| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/18/2001 | US20010030934 Optical storage media and method for optical data storage via local changes in reflectivity of a format grating |
| 10/18/2001 | US20010030821 Color filter composition and color filter made therefrom |
| 10/18/2001 | US20010030798 Optical system for integrated circuit fabrication |
| 10/18/2001 | US20010030747 Method for aligning two objects |
| 10/18/2001 | US20010030740 Optical exposure apparatus and photo-cleaning method |
| 10/18/2001 | US20010030739 Exposure apparatus |
| 10/18/2001 | US20010030724 Liquid-crystal display device and colored resin substrate |
| 10/18/2001 | US20010030522 Guideless stage with isolated reaction stage |
| 10/18/2001 | US20010030289 Methods, based on a genetic algorithm, for configuring parameters of an array of multiple components for cooperative operation to achieve a desired performance result |
| 10/18/2001 | US20010029983 Microfabricated elastomeric valve and pump systems |
| 10/18/2001 | US20010029885 Apparatus for spin-coating semiconductor substrate and method of doing the same |
| 10/18/2001 | US20010029674 Abbe error correction system and method |
| 10/18/2001 | DE10115931A1 Production of lithographic printing plates using a plate material sensitive to violet laser light but insensitive to light of longer wavelength |
| 10/18/2001 | DE10103964A1 Lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Relief-Bildes unter Verwendung dieser Zusammensetzung The light-sensitive composition and method for forming a relief image using this composition |
| 10/18/2001 | DE10016341A1 Apparatus for cleaning a developer spray head in the production of semiconductor wafers has a water bath in the same rectangular shape with a controlled water flow to reduce cleaning times |
| 10/18/2001 | DE10015987A1 Automatic printing plate exposure assembly has overlapping conveyor belts to carry the plates through the exposure station between plate buffer stores and moving alignment pins position the plates for exposure |
| 10/17/2001 | EP1146395A2 Lithographic apparatus, device manufacturing method, and device manufactured by said method |
| 10/17/2001 | EP1146394A1 Photosensitive resin composition and method for improving dry etching resistance of photosensitive resin composition |
| 10/17/2001 | EP1146392A1 Method for on-site preparation of a relief image |
| 10/17/2001 | EP1146087A1 Organic pigments for LCD colour filter |
| 10/17/2001 | EP1145848A2 Lithographic printing plate precursor |
| 10/17/2001 | EP1145607A1 Production of photoresist coatings |
| 10/17/2001 | EP1145339A1 Method of producing vertical interconnects between thin film microelectronic devices and products comprising such vertical interconnects |
| 10/17/2001 | EP1145303A1 Method and device for optically monitoring processes for manufacturing microstructured surfaces in the production of semiconductors |
| 10/17/2001 | EP1145083A2 Hybrid surface modification process and article |
| 10/17/2001 | EP1145082A1 Reticle, wafer and method for determining an alignment error in a stepper |
| 10/17/2001 | EP1145081A1 Method for determining rotational error portion of total misalignment error in a stepper |
| 10/17/2001 | EP1145080A1 Reticle, wafer, measuring stepper and methods for preventative maintenance |
| 10/17/2001 | EP1145079A2 Method for determining misalignment between a reticle and a wafer |
| 10/17/2001 | EP1144476A1 Coating agents which can be hardened by the addition of isocyanate groups as well as by the radiation-induced addition of activated c-c double covalent bonds |
| 10/17/2001 | EP1144198A1 Thermal transfer element for forming multilayer devices |
| 10/17/2001 | EP1144197A1 Thermal transfer element and process for forming organic electroluminescent devices |
| 10/17/2001 | EP1144119A2 Trace metal ion reduction by ion exchange pack |
| 10/17/2001 | EP1053509A4 Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures |
| 10/17/2001 | EP0886667B1 Initiators for the cationic crosslinking of polymers containing organofunctional groups |
| 10/17/2001 | EP0885408B1 A screen printing stencil |
| 10/17/2001 | EP0843840B1 The provision of tracks on flat substrates by means of a stencil-printing method |
| 10/17/2001 | EP0677068B1 Using a lewis base to control molecular weight of novolak resins |
| 10/17/2001 | CN1318157A Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 10/17/2001 | CN1318014A Thermosensitive, polymeric image recording material and method for use |
| 10/17/2001 | CN1317725A Optical component keeper of exposure equipment |
| 10/16/2001 | US6304630 Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit |
| 10/16/2001 | US6304320 Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same |
| 10/16/2001 | US6304318 Lithography system and method of manufacturing devices using the lithography system |
| 10/16/2001 | US6304317 Projection apparatus and method |
| 10/16/2001 | US6304316 Microlithography system for high-resolution large-area patterning on curved surfaces |
| 10/16/2001 | US6303742 Characterized by a cinnamoyl group or a derived cinnamoyl group incorporated therein and by photo-reactivity and heat-reactivity which are inherent in the cinnamoyl group. |
| 10/16/2001 | US6303725 Cyclic dione polymer |
