamic support structure isolation and exposure method |
| 08/28/2001 | US6281643 Stage apparatus |
| 08/28/2001 | US6281513 Pattern forming method |
| 08/28/2001 | US6281491 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 08/28/2001 | US6281318 Reacting 4-(1-methylethenyl-)phenyl with vinyl ether |
| 08/28/2001 | US6281314 Containing maleimide compound |
| 08/28/2001 | US6281170 Surface tension reduction with N,N,N'-trialkkyl ureas |
| 08/28/2001 | US6281145 Apparatus and method for applying process solution |
| 08/28/2001 | US6281135 Oxygen free plasma stripping process |
| 08/28/2001 | US6281130 Method for developing ultra-thin resist films |
| 08/28/2001 | US6280911 Forming a photoresist relief image on microelectronic wafer substrates or flat panel display substrate, exposure to activating radiation |
| 08/28/2001 | US6280910 Photoresist for optical disc and method of preparing optical disc utilizing photoresist |
| 08/28/2001 | US6280908 Post-development resist hardening by vapor silylation |
| 08/28/2001 | US6280906 Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method |
| 08/28/2001 | US6280905 Photosensitive resin composition |
| 08/28/2001 | US6280903 Chemically amplified resist composition |
| 08/28/2001 | US6280902 Resin converted to alkali soluble to alkali insoluble or alkali slightly acid soluble, an acid generator and nitrogen cyclic compound |
| 08/28/2001 | US6280901 High sensitivity, photo-active polymer and developers for high resolution resist applications |
| 08/28/2001 | US6280900 Radiation-sensitive resin composition |
| 08/28/2001 | US6280899 Relation to lithographic printing forms |
| 08/28/2001 | US6280898 Photoresists patterns |
| 08/28/2001 | US6280897 Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts |
| 08/28/2001 | US6280887 Complementary and exchange mask design methodology for optical proximity correction in microlithography |
| 08/28/2001 | US6280886 Photolithography system with supports, reflective recticle, protective covering and windows |
| 08/28/2001 | US6280646 Use of a chemically active reticle carrier for photomask etching |
| 08/28/2001 | US6280527 Aqueous quaternary ammonium hydroxide as a screening mask cleaner |
| 08/28/2001 | US6280062 Light source device and illumination system |
| 08/28/2001 | US6279881 Method and apparatus which exposes a second object with a pattern formed on a first object and which performs statistical calculation based on position information of marks on the first object |
| 08/28/2001 | US6279601 Liquid zone seal |
| 08/28/2001 | US6279502 Resist developing method by magnetic field controlling, resist developing apparatus and method of fabricating semiconductor device |
| 08/28/2001 | CA2054706C Very large scale immobilized polymer synthesis |
| 08/24/2001 | CA2336569A1 Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method |
| 08/23/2001 | WO2001061798A1 Injection seeded f2 lithography laser |
| 08/23/2001 | WO2001061515A1 Laser lithography quality alarm system |
| 08/23/2001 | WO2001061514A1 Process monitoring system for lithography lasers |
| 08/23/2001 | WO2001061412A1 A method of improving photomask geometry |
| 08/23/2001 | WO2001061411A1 Zoom illumination system for use in photolithography |
| 08/23/2001 | WO2001061410A1 Resist composition |
| 08/23/2001 | WO2001061409A2 Apparatus and method of cleaning reticles for use in a lithography tool |
| 08/23/2001 | WO2001061296A1 Method and apparatus for optical system coherence testing |
| 08/23/2001 | US20010016302 Microelectronics |
| 08/23/2001 | US20010016300 Resist comprises organic material having resistance to dry etching and being photosensitive to light |
| 08/23/2001 | US20010016299 Absorbs a very low percentage of incident charged particles and hence does not experience excessive temperature increases due to bombardment by and absorption of incident charged particles |
| 08/23/2001 | US20010016298 Chemically amplified positive resist composition |
| 08/23/2001 | US20010016295 Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography |
| 08/23/2001 | US20010016294 Methods and devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system |
| 08/23/2001 | US20010016293 Method for positioning substrate |
| 08/23/2001 | US20010016292 Electron beam mask, production method thereof, and exposure method |
| 08/23/2001 | US20010016247 Laminate structure and method of manufacturing the same |
| 08/23/2001 | US20010016121 Developing method and developing apparatus |
| 08/23/2001 | US20010015901 Pulse width modulated control apparatus |
| 08/23/2001 | US20010015807 Pattern reading apparatus |
| 08/23/2001 | US20010015805 Inspection method, apparatus and system for circuit pattern |