| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/13/2001 | US20010021419 Method for applying photoresist to a base body surface |
| 09/13/2001 | US20010021239 X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device |
| 09/13/2001 | US20010021206 Laser repetition rate multiplier |
| 09/13/2001 | US20010021023 Pattern reading apparatus |
| 09/13/2001 | US20010021022 Pattern reading apparatus |
| 09/13/2001 | US20010021021 Pattern reading apparatus |
| 09/13/2001 | US20010021020 Inspection method, apparatus and system for circuit pattern |
| 09/13/2001 | US20010021019 Inspection method, apparatus and system for circuit pattern |
| 09/13/2001 | US20010021010 Exposure apparatus and exposure method |
| 09/13/2001 | US20010021009 Method and apparatus for controlling trajectory in a scan and step wafer stepper |
| 09/13/2001 | US20010020687 Surface position detecting system and method |
| 09/13/2001 | US20010020684 Reaction force isolation system |
| 09/13/2001 | US20010020676 Method of and apparatus for adjusting amount of light in image exposure recording system |
| 09/13/2001 | US20010020643 Substrate for device manufacture |
| 09/13/2001 | US20010020443 Method and apparatus for controlling air over a spinning microelectronic substrate |
| 09/13/2001 | US20010020442 Dispenser apparatus and associated method of heating |
| 09/13/2001 | DE10046023A1 Formation method of resist pattern for ion implantation, involves forming anti-reflective coating and resist on substrate, patterning resist to form hole and removing portions of coating exposed to bottom of hole |
| 09/13/2001 | DE10012017A1 Printing plate exposure device, has optical error and/or tolerance compensation device incorporated in electronic image processing device controlling light modulator |
| 09/13/2001 | DE10011202A1 Verfahren zur Ausrichtung eines Elektronenstrahls auf eine Zielposition an einer Substratoberfläche A method for aligning an electron beam to a target position on a substrate surface |
| 09/13/2001 | DE10011201A1 Photosensitive resist exposure method for electron beam lithography uses stepped displacement of substrate in coordinate directions with regulation of electron beam energy after each displacement |
| 09/13/2001 | DE10010619A1 Laser exposure device for photosensitive printing plate, has combined beam provided by individual laser beams of different wavelength focusing by deflection device with spectral dispersive element |
| 09/13/2001 | DE10010484A1 Device for growing large volume single crystals has heating element arranged on side walls of melt crucible to prevent lateral radial heat flow |
| 09/13/2001 | CA2402249A1 Three dimensional optical memory storage |
| 09/12/2001 | EP1132948A2 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing device |
| 09/12/2001 | EP1132945A2 Method and device for producing curved lines on an irradiation sensitive resist |
| 09/12/2001 | EP1132944A2 Method of aligning an electron beam with a target position on a substrate surface |
| 09/12/2001 | EP1132776A2 Method and apparatus for seamless imaging of sleeves as used in flexography |
| 09/12/2001 | EP1132775A1 Presensitized plate useful for preparing a lithographic printing plate |
| 09/12/2001 | EP1132774A2 Polymer, resist composition and patterning process |
| 09/12/2001 | EP1132773A1 Positive-type photosensitive polyimide precursor composition |
| 09/12/2001 | EP1131679A1 System to reduce heat-induced distortion of photomasks during lithography |
| 09/12/2001 | EP1131678A2 Antireflective composition for a deep ultraviolet photoresist |
| 09/12/2001 | EP1131677A1 Photoresists, polymers and processes for microlithography |
| 09/12/2001 | EP1131675A1 A mixed solvent system for positive photoresists |
| 09/12/2001 | CN1312490A Automatic developing device and method for supplementing developing liquid |
| 09/12/2001 | CN1312489A Chemical-amplifying type positive photoetching gel composition |
| 09/12/2001 | CN1312488A Chemical-amplifying type positive photoetching gel composition |
| 09/12/2001 | CN1312487A 4,4'-[1-[4-[1-(4-hydroxy-phenyl)-1-methyl ethyl]phenyl]-1,1-subethyl]bisphenol with low metal content |
| 09/12/2001 | CN1312486A 4,4'-[1-[4-[1-4-hydroxy-phenyl)-1-methyl ethyl]phenyl]-1,1-subethyl]bisphenol with low metal content |
| 09/12/2001 | CN1312475A Red-colouring corrosion-resisting stamp-pad ink and pigment optical filter |
| 09/12/2001 | CN1071035C Apparatus for managing liquid for removing glue used in photoetch |
| 09/11/2001 | USRE37361 Scanning type exposure apparatus and exposure method |
| 09/11/2001 | US6289499 Proximity correction software for wafer lithography |
| 09/11/2001 | US6289077 Transmission system for synchrotron radiation light |
| 09/11/2001 | US6289076 Transmission system for synchrotron radiation light |
| 09/11/2001 | US6288830 Optical image forming method and device, image forming apparatus and aligner for lithography |
| 09/11/2001 | US6288773 Method and apparatus for removing residual material from an alignment mark of a semiconductor wafer |
