| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 09/06/2001 | DE10014493A1 Polymers, useful for the production of resist compositions for electronic component fabrication contain at least one pericyclic protective group |
| 09/06/2001 | DE10011548A1 Thermally stable layer system used for reflecting extreme UV rays consists of layer pairs made up of a barrier layer of molybdenum silicide between a molybdenum layer and a silicon layer |
| 09/06/2001 | DE10011547A1 Thermally stable layer system used for reflecting extreme UV rays consists of layer pairs made up of a barrier layer of molybdenum carbide between molybdenum layer and a silicon layer |
| 09/06/2001 | DE10010131A1 Microlithography projection exposure with tangential polarization involves using light with preferred direction of polarization oriented perpendicularly with respect to plane of incidence |
| 09/05/2001 | EP1130632A2 Electrically insulating crosslinked thin-film-forming organic resin composition |
| 09/05/2001 | EP1130473A2 A system, method and article of manufacture for direct image processing of printed circuit boards |
| 09/05/2001 | EP1130472A2 Exposure method, method of production of density filter, and exposure apparatus |
| 09/05/2001 | EP1130471A2 Exposure apparatus for printing plates |
| 09/05/2001 | EP1130470A2 Microlithographic projection illumination with tangential polarisation |
| 09/05/2001 | EP1130469A1 A radiation-sensitive resist material and a process for device fabrication using the same |
| 09/05/2001 | EP1130468A2 Polymer and photoresist compositions |
| 09/05/2001 | EP1130467A2 Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method |
| 09/05/2001 | EP1130423A1 Color filter composition and color filter made therefrom |
| 09/05/2001 | EP1130421A2 Light diffusing plate and display apparatus |
| 09/05/2001 | EP1130419A2 Optical member for vacuum ultraviolet, and aligner and device manufacture method using same |
| 09/05/2001 | EP1130036A2 Composition for bulkhead of thin display panel |
| 09/05/2001 | EP1129861A1 Image-forming material and planographic printing original plate using same |
| 09/05/2001 | EP1129390A1 Priming composition for bonding photoresists on substrates |
| 09/05/2001 | EP1129145A1 Non-corrosive stripping and cleaning composition |
| 09/05/2001 | EP0765493B1 Self-contained imaging assembly and method for forming images therein |
| 09/05/2001 | EP0674342B1 Method for evaluating focal point |
| 09/05/2001 | CN1311718A Disc master drying cover assembly |
| 09/05/2001 | CN1311525A Exposure mask and its mfg. method |
| 09/05/2001 | CN1311459A Chemical amplifying type positive photolithographic gelatin composition |
| 09/05/2001 | CN1311458A 感光性树脂组成物 The photosensitive resin composition |
| 09/05/2001 | CN1311141A Flat-bed printing platen slip sheet, flat-bed printing platen adjoining elements and flat-bed printing platen packaging structure |
| 09/04/2001 | USRE37352 Projection optical apparatus |
| 09/04/2001 | US6285855 Illumination system and exposure apparatus having the same |
| 09/04/2001 | US6285817 Holographic patterning method and tool for production environments |
| 09/04/2001 | US6285743 Method and apparatus for soft X-ray generation |
| 09/04/2001 | US6285737 Condenser for extreme-UV lithography with discharge source |
| 09/04/2001 | US6285512 Lens barrel having deformed optical element, and projection including same |
| 09/04/2001 | US6285497 Diffractive element in extreme-UV lithography condenser |
| 09/04/2001 | US6285496 Optical mount with UV adhesive and protective layer |
| 09/04/2001 | US6285488 Pattern generator for avoiding stitching errors |
| 09/04/2001 | US6285457 Exposure apparatus and device manufacturing method including measuring position and/or displacement of each of a base and a stage with respect to a support |
| 09/04/2001 | US6285444 Positioning system and position measuring method for use in exposure apparatus |
| 09/04/2001 | US6285443 Illuminating arrangement for a projection microlithographic apparatus |
| 09/04/2001 | US6285442 Exposure apparatus and device manufacturing method using the exposure apparatus |
| 09/04/2001 | US6285440 Illumination system and projection exposure apparatus using the same |
| 09/04/2001 | US6285438 Scanning exposure method with reduced time between scans |
| 09/04/2001 | US6285437 Method for controlling stages, apparatus therefor, and scanning type exposure apparatus |
| 09/04/2001 | US6285097 Planar electric motor and positioning device having transverse magnets |
| 09/04/2001 | US6285001 Method and apparatus for step and repeat exposures |
| 09/04/2001 | US6284863 Reacted with unsaturated amides that may be cyclic, e.g., n-vinyl-2-pyrrolidone |
| 09/04/2001 | US6284813 Alkylphenylbisacylphosphine oxides and photoinitiator mixtures |
| 09/04/2001 | US6284676 Prewetting wafer with diacetone alcohol |
| 09/04/2001 | US6284443 Method and apparatus for image adjustment |
| 09/04/2001 | US6284440 As developing solution |
| 09/04/2001 | US6284439 Selecting an enhanced positive photoresist and depositing onto substrate; exposing selected portions of positive photoresist layer to light, wherein the exposed portions are soluble in aqueous base; developing exposed portions |
| 09/04/2001 | US6284438 Providing semiconductor substrate; forming material film to be patterned on semiconductor substrate; forming a photoresist film on the material film by coating photoresist; patterning photoresist film reducing size of opening by thermal flow |
