| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/11/2001 | US20010028448 Exposure amount control method in exposure apparatus |
| 10/11/2001 | US20010028447 Exposure apparatus and method of cleaning optical element of the same |
| 10/11/2001 | US20010028446 Optical exposure apparatus of scanning exposure system and its exposing method |
| 10/11/2001 | US20010028443 Exposure apparatus, gas replacing method, and method of manufacturing a semiconductor device |
| 10/11/2001 | US20010028442 Resist processing method |
| 10/11/2001 | US20010028046 Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device |
| 10/11/2001 | US20010028039 Method for directing an electron beam onto a target position on a substrate surface |
| 10/11/2001 | US20010028037 Hollow-beam aperture for charged-particle-beam optical systems and microlithography apparatus, andbeam-adjustment methods employing same |
| 10/11/2001 | US20010027971 Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface |
| 10/11/2001 | US20010027748 Deposition apparatus |
| 10/11/2001 | US20010027595 Stage device, exposure apparatus incorporating the stage device, and method of using the same |
| 10/11/2001 | EP1144119A3 Trace metal ion reduction by ion exchange pack |
| 10/11/2001 | DE10112591A1 Production of a molded body used for molding a metal powder or a liquid resin comprises solidifying and/or melting a liquid or powdered raw material by irradiating with a laser beam corresponding to the cross-section of the molded body |
| 10/11/2001 | DE10025303A1 Organische Pigmente für Farbfilter in LCD Organic pigments for color filters in LCD |
| 10/11/2001 | DE10016925A1 Irisblende Iris |
| 10/11/2001 | DE10016008A1 Villagensystem und dessen Herstellung Village system and its production |
| 10/11/2001 | DE10011096A1 Verwendung von carboxylgruppenhaltigen Acetalpolymeren in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten Use of carboxyl-acetal in photosensitive compositions and lithographic printing plates |
| 10/10/2001 | EP1143498A2 Post etch photoresist and residue removal process |
| 10/10/2001 | EP1143492A1 Exposure apparatus and exposure method, and device and method for producing the same |
| 10/10/2001 | EP1143491A1 Optical device, exposure system, and laser beam source, and gas feed method, exposure method, and device manufacturing method |
| 10/10/2001 | EP1143301A1 Presensitized plate useful for preparing a lithographic printing plate |
| 10/10/2001 | EP1143300A1 Photoresist compositions and use of same |
| 10/10/2001 | EP1143299A1 Chemically amplified positive resist composition |
| 10/10/2001 | EP1143298A1 Photosensitive composition |
| 10/10/2001 | EP1143297A2 Method for forming pattern |
| 10/10/2001 | EP1143296A2 Method for forming pattern |
| 10/10/2001 | EP1142928A1 Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds |
| 10/10/2001 | EP1142922A2 Photo-curable resin composition, process for producing the same and products using the same |
| 10/10/2001 | EP1141995A1 Array of multiple charged particle beamlet emitting columns |
| 10/10/2001 | EP1141783A1 A printing stencil and a method for preparation thereof |
| 10/10/2001 | EP1141782A1 Using block copolymers as supercritical fluid developable photoresists |
| 10/10/2001 | EP1141781A1 Large-apertured projection lens with minimal diaphragm error |
| 10/10/2001 | EP1141780A1 An exposure device |
| 10/10/2001 | EP1141779A1 Method for depositing photoresist onto a substrate |
| 10/10/2001 | EP1141778A1 Novolac polymer planarization films with high temperature stability |
| 10/10/2001 | EP1141777A2 Photoresists and processes for microlithography |
| 10/10/2001 | EP1141776A1 Method for patterning thin films |
| 10/10/2001 | EP1141772A1 Color filters for flat panel displays |
| 10/10/2001 | EP1141444A1 Novel composition for selective etching of oxides over metals |
| 10/10/2001 | EP1141142A1 Improved method for producing thermally cleavable, soluble pigment derivatives |
| 10/10/2001 | EP1141074A1 Photo-polymerizable compositions and articles made therefrom |
| 10/10/2001 | EP1141063A1 High photo-sensitivity curable resin, photo-curable resin composition, production method thereof, color filter and liquid crystal display panel |
| 10/10/2001 | EP1140761A1 Benzophenones and the use thereof as photoinitiators |
| 10/10/2001 | EP1140516A1 Thermosensitive, polymeric image recording material and method for use |
| 10/10/2001 | EP1140024A2 Particles for oral delivery of peptides and proteins |
| 10/10/2001 | EP0746800B1 Process and device for the photomechanical production of structured surfaces, in particular for exposing offset plates |
| 10/10/2001 | CN1316675A Chemical amplifying type positive photoetching rubber composition |
| 10/10/2001 | CN1316444A Producing method of semiconductor device |
| 10/10/2001 | CN1316338A Method for making offset printing plate supporting body, affset printing plate supporting body and offset printing plate |
| 10/10/2001 | CN1072813C Method of developing positive photoresist and compositions therefor |
| 10/10/2001 | CN1072812C Photoimaging composition and dry plate coating the composition |
| 10/10/2001 | CN1072811C Novel matrix resin for high-temp. stable photoimageable compositions |
| 10/10/2001 | CN1072662C Phenyl alkyl ketone substituted by cyclic amine and process for preparation thereof |
| 10/09/2001 | US6301697 Streamlined IC mask layout optical and process correction through correction reuse |