| 09/11/2001 | US6288772 Scanning exposure method and scanning type exposure apparatus |
| 09/11/2001 | US6288769 Optical device method of cleaning the same, projection aligner, and method of producing the same |
| 09/11/2001 | US6288561 Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus |
| 09/11/2001 | US6288556 Method of electrical measurement of misregistration of patterns |
| 09/11/2001 | US6288483 Light-emitting structure having specially configured dark region |
| 09/11/2001 | US6288407 Electron beam-writing apparatus and electron beam-writing method |
| 09/11/2001 | US6288404 Proximity lithography device |
| 09/11/2001 | US6287876 Reticle-substrate alignment methods for charged-particle-beam microlithography, and associated semiconductor-device manufacturing methods |
| 09/11/2001 | US6287749 For unsaturated compounds |
| 09/11/2001 | US6287748 Solid imaging compositions for preparing polyethylene-like articles |
| 09/11/2001 | US6287747 Photosensitive polymer having cyclic backbone and resist composition comprising the same |
| 09/11/2001 | US6287746 Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask |
| 09/11/2001 | US6287745 Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound |
| 09/11/2001 | US6287735 Drive the wafer towrd target; measuring position |
| 09/11/2001 | US6287734 Transferring pattern formed on mask using projection optical system |
| 09/11/2001 | US6287731 Methods for making microlithography masks utilizing temperature control |
| 09/11/2001 | US6287636 Process control; mixture of paint and diluent |
| 09/11/2001 | US6287390 Apparatus and method of cleaning nozzle and apparatus of processing substrate |
| 09/11/2001 | US6287024 Heating unit |
| 09/11/2001 | US6286644 Active vibration isolator, exposure apparatus, exposure method and device manufacturing method |
| 09/11/2001 | CA2229170C Laser plasma x-ray source, semiconductor lithography apparatus using the same and a method thereof |
| 09/07/2001 | WO2001065600A2 Nanoscale patterning for the formation of extensive wires |
| 09/07/2001 | WO2001065317A2 Method for evaluation of reticle image using aerial image simulator |
| 09/07/2001 | WO2001065314A2 Patterning methods and systems using reflected interference patterns |
| 09/07/2001 | WO2001065296A1 Reflection/refraction optical system and projection exposure apparatus comprising the optical system |
| 09/07/2001 | WO2001064975A2 Method and device for growing large-volume oriented monocrystals |
| 09/06/2001 | US20010020195 Process monitoring system for lithography lasers |
| 09/06/2001 | US20010020065 Vinyl 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer, vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate and preparation methods thereof |
| 09/06/2001 | US20010019812 Charged-particle-beam microlithography apparatus and methods for exposing a segmented reticle |
| 09/06/2001 | US20010019811 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 09/06/2001 | US20010019809 Methyl vinyl ether-maleimide copolymer |
| 09/06/2001 | US20010019808 Lift-off resist compositions |
| 09/06/2001 | US20010019806 Dry processing photography |
| 09/06/2001 | US20010019802 Forming light shield on substrate |
| 09/06/2001 | US20010019748 Optical structures for diffusing light |
| 09/06/2001 | US20010019625 Method and apparatus for reticle inspection using aerial imaging |
| 09/06/2001 | US20010019453 Light-transmitting optical member, manufacturing method thereof, evaluation method therefor, and optical lithography apparatus using the optical member |
| 09/06/2001 | US20010019413 Pattern reading apparatus |
| 09/06/2001 | US20010019412 Semiconductor wafer alignment methods and semiconductor wafer alignment tools |
| 09/06/2001 | US20010019411 Inspection method, apparatus and system for circuit pattern |
| 09/06/2001 | US20010019407 Method for inspecting exposure apparatus |
| 09/06/2001 | US20010019404 Projection exposure system for microlithography and method for generating microlithographic images |
| 09/06/2001 | US20010019403 Optical arrangement |
| 09/06/2001 | US20010019401 Exposure apparatus, microdevice, photomask, and exposure method |
| 09/06/2001 | US20010019400 Exposure apparatus |
| 09/06/2001 | US20010019399 Exposure apparatus |
| 09/06/2001 | US20010019298 Structure of making a thick film low value high frequency inductor |
| 09/06/2001 | US20010019250 Exposure apparatus and method utilizing isolated reaction frame |
| 09/06/2001 | US20010019229 Stage device capable of moving an object to be positioned precisely to a target position |
| 09/06/2001 | US20010019111 Surface position detecting system and method |
| 09/06/2001 | US20010019036 Thin-film patterning method, manufacturing method of thin-film device and manufacturing method of thin-film magnetic head |
| 09/06/2001 | US20010018877 Heat sensitive printing plate precursors |
| 09/06/2001 | DE10106565A1 Point diffraction interferometer is used in the manufacture of very high tolerance reflex mirrors and as an aid in projection alignment, with a pinhole mirror for beam bundling and splitting off a reference beam |