| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/04/2001 | US20010026900 Support and a recording layer whose solubility is altered by irradiation with infrared laser; used for printing plates, color filters, photoresists |
| 10/04/2001 | US20010026897 For manufacturing a semiconductor integrated circuit or liquid display element; high precision |
| 10/04/2001 | US20010026895 Alkali-soluble resin, photoacid generator, and dissolution inhibiting groups, increasing the sensitivity of the pattern formation material |
| 10/04/2001 | US20010026894 Photomask and exposure method for large scaled LCD device |
| 10/04/2001 | US20010026847 Polyimidesiloxane copolymer |
| 10/04/2001 | US20010026691 Substrate process method and substrate process apparatus |
| 10/04/2001 | US20010026638 Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same |
| 10/04/2001 | US20010026606 Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices |
| 10/04/2001 | US20010026448 Projection exposure apparatus |
| 10/04/2001 | US20010026408 Drive apparatus, exposure apparatus, and method of using the same |
| 10/04/2001 | US20010026402 Process for the decontamination of microlithographic projection exposure devices |
| 10/04/2001 | US20010026368 Mark position detecting system and method for detecting mark position |
| 10/04/2001 | US20010026367 Method and apparatus for inspecting optical device |
| 10/04/2001 | US20010026366 Method of measuring displacement of optical axis, optical microscope and evaluation mark |
| 10/04/2001 | US20010026360 Method of illumination uniformity in photolithographic systems |
| 10/04/2001 | US20010026358 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 10/04/2001 | US20010026356 Scanning exposure apparatus and device manufacturing method |
| 10/04/2001 | US20010026355 Exposure apparatus, exposure method, and device manufacturing method |
| 10/04/2001 | US20010026354 Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices |
| 10/04/2001 | US20010026313 Base structure, processing device, and image forming device |
| 10/04/2001 | US20010026312 Scan-exposure device |
| 10/04/2001 | US20010026309 Ablation image forming method |
| 10/04/2001 | US20010025932 Charged-particle-beam microlithography apparatus and methods including shielding of the beam from extraneous magnetic fields |
| 10/04/2001 | US20010025931 Charged particle beam system and chamber of charged particle beam system |
| 10/04/2001 | US20010025925 Charged particle beam system and pattern slant observing method |
| 10/04/2001 | US20010025890 Treatment solution supply apparatus and treatment solution supply method |
| 10/04/2001 | US20010025690 Bonding process |
| 10/04/2001 | EP1139706A2 Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same |
| 10/04/2001 | EP1139521A1 Light source and wavelength stabilization control method, exposure apparatus and exposure method, method for producing exposure apparatus, and device manufacturing method and device |
| 10/04/2001 | EP1139401A1 Composition for removing sidewall and method of removing sidewall |
| 10/04/2001 | EP1139384A2 Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method |
| 10/04/2001 | EP1139176A2 Lithographic apparatus and mask table |
| 10/04/2001 | EP1139175A2 Optical element holding device for exposure apparatus |
| 10/04/2001 | EP1139174A2 Illuminance measurement apparatus and exposure apparatus |
| 10/04/2001 | EP1139173A2 Microlithographic illumination system and microlithographic projection system with the same |
| 10/04/2001 | EP1139138A1 Projection exposure method and apparatus and projection optical system |
| 10/04/2001 | EP1138726A1 Polymer remover |
| 10/04/2001 | EP1138520A2 Protective interleaf sheet for planographic printing plates, and packaging method for planographic printing plates |
| 10/04/2001 | EP1138481A2 Lithographic printing machine and lithographic printing method |
| 10/04/2001 | EP1138091A1 Conductive structure based on poly-3,4-alkenedioxythiophene (pedot) and polystyrenesulfonic acid (pss) |
| 10/04/2001 | EP1138086A1 Improved microlens upon a photodetector |
| 10/04/2001 | EP1137970A2 Method and device for aligning two photo masks with each other and optionally, an unexposed printed circuit board blank, and for subsequent simultaneous exposure in the production of double-sided printed circuit boards |
| 10/04/2001 | EP1137969A1 Method of using a modulated exposure mask |
| 10/04/2001 | EP1137968A1 Novel photosensitive resin compositions |
| 10/04/2001 | EP1137675A1 Preparation of partially cross-linked polymers and their use in pattern formation |
| 10/04/2001 | EP0985267B1 Method of making surface wave devices |
| 10/04/2001 | DE10016395A1 Method for 3D visualizing of camera shots uses a film or video camera with two stereoscope lenses at an optic distance or at a flexible base distance. |
| 10/04/2001 | DE10016176A1 Microlithographic illumination system, has optical element that can detect entire light beam with continuously differentiable surface in near field and asymmetrical with respect to optical axis |
| 10/04/2001 | DE10012245A1 Keramischer Grünkörper mit einer platinhaltigen, photostrukturierbaren Funktionsschicht und Verfahren zu dessen Herstellung Ceramic green body with a platinum-containing, photostructurable functional layer and process for its preparation |
