| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/27/2001 | WO2000002089A9 Method of making optical replicas by stamping in photoresist and replicas formed thereby |
| 09/27/2001 | US20010024875 Method for patterning semiconductor devices on a silicon substrate using oxynitride film |
| 09/27/2001 | US20010024769 In an oxygen-free reaction chamber introducing etchant gases including methane and/or ammonia, generating a plasma and exposing the semiconductor to the plasma; will not oxidize low-k dielectric material such as an organosilicate |
| 09/27/2001 | US20010024768 Pattern forming material and pattern forming method |
| 09/27/2001 | US20010024767 Supplying a mixture of solutions where one has a smaller specific gravity than the other, and leaving the substrate until the mixed solution has separated into two solutions; line width uniformity of developed patterns |
| 09/27/2001 | US20010024766 Heat-sensitive lithographic printing plate precursor |
| 09/27/2001 | US20010024765 Without purifying resist materials formed by reaction, by reacting an alkali-soluble polymer having phenolic hydroxyl groups or carboxyl group with a vinyl ether and/or dialkyl carbonate in catalyst, aprotic solvent, adding acid generator |
| 09/27/2001 | US20010024763 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same |
| 09/27/2001 | US20010024762 Phenol novolak resin, production process thereof, and positive photoresist composition using the same |
| 09/27/2001 | US20010024760 Method of optical proximity correction |
| 09/27/2001 | US20010024759 Photopolymerizable elastomer |
| 09/27/2001 | US20010024731 Interleaf sheet for planographic printing plates, abutting member for planographic printing plates, and packaging structure for planographic printing plates |
| 09/27/2001 | US20010024403 Oscillation isolator |
| 09/27/2001 | US20010024330 Catadioptric reduction projection optical system |
| 09/27/2001 | US20010024314 Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element |
| 09/27/2001 | US20010024269 Exposure apparatus and device manufacturing method |
| 09/27/2001 | US20010024014 Sheet material fixing device |
| 09/27/2001 | US20010023972 Method for eliminating development related defects in photoresist masks |
| 09/27/2001 | US20010023927 Reaction force isolation system for a planar motor |
| 09/27/2001 | US20010023926 Method of forming a quadrupole device for projection lithography by means of charged particles |
| 09/27/2001 | US20010023918 Alignment apparatus, alignment method, exposure apparatus and exposure method |
| 09/27/2001 | US20010023647 Sensitised heat sensitive printing plate precursors |
| 09/27/2001 | US20010023522 Flexibly interconnected vacuum chambers comprising load-canceling device therebetween, and process apparatus comprising same |
| 09/27/2001 | DE10015502A1 Photostructurizable paste, for producing structurized resistance film or wiring trace on green ceramic substrate, contains platinum (compound) powder and optionally ceramic (precursor) as filler in light-sensitive organic binder |
| 09/27/2001 | DE10012523A1 Device for illuminating, scanning and/or reproducing document has read/write device extending parallel to surface of stationary bearer unit in y direction or x-y plane |
| 09/27/2001 | CA2397692A1 Apparatus for generating a laser pattern on a photomask and associated methods |
| 09/26/2001 | EP1137054A1 Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices |
| 09/26/2001 | EP1136887A2 Substrate holder for lithographic apparatus |
| 09/26/2001 | EP1136886A1 Positive-working presensitized plate useful for preparing a lithographic printing plate |
| 09/26/2001 | EP1136885A1 Chemically amplified positive resist composition and patterning method |
| 09/26/2001 | EP1136817A2 Method and apparatus for detecting concentration of solution, and apparatus for diluting and preparing agents |
| 09/26/2001 | EP1136282A2 Interleaf sheet for planographic printing plates, abutting member for planographic printing plates, and packaging structure for planographic printing plates |
| 09/26/2001 | EP1136281A1 Lithographic printing plate precursor |
| 09/26/2001 | EP1136272A2 Apparatus for and method of recording image |
| 09/26/2001 | EP1136256A1 Heat-sensitive lithographic printing plate precursor |
| 09/26/2001 | EP1135977A1 Method of manufacturing an interlayer via and a laminate precursor useful therefor |
| 09/26/2001 | EP1135846A1 Displacement device |
| 09/26/2001 | EP1135810A1 Indirect laser patterning of resist |
| 09/26/2001 | EP1135789A2 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
| 09/26/2001 | EP1135713A1 Composition and method for removing probing ink and negative photoresist from silicon wafers |
| 09/26/2001 | EP1135704A1 Process for producing light-guiding structures |
| 09/26/2001 | EP1135668A1 Dynamic beam steering interferometer |
| 09/26/2001 | EP1135267A1 Method for decoratively shaping a painted substrate surface |
| 09/26/2001 | EP1135266A1 Method for decorating the surface of a painted substrate |
| 09/26/2001 | CN2449917Y Silver salt diffusion transfer Al-based offset plate |