| 09/04/2001 | US6284432 Coat property, has not special color unevenness and contrast |
| 09/04/2001 | US6284430 Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same |
| 09/04/2001 | US6284429 For formulating photoresists having sensitivity, resolution, etching resistance |
| 09/04/2001 | US6284428 For forming of antireflection undercoating layer to intervene between surface of substrate and photoresist layer to be patterned in manufacturing process of semiconductor devices |
| 09/04/2001 | US6284427 Reacting alkali-soluble polymer having phenolic hydroxyl or carboxyl groups with vinyl ether compound in aprotic solvent; suspending by adding base and adding photoacid generator to solution to prepare resist without isolation and purification |
| 09/04/2001 | US6284426 Information-wise exposing an imaging element; developing aqueous alkaline processing solution presence of developing agent; removing silver halide emulsion layer on top of silver image to expose silver image by washing with rinsing water |
| 09/04/2001 | US6284419 Methods of reducing proximity effects in lithographic processes |
| 09/04/2001 | US6284416 Photo mask and exposure method using same |
| 09/04/2001 | US6284415 Charged-particle-beam transfer masks and methods of making |
| 09/04/2001 | US6284414 Preparing mask substrate having light-shielding film pattern over including integrated circuit pattern and alignment mark; forming resist film; aligning position of phase-shifting pattern; electron beam exposure to form phase-shifting pattern |
| 09/04/2001 | US6284413 Selecting reticle primitives containing patterns corresponding to portions of a layer to be created by semicustom reticle; exposing to create image; employing semicustom reticle to create an image of patterns on integrated circuit |
| 09/04/2001 | US6284345 Designer particles of micron and submicron dimension |
| 09/04/2001 | US6284072 Multifunctional microstructures and preparation thereof |
| 09/04/2001 | US6284044 Film forming method and film forming apparatus |
| 09/04/2001 | US6283997 Photocurable polymer dispersion; laser scanning; orthopedic bone transplantation |
| 09/04/2001 | US6283134 Apparatus for removing photo-resist |
| 09/04/2001 | US6283030 Imaging a lithographic printing plate |
| 08/30/2001 | WO2001063732A2 Methods and apparatus for selectively tailored electromagnetic fields of linear motors |
| 08/30/2001 | WO2001063662A2 Resistor arrays for mask-alignment detection |
| 08/30/2001 | WO2001063653A1 Semiconductor integrated circuit device and method of producing the same, and method of producing masks |
| 08/30/2001 | WO2001063607A1 Method for producing recording medium, method for producing stamper of recording medium, apparatus for producing recording medium, and apparatus for producing stamper of recording medium |
| 08/30/2001 | WO2001063365A1 Method of reducing defects |
| 08/30/2001 | WO2001063364A1 Laser imaged printing plates comprising a multi-layer slip film |
| 08/30/2001 | WO2001063363A2 Photoacid generators and photoresists comprising same |
| 08/30/2001 | WO2001063362A2 Resist materials for 157-nm lithography |
| 08/30/2001 | WO2001063361A1 Device for homogeneous heating of an object |
| 08/30/2001 | WO2001063360A2 Encapsulated inorganic resists |
| 08/30/2001 | WO2001063359A2 Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengths |
| 08/30/2001 | WO2001063358A1 Organic polymeric antireflective coatings deposited by chemical vapor deposition |
| 08/30/2001 | WO2001063342A1 Ultraviolet polarization beam splitter for microlithography |
| 08/30/2001 | WO2001063325A1 Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber |
| 08/30/2001 | WO2001063233A2 Device for detecting wave fronts |
| 08/30/2001 | WO2001062511A2 Dual-layer self-contained recording paper incorporating hollow microspheres |
| 08/30/2001 | WO2001062400A2 Precision fabrication of diverse polymer microstructures by use of the hydrophobic effect |
| 08/30/2001 | WO2001007506A3 Microfabricated devices and method of manufacturing the same |
| 08/30/2001 | US20010018642 Method and system for providing a probe array chip design database |
| 08/30/2001 | US20010018497 Novolak resin |
| 08/30/2001 | US20010018168 Resist development method |
| 08/30/2001 | US20010018167 Method of and apparatus for developing exposed photoresist to prevent impurity from being attached to wafer surface |
| 08/30/2001 | US20010018166 Organic solvent developer |
| 08/30/2001 | US20010018165 Protective coating for silicon nitride spacer |
| 08/30/2001 | US20010018164 Lithography printing plates |
| 08/30/2001 | US20010018163 Undercoating composition for photolithographic resist |
| 08/30/2001 | US20010018162 Novel polymers, chemical amplification resist compositions and patterning process |
| 08/30/2001 | US20010018161 Resist compositions |
| 08/30/2001 | US20010018160 Novolak resin containing naphthoqiononediazidosulfonyl group; phenolic compound |
| 08/30/2001 | US20010018153 Photolithography |
| 08/30/2001 | US20010017939 Position detecting method, position detecting apparatus, exposure method, exposure apparatus and making method thereof, computer readable recording medium and device manufacturing method |
| 08/30/2001 | US20010017693 Image displacement test reticle for measuring aberration characteristics of projection optics |