| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/20/2001 | WO2001068360A1 Flame retardant optical films |
| 09/20/2001 | WO2001068277A1 Processes and apparatus for treating electronic components |
| 09/20/2001 | WO2001018604A3 Method and apparatus for thermal processing a photosensitive element |
| 09/20/2001 | WO2001018603A3 Polymer for chemically amplified resist and a resist composition using the same |
| 09/20/2001 | WO2001016998A3 Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition |
| 09/20/2001 | US20010023137 Repairing photolithographic exposure masks by etching, extending over a length and a width equal of line pattern; repair accuracy |
| 09/20/2001 | US20010023052 Patterning using mask by reduction projection |
| 09/20/2001 | US20010023050 Chemical amplified photoresist |
| 09/20/2001 | US20010023045 Transferring integrated circuit pattern from amask to semiconductor substarte |
| 09/20/2001 | US20010023043 Dynamic random access memory |
| 09/20/2001 | US20010023042 Test object for detecting aberrations of an optical imaging system |
| 09/20/2001 | US20010022897 Substrate processing method and substrate processing apparatus |
| 09/20/2001 | US20010022693 Pattern reading apparatus |
| 09/20/2001 | US20010022691 Projection exposure system having a reflective reticle |
| 09/20/2001 | US20010022687 Reflection and refraction optical system and projection exposure apparatus using the same |
| 09/20/2001 | US20010022660 Method of conveying recording material and device for controlling conveying of recording material |
| 09/20/2001 | US20010022658 Apparatus for and method of recording image |
| 09/20/2001 | US20010022652 Substrate holder for lithographic apparatus |
| 09/20/2001 | US20010022611 Multiple-beam, diode-pumped imaging system |
| 09/20/2001 | US20010022425 Sheet material positioning method and apparatus |
| 09/20/2001 | US20010022405 Stepper alignment mark formation with dual field oxide process |
| 09/20/2001 | US20010022347 Electron emitters for lithography tools |
| 09/20/2001 | US20010022145 Printing plate automatic exposing device |
| 09/20/2001 | DE10007750A1 Process for enlarging the surface covering a relief-like polymer film used in semiconductor technology for the local modification of surfaces comprises subjecting the film to elevated temperature for a defined time |
| 09/20/2001 | CA2440992A1 Ultra-high resolution imaging devices |
| 09/20/2001 | CA2429702A1 Disposable modular hearing aid |
| 09/20/2001 | CA2391042A1 Exposure device and method for compensating optical defects |
| 09/19/2001 | EP1134793A1 Exposure method and exposure apparatus |
| 09/19/2001 | EP1134618A2 Alignment for lithography |
| 09/19/2001 | EP1134617A2 Pattern formation material and method |
| 09/19/2001 | EP1134077A2 Heat-sensitive lithographic printing plate precursor |
| 09/19/2001 | EP1133788A1 Silane-based oxide anti-reflective coating for patterning of metal features in semiconductor manufacturing |
| 09/19/2001 | EP1133715A2 Preparation of fractionated novolak resins by a novel extraction technique |
| 09/19/2001 | EP1133440A1 Automated opening and closing of ultra clean storage containers |
| 09/19/2001 | EP1000384A4 Latex-based, aqueous developable photopolymers and use thereof in printing plates |
| 09/19/2001 | EP0944708A4 Non-corrosive cleaning composition for removing plasma etching residues |
| 09/19/2001 | EP0917508B1 Lithographic plates |
| 09/19/2001 | EP0901650B1 Optical system for integrated circuit fabrication |
| 09/19/2001 | EP0830640B1 Stabilizers for use with photoacid precursor formulations |
| 09/19/2001 | CN2449258Y Multi-beam formation system for interference photoetching |
| 09/19/2001 | CN2449257Y Projection photoetching imaging filter |
| 09/19/2001 | CN1313962A Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition |
| 09/19/2001 | CN1313850A New unsaturated oxime derivatives and the use thereof as latent acids |
| 09/19/2001 | CN1313633A Substrate protecting device and exposoure device therewith |
| 09/19/2001 | CN1313630A Method for forming thin pattern on semiconductor device |
| 09/18/2001 | US6292255 Dose correction for along scan linewidth variation |
| 09/18/2001 | US6292254 Projection exposure method and apparatus |
| 09/18/2001 | US6291800 Heat treatment apparatus and substrate processing system |
| 09/18/2001 | US6291619 Heat resistance |
| 09/18/2001 | US6291540 Iodonium salt with low toxicity; e.g., (ch(ch3)2-c6h4)2-i+ |