| 10/09/2001 | US6301284 Narrow band UV laser with visible light guide laser |
| 10/09/2001 | US6301051 High fill-factor microlens array and fabrication method |
| 10/09/2001 | US6301008 Arrangement and method for calibrating optical line shortening measurements |
| 10/09/2001 | US6301001 Optical element manufacturing system, an illumination system, and an exposure apparatus |
| 10/09/2001 | US6301000 Dual-flexure light valve |
| 10/09/2001 | US6300671 Selectively etchable |
| 10/09/2001 | US6300253 Semiconductor processing methods of forming photoresist over silicon nitride materials, and semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
| 10/09/2001 | US6300240 Conforming antireflective coating on films, sharp pattern photoresists |
| 10/09/2001 | US6300043 Controlling and reducing thickness prior to photolithographic exposure; applying acidic solution to resist film to make alkali soluble; dissolving |
| 10/09/2001 | US6300042 Lithographic printing method using a low surface energy layer |
| 10/09/2001 | US6300037 Photosensitive resin composition and adhesive |
| 10/09/2001 | US6300036 Copolymer of maleic anhydride and 2-norbornene-5-methanol derivative; accurate patterns when exposed to argon fluoride lasers; dry etching resistance |
| 10/09/2001 | US6300035 Chemically amplified positive photoresists |
| 10/09/2001 | US6300034 Processing method and apparatus for imaged elements |
| 10/09/2001 | US6300033 Positive photoresist composition and process for forming resist pattern |
| 10/09/2001 | US6300023 Microlithographic pattern-transfer methods for large segmented reticles, and device manufacturing methods using same |
| 10/09/2001 | US6300022 Coating pigment dispersed slurry to form color filter layer; coating photosensitive resin; spraying powder of fluorescent dye; exposure, development |
| 10/09/2001 | US6300020 Ball-shaped device exposure apparatus and ball-shaped device manufacturing method |
| 10/09/2001 | US6300019 Prevents particle from lying on mask used for exposing a wafer and defocusing second particle lying on pellicle; antislipping agents; semiconductors |
| 10/09/2001 | US6299938 Apparatus and method of applying resist |
| 10/09/2001 | US6299697 Processing substrate with mixture of sulfuric acid and first hydrogen peroxide solution, supplying second hydrogen peroxide solution alone to substrate, rinsing substrate after supplying second solution for predetermined time period |
| 10/09/2001 | US6299363 Substrate processing apparatus |
| 10/09/2001 | US6299318 Mirror projector system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 10/04/2001 | WO2001073834A1 Method for etching sidewall polymer and other residues from the surface of semiconductor devices |
| 10/04/2001 | WO2001073825A1 Aligner, apparatus and method for transferring wafer, microdevice and method for manufacturing the same |
| 10/04/2001 | WO2001073769A1 Apparatus having line source of radiant energy for exposing a substrate |
| 10/04/2001 | WO2001073512A1 Chemical amplification type positive resist composition |
| 10/04/2001 | WO2001073511A1 Photocurable paste composition and formation of inorganic burned pattern therefrom |
| 10/04/2001 | WO2001073510A1 Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with the same |
| 10/04/2001 | WO2001073509A1 Novel photosensitive resin compositions |
| 10/04/2001 | WO2001072857A1 Resins curable with actinic radiation, process for the production thereof, and photo- and thermo-setting resin composition |
| 10/04/2001 | WO2001072649A1 Synthetic quartz glass member, photolithography apparatus, and method for producing photolithography apparatus |
| 10/04/2001 | WO2000041213A9 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 10/04/2001 | US20010027570 Stamp for use a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate |
| 10/04/2001 | US20010027351 Stocker, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 10/04/2001 | US20010027253 Photoactivatable nitrogen-containing bases based on alpha-amino ketones |
| 10/04/2001 | US20010027029 Thin-film patterning method, manufacturing method of thin-film device and manufacturing method of thin-film magnetic head |
| 10/04/2001 | US20010027027 Ferroelectric random access memory device and method for manufacture thereof |
| 10/04/2001 | US20010027021 Method for patterning semiconductor devices on a silicon substrate using oxynitride film |
| 10/04/2001 | US20010027016 Oxygen free plasma stripping process |
| 10/04/2001 | US20010026956 Fluorinated hard mask for micropattering of polymers |
| 10/04/2001 | US20010026905 A novolac resin, a radiation sensitive quinonediazide compound and a thioxanthone compound; used in fine processing of semiconductor integrated circuits |
| 10/04/2001 | US20010026904 A polymer with monomers of a robust alicyclic structure having both polar and acid labile groups; resist composition of improved reactivity, substrate adhesion and etching resistance |
| 10/04/2001 | US20010026903 Composition for lithographic anti-reflection coating, and resist laminate using the same |
| 10/04/2001 | US20010026902 A support member, a light-to-heat conversion layer that contains a polyurethane with carboxyl group, and a silicone rubber layer; does not generate toxic gas at the time of image formation and printing plate preparation |
| 10/04/2001 | US20010026901 (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it |