| 10/04/2001 | DE10011604A1 Polybenzoxazol-Vorstufen Polybenzoxazole precursors |
| 10/04/2001 | CA2342465A1 Organic pigments in colour filters of liquid chrystal displays |
| 10/03/2001 | CN1316068A Photosensitive resin composition and method for improving dry etching resistance of photosensitive resin composition |
| 10/03/2001 | CN1316067A Colour changing composition and colouring polymeric articles made therefrom |
| 10/03/2001 | CN1316066A Stereolithographic composition for preparing polyethylene-like articles |
| 10/03/2001 | CN1316061A Structure for micro-machine optical tool and method for making and using |
| 10/03/2001 | CN1315744A Magnetic guide piece, its making method and light mask using it |
| 10/03/2001 | CN1315678A Complete set of chemicals for high-temp high-contrast quick print |
| 10/03/2001 | CN1315677A Two-side exposure system |
| 10/03/2001 | CN1072367C Improved photoresist material containing photosensitive component for cathode-ray tube and its preparation method |
| 10/02/2001 | US6298473 Apparatus and method for inhibiting pattern distortions to correct pattern data in a semiconductor device |
| 10/02/2001 | US6298470 Method for efficient manufacturing of integrated circuits |
| 10/02/2001 | US6298080 Narrow band excimer or molecular fluorine laser with adjustable bandwidth |
| 10/02/2001 | US6297877 Methods for compensating for lens heating resulting from wafer reflectance in micro-photolithography equipment |
| 10/02/2001 | US6297871 Exposure apparatus |
| 10/02/2001 | US6297540 Microlens for surface mount products |
| 10/02/2001 | US6297521 Graded anti-reflective coating for IC lithography |
| 10/02/2001 | US6297419 Sintering a cast green body comprising a sol of oxidized zirconium originating from dissolved nuclear fuel rods for safe storage or disposal |
| 10/02/2001 | US6297352 Washing solution comprising water or a dilute solution of a water-soluble metal ion chelating agent; novolaks must contain low metal contaminants in advanced microlithographic electronic devices |
| 10/02/2001 | US6297294 Adding an adhesion promoter, which consists essentially of a polycarboxylic acid having three to six carbon atoms, to the photopolymerizable composition. |
| 10/02/2001 | US6296992 Contact apertures by phase shift method with photoresist film |
| 10/02/2001 | US6296991 Bi-focus exposure process |
| 10/02/2001 | US6296990 Gas bearing and lithographic apparatus including such a bearing |
| 10/02/2001 | US6296989 Silylation of epoxy-containing photoresist films |
| 10/02/2001 | US6296987 Method for forming different patterns using one mask |
| 10/02/2001 | US6296986 Multifunctional core with reactive groups and photoinitiators |
| 10/02/2001 | US6296985 Positive photoresist composition comprising a polysiloxane |
| 10/02/2001 | US6296984 Photoresists light sensitive layers on a substrate with chromophore of iodinium and sulfonium groups |
| 10/02/2001 | US6296982 Carboxy acid from cellulose polymer with 1,2,4-naphthoquinone diazide for printing plates, electronics or masking |
| 10/02/2001 | US6296977 Measurement of abberation of optical projection system, location of substrate, exposure to pattern and measurement displacement difference |
| 10/02/2001 | US6296976 Compensation of within-subfield linewidth variation in e-beam projection lithography |
| 10/02/2001 | US6296974 Method of forming a multi-layer photo mask |
| 10/02/2001 | US6296806 System for detecting base contamination in semiconductor processing comprising converter that oxygenates amines in received gas samples, detector coupled thereto that receives converted samples, producing signals representing amount |
| 10/02/2001 | US6296778 Method and apparatus for simulating standard test wafers |
| 10/02/2001 | US6296750 Composition including black matrix material |
| 10/02/2001 | US6296700 Method of producing a structured layer |
| 10/02/2001 | US6295929 External drum imaging system |
| 10/02/2001 | US6295841 Method pre-compaction of fused silica |
| 09/27/2001 | WO2001071778A2 Nanometric scale coherently controlled deposition |
| 09/27/2001 | WO2001071431A1 Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (h-tpip) |
| 09/27/2001 | WO2001071429A1 Method and composition for removing sodium-containing material from microcircuit substrates |
| 09/27/2001 | WO2001071428A1 Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board |
| 09/27/2001 | WO2001071426A2 Apparatus for generating a laser pattern on a photomask and associated methods |
| 09/27/2001 | WO2001071425A2 Method for two dimensional adaptive process control of critical dimensions during spin coating process |
| 09/27/2001 | WO2001071422A1 Scanning framing blade apparatus |
| 09/27/2001 | WO2001070517A1 High speed stripping for damaged photoresist |
| 09/27/2001 | WO2001070511A2 Ablatable processes imaging member and method of use |
| 09/27/2001 | WO2001070503A1 Method for centered screen printing and apparatus |
| 09/27/2001 | WO2001070502A2 Planographic thermal processless imaging member and methods of use |
| 09/27/2001 | WO2001070385A2 Method for producing microcapsules having improved wall characteristics |
| 09/27/2001 | WO2001033232A3 Precision stage |