| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/24/2001 | EP1148390A2 Mark independent alignment sensor |
| 10/24/2001 | EP1148389A2 Lithographic apparatus, device manufacturing method, and device manufactured by said method |
| 10/24/2001 | EP1148388A1 Pattern formation material and pattern formation method |
| 10/24/2001 | EP1148387A1 Photosensitive lithographic printing plate and method for making the printing plate |
| 10/24/2001 | EP1148386A1 Self-contained humidity stabilized imaging media comprising microencapsulated color formers |
| 10/24/2001 | EP1148385A1 Self-contained imaging media comprising microencapsulated color formers and a resilient layer |
| 10/24/2001 | EP1148384A1 A self-contained imaging media comprising opaque laminated support |
| 10/24/2001 | EP1148383A1 Self-contained imaging media comprising microencapsulated color formers |
| 10/24/2001 | EP1148382A1 Self-contained imaging media comprising removable laminate |
| 10/24/2001 | EP1148381A1 Self contained imaging media comprising microencapsulated color formers and a ceramic barrier layer |
| 10/24/2001 | EP1148380A1 Self-contained imaging media comprising microencapsulated color formers and a chlorofluoropolymer support |
| 10/24/2001 | EP1148368A2 Device for combining housings or mountings for optical elements |
| 10/24/2001 | EP1148045A1 Ester compounds, polymers, resist compositions and patterning process |
| 10/24/2001 | EP1148044A1 Ester compounds, polymers, resist compositions and patterning process |
| 10/24/2001 | EP1148043A1 PROCESS FOR PRODUCING t-BUTYL ESTERS OF BRIDGED-RING POLYCARBOXYLIC ACIDS |
| 10/24/2001 | EP1147906A2 Multi-beam exposure apparatus |
| 10/24/2001 | EP1147884A2 Planographic printing plate precursor |
| 10/24/2001 | EP1147583A1 Energy stabilized gas discharge laser |
| 10/24/2001 | EP1147582A1 ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE |
| 10/24/2001 | EP1147581A1 Line narrowed f2 laser with etalon based output coupler |
| 10/24/2001 | EP1146967A1 Flow controller |
| 10/24/2001 | EP1080170A4 Cleaning composition and method for removing residues |
| 10/24/2001 | EP0990195B1 Low-cost photoplastic cantilever |
| 10/24/2001 | EP0983481B1 Two piece mirror arrangement for interferometrically controlled stage |
| 10/24/2001 | EP0904559B1 Short wavelength pulsed laser scanner |
| 10/24/2001 | EP0865617B1 Polariser made from brewster plates |
| 10/24/2001 | CN1319323A Method for producing etched circuit |
| 10/24/2001 | CN1319199A Photoresists, polymers and process for microlithography |
| 10/24/2001 | CN1318973A Positioning device for use in process for manufacturing multi-layer printed circuit board and its using method |
| 10/24/2001 | CN1318774A Photosensitive image recording material |
| 10/24/2001 | CN1318773A Photoresist composition for etch-resistant agent flowing process and method for forming contact hole using the same |
| 10/24/2001 | CN1318762A Method of making multimode interference type optical coupler on insulating silicon material layer |
| 10/24/2001 | CN1318593A Organic pigment for use in color filter of liquid crystal display |
| 10/24/2001 | CN1318509A Probe transferred particle method of making nanometer line structure |
| 10/23/2001 | US6308170 Gene expression and evaluation system |
| 10/23/2001 | US6307913 Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation |
| 10/23/2001 | US6307688 Optical system, in particular projection-illumination unit used in microlithography |
| 10/23/2001 | US6307682 Zoom illumination system for use in photolithography |
| 10/23/2001 | US6307635 Phase-shifting point diffraction interferometer mask designs |
| 10/23/2001 | US6307620 Substrate holding apparatus, substrate transfer system, exposure apparatus, coating apparatus, method for making a device, and method for cleaning a substrate holding section |
| 10/23/2001 | US6307619 Scanning framing blade apparatus |
| 10/23/2001 | US6307618 Projection exposure apparatus and device manufacturing method including a projection optical system having a pair of diffractive members |
| 10/23/2001 | US6307617 Initial alignment system for use in manufacturing an optical filter |
| 10/23/2001 | US6307616 Exposure apparatus and substrate handling system therefor |
| 10/23/2001 | US6307312 Immersion lens and electron beam projection system using the same |
| 10/23/2001 | US6307273 High contrast, low noise alignment mark for laser trimming of redundant memory arrays |
| 10/23/2001 | US6307209 Pattern-transfer method and apparatus |
| 10/23/2001 | US6307085 Process and composition for generation of acid |
| 10/23/2001 | US6307002 Polyimide composition and process for producing the same |
| 10/23/2001 | US6306990 Maleic acid diester monomers for polymer films and heat stable polymers |
| 10/23/2001 | US6306807 Post plasma ashing mixture includes ethanolamine, water and catechol |
| 10/23/2001 | US6306780 Method for making a photoresist layer having increased resistance to blistering, peeling, lifting, or reticulation |
| 10/23/2001 | US6306769 Use of dual patterning masks for printing holes of small dimensions |
| 10/23/2001 | US6306564 Removal of resist or residue from semiconductors using supercritical carbon dioxide |
| 10/23/2001 | US6306563 Optical devices made from radiation curable fluorinated compositions |
| 10/23/2001 | US6306558 Method of forming small contact holes using alternative phase shift masks and negative photoresist |
