Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2013
09/26/2013WO2013141046A1 Resist upper layer film-forming composition for lithography
09/26/2013WO2013141015A1 Composition for forming resist lower layer film for euv lithography
09/26/2013WO2013141014A1 Novel compound and photosensitive resin composition
09/26/2013WO2013141009A1 Photosensitive conductive paste and method for producing conductive pattern
09/26/2013WO2013140979A1 Colored radiation-sensitive composition, colored cured film, color filter, pattern forming method, method for producing color filter, solid-state imaging element, and image display device
09/26/2013WO2013140969A1 Photoresist composition, compound and method for producing same
09/26/2013WO2013140638A1 Photosensitive resin composition, cured product thereof, and printed wiring board
09/26/2013WO2013140499A1 Exposure head and exposure device
09/26/2013WO2013139878A2 Arrangement and method for transporting radicals
09/26/2013WO2013139635A1 Illumination optical unit for euv projection lithography
09/26/2013WO2013139553A2 Lithographic apparatus, sensor and method
09/26/2013WO2013139483A2 Measuring system for measuring an imaging quality of an euv lens
09/26/2013WO2013113537A3 Optical element, lithographic apparatus incorporating such an element, method of manufacturing an optical element
09/26/2013WO2013087073A3 Substrate with a structured surface and methods for the production thereof, and methods for determining the wetting properties thereof
09/26/2013WO2013003665A3 Holographic storage method and article
09/26/2013US20130252429 Mask and method for fabricating semiconductor device
09/26/2013US20130252181 Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon
09/26/2013US20130252180 Resist composition, method of forming resist pattern and polymeric compound
09/26/2013US20130252178 Liquid Deposition Photolithography
09/26/2013US20130252177 Method for manufacturing a fine metal electrode
09/26/2013US20130252176 Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device
09/26/2013US20130252175 Litho Cluster and Modulization to Enhance Productivity
09/26/2013US20130252174 Method for Forming Fine Patterns of Semiconductor Device
09/26/2013US20130252173 Method of manufacturing electroforming mold, electroforming mold, and method of manufacturing electroformed component
09/26/2013US20130252172 Multi charged particle beam writing apparatus and multi charged particle beam writing method
09/26/2013US20130252171 Resist composition and method of forming resist pattern
09/26/2013US20130252170 Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process
09/26/2013US20130251965 Photo-patternable multifunctional polymer nanocomposite
09/26/2013US20130250418 Methods for fabricating retroreflector tooling and retroreflective microstructures and devices thereof
09/26/2013US20130250404 Optical lens and method of making the same
09/26/2013US20130250271 Stage assembly with secure device holder
09/26/2013US20130250270 Lithographic apparatus and device manufacturing method
09/26/2013US20130250269 Exposure apparatus
09/26/2013US20130250268 Illumination optical apparatus and projection exposure apparatus
09/26/2013US20130250267 Lithographic apparatus and device manufacturing method
09/26/2013US20130250266 Projection exposure apparatus with optimized adjustment possibility
09/26/2013US20130250265 Projection Exposure Apparatus for EUV Microlithography and Method for Microlithographic Exposure
09/26/2013US20130250264 Illumination system for illuminating a mask in a microlithographic exposure apparatus
09/26/2013US20130250262 Illumination optical system for projection lithography
09/26/2013US20130250261 Optical system and method of use
09/26/2013US20130250259 Exposure method, exposure apparatus, and method for producing device
09/26/2013US20130250258 Exposure method, exposure apparatus, and method for producing device
09/26/2013US20130250257 Exposure apparatus, and device manufacturing method
09/26/2013US20130248482 Methods of patterning layered-material and forming imprinting mold
09/26/2013US20130248382 Selective Masking by Photolithography (SMP) for Making Electrochemical Measurements
09/26/2013DE112011104571T5 Verfahren zum Ausbilden eines feinen Musters in einem großen Bereich unter Verwendung von Laser-Interferenz-Lithographie, Verfahren zum nicht-planaren Transfer des feinen Musters, ausgebildet durch das Verfahren und Artikel, an welchen das feine Muster durch das Transferverfahren transferiert ist A method of forming a fine pattern in a large area by using laser-interference lithography, methods for non-planar transfer of the fine pattern formed by the method and products, to which the fine pattern is transferred by the transfer method
09/26/2013DE102012204704A1 Messvorrichtung zum Vermessen einer Abbildungsgüte eines EUV-Objektives Measuring device for measuring an image quality of an EUV lens