| 09/18/2001 | US6291410 Compositions for the stripping of photoresists in the fabrication of integrated circuits |
| 09/18/2001 | US6291377 Silica glass and its manufacturing method |
| 09/18/2001 | US6291363 Surface treatment of DARC films to reduce defects in subsequent cap layers |
| 09/18/2001 | US6291183 A plurality of oligonucleotide linker molecules are attached on a planar solid support, photoremovable groups react with terminal ends of oligonucleotides, substrates exposed to light activate binding at selected areas; peptide synthesis |
| 09/18/2001 | US6291145 Image formation method with photosensitive material |
| 09/18/2001 | US6291143 Laser absorbable photobleachable compositions |
| 09/18/2001 | US6291142 Stripping photoresists, hydroxylamine, water, mono and diethanolamine, dimethyl sulfoxide and aromatic hydroxy compound |
| 09/18/2001 | US6291141 Washing solvent designed to remove the unpolymerised part of a layer of photopolymer exposed to light |
| 09/18/2001 | US6291140 Low-cost photoplastic cantilever |
| 09/18/2001 | US6291139 Process for fabricating three-dimensional polymer layer structures |
| 09/18/2001 | US6291136 Pixel electrodes and counter electrodes for tft array substrates |
| 09/18/2001 | US6291135 Semiconductor with photoresists, exposure to plasma and masking then development |
| 09/18/2001 | US6291134 Lithographic plate precursor |
| 09/18/2001 | US6291133 Photosensitive resin composition and flexographic resin plate |
| 09/18/2001 | US6291131 Monomers for photoresist, polymers thereof, and photoresist compositions using the same |
| 09/18/2001 | US6291130 Light sensitive composition. polymer, solubility, alkaline developers and silicon surfaces |
| 09/18/2001 | US6291129 Light sensitive element with unsaturated polymers |
| 09/18/2001 | US6291126 Thermal transfer element and process for forming organic electroluminescent devices |
| 09/18/2001 | US6291119 Exposure to rescattered electron beams, compensation exposure dosage |
| 09/18/2001 | US6291118 Elimination of proximity effect in photoresist |
| 09/18/2001 | US6291116 Thermal transfer element and process for forming organic electroluminescent devices |
| 09/18/2001 | US6291110 Exposing wafers, masking with programmable photolithography, controlling active electron distribution |
| 09/18/2001 | US6291060 Water-developable plate package |
| 09/18/2001 | US6291059 Foam core layer with surfaces and thermosetting seal layers of photopolymerization composition |
| 09/18/2001 | US6290881 Ultraviolet curable silver composition and related method |
| 09/18/2001 | US6290858 Manufacturing method for a micromechanical device |
| 09/13/2001 | WO2001067181A1 Wafer alignment |
| 09/13/2001 | WO2001067180A1 Method for forming resist pattern in reverse-tapered shape |
| 09/13/2001 | WO2001067179A2 Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates |
| 09/13/2001 | WO2001067178A1 Solder resist ink |
| 09/13/2001 | WO2001067176A1 Three dimensional optical memory storage |
| 09/13/2001 | WO2001066645A1 Resin composition, heat-resistant resin paste and semiconductor device using them and method for manufacture thereof |
| 09/13/2001 | WO2001066619A1 Polybenzoxazole precursors |
| 09/13/2001 | WO2001066272A1 Laser discharge chamber passivation by plasma |
| 09/13/2001 | WO1997007986A3 Water-less lithographic plates |
| 09/13/2001 | US20010021750 Polymer compound, method of producing the same, photosensitive composition, and pattern formation method |
| 09/13/2001 | US20010021586 Method of manufacturing semiconductor device |
| 09/13/2001 | US20010021577 Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby |
| 09/13/2001 | US20010021548 Alignment mark set and method of measuring alignment accuracy |
| 09/13/2001 | US20010021546 Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices |
| 09/13/2001 | US20010021490 Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same |
| 09/13/2001 | US20010021489 Photoresist stripping solution and a method of stripping photoresists using the same |
| 09/13/2001 | US20010021488 Cyclic urea |
| 09/13/2001 | US20010021487 Fine etching |
| 09/13/2001 | US20010021486 Substrate processing method and substrate processing apparatus |
| 09/13/2001 | US20010021484 Forming structures in photosensitive layer |
| 09/13/2001 | US20010021482 Acrylic polymer |
| 09/13/2001 | US20010021481 Heating to vaporize aromatic resin; conformation coating |
| 09/13/2001 | US20010021479 Positive photoresist composition |
| 09/13/2001 | US20010021475 Patterned layers; integraed circuits |