| 10/23/2001 | US6306557 Adding unsaturated photomonomer and/or plasticizer to carboxyl-group bearing acrylic resin solution, distilling out solvent to form resin paste, dissolving photoinitiator and alkali into paste, adding deionized water to form emulsion |
| 10/23/2001 | US6306556 Pattern forming material comprising copolymer including first group for generating base through irradiation with energy beam and second group having acidic property |
| 10/23/2001 | US6306555 Iodonium salts as latent acid donors |
| 10/23/2001 | US6306554 Photoresist composition comprising photoactive component and polymer that comprises a photoacid-labile moiety and structure containing oxygen and/or sulfur alicyclic units and carbon alicyclic units |
| 10/23/2001 | US6306553 Photosensitive composition and method of forming a pattern using the same |
| 10/23/2001 | US6306550 Liquid crystal display color filter fabricated by curing composition comprising dye containing photopolymerizable substituent or dye for color filters having molecular weight between 500 and 4000, and photosensitive resist resin |
| 10/23/2001 | US6306547 Photomask and manufacturing method thereof, and exposure method using the photomask |
| 10/23/2001 | US6306481 Multilayer circuit board having insulating layer with via-holes |
| 10/23/2001 | US6306463 Citric acid tri-alkylamide surfactants |
| 10/23/2001 | US6306272 Adding charged reactant materials to one or more channels in a chemical-reaction device; electrophoretically moving materials by supplying electrical potentials across selected electrodes in device whereby materials contact and react |
| 10/23/2001 | US6306254 Interleaf paper for photosensitive printing plate material |
| 10/23/2001 | US6305283 Imaging element for making lithographic printing plates with a decreased slippage in the press |
| 10/23/2001 | US6305097 Apparatus for in-situ reticle cleaning at photolithography tool |
| 10/23/2001 | US6305095 Methods and circuits for mask-alignment detection |
| 10/23/2001 | CA2047428C Flexographic printing plate process |
| 10/20/2001 | CA2338479A1 Self referencing mark independent alignment sensor |
| 10/18/2001 | WO2001078163A1 Method for producing organic light-emitting diodes |
| 10/18/2001 | WO2001078129A1 Inhibition of titanium corrosion |
| 10/18/2001 | WO2001078122A1 Method of forming structures on a semiconductor substrate |
| 10/18/2001 | WO2001078108A2 Wafer chuck having piezoelectric elements and method |
| 10/18/2001 | WO2001078103A2 Bi-directional electron beam scanning apparatus |
| 10/18/2001 | WO2001077753A1 Photoimageable, aqueous acid soluble polyimide polymers |
| 10/18/2001 | WO2001077752A2 Self-contained imaging assembly having improved peel strength |
| 10/18/2001 | WO2001077733A1 Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrate |
| 10/18/2001 | WO2001077719A1 Film coated optical lithography elements and method of making |
| 10/18/2001 | WO2001077716A2 High fill-factor microlens array and fabrication method |
| 10/18/2001 | WO2001077415A1 3-dimensional imprint tooling and method therefor |
| 10/18/2001 | WO2001077250A1 Near-infrared-absorbing composition and optical material |
| 10/18/2001 | WO2001076872A1 A method and an apparatus for controlling light intensity in connection with the exposure of photosensitive material |
| 10/18/2001 | WO2000043839A9 Hybrid aerial image simulation |
| 10/18/2001 | US20010031898 Organometallic monoacylarylphosphines |
| 10/18/2001 | US20010031501 Determining concentration of solution using mathematical formula which relates concentration to electroconductivity at a given temperature |
| 10/18/2001 | US20010031429 (Meth) acrylate, polymer, photoresist composition, and pattern forming process making use of the composition |
| 10/18/2001 | US20010031428 Made by reacting a hydroxyalkyl cellulose with an aryl isocyanate such as phenyl isocyanate; coatings have high etch rate and optical density |
| 10/18/2001 | US20010031426 Lithographic printing method using a low surface energy layer |
| 10/18/2001 | US20010031425 Before wet etching, surface treating by novolak coating, base treatment, or irradiating the patterned chemical amplification resist layer to form an insoluble layer on the resist layer, improving wet etching resistance |
| 10/18/2001 | US20010031424 Polymers having fused rings with polar and acid labile groups tetracyclo(4.4.0.1(2,5).1(7,10))dodec-3-ene-8-carboxylic acid, tert-butyl ester for example; resists with improved etch resistance, resolution and sensitivity |
| 10/18/2001 | US20010031423 Negative-working heat-sensitive lithographic printing plate precursor |
| 10/18/2001 | US20010031421 Comprising a blend of a divinyl ether of a (cyclo)alkanediol-crosslinked polyhydroxystyrene having acid labile hydroxyl blocking groups and a crosslinked acrylate-hydroxystyrene copolymer; dry etching resistance, high resolution |
| 10/18/2001 | US20010031420 Partially crosslinked polymer for bilayer photoresist |
| 10/18/2001 | US20010031419 Photosensitive polymer composition, method for forming relief patterns, and electronic parts |
| 10/18/2001 | US20010031406 Enables multiple device patterns to be arranged on photsensitive substrate with high accuracy; thin film magnetic heads |
| 10/18/2001 | US20010031191 Supporting system in exposure apparatus |
| 10/18/2001 | US20010031147 Substrate process method and substrate process apparatus |