09/26/2013DE102012204674A1 Strahlregelungsvorrichtung für einen EUV-Beleuchtungsstrahl Beam control apparatus for an EUV illumination beam
09/26/2013DE10027323B4 Verfahren zum Generieren eines dreidimensionalen Objekts A method for generating a three-dimensional object
09/25/2013EP2642511A1 Member for mounting and temperature controlled mounting device
09/25/2013EP2642341A2 Manufacturing method of an apparatus for the processing of single molecules
09/25/2013EP2641131A1 Silicate-free developer compositions
09/25/2013EP2641130A2 Method and apparatus for printing high-resolution two-dimensional periodic patterns
09/25/2013EP2640573A1 Methods of processing using silicate-free developer compositions
09/25/2013CN203217248U 曝光机 Exposure Machine
09/25/2013CN203217247U Semi-parallel light exposure machine lamp box
09/25/2013CN203217246U Lamp box mounting support
09/25/2013CN203217245U Light box system for scattered light exposure machine
09/25/2013CN203217244U Working framework for exposure machine
09/25/2013CN203217243U Air-cooling system for exposure machine
09/25/2013CN203217242U Appearance structure for exposure machine
09/25/2013CN203217241U UV (Ultraviolet) lamp air-cooling shutter
09/25/2013CN203217240U Self-adaptive imprinting head for large-area nanoimprinting
09/25/2013CN203217239U Large-area nano graphics device
09/25/2013CN203217238U Nano imprinting machine
09/25/2013CN203215952U Mounting support of air conditioning evaporator and fan
09/25/2013CN103329254A Substrate having etching mask and method for producing same
09/25/2013CN103329045A Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound
09/25/2013CN103329044A Photosensitive resin composition, and photosensitive material comprising same
09/25/2013CN103329043A Photosensitive composition comprising an acrylate compound
09/25/2013CN103329042A Photoresist resin composition
09/25/2013CN103329026A Magnifying imaging optical unit and metrology system comprising such an imaging optical unit
09/25/2013CN103328610A Use of surfactants having at least three short-chain perfluorinated groups for manufacturing integrated circuits having patterns with line-space dimensions below 50nm
09/25/2013CN103328526A Photopolymer formulation for producing holographic media
09/25/2013CN103328226A Member with concave portion and method for manufacturing same
09/25/2013CN103328176A Method for producing mold for fine pattern transfer, method for producing diffraction grating using same, and method for manufacturing organic el element which comprises the diffraction grating
09/25/2013CN103328175A Method for manufacturing photoaligning integrated large area metallic stamp, and method for manufacturing polymer optical device using same
09/25/2013CN103324370A Manufacturing method of OGS (one glass solution) capacitive touch screen by using full silver paste via hole
09/25/2013CN103324039A Cleaning system for selection plating product developing process
09/25/2013CN103324038A Developing device and developing method
09/25/2013CN103324037A Exposure device and method
09/25/2013CN103324036A Device and method for detecting ratio and distortion of projection objective
09/25/2013CN103324035A Mask plate and manufacture method of array base plate
09/25/2013CN103324034A Pellicles for use during euv photolithography processes
09/25/2013CN103324033A Exposure method and exposure system
09/25/2013CN103324032A Polyhedron main substrate, manufacturing method and processing method thereof
09/25/2013CN103324031A Photosensitive resin composition, color filter and liquid crystal display device
09/25/2013CN103324030A Positive photoresist composition and positive photoresist developing process
09/25/2013CN103324029A Photosensitive resin composition and cured product thereof, and printed circuit board
09/25/2013CN103324028A Ultraviolet-curable resin composition
09/25/2013CN103324026A Methods of patterning layered-material and forming imprinting mold
09/25/2013CN103324025A Mask plate and method for detecting exposure defects through mask plate
09/25/2013CN103319713A Curable resin, black photoresist, optical filter, preparation methods thereof, and display device
09/25/2013CN103317627A Methods for fabricating a retroreflector tooling and retroreflective microstructures and devices thereof
09/25/2013CN102662305B Micro-lens mould structure and manufacturing method thereof
09/25/2013CN102540718B Photosensitive resin composition for color filter and color filter using same
09/25/2013CN102269929B Patterned inorganic layers, radiation based patterning compositions and corresponding methods
09/25/2013CN102269928B Imprinting apparatus and imprinting method using same
09/25/2013CN102099742B Imaging optics
09/25/2013CN101878438B Methods for forming sheeting with a composite image that floats and a master tooling
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