| 09/26/2001 | CN1314991A Methods and apparatus for measuring the thickness of a film, particularly of a photoresist film on a semiconductor substrate |
| 09/26/2001 | CN1314931A Water soluble resin composition |
| 09/26/2001 | CN1314618A Method for preparing multiple layer inner connection circuit |
| 09/26/2001 | CN1314617A Positive sensitive flat-plate printing plate |
| 09/26/2001 | CN1314607A Molded optic panel and its mold |
| 09/26/2001 | CN1314254A 平版印刷版 Lithographic printing plate |
| 09/26/2001 | CN1071911C Waterborne photoresists having binders neutralized with amino acrylates |
| 09/26/2001 | CN1071910C Waterborne Photoresists having non-ionic fluorocarbon surfactants |
| 09/25/2001 | USRE37391 Exposure method and projection exposure apparatus |
| 09/25/2001 | US6295637 Simulator for the post-exposure bake of chemically amplified resists |
| 09/25/2001 | US6295629 Focus correcting method and method of manufacturing semiconductor device |
| 09/25/2001 | US6295334 Transmission system for synchrotron radiation light |
| 09/25/2001 | US6295332 Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices |
| 09/25/2001 | US6295168 Refractive optical system that converts a laser beam to a collimated flat-top beam |
| 09/25/2001 | US6295164 Multi-layered mirror |
| 09/25/2001 | US6295153 Digital optical chemistry micromirror imager |
| 09/25/2001 | US6295133 Method and apparatus for modifying raster data |
| 09/25/2001 | US6295123 Multiple photon absorption for high resolution lithography |
| 09/25/2001 | US6295122 Illumination system and REMA objective with lens displacement and operating process therefor |
| 09/25/2001 | US6295121 Exposure apparatus |
| 09/25/2001 | US6295119 Scanning type exposure apparatus with multiple field diaphragms for providing consistent exposure |
| 09/25/2001 | US6295118 Optical arrangement for exposure apparatus |
| 09/25/2001 | US6295076 Method of increasing imaging resolution |
| 09/25/2001 | US6294909 Electro-magnetic lithographic alignment method |
| 09/25/2001 | US6294756 Thick film low value high frequency inductor, and method of making the same |
| 09/25/2001 | US6294630 For forming high resolutin pattern |
| 09/25/2001 | US6294465 Method for making integrated circuits having features with reduced critical dimensions |
| 09/25/2001 | US6294450 Nanoscale patterning for the formation of extensive wires |
| 09/25/2001 | US6294315 Method of forming a metal wiring by a dual damascene process using a photosensitive polymer |
| 09/25/2001 | US6294314 First opening is used to pattern the insulating layer to form a second opening within the insulating layer wherein the hard mask layer is to protect the deep ultra-violet photoresist layer. |
| 09/25/2001 | US6294313 Pattern forming body, pattern forming method, and their applications |
| 09/25/2001 | US6294312 Tonable, photosensitive composition and process for making polychromatic images |
| 09/25/2001 | US6294311 Underlayer contains a combination of polymeric materials that provides resistance both to fountain solution and to aggressive washes, such as a uv wash; can be used in either thermally imageable or photochemically imageable elements. |
| 09/25/2001 | US6294309 Positive photoresist composition containing alicyclic dissolution inhibitors |
| 09/25/2001 | US6294307 Imaging transfer system |
| 09/25/2001 | US6294298 Pigmented recording material having a backing coating for the production of offset printing plates |
| 09/25/2001 | US6294297 For a semiconductor manufacturing process. |
| 09/25/2001 | US6294099 Method of processing circular patterning |
| 09/25/2001 | US6294020 Device for applying photoresist to a base body surface |
| 09/20/2001 | WO2001069973A2 Disposable modular hearing aid |
| 09/20/2001 | WO2001069970A2 Hearing aid format selector |
| 09/20/2001 | WO2001069969A2 Remote programming and control means for a hearing aid |
| 09/20/2001 | WO2001069963A2 Through-hole and surface mount technologies for highly-automatable hearing aid receivers |
| 09/20/2001 | WO2001069916A1 Device and method for illuminating, scanning and/or reproducing a model |
| 09/20/2001 | WO2001069661A1 Laser exposure device |
| 09/20/2001 | WO2001069336A1 Touch calibration system for wafer transfer robot |
| 09/20/2001 | WO2001069321A1 Lithographic condenser |
| 09/20/2001 | WO2001069320A2 Exposure device and method for compensating optical defects |
| 09/20/2001 | WO2001069319A1 Photosensitive structural body for flexographic printing plate |
| 09/20/2001 | WO2001069318A1 Ceramic blank with a photostructurable functional layer containing platinum and method for production thereof |
| 09/20/2001 | WO2001069317A1 Device for transferring a pattern to an object |
| 09/20/2001 | WO2001069316A1 Exposure controlling photomask and production method therefor |
| 09/20/2001 | WO2001069299A1 Ultra-high resolution imaging devices |
| 09/20/2001 | WO2001068575A1 Fluoroalkylonium salt type cation or acid generator generating cation or acid upon irradiation with energy ray |
| 09/20/2001 | WO2001068567A2 Photostructured paste |