| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/31/2001 | EP1150139A2 Multilayer system with protecting layer system and production method |
| 10/31/2001 | EP1149826A2 Ester compounds having alicyclic structure, and methods for preparing the same |
| 10/31/2001 | EP1149825A2 Ester compounds, polymers, resist compositions and patterning process |
| 10/31/2001 | EP1149328A1 Method and assembly for producing printing plates |
| 10/31/2001 | EP1110054A4 Methods and apparatus for measuring the thickness of a film, particularly of a photoresist film on a semiconductor substrate |
| 10/31/2001 | CN2457633Y Super high resolution radio super high speed laser holographic cutting and recording machine |
| 10/31/2001 | CN1319882A Method for forming pattern |
| 10/31/2001 | CN1319785A Exposure method and apparatus, method for making exposure apparatus and device |
| 10/31/2001 | CN1319784A Optical polymerism composition |
| 10/31/2001 | CN1074165C Optical mask with vernier |
| 10/31/2001 | CN1074142C 曝光装置 Exposure device |
| 10/31/2001 | CN1074141C Low metal ions p-cresol oligomers and photosensitive compositions |
| 10/31/2001 | CN1074140C Precoating sensitive plate and its prodn. method |
| 10/30/2001 | US6311319 Solving line-end shortening and corner rounding problems by using a simple checking rule |
| 10/30/2001 | US6310996 Writing Bragg gratings in optical waveguides |
| 10/30/2001 | US6310934 X-ray projection exposure apparatus and a device manufacturing method |
| 10/30/2001 | US6310850 Method and apparatus for optical data storage and/or retrieval by selective alteration of a holographic storage medium |
| 10/30/2001 | US6310689 Pattern reading apparatus |
| 10/30/2001 | US6310684 Method of measuring spherical aberration in projection system |
| 10/30/2001 | US6310680 Method of adjusting a scanning exposure apparatus and scanning exposure apparatus using the method |
| 10/30/2001 | US6310679 Projection exposure method and apparatus |
| 10/30/2001 | US6310189 Nucleotides and analogs having photoremoveable protecting groups |
| 10/30/2001 | US6310135 Polyimide resin composition |
| 10/30/2001 | US6310133 Antistatic coat, thermal transfer sheet having antistatic property and antistatic agent |
| 10/30/2001 | US6310020 Polycarboxylic acid or a salt thereof, organic silicon compound, water |
| 10/30/2001 | US6309991 Silica with low compaction under high energy irradiation |
| 10/30/2001 | US6309973 Semiconductor processing methods of forming a conductive projection and methods of increasing alignment tolerances |
| 10/30/2001 | US6309944 Overlay matching method which eliminates alignment induced errors and optimizes lens matching |
| 10/30/2001 | US6309822 Detecting adjustments in nucleotide sequences; provide probes, mix probes with nucleic acids, detect binding of probes to preferential nucleotide sequences |
| 10/30/2001 | US6309809 Multi-layer integrated imaging/image recording process with improved image tolerances |
| 10/30/2001 | US6309806 Method of providing microscopic features |
| 10/30/2001 | US6309804 Reducing contamination induced scumming, for semiconductor device, by acid treatment |
| 10/30/2001 | US6309800 Irradiating a mask to enlarge circuit pattern |
| 10/30/2001 | US6309799 Process for producing a printing form |
| 10/30/2001 | US6309798 Forming films; exposure to electron beams; washing; annealing |
| 10/30/2001 | US6309797 Containing oxidizer; exposure to actinic radiation |
| 10/30/2001 | US6309796 High molecular weight silicone compounds resist compositions, and patterning method |
| 10/30/2001 | US6309795 Resist composition |
| 10/30/2001 | US6309793 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations |
| 10/30/2001 | US6309791 Polyimide precursor, polyimide and their use |
| 10/30/2001 | US6309790 Organic anti-reflective coating material and its preparation |
| 10/30/2001 | US6309789 Mixture of perfluoroalkylsulfonic acid, amine, water soluble polymer, perfluorosulfonamide and water |
| 10/30/2001 | US6309781 Photomask provided with an ESD-precluding envelope |
| 10/30/2001 | US6309705 Process for fabricating high reflectance-low stress Mo—Si multilayer reflective coatings |
| 10/30/2001 | US6309698 Manufacturing process for a lead-frame forming material |
| 10/30/2001 | US6309580 Release surfaces, particularly for use in nanoimprint lithography |
| 10/30/2001 | US6309212 Substrate conveying system and device manufacturing method using the same |
| 10/30/2001 | US6309163 Wafer positioning device with storage capability |
| 10/30/2001 | US6309116 Substrate processing system |
| 10/30/2001 | US6308776 Temperature control apparatus with recirculated coolant |
| 10/25/2001 | WO2001080306A2 Automated process monitoring and analysis system for semiconductor processing |
| 10/25/2001 | WO2001080292A1 Pattern drawing apparatus and pattern drawing method |
| 10/25/2001 | WO2001079936A1 Mitigation of photoresist outgassing in vacuum lithography |
| 10/25/2001 | WO2001079935A1 Pattern generation system using a spatial light modulator |
| 10/25/2001 | WO2001079934A1 Chemically amplified resist and a resist composition |
| 10/25/2001 | WO2001079933A1 A substrate for and a process in connection with the product of structures |
| 10/25/2001 | WO2001079932A1 Method for measuring diffusion of photogenerated catalyst in chemically amplified resists |
| 10/25/2001 | WO2001079374A2 Stabilized cationically polymerizable composition, and adhesive film and conductor circuit comprising the same |
| 10/25/2001 | WO2001079324A1 Hydrogenated ring-opening metathesis copolymer and process for producing the same |
| 10/25/2001 | WO2001078889A2 A method of fabricating coded particles |
| 10/25/2001 | US20010034877 Photomask pattern shape correction method and corrected photomask |
| 10/25/2001 | US20010034427 Organic anti-reflective coating polymer and preparation thereof |
| 10/25/2001 | US20010034313 Solvent, alkanolamine, carboxylic acid, water; for photoresist |
| 10/25/2001 | US20010034131 Method of forming a pattern |
| 10/25/2001 | US20010034000 A pattern forming material comprising a copolymer including a first group for generating a base through irradiation with an energy beam and second group including a sulfonic acid group having an acidic property |
| 10/25/2001 | US20010033999 A pattern formation material includes a copolymer of acrylic nitrile wherein an alkyl or chloro or an alkyl group including chlorine atom is substituted at the alpha position of the main chain and a vinyl alkoxylated phneol comonomer |
| 10/25/2001 | US20010033998 Forming a photoresist layer of a positive type on a substrate, exposing to light and developing the photoresist layer using inversion mask having an opening at a site where a desired pattern to be formed, thus exposing the substrate |
| 10/25/2001 | US20010033997 Semiconductor processing methods |
| 10/25/2001 | US20010033996 Electronically controlled universal phase-shifting mask for stepper exposure method and system |
| 10/25/2001 | US20010033995 Electron device manufacturing method, a pattern forming method, and a photomask used for those methods |
| 10/25/2001 | US20010033994 Positive resist comprising a photoacid generator and a resin which changes its solubility in an alkali developer under the action of acid and has substituted by formula CYCLOHEXYL-(CH2)OCH(CH2CH3)- OR CYCLOHEXYL-OCH(CH2CH3)- |
| 10/25/2001 | US20010033993 Comprising a resin having an acid-decomposing group which is decomposed by the action of an acid to increase alkali solubility, compounds generate acid by irriadiation of active light (one contributes decomposition other does not), solvent |
| 10/25/2001 | US20010033992 Multilayer structure comprising ink receptive layer of an epoxy resin, a water receptive layer comprising colloidal particulate oxide or hydroxides of specific metal, and a layer containing a compound which changes light into heat |
| 10/25/2001 | US20010033990 A chemically amplified, positive resist comprising a sulfonium salt compound as photoacid generator, a base resin containing a monomer having alicyclic structure, and a solvent; heat treatment and exposure |
| 10/25/2001 | US20010033989 Fluoropolymer |
| 10/25/2001 | US20010033987 Chemically amplified positive resist composition |
| 10/25/2001 | US20010033981 Comprised of polyurethane; water developing properties; sensitivity, impact resilience, water resistance, and ink resistance |
| 10/25/2001 | US20010033976 Mask used in reduction projection exposure in photolithography |
| 10/25/2001 | US20010033895 Spreading and thining a coating supplied to center of a substrate by rotation, and supplying solbent vapor; low viscosity, uniformity, thinness; semiconductors |
| 10/25/2001 | US20010033894 Spreading thin liquid film, semiconductors |
| 10/25/2001 | US20010033796 Microfabricated elastomeric valve and pump sysems |
| 10/25/2001 | US20010033664 Hearing aid format selector |
| 10/25/2001 | US20010033634 High contrast ratio membrane mask |
| 10/25/2001 | US20010033490 Optical apparatus, exposure apparatus, and exposure method |
| 10/25/2001 | US20010033441 Color filter substrate, method of fabricating color filter substrate, liquid crystal device, method of fabricating liquid crystal device, and electronic apparatus |
| 10/25/2001 | US20010033437 Apparatus, system, and method for precision positioning and alignment of a lens in an optical system |
| 10/25/2001 | US20010033435 Optical element housing or mounting connector |
| 10/25/2001 | US20010033433 Illumination optical system in exposure apparatus |
| 10/25/2001 | US20010033421 Multi-layered mirror |
| 10/25/2001 | US20010033369 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method |
| 10/25/2001 | US20010033219 Photosensitive thick film composition and electronic device using the same |
| 10/25/2001 | US20010032936 Ion beam processing position correction method |
| 10/25/2001 | US20010032829 Hydroxylammonium salt |
| 10/25/2001 | US20010032704 Vacuum loadlock ultra violet bake for plasma etch |
| 10/25/2001 | US20010032665 Photovoltaic cell and solar cell utilizing the same |
| 10/25/2001 | US20010032396 Substrate processing method and substrate processing apparatus |
| 10/25/2001 | DE10019562A1 Vorrichtung zum Verbinden von Gehäusen oder Fassungen für optische Elemente A device for connecting casings or holders for optical elements |
| 10/25/2001 | DE10018168A1 Verfahren zum Herstellen von organischen, Licht emittierenden Dioden A process for the manufacture of organic light emitting diodes |
| 10/25/2001 | CA2406635A1 A method of fabricating coded particles |
| 10/25/2001 | CA2406307A1 Method for measuring diffusion of photogenerated catalyst in chemically amplified resists |