| 10/16/2001 | US6303724 Polycyclic copolymer compositions |
| 10/16/2001 | US6303670 Cellulose based coating composition curable with ultraviolet ray |
| 10/16/2001 | US6303477 Removal of organic anti-reflection coatings in integrated circuits |
| 10/16/2001 | US6303416 Method to reduce plasma etch fluting |
| 10/16/2001 | US6303277 Pattern forming method and method of manufacturing device having fine pattern |
| 10/16/2001 | US6303275 Method for resist filling and planarization of high aspect ratio features |
| 10/16/2001 | US6303271 Lithographic plates |
| 10/16/2001 | US6303270 Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor |
| 10/16/2001 | US6303268 Sensitivity to radiation |
| 10/16/2001 | US6303267 For offset printing plates or color proofs can be produced from the recording material |
| 10/16/2001 | US6303266 Resin useful for resist, resist composition and pattern forming process using the same |
| 10/16/2001 | US6303265 Storage stability of solution with solvent |
| 10/16/2001 | US6303264 Profile of pattern of quarter micron order without causing footing, while retaining high resolution ability and high sensitivity |
| 10/16/2001 | US6303263 For semiconductor manufacturing; performance |
| 10/16/2001 | US6303262 Photomask material, photomask and methods for the production thereof |
| 10/16/2001 | US6303260 Useful for a lift-off resist in a bilayer metal lift-off process |
| 10/16/2001 | US6303259 Heat and light-sensitive recording material and recording method with the same |
| 10/16/2001 | US6303251 At shape selection step, rectangular shapes are divided into a dense rectangular shape group and a non-dense rectangular shape group; at correction process selection step, a correction process suited for selected shape group is selected |
| 10/16/2001 | US6303230 For the manufacture of hard disk drive(hdd) suspensions of an integrated circuit/wiring structure with high accuracy |
| 10/16/2001 | US6302600 Apparatus for treating surface of boards |
| 10/16/2001 | US6302548 Catoptric reduction projection optical system and exposure apparatus and method using same |
| 10/16/2001 | US6301798 Method of measuring misalignment |
| 10/16/2001 | CA2072136C Stereolithographic construction techniques |
| 10/11/2001 | WO2001075946A1 Multibeam exposure apparatus comprising multiaxis electron lens, multiaxis electron lens for focusing multiple electron beam, and method for manufacturing semiconductor device |
| 10/11/2001 | WO2001075944A2 Dry silylation plasma etch process |
| 10/11/2001 | WO2001075939A2 Method and apparatus for increased workpiece throughput |
| 10/11/2001 | WO2001075932A2 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 10/11/2001 | WO2001075526A1 Positive-working, infrared-sensitive lithographic printing plate and method of imaging |
| 10/11/2001 | WO2001075525A1 Positive photosensitive polyimide resin composition |
| 10/11/2001 | WO2001075524A2 Solid imaging compositions for preparing polypropylene-like articles |
| 10/11/2001 | WO2001075523A2 Method and apparatus for multi-pass, interleaved imaging with offline rasterization |
| 10/11/2001 | WO2001075501A1 Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method |
| 10/11/2001 | WO2001074918A1 Photocurable composition, cured object, and process for producing the same |
| 10/11/2001 | WO2001074916A1 Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same |
| 10/11/2001 | WO2000001487A3 Trace metal ion reduction by ion exchange pack |
| 10/11/2001 | US20010029403 Method and apparatus for determining optimum exposure threshold for a given photolithographic model |
| 10/11/2001 | US20010029107 Resist pattern forming method and semiconductor device manufacturing method |
| 10/11/2001 | US20010028998 For an exposure lens in semiconductor lithography; leaves/sheets adjust opening |
| 10/11/2001 | US20010028997 Recovering method of support and useful ingredient from image forming material |
| 10/11/2001 | US20010028993 Maskless photoresist exposure system; photolithography; semiconductor wafers; printed circuit boards |
| 10/11/2001 | US20010028992 Preparing lithographic printing plates via ablatively removing particles of an imaging layer during exposure to radiation; vacuum filtration of toxic materials; materials handling |
| 10/11/2001 | US20010028991 Semiconductors; integrated circuits; lasers |
| 10/11/2001 | US20010028989 Pattern formation material and method |
| 10/11/2001 | US20010028985 Masking |
| 10/11/2001 | US20010028984 Electron beam exposure mask and pattern designing method thereof |
| 10/11/2001 | US20010028983 Radiation transparent substrate; forming pattern |
| 10/11/2001 | US20010028981 Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same |
| 10/11/2001 | US20010028669 Narrow band excimer or molecular fluorine laser with adjustable bandwidth |
| 10/11/2001 | US20010028495 Compositions and methods involving direct write optical lithography |
| 10/11/2001 | US20010028462 Interferometer system and method of manufacturing projection optical system using same |
| 10/11/2001 | US20010028456 Exposure method, exposure apparatus, and method for producing device |
| 10/11/2001 | US20010028449 Stage device, an exposure apparatus and a device manufacturing